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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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NASA NTRS2015

Technology Demonstration Missions

Technology Demonstration Missions (TDM) is in its third year of execution, being initiated in 2010 and baselined in January of 2012. There are 11 projects that NASA Marshall Space Flight Center (MSFC) has contributed to or led: (1) Evolvable Cryogenics (eCryo): Cyrogenic Propellant Storage and Transfer Engineering Development Unit (EDU), a proof of manufacturability effort, used to enhance knowledge and technology related to handling cryogenic propellants, specifically liquid hydrogen. (2) Composites for Exploration Upper Stage (CEUS): Design, build, test, and address flight certification of a large composite shell suitable for the second stage of the Space Launch System (SLS). (3) Deep Space Atomic Clock (DSAC): Spaceflight to demo small, low-mass atomic clock that can provide unprecedented stability for deep space navigation. (4) Green Propellant Infusion Mission (GPIM): Demo of high-performance, green propellant propulsion system suitable for Evolved Expendable Launch Vehicle (EELV) Secondary Payload Adapter (ESPA)-class spacecraft. (5) Human Exploration Telerobotics (HET): Demonstrating how telerobotics, remote control of a variety of robotic systems, can take routine, highly repetitive, dangerous or long-duration tasks out of human hands. (6) Laser Communication Relay Demo (LCRD): Demo to advance optical communications technology toward infusion into deep space and near Earth operational systems, while growing the capabilities of industry sources. (7) Low Density Supersonic Decelerator (LDSD): Demo new supersonic inflatable decelerator and parachute technologies to enable Mars landings of larger payloads with greater precision at a wider range of altitudes. (8) Mars Science Laboratory (MSL) Entry Descent & Landing Instrumentation (MEDLI): Demo of embedded sensors embedded in the MSL heat shield, designed to record the heat and atmospheric pressure experienced during the spacecraft's high-speed, hot entry in the Martian atmosphere. (9) Solar Electric Propulsion (SEP): 50-kW class spacecraft that uses flexible blanket solar arrays for power generation and an electric propulsion system that delivers payload from low-Earth orbit to higher orbits. (10) Solar Sail Demonstration (SSD): Demo to validate sail deployment techniques for solar sails that are propelled by the pressure of sunlight. (11) Terrestrial HIAD Orbit Reentry (THOR): Demo of a 3.7-m Hypersonic Inflatable Aerodynamic Decelerator (HIAD) entry vehicle to test second generation aerothermal performance and modeling.

McDougal, John↗

NASA NTRS2019

Application and Development of Atomic Layer Deposition Techniques to Improve Thermo-Optical Coatings for Spacecraft Thermal Control and Advanced Optical Instruments

A key technology development driver in environmental control systems and next generation optics are discussed utilizing thin film development borrowed from the semiconductor industry. The optical and physical properties of spacecraft radiator coatings are dictated by orbital environmental conditions. For example, coatings must adequately dissipate charge buildup when orbital conditions, such as polar, geostationary or gravity neutral, result in surface charging. Current dissipation techniques include depositing a layer of ITO (indium tin oxide) on the radiator surface in a high temperature process. The application of these enhanced coatings must be such that the properties in question are tailored to mission-specific requirements. The multi-billion-dollar semiconductor industry has adopted Atomic Layer Deposition (ALD) for self-assembly and atomic-scale placement. ALD is a cost-effective nanoadditive-manufacturing technique that allows for the conformal coating of substrates with atomic control in a benign temperature and pressure environment. By using ALD, modification of these coatings can be accomplished during coating application preprocessing. The preprocessing is rendered directly on the coating dry pigment before binding. Through the introduction of paired precursor gases, thin films can be deposited on a myriad of substrates ranging from glass, polymers, aerogels, metals, powders, and other high aspect-ratio micro- and nano- structures. By providing atomic-level control, where single layers of atoms can be deposited, the fabrication of metal transparent films, precise nano-laminates, and coatings of nano-channels and pores is achievable. A method has been demonstrated for the ALD of In2O3 and films on a variety of substrates from Si(100) wafers, glass slides, and on Z93P pigments resulting in a direct spaceflight application. Results will be presented that verify the chemical composition of ALD pigments and charge dissipation properties when the pigment goes through its binding and coating process and we present early results of ALD for carbon nanotube formation and encapsulation.

