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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 37 records · Page 2
All sourcesNASA NTRSDOE OSTI
NASA NTRS1988

Electron heating and the potential jump across fast mode shocks

Two different methods were applied to determine the cross-shock potential jump in the de Hoffmann-Teller reference frame, using a data set that represented 66 crossings of the terrestrial bow shock and 14 interplanetary shocks observed by various ISEE spacecraft, and one crossing each of the Jovian bow shock and the Uranian bow shock made by the Voyager spacecraft. Results for estimates of the electrostatic potential based on an estimate of the jump in electron enthalpy correlated well with estimates based on Liouville's theorem, although the Liouville-determined values were systematically the higher of the two, suggesting that significant irreversible processes contribute to the shape of the downstream distribution. The potential jump corresponds to approximately 12-15 percent of the incident ion ram kinetic energy, and was found not to be controlled by the Mach number, plasma beta, shock geometry, or electron to ion temperature ratios.

Schwartz, Steven J.↗
NASA NTRS2016

Fabrication of a Silicon Nanowire on a Bulk Substrate by Use of a Plasma Etching and Total Ionizing Dose Effects on a Gate-All-Around Field-Effect Transistor

The gate all around transistor is investigated through experiment. The suspended silicon nanowire for the next generation is fabricated on bulk substrate by plasma etching method. The scallop pattern generated by Bosch process is utilized to form a floating silicon nanowire. By combining anisotropic and istropic silicon etch process, the shape of nanowire is accurately controlled. From the suspended nanowire, the gate all around transistor is demonstrated. As the silicon nanowire is fully surrounded by the gate, the device shows excellent electrostatic characteristics.

Transistor↗
NASA NTRS2007

Numerical Simulations of Flow Separation Control in Low-Pressure Turbines using Plasma Actuators

A recently introduced phenomenological model to simulate flow control applications using plasma actuators has been further developed and improved in order to expand its use to complicated actuator geometries. The new modeling approach eliminates the requirement of an empirical charge density distribution shape by using the embedded electrode as a source for the charge density. The resulting model is validated against a flat plate experiment with quiescent environment. The modeling approach incorporates the effect of the plasma actuators on the external flow into Navier Stokes computations as a body force vector which is obtained as a product of the net charge density and the electric field. The model solves the Maxwell equation to obtain the electric field due to the applied AC voltage at the electrodes and an additional equation for the charge density distribution representing the plasma density. The new modeling approach solves the charge density equation in the computational domain assuming the embedded electrode as a source therefore automatically generating a charge density distribution on the surface exposed to the flow similar to that observed in the experiments without explicitly specifying an empirical distribution. The model is validated against a flat plate experiment with quiescent environment.

Suzen, Y. B.↗
NASA NTRS2010

Design of a Microwave Assisted Discharge Inductive Plasma Accelerator

A new plasma accelerator concept that employs electrodeless plasma preionization and pulsed inductive acceleration is presented. Preionization is achieved through an electron cyclotron resonance discharge that produces a weakly-ionized plasma at the face of a conical theta pinch-shaped inductive coil. The presence of the preionized plasma allows for current sheet formation at lower discharge voltages than those found in other pulsed inductive accelerators. The location of an electron cyclotron resonance discharge can be controlled through the design of the applied magnetic field in the thruster. A finite-element model of the magnetic field was used as a design tool, allowing for the implementation of an arrangement of permanent magnets that yields a small volume of preionized propellant at the coil face. This allows for current sheet formation at the face of the inductive coil, minimizing the initial inductance of the pulse circuit and maximizing the potential efficiency of the new accelerator.

Hallock, Ashley K.↗
NASA NTRS1982

Programable Plasma-Spray System

NASA-funded research led to development of automated plasma-spray system programable and reproducible. System utilizes standard plasma-spray equipment with noncoherent light-measuring system and microprocessor. System monitors and controls surface contours and coating thickness. Other advantages of system are consistant coating reproducibility, exact blending and feathering operations, ability to handle complex shapes and ease of changing spray parameters.

