Two–Photon Printing of Base–Catalyzed Resins Involving Thiol–Michael Network Formation
Two-photon printing is accomplished using a photobase generator, 2-(2-nitrophenyl)-propyloxycarbony tetramethyl guanidine, to locally catalyze thiol-ene coupling between multifunctional monomers while mitigating chain-growth polymerization with free radical scavengers. Microstructures printed from base-catalyzed resins exhibit higher resolution (linewidths < 400 nm) and lower print error (<3%) than analogous microstructures printed using a photosensitive, free radical initiator. Further, Raman spectroscopy reveals that resins polymerized using the photobase generator in the presence of free radical scavengers exhibit higher selectivity of thiol-ene coupling over radical polymerization, resulting in stiffer, more uniform polymer networks. The base-catalyzed resins are capable of producing 3D microstructures printed with high accuracy and minimal post-processing defects. As a result, a direct comparison between free radical and base-initiated resins highlights the need for mindful consideration of how chemical reaction pathway influences printability and network end-properties when designing resins.