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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 55 records · Page 3
All sourcesNASA NTRSDOE OSTI
DOE OSTI2024

NO formation by N 2 /O 2 plasma catalysis: The impact of surface reactions, gas-phase reactions, and mass transport

Pathways and timescales relevant to facilitate plasma-assisted N 2 -O 2 reactions are assessed by measuring the consumption of plasma-derived N and the formation of NO in the gas phase and over Ag catalytic surfaces. These measurements are enabled by a setup that enables N 2 activation in an atmospheric pressure RF plasma jet, enables O 2 addition in the plasma afterglow, facilitates reactions over an Ag wire catalyst, and allows species density quantification by molecular beam mass spectrometry. Gas-phase reactions consume N but do not form NO with high selectivity. The presence of the non-porous Ag wire catalyst increases the rate of N conversion to NO, though mass transfer processes, not surface reactions, dictate the rate of N consumption. When O 2 concentrations and the ratio of the surface area of the catalyst to the void volume of the reactor are high (3–5 mol% O 2 , 10900 m –1 ), N conversion to NO reaches 100 % selectivity. When both N 2 and O 2 are fed through the plasma jet, gas-phase NO production increases 10×, although plasma and gas-phase processes do not exclusively produce NO. Above a threshold NO density, N cannot diffuse to the catalyst surface faster than it is consumed in the gas phase by reactions with NO. Furthermore, the use of heterogeneous catalysts to enhance plasma-driven N x O y formation and control N x O y product selectivity is limited to cases where diffusive transport of N from the gas phase to the catalyst surface is faster than consumption of N from gas-phase reactions with NO.

Engineering↗
DOE OSTI2026

Liquid-to-gas transfer of sodium in a liquid anode glow discharge

Solute transfer from the liquid to the gas phase in plasmas has been widely used in analytical chemistry often focused on liquid cathode discharges. In this study, we report on time-resolved absolute density measurements of sodium in a glow discharge plasma with a NaCl solution anode using two-photon absorption laser induced fluorescence. The averaged maximum sodium density is found to be similar to the electron density in the discharge consistent with plasma-induced vapor generation. Random sodium flashes were also observed extending into the plasma afterglow and are attributed to sodium particles falling back on the liquid surface. Cataphoresis can explain the location of the maximum sodium density near the cathode side of the electrode gap rather than near the liquid anode region.

chemical vapor generation↗
DOE OSTI2021

Experimental study of atmospheric pressure single-pulse nanosecond discharge in pin-to-pin configuration

We present an experimental study of nanosecond high-voltage discharges in a pin-to-pin electrode configuration at atmospheric conditions operating in single-pulse mode (no memory effects). Discharge parameters were measured using microwave Rayleigh scattering, laser Rayleigh scattering, optical emission spectroscopy enhanced with a nanosecond probing pulse, and fast photography. Spark and corona discharge regimes were studied for electrode gap sizes 2-10 mm and discharge pulse duration of 90 ns. The spark regime was observed for gaps < 6 mm using discharge pulse energies of 0.6-1 mJ per mm of the gap length. Higher electron number densities, total electron number per gap length, discharge currents, and gas temperatures were observed for smaller electrode gaps and larger pulse energies, reaching maximal values of about 7.5 x 10 15 cm -3 , 3.5 x 10 11 electrons per mm, 22 A, and 4,000 K (at 10 microseconds after the discharge), respectively, for a 2 mm gap and 1 mJ/mm discharge pulse energy. Initial breakdown was followed by a secondary breakdown occurring about 30-70 ns later and was associated with ignition of a cathode spot and transition to cathodic arc. Here, a majority of the discharge pulse energy was deposited into the gas before the secondary breakdown (85-89%). The electron number density after the ns-discharge pulse decayed with a characteristic time scale of 150 ns governed by dissociative recombination and electron attachment to oxygen mechanisms. For the corona regime, substantially lower pulse energies (~0.1 mJ/mm), peak conduction current (1-2 A), and electron numbers (3-5 x 10 10 electrons per mm), and gas temperatures (360 K) were observed.

