Search NASA⌕ Search

SEARCH · Search NASA

Results for “Electron beams”

Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

Quote a phrase for an exact phrase match. Source license links do not imply unrestricted reuse.

At least 55 records · Page 3

Electron-Beam-Related Studies of Halide Perovskites: Challenges and Opportunities

Electron beam microscopy and related characterization techniques play an important role in revealing the microstructural, morphological, physical, and chemical information of halide perovskites and their impact on associated optoelectronic devices. However, electron beam irradiation usually causes damage to these beam-sensitive materials, negatively impacting their device performance, and complicating this interpretation. Here, the electron microscopy and spectroscopy techniques are reviewed that are crucial for the understanding of the crystallization and microstructure of halide perovskites. In addition, special attention is paid to assessing and mitigating the electron beam-induced damage caused by these techniques. Since the halide perovskites are fragile, a protocol involving delicate control of both electron beam dose and dose rate, coupled with careful data analysis, is key to enable the acquisition of reliable structural and compositional information such as atomic-resolution images, chemical elemental mapping and electron diffraction patterns. Limiting the electron beam dose is critical parameter enabling the characterization of various halide perovskites. Novel methods to unveil the mechanisms of device operation, including charge carrier generation, diffusion, and extraction are presented in scanning electron microscopy studies combined with electron-beam-induced current and cathodoluminescence mapping. Future opportunities for electron-beam-related characterizations of halide perovskites are also discussed.

36 MATERIALS SCIENCE↗

Exploring electron-beam induced modifications of materials with machine-learning assisted high temporal resolution electron microscopy

Directed atomic fabrication using an aberration-corrected scanning transmission electron microscope (STEM) opens new pathways for atomic engineering of functional materials. In this approach, the electron beam is used to actively alter the atomic structure through electron beam induced irradiation processes. One of the impediments that has limited widespread use thus far has been the ability to understand the fundamental mechanisms of atomic transformation pathways at high spatiotemporal resolution. Here, we develop a workflow for obtaining and analyzing high-speed spiral scan STEM data, up to 100 fps, to track the atomic fabrication process during nanopore milling in monolayer MoS 2 . An automated feedback-controlled electron beam positioning system combined with deep convolution neural network (DCNN) was used to decipher fast but low signal-to-noise datasets and classify time-resolved atom positions and nature of their evolving atomic defect configurations. Through this automated decoding, the initial atomic disordering and reordering processes leading to nanopore formation was able to be studied across various timescales. Using these experimental workflows a greater degree of speed and information can be extracted from small datasets without compromising spatial resolution. This approach can be adapted to other 2D materials systems to gain further insights into the defect formation necessary to inform future automated fabrication techniques utilizing the STEM electron beam.

36 MATERIALS SCIENCE↗

Valence Electron Distributions from Sub-Angstrom Convergent Beam Electron Diffraction

Modern aberration-corrected scanning transmission electron microscopes can acquire four-dimensional data sets (“4D STEM”) by recording convergent beam electron diffraction (CBED) patterns, using precisely positioned, sub-angstrom probes. Here, we demonstrate that these patterns can probe the site symmetry, atomic displacements, and valence electron distributions at individual atomic columns. To this end, 4D STEM CBED patterns were acquired from SrTiO 3 single crystals and compared with patterns calculated using scattering potentials derived from density functional theory. Here, we show that an aspherical valence electron charge build-up at the oxygen sites causes intensity asymmetries in the low-angle scattering portion of the patterns. Using strained SrTiO 3 films containing subtle polar displacements within nanometer-sized domains, it is shown that the high-angle scattering portion in each pattern is sensitive to atomic displacements.

36 MATERIALS SCIENCE↗

Rotary Table Design for the Modular In-Chamber Electron Beam Welding System

The Modular In-Chamber Electron Beam Welding (MIC-EBW) system which is being designed and assembled under DOE Projects DE-NE0008846 (Phase 1--completed) and DE-NE0009039 (Phase 2—in progress) includes several major components: four modules (the lower vacuum module, electron beam module, a spacer module, and a lid), a robust rotary table, large vacuum pumps/system, electron beam welding system controls/power supply, and an electron beam generator/gun. Many of these components and their functions were described in the earlier EPRI-DOE report 3002018146. This report provides an overview of one of the primary components, the rotary table, that has been designed and will be manufactured by Rusach International in Phase 2 of the project.