Fetheroff, C. W.↗
NASA NTRS2001

Vacuum Plasma Spray Forming of Tungsten Lorentz Force Accelerator Components

The Vacuum Plasma Spray (VPS) Laboratory at NASA's Marshall Space Flight Center has developed and demonstrated a fabrication technique using the VPS process to form anode sections for a Lorentz force accelerator from tungsten. Lorentz force accelerators are an attractive form of electric propulsion that provides continuous, high-efficiency propulsion at useful power levels for such applications as orbit transfers or deep space missions. The VPS process is used to deposit refractory metals such as tungsten onto a graphite mandrel of the desired shape. Because tungsten is reactive at high temperatures, it is thermally sprayed in an inert environment where the plasma gun melts and accelerates the metal powder onto the mandrel. A three-axis robot inside the chamber controls the motion of the plasma spray torch. A graphite mandrel acts as a male mold, forming the required contour and dimensions of the inside surface of the anode. This paper describes the processing techniques, design considerations, and process development associated with the VPS forming of the Lorentz force accelerator.

Zimmerman, Frank R.↗
NASA NTRS2004

Vacuum Plasma Spray Forming of Tungsten Lorentz Force Accelerator Components

The Vacuum Plasma Spray (VPS) Laboratory at NASA's Marshall Space Flight Center, working with the Jet Propulsion Laboratory, has developed and demonstrated a fabrication technique using the VPS process to form anode and cathode sections for a Lorentz force accelerator made from tungsten. Lorentz force accelerators are an attractive form of electric propulsion that provides continuous, high-efficiency propulsion at useful power levels for such applications as orbit transfers or deep space missions. The VPS process is used to deposit refractory metals such as tungsten onto a graphite mandrel of the desired shape. Because tungsten is reactive at high temperatures, it is thermally sprayed in an inert environment where the plasma gun melts and deposits the molten metal powder onto a mandrel. A three-axis robot inside the chamber controls the motion of the plasma spray torch. A graphite mandrel acts as a male mold, forming the required contour and dimensions for the inside surface of the anode or cathode of the accelerator. This paper describes the processing techniques, design considerations, and process development associated with the VPS forming of Lorentz force accelerator components.

Zimmerman, Frank R.↗
NASA NTRS2010

Design of a Microwave Assisted Discharge Inductive Plasma Accelerator

The design and construction of a thruster that employs electrodeless plasma preionization and pulsed inductive acceleration is described. Preionization is achieved through an electron cyclotron resonance discharge that produces a weakly-ionized plasma at the face of a conical theta pinch-shaped inductive coil. The presence of the preionized plasma allows for current sheet formation at lower discharge voltages than those employed in other pulsed inductive accelerators that do not employ preionization. The location of the electron cyclotron resonance discharge is controlled through the design of the applied magnetic field in the thruster. Finite element analysis shows that there is an arrangement of permanent magnets that yields a small volume of resonant magnetic field at the coil face. Preionization in the resonant zone leads to current sheet formation at the coil face, which minimizes the initial inductance of the pulse circuit and maximizes the potential electrical efficiency of the accelerator. A magnet assembly was constructed around an inductive coil to provide structural support to the selected arrangement of neodymium magnets. Measured values of the resulting magnetic field compare favorably with the finite element model.

Hallock, Ashley K.↗
NASA NTRS2003

Enhanced Design of Turbo-jet LPT by Separation Control Using Phased Plasma Actuators

This work deals with the documentation and control of flow separation that occurs over turbine blades in the low-pressure turbine stage at low Reynolds numbers that exist at high altitude cruise. We utilize a specially constructed linear cascade that is designed to study the flow field over a generic LPT cascade consisting of Pratt & Whitney 'Pak B' shaped blades. This facility was constructed under a previous one-year NASA Glenn RC initiative. The center blade in the cascade is instrumented to measure the surface pressure coefficient distribution. Optical access allows two-component LDV measurement for boundary layer profiles. Experimental conditions have been chosen to give a range of chord Reynolds numbers from 10 to 100K, and a range of free-stream turbulence levels from u'/U(sub infinity)= 0.08 to 3 percent. The surface pressure measurements were used to define a region of separation and reattachment that depend on the free-stream conditions. The location of separation was found to be relatively insensitive to the experimental conditions. However, reattachment location was very sensitive to the turbulence level and Reynolds number. Excellent agreement was found between the measured pressure distributions and predictions from Euler and RANS simulations. Two-component LDV measurements are presently underway to document the mean and fluctuating velocity components in the boundary layer over the center blade for the range of experimental conditions. The fabrication of the plasma actuator is underway. These are designed to produce either streamwise vortices, or a downstream-directed wall jet. A precursor experiment for the former approach was performed with an array of vortex generators placed just upstream of the separation line. These led to reattachment except for the lowest Reynolds number. Progress has also been made on the proposed concept for a laterally moving wake. This involved constructing a smaller wind tunnel and molding an array of symmetric airfoils to form an array. Following its development, it will be scaled up and used to introduce lateral moving wakes upstream up the Pak-B cascade.

