Oxide scale stresses in polycrystalline Ni200
An X-ray diffraction method has been successfully used to measure the oxidation stresses at room temperature in annealed and electropolished samples of polycrystalline Ni200 coupons oxidized in the temperature range 760 to 982 C for 4 h. The stresses on the free surface of the oxide were compressive and the average stress through the thickness normal to the oxide layer was found to be tensile. Surface stresses on the oxides formed at temperatures up to 927 C were found to be isotropic and both surface stresses and the average normal stress increased with increasing temperature of oxidation. At 982 C, the surface stresses were lower and this was attributed to the deformation and fracture of oxide layer resulting in stress relation.