21 SPECIFIC NUCLEAR REACTORS AND ASSOCIATED PLANTS↗

Electron beam irradiation of 1,4 dioxane

Electron beam irradiation produces both, reducing and oxidizing species which facilitate the reduction of contaminants found in water and wastewater. To investigate the impact of electron beam on 1,4-dioxane, a widely used solvent which has been declared as a probable human carcinogen by the U.S. Environmental Protection Agency, a beamline was designed and commissioned at the Upgraded Injector Test Facility at Jefferson Lab. Here, wastewater samples can be irradiated with a beam energy up to 10 MeV and a beam current of up to 100 nA. Beam acceleration is achieved by two superconducting radio-frequency cavities cooled by liquid helium in a cryomodule. A beam spot with a diameter of ~5 cm was produced at the target location using a pair of raster coils. Electron beam irradiation studies were performed using 1,4-dioxane in two different matrices, de-ionized water and secondary effluent wastewater, and for two concentrations, 10 microg/L and 100 microg/L. The concentration of 1,4-dioxane after irradiation was measured as a function of dose.

Li, Xi↗

Computational simulations and beamline optimizations for an electron beam degrader at CEBAF

An electron beam degrader is under development with the objective of measuring the transverse and longitudinal acceptance of the Continuous Electron Beam Accelerator Facility (CEBAF) at Jefferson Lab. This project is in support of the CE+BAF positron capability. Computational simulations of beam-target interactions and particle tracking were performed integrating the GEANT4 and Elegant toolkits. A solenoid was added to the setup to control the beam's divergence. Parameter optimization of the solenoid field and magnetic quadrupoles gradient was also performed to further reduce particle loss through the rest of the injector beamline.

Lizárraga-Rubio, V.↗

Shaping Micro-Bunched Electron Beams for Compact X-ray Free-Electron Lasers with Transverse Gradient Undulators

Laser-modulator-based micro-bunching of electron beams has been applied to many novel operating modes of X-ray free-electron lasers from harmonic generation to attosecond pulse production. Recently, it was also identified as a key enabling technology for the production of a compact XFEL driven by a relatively low-energy beam. In traditional laser modulator schemes with low-energy and high-current bunches, collective effects limit the possible working points that can be employed, and thus it is difficult to achieve optimal XFEL performance. We propose to utilize transverse longitudinal coupling in a transverse gradient undulator (TGU) to shape micro-bunched electron beams so as to optimize their performance in a compact X-ray free-electron laser. We show that a TGU added to a conventional laser modulator stage enables much more flexibility in the design, allowing one to generate longer micro-bunches less subject to slippage effects and even lower the slice emittance of the micro-bunches. We present a theoretical analysis of laser-based micro-bunching with an added TGU, simulation of compression with collective effects in such systems, and finally XFEL simulations demonstrating the gains in peak power enabled by the TGU. Although we focus on the application to compact XFELs, what we propose is a general phase space manipulation that may find utility in other applications as well.

eSASE↗

Unraveling Li growth kinetics in solid electrolytes due to electron beam charging

Revealing the local structure of solid electrolytes (SEs) with electron microscopy is critical for the fundamental understanding of the performance of solid-state batteries (SSBs). However, the intrinsic structural information in the SSB can be misleading if the sample’s interactions with the electron beams are not fully understood. In this work, we systematically investigate the effect of electron beams on Al-doped lithium lanthanum zirconium oxide (LLZO) under different imaging conditions. Li metal is observed to grow directly on the clean surface of LLZO. The Li metal growth kinetics and the morphology obtained are found to be heavily influenced by the temperature, accelerating voltage, and electron beam intensity. We prove that the lithium growth is due to the LLZO delithiation activated by a positive charging effect under electron beam emission. Our results deepen the understanding of the electron beam impact on SEs and provide guidance for battery material characterization using electron microscopy.

36 MATERIALS SCIENCE↗

Multimodal azimuthal oscillations in electron beam generated E×B plasma

Electron beam (e-beam) generated plasmas with applied crossed electric and magnetic (E×B) fields are promising for low-damage material processing. However, these plasmas can be subject to the formation of azimuthally propagating structures that enhance the radial transport of energetic charged species, which can harm the gentle processing capability of the plasma. In this work, we investigate the azimuthal structure formation in an e-beam generated E×B plasma using experimental diagnostics and 2D3V particle-in-cell simulations. Our findings demonstrate the formation of multiple simultaneously occurring azimuthally propagating modes that exhibit nontrivial radial dependence. It is suggested that the multimodal azimuthal spectrum is caused in part by the radial outflow of ions in the plasma.

electron beams↗

Electron-beam-driven chemical processes during liquid phase transmission electron microscopy

Liquid phase (or liquid cell) transmission electron microscopy (LP-TEM) has been established as a powerful tool for observing dynamic processes in liquids at nanometer to atomic length scales. However, the simple act of observation using electrons irreversibly alters the nature of the sample. A clear understanding of electron beam-driven processes during LP-TEM is required to interpret in situ observations and utilize the electron beam as a stimulus to drive nanoscale dynamic processes. In this review, we discuss recent advances toward understanding, quantifying, mitigating, and harnessing electron beam-driven chemical processes occurring during LP-TEM. We will highlight progress in several research areas, including modeling electron beam-induced radiolysis near interfaces, electron beam-induced nanocrystal formation, and radiation damage of soft materials and biomolecules.