Ashpis, David↗
NASA NTRS2010

Fabrication and Modification of Nanoporous Silicon Particles

Silicon-based nanoporous particles as biodegradable drug carriers are advantageous in permeation, controlled release, and targeting. The use of biodegradable nanoporous silicon and silicon dioxide, with proper surface treatments, allows sustained drug release within the target site over a period of days, or even weeks, due to selective surface coating. A variety of surface treatment protocols are available for silicon-based particles to be stabilized, functionalized, or modified as required. Coated polyethylene glycol (PEG) chains showed the effective depression of both plasma protein adsorption and cell attachment to the modified surfaces, as well as the advantage of long circulating. Porous silicon particles are micromachined by lithography. Compared to the synthesis route of the nanomaterials, the advantages include: (1) the capability to make different shapes, not only spherical particles but also square, rectangular, or ellipse cross sections, etc.; (2) the capability for very precise dimension control; (3) the capacity for porosity and pore profile control; and (4) allowance of complex surface modification. The particle patterns as small as 60 nm can be fabricated using the state-of-the-art photolithography. The pores in silicon can be fabricated by exposing the silicon in an HF/ethanol solution and then subjecting the pores to an electrical current. The size and shape of the pores inside silicon can be adjusted by the doping of the silicon, electrical current application, the composition of the electrolyte solution, and etching time. The surface of the silicon particles can be modified by many means to provide targeted delivery and on-site permanence for extended release. Multiple active agents can be co-loaded into the particles. Because the surface modification of particles can be done on wafers before the mechanical release, asymmetrical surface modification is feasible. Starting from silicon wafers, a treatment, such as KOH dipping or reactive ion etching (RIE), may be applied to make the surface rough. This helps remove the nucleation layer. A protective layer is then deposited on the wafer. The protective layer, such as silicon nitride film or photoresist film, protects the wafer from electrochemical etching in an HF-based solution. A lithography technique is applied to pattern the particles onto the protective film. The undesired area of the protective film is removed, and the protective film on the back side of the wafer is also removed. Then the pattern is exposed to HF/surfactant solution, and a larger DC electrical current is applied to the wafers for a selected time. This step removes the nucleation layer. Then a DC current is applied to generate the nanopores. Next, a large electrical current is applied to generate a release layer. The particles are mechanically suspended in the solvent and collected by filtration or centrifuge.

Ferrari, Mauro↗
NASA NTRS1980

A plasma-sprayed valve coating

Need to reduce wear on nickel alloy seats and poppets for Space Shuttle main engine led to fused cobalt/tungsten carbide coating. Coating, which is dense, wear-resistant, and nonporous, can be applied in controlled amounts to various substrate configurations. Ease of application to parts with intricate shapes and contours should make coating useful in automotive and aircraft manufacturing.

Brennan, A.↗
NASA NTRS1985

Experimental performance of a microwave cavity plasma disk ion source

The detailed description and performance characteristics of a microwave ion source are presented. This ion source utilizes an internally tuned, single-mode (or selective multimode) cylindrical cavity applicator to focus and match microwave energy into a disk-shaped discharge zone. The combination of mode focus control and variable, internal cavity matching allows the efficient operation and beam extraction over a wide range of pressures, powers and gaseous inputs. Experimental measurements of ion beam current versus accelerating voltage and input microwave power in xenon and oxygen gas are presented. Ion source specific energy and mass utilization versus experimental variables are also determined. The experimental performance demonstrates the ability of this ion source to extract an ion beam with a well matched, stable, and continuous operation over a wide range of input gases, low pressures, and over input gas flow rates in excess of 100 to a few sccm. Double Langmuir probe measurements in xenon gas indicate high degrees of ionization, and electron and ion concentrations in excess of 100 critical densities in the microwave discharge zone. This ion source has many potential uses such as spacecraft electric propulsion, material ion beam processing, and neutral beam ion sources.

