Properties of oxidized silicon as determined by angular-dependent X-ray photoelectron spectroscopy
Silicon with thermally-grown oxide overlayers in the thickness range 15-89 A is studied by angular-dependent XPS. Electron attenuation lengths at 1382 eV are found to be 37 plus or minus 4 A in SiO2 and 27 plus or minus 6 A in Si. Single-crystal effects and thin-layer anomalies are also discussed.