Woehl, Taylor J.↗

Filamentation and focusing of electron beams due to interactions with plasma waves

Results of numerical modeling of the interaction of an electron beam propagating across relativistic plasma waves indicate that electron beam filamentation and focusing may occur under certain conditions. The model is based on solving the relativistic equation of motion in three dimensions for the individual electrons in a tenuous Gaussian beam, as they pass through a relativistic plasma wave. Several electron beam and plasma wave parameters were varied, and the results are summarized. One of the results is that the spacing of the electron beam filaments correlates with the wavelength of the plasma wave. The electron beam filaments appear as vertical slabs after the beam exits the plasma waves. The electron beam also compresses to a focus after it exits the plasma, and the focal distance depends on several parameters including the electron beam energy and phase velocity of the relativistic plasma wave. It is suggested that these focusing and filamentation phenomena may be the basis for diagnostics schemes for laser plasma interactions. The parameters used in the model were electron beam energies in the 5–50 keV range and plasma wave properties typical for the beat-wave produced by CO2 lasers, which correspond to the facilities available in our laboratory. The limitations of these results to lower energy density beam and plasma regimes and to higher energy density regimes will be discussed.

47 OTHER INSTRUMENTATION↗

Electron-Beam-Induced Molecular Plasmon Excitation and Energy Transfer in Silver Molecular Nanowires

In this work, we investigate (1) electron-beam-induced plasmon absorption spectra of Ag molecular nanowire dimers and (2) electron-beam-induced energy transfer between two nanowires. We employ linear-response time-dependent density functional theory (TDDFT) and real-time TDDFT methods to simulate the electron-beam-induced plasmonic excitations, dynamics, and corresponding electron energy loss spectrum for small models of a single molecular nanowire with four Ag atoms and for two Ag nanowires. An array of different relative orientations of nanowires and of different initial excitation conditions resulting from applying an electron beam at different positions with respect to the Ag nanowires is investigated. The results demonstrate (1) an electron beam can induce plasmonic excitations from the molecular Ag nanowire ground state to the excited states that are both optically allowed and forbidden, (2) a tunability for selective excitations that can be controlled by the position of a focused electron beam, and (3) kinetic and dynamic behaviors of time-dependent electron-beam-induced energy transfer between two Ag molecular nanowires depend on the position of the beam source and nanowire separation distance, providing insights into the spatial dependences of plasmonic couplings in nanowire arrays.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Optimization of an electron injector for operating high-intensity polarized electron beam

In this work, the simulation and optimization of an electron injector that operates a high-intensity polarized electron beam are presented. The electron injector would provide a single-bunch electron beam at a repetition rate of 1 Hz with a bunch charge of 10 nC, kinetic energy of 400 MeV and an electron spin polarization of 85%. A direct current (DC) high-voltage photogun was employed to produce the 10 nC polarized electron beam with a kinetic energy of 350 keV, beam diameter of 1.44 cm (Gaussian distribution with σ of 0.36 cm) and full bunch length of 1.3 ns (Gaussian distribution with σ of 0.325 ns). The beam was compressed to 6 ps of RMS bunch length using one 114.24 MHz standing-wave sub-harmonic buncher, two 571.2 MHz standing-wave sub-harmonic bunchers and one 2.856 GHz traveling-wave buncher. The beam was accelerated finally to 400 MeV via eight 2.856 GHz traveling-wave Linacs. We performed the beam simulation, and the simulated results showed that the optimized RMS bunch length was 4.65 ps, RMS relative energy spread was 0.48% and normalized RMS transverse emittance was 30.13 mm · mrad at a beam energy of 400 MeV.