Dwivedi, Vivek H.↗

DOE OSTI2025

Radiation‐Resistant Aluminum Alloy for Space Missions in the Extreme Environment of the Solar System

Future human exploration of the solar system demands advanced materials capable of withstanding extreme environments, particularly exposure to solar energetic particle radiation. Current material selection criteria for space applications prioritize a high strength-to-weight ratio, high corrosion resistance and manufacturability, favoring age-hardenable Al-based alloys. However, conventional precipitation-hardened Al alloys suffer from irradiation-assisted dissolution of strengthening phases at doses as low as 0.2 displacements-per-atom (dpa), undermining their performance. Furthermore, these alloys develop radiation-induced defects, such as dislocation loops and voids, even at low doses. This study presents a novel ultrafine-grained (UFG) Al-based alloy, designed using the crossover alloying concept and strengthened by T-phase precipitates, featuring a chemically-complex structure with 162 atoms in its unit cell composed of Mg 32 (Zn,Al) 49 . It is showed that T-phase precipitates have exceptional radiation tolerance up to 24 dpa. Owing to the nanoscale UFG structure, dislocation loops are suppressed, and voids are only observed beyond 75 dpa. Microtensile tests up to 20 dpa confirm the preservation of mechanical performance under irradiation. The results underline the potential of this alloy as a radiation-resistant, lightweight material for future space applications. Three key strategies enable this performance: (i) stabilization of a UFG microstructure, (ii) T-phase precipitation featuring a highly negative Gibbs free energy and chemically-complex giant unit cell, and (iii) precise process control to prevent grain growth during heat treatment and irradiation.

36 MATERIALS SCIENCE↗

DOE OSTI2024

Enhanced nucleation mechanism in ruthenium atomic layer deposition: Exploring surface termination and precursor ligand effects with RuCpEt(CO)2

Miniaturization of microelectronic devices necessitates atomic precision in manufacturing techniques, particularly in the deposition of thin films. Atomic layer deposition (ALD) is recognized for its precision in controlling film thickness and composition on intricate three-dimensional structures. This study focuses on the ALD nucleation and growth mechanisms of ruthenium (Ru), a metal that has significant future implications for microelectronics. Despite its advantages, the deposition of a high surface-free energy material like Ru on a low surface-free energy material such as an oxide often faces challenges of large nucleation delays and non-uniform growth. To address these challenges, we explored the effectiveness of organometallic surface pretreatments using trimethylaluminum (TMA) or diethylzinc (DEZ) to enhance Ru film nucleation and growth. Our study employed a less-studied Ru precursor, cyclopentadienylethyl(dicarbonyl)ruthenium [RuCpEt(CO)2], which demonstrated promising results in terms of reduced nucleation delay and increased film continuity. Ru ALD was performed on silicon substrates with native oxide, using RuCpEt(CO)2 and O2 as coreactants. Our findings reveal that surface pretreatment significantly improves nucleation density and film thickness within the initial 60 ALD cycles, achieving up to a 3.2-fold increase in Ru surface coverage compared to nonpretreated substrates. Supported by density functional theory calculations, we propose that the enhanced nucleation observed with RuCpEt(CO)2 compared to previously-studied Ru(Cp)2 is due to two key mechanisms: the facilitated removal of CO ligands during deposition, which enhances the reactivity of the precursor, and a hydrogen-abstraction reaction involving the ethyl ligand of RuCpEt(CO)2 and the metal-alkyl groups on the surface. This study not only advances our understanding of Ru ALD processes but also highlights the significant impact of precursor chemistry and surface treatments in optimizing ALD for advanced microelectronic applications.

Materials Science↗