Root, J.↗
NASA NTRS2013

Fabrication Methods for Adaptive Deformable Mirrors

Previously, it was difficult to fabricate deformable mirrors made by piezoelectric actuators. This is because numerous actuators need to be precisely assembled to control the surface shape of the mirror. Two approaches have been developed. Both approaches begin by depositing a stack of piezoelectric films and electrodes over a silicon wafer substrate. In the first approach, the silicon wafer is removed initially by plasmabased reactive ion etching (RIE), and non-plasma dry etching with xenon difluoride (XeF2). In the second approach, the actuator film stack is immersed in a liquid such as deionized water. The adhesion between the actuator film stack and the substrate is relatively weak. Simply by seeping liquid between the film and the substrate, the actuator film stack is gently released from the substrate. The deformable mirror contains multiple piezoelectric membrane layers as well as multiple electrode layers (some are patterned and some are unpatterned). At the piezolectric layer, polyvinylidene fluoride (PVDF), or its co-polymer, poly(vinylidene fluoride trifluoroethylene P(VDF-TrFE) is used. The surface of the mirror is coated with a reflective coating. The actuator film stack is fabricated on silicon, or silicon on insulator (SOI) substrate, by repeatedly spin-coating the PVDF or P(VDFTrFE) solution and patterned metal (electrode) deposition. In the first approach, the actuator film stack is prepared on SOI substrate. Then, the thick silicon (typically 500-micron thick and called handle silicon) of the SOI wafer is etched by a deep reactive ion etching process tool (SF6-based plasma etching). This deep RIE stops at the middle SiO2 layer. The middle SiO2 layer is etched by either HF-based wet etching or dry plasma etch. The thin silicon layer (generally called a device layer) of SOI is removed by XeF2 dry etch. This XeF2 etch is very gentle and extremely selective, so the released mirror membrane is not damaged. It is possible to replace SOI with silicon substrate, but this will require tighter DRIE process control as well as generally longer and less efficient XeF2 etch. In the second approach, the actuator film stack is first constructed on a silicon wafer. It helps to use a polyimide intermediate layer such as Kapton because the adhesion between the polyimide and silicon is generally weak. A mirror mount ring is attached by using adhesive. Then, the assembly is partially submerged in liquid water. The water tends to seep between the actuator film stack and silicon substrate. As a result, the actuator membrane can be gently released from the silicon substrate. The actuator membrane is very flat because it is fixed to the mirror mount prior to the release. Deformable mirrors require extremely good surface optical quality. In the technology described here, the deformable mirror is fabricated on pristine substrates such as prime-grade silicon wafers. The deformable mirror is released by selectively removing the substrate. Therefore, the released deformable mirror surface replicates the optical quality of the underlying pristine substrate.

Toda, Risaku↗
NASA NTRS2016

Unpredictable Variable Prenatal Stress Programs Expression of Genes Involved in Appetite Control and Energy Expenditure

Exposure to stress in the womb shapes neurobiological and physiological outcomes of offspring in later life, including body weight regulation and metabolic profiles. Our previous work utilizing a centrifugation-induced hyper-gravity demonstrated significantly increased (8-15%) body mass in male, but not female, rats exposed throughout gestation to chronic 2-g from conception to birth. We reported a similar outcome in adult offspring exposed throughout gestation to Unpredictable Variable Prenatal Stress (UVPS). Here we examine gene expression changes and the plasma of animals treated with our UVPS model to identify a potential role for prenatal stress in this hypergravity programming effect. Specifically we focused on appetite control and energy expenditure pathways in prenatally stressed adult (90-day-old) male Sprague-Dawley rats.

Prenatal Stress↗
NASA NTRS2003

Factors Controlling the Position of the Martian Magnetic Pileup Boundary

The magnetic pileup boundary (MPB) at Mars is the position where the dominant ion of the plasma changes from solar wind protons to heavy ions of planetary origin. As such, it is the obstacle to solar wind ions. We investigate the factors that influence the shape and position of the magnetic pileup boundary at Mars in order to better understand the Martian obstacle to the solar wind. Employing MGS data, we determine how the Martian MPB moves in response to factors including solar wind pressure and crustal magnetic fields. We also study the factors affecting the thickness of the MPB. Further, we compare the magnetic pileup boundary to the magnetic barrier at Venus. Direct comparison aids in our interpretation of the physics involved in the solar wind interaction with planets lacking a significant intrinsic magnetic field.