73 NUCLEAR PHYSICS AND RADIATION PHYSICS↗

Etching of Si 3 N 4 induced by electron beam plasma from hollow cathode plasma in a downstream reactive environment

An etching system based on the interaction of electrons extracted from a direct current (DC) hollow-cathode (HC) Ar plasma and injected towards a Si3N4 covered silicon substrate located in the downstream reactive environment created by an additional remote CF 4 /O 2 plasma source was developed and evaluated. By controlling the properties of the injected beam electrons, this approach allows to deliver energy to a surface functionalized by exposure to reactive species, and initiate surface etching. The energy of the primary beam electrons is controlled by the acceleration voltage relative to the HC discharge. Ar atoms flow from the high-pressure HC discharge into the low pressure downstream reactive environment in the process chamber. For an acceleration voltage greater than the ionization potential of Ar and/or process gas species, the energetic primary beam electrons produce a secondary plasma in the process chamber, and can also cause additional dissociation. We have characterized the properties of the secondary plasma and also surface etching of Si 3 N 4 as a function of process parameters, including acceleration voltage (0-80 V), discharge current of the HC discharge (1-2 A), pressure (3.5-20 mTorr), source to substrate distance (1.5 to 5 cm), and feed gas composition (20% and 80% O2 in CF 4 /O 2 ). The electron energy probability function (EEPF) measured with a Langmuir probe about 2.5 cm below the extraction ring suggests several major groups of electrons for this situation, including high energy primary beam electrons with an energy that varies as the acceleration voltage is changed and low energy electrons produced by beam electron-induced ionization of the Ar gas in the process chamber. When a remote CF 4 /O 2 plasma is additionally coupled to the process chamber, Si 3 N 4 surfaces can be functionalized, and by varying the energy of the beam electrons, Si 3 N 4 etching can be induced by electron-neutral synergy effect with plasma-surface interaction. For conditions without beam electron injection, the remote plasma etching rate (ER) of Si 3 N 4 depends strongly on the O 2 concentration in the CF 4 /O 2 processing gas mixture and can be suppressed for O 2 -rich process conditions by the formation of a SiONF passivation layer on the Si 3 N 4 surface. The combination of the HC electron beam source with the remote plasma source (HCEB-RP) makes it possible to induce Si 3 N 4 etching for O 2 -rich remote plasma conditions where remote plasma by itself produces negligible Si 3 N 4 etching. The electron enhanced etching of Si 3 N 4 depends strongly on O 2 /CF 4 mixing ratio reflecting changing arrival rates of O and F species at the surface. Optical emission spectroscopy was used to estimate the ratio of gas phase F and O densities and found to be controlled by the gas mixing ratio and independent of HC EB operating conditions. At this time the detailed sequence of events operative in the etching mechanism is unclear. While the increase of the electron energy is ultimately responsible for initiating surface etching, at present we cannot rule out a role of ions from the simultaneously produced secondary plasma in plasma surface interaction mechanisms.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Mending cracks atom-by-atom in rutile TiO2 with electron beam radiolysis

Abstract Rich electron-matter interactions fundamentally enable electron probe studies of materials such as scanning transmission electron microscopy (STEM). Inelastic interactions often result in structural modifications of the material, ultimately limiting the quality of electron probe measurements. However, atomistic mechanisms of inelastic-scattering-driven transformations are difficult to characterize. Here, we report direct visualization of radiolysis-driven restructuring of rutile TiO 2 under electron beam irradiation. Using annular dark field imaging and electron energy-loss spectroscopy signals, STEM probes revealed the progressive filling of atomically sharp nanometer-wide cracks with striking atomic resolution detail. STEM probes of varying beam energy and precisely controlled electron dose were found to constructively restructure rutile TiO 2 according to a quantified radiolytic mechanism. Based on direct experimental observation, a “two-step rolling” model of mobile octahedral building blocks enabling radiolysis-driven atomic migration is introduced. Such controlled electron beam-induced radiolytic restructuring can be used to engineer novel nanostructures atom-by-atom.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Structural Tolerance of Zirconium Diboride under Electron Irradiation through in-situ Convergent Beam Electron Diffraction and Energy-dispersive X-ray Spectroscopy

Zirconium diboride (ZrB 2 ) is a ultra-high temperature ceramic with high melting temperature (>3000 K), super strength and hardness, good thermal conductivity, and excellent resistance to plasma erosion and chemical erosion, being widely applied in hypersonic flight, arc-electrodes, refractory materials, and plasma-facing materials in fusion reactors. Therefore, the structural stability of the material is essential for the applications. Up to now, the material was investigated under neutron irradiation and high-energy ion irradiations. It was reported that the neutron irradiation caused swelling and catastrophic cracking. High-energy ions (30 keV He + ) changed the surface morphology and caused the bright blue and brown colors on ZrB 2 surfaces between 920 K and 1120 K. The electron irradiation tolerance of the material has not been reported yet. Here we used convergent beam electron diffraction (CBED) and energy-dispersive X-ray spectroscopy (EDS) to investigate structural tolerances of ZrB 2 crystals under high-energy electrons at room temperature under vacuum. Finally, the investigation would benefit the understanding of its structural tolerance at microscales.

42 ENGINEERING↗