D H Crider↗
NASA NTRS2000

Helicon Plasma Injector and Ion Cyclotron Acceleration Development in the VASIMR Experiment

In the Variable Specific Impulse Magnetoplasma Rocket (VASIMR) radio frequency (rf) waves both produce the plasma and then accelerate the ions. The plasma production is done by action of helicon waves. These waves are circular polarized waves in the direction of the electron gyromotion. The ion acceleration is performed by ion cyclotron resonant frequency (ICRF) acceleration. The Advanced Space Propulsion Laboratory (ASPL) is actively developing efficient helicon plasma production and ICRF acceleration. The VASIMR experimental device at the ASPL is called VX-10. It is configured to demonstrate the plasma production and acceleration at the 10kW level to support a space flight demonstration design. The VX-10 consists of three electromagnets integrated into a vacuum chamber that produce magnetic fields up to 0.5 Tesla. Magnetic field shaping is achieved by independent magnet current control and placement of the magnets. We have generated both helium and hydrogen high density (>10(exp 18) cu m) discharges with the helicon source. ICRF experiments are underway. This paper describes the VX-10 device, presents recent results and discusses future plans.

Squire, Jared P.↗
NASA NTRS2005

Carbon Nanotubes/Nanofibers by Plasma Enhanced Chemical Vapour Deposition

Plasma enhanced chemical vapour deposition (PECVD) has been recently used for the production of vertically aligned carbon nanotubedfibers (CN) directly on substrates. These structures are potentially important technologically as electron field emitters (e.g. microguns, microwave amplifiers, displays), nanoelectrodes for sensors, filter media, superhydrophobic surfaces and thermal interface materials for microelectronics. A parametric study on the growth of CN grown by glow discharge dc-PECVD is presented. In this technique, a substrate containing thin film Ni catalyst is exposed to C2H2 and NH3 gases at 700 C. Without plasma, this process is essentially thermal CVD which produces curly spaghetti-like CN as seen in Fig. 1 (a). With the plasma generated by biasing the substrate at -6OOV, we observed that the CN align vertically during growth as shown in Fig. l(b), and that the magnitude of the applied substrate bias affects the degree of alignment. The thickness of the thin film Ni catalyst was found to determine the average diameter and inversely the length of the CN. The yield and density of the CN were controlled by the use of different diffusion barrier materials under the Ni catalyst. Patterned CN growth [Fig. l(c)], with la variation in CN diameter of 4.1% and 6.3% respectively, is achieved by lithographically defining the Ni thin film prior to growth. The shape of the structures could be varied from very straight nanotube-like to conical tip-like nanofibers by increasing the ratio of C2H2 in the gas flow. Due to the plasma decomposition of C2H2, amorphous carbon (a-C) is an undesirable byproduct which could coat the substrate during CN growth. Using a combination of depth profiled Auger electron spectroscopy to study the substrate and in-situ mass spectroscopy to examine gas phase neutrals and ions, the optimal conditions for a-C free growth of CN is determined.

Teo, K. B. K.↗
NASA NTRS1993

Robotic Variable Polarity Plasma Arc (VPPA) Welding

The need for automated plasma welding was identified in the early stages of the Space Station Freedom Program (SSFP) because it requires approximately 1.3 miles of welding for assembly. As a result of the Variable Polarity Plasma Arc Welding (VPPAW) process's ability to make virtually defect-free welds in aluminum, it was chosen to fulfill the welding needs. Space Station Freedom will be constructed of 2219 aluminum utilizing the computer controlled VPPAW process. The 'Node Radial Docking Port', with it's saddle shaped weld path, has a constantly changing surface angle over 360 deg of the 282 inch weld. The automated robotic VPPAW process requires eight-axes of motion (six-axes of robot and two-axes of positioner movement). The robot control system is programmed to maintain Torch Center Point (TCP) orientation perpendicular to the part while the part positioner is tilted and rotated to maintain the vertical up orientation as required by the VPPAW process. The combined speed of the robot and the positioner are integrated to maintain a constant speed between the part and the torch. A laser-based vision sensor system has also been integrated to track the seam and map the surface of the profile during welding.

Jaffery, Waris S.↗