42 ENGINEERING↗
DOE OSTI2026

Single-shot ultrafast dynamics of nanosecond pulsed plasmas: Transition from ps–ns nonequilibrium to near-full ionization

The ultrafast multi-stage evolution of state-defining properties in atmospheric-pressure nanosecond pulsed plasmas is quantified using single-discharge, jitter-free, continuous streak-sweep spectroscopy of N 2 (C → B) molecular and N + /O + ionic species with a single-shot time resolution as short as ∼160 ps. An early period of extreme nonequilibrium is observed with vibrational temperatures [T V (C)] dropping from ∼8000 K at <200 ps after plasma breakdown to <4000 K within ∼1 ns, with near-ambient rotational temperatures [T R (C)] ∼ 300 K due to limited collisional energy transfer. This early-time T V (C) trend is representative of a direct and unquenched look into the high-energy tail of the electron energy distribution function; thus, it tracks real-time changes in the mean electron energy via the N2(C) emission signatures. This is followed by the rapid onset of N + /O + ionic emission after a distinct time delay of ∼14.9 ns due to multistep chemical kinetics. The ionic emission enables determination of electron densities (n e ) >2 × 10 19 cm −3 and electron temperatures (T e ) >36 000 K, indicating the transition to a nearly fully ionized regime. The ps–ns temporal dynamics are also compared between air and N 2 plasmas to assess the influence of collisional partners, as well as across the anode, cathode, and central gap regions to identify spatial variations in plasma behavior. Finally, this work demonstrates versatile continuously probing approach capable of spectro-temporal and spatially resolved single-shot measurements of key state variables in the ps–ns evolution of atmospheric-pressure nanosecond pulsed plasmas.

Electric discharges↗
NASA NTRS1976

Filamentation instability of a large amplitude whistler wave

Experiments performed in a pulsed afterglow plasma column with specified parameters revealed a filamentation instability of a large-amplitude whistler wave launched from antennas which produce a diverging energy flow in the linear regime. The difficult problem of diagnosing local density perturbations in a magnetized plasma in the presence of large-amplitude RF signals and nonuniform anisotropic electron distributions is discussed. Since Langmuir probes are too unreliable under these conditions, a microwave probe is developed based on the principle of the cavity shift method. The temporal and spatial evolution of the duct formation and wave propagation are shown. The role of the observed electron heating in the filamentation process is examined. The observed self-focusing process appears to be the result of the reinforcing interaction between the wave-induced density depression and the density-induced wave refraction. Interesting applications are noted.

Stenzel, R. L.↗
DOE OSTI2024

Controlling the charge of dust particles in an afterglow by modulating the plasma power

Abstract A dust particle immersed in a glow-discharge plasma has long been known to have a charge that is negative , while the plasma is powered. However, in the afterglow, following the stopping of the plasma power, a large positive charge can collect on the particle, as was shown recently for particles in a cathodic sheath. While that outcome of positive charging in the afterglow may be common, an experimental discovery reported here reveals that the opposite outcome is also possible: a particle can develop a negative charge in the afterglow, if the plasma had previously been operated with a modulated power. Before stopping the plasma power off altogether, in a run with power modulated at a low duty cycle of 4.5 % , the particle’s residual charge was negative, but it was positive in a control run without modulation. This result points to a way of controlling the charge of dust particles in a decaying plasma, which can be useful for mitigating defects in semiconductor manufacturing.

Physics↗
DOE OSTI2025

Particle dynamics in the spatial afterglow of flowing dusty plasmas

Final technical report for project Department of Energy - DE-SC0022242. The overarching hypothesis of this project was that the particle dynamics in the afterglow of dusty plasmas are determined by the interplay of the transient plasma properties and the material properties of dust particles. By combining experiments and modeling in an approach fundamentally different from prior research, this project investigated correlations between material properties and basic dust charging and decharging mechanisms.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
DOE OSTI2021

Modeling nanoparticle charge distribution in the afterglow of non-thermal plasmas and comparison with measurements

Particle charging in the afterglows of non-thermal plasmas typically take place in a non-neutral space charge environment. We model the same by incorporating particle-ion collision rate constant models, developed in prior work by analyzing particle-ion trajectories calculated using Langevin Dynamics simulations, into species transport equations for ions, electrons and charged particles in the afterglow. A scaling analysis of particle charging and additional Langevin Dynamics calculations of the particle-ion collision rate constant are presented to extend the range of applicability to ion electrostatic to thermal energy ratios of 300 and diffusive Knudsen number (that scales inversely with gas pressure) up to 2000. The developed collision rate constant models are first validated by comparing predictions of particle charge against measured values in a stationary, non-thermal DC plasma from past PK-4 campaigns published in Phys. Rev. Lett. 93(8): 085001 and Phys. Rev. E 72(1): 016406). The comparisons reveal excellent agreement within ±35% for particles of radius 0.6,1.0,1.3 μm in the gas pressure range of ~20-150 Pa. The experiments to probe particle charge distributions by Sharma et al. (J. Physics D: Appl. Phys. 53(24): 245204) are modeled using the validated particle-ion collision rate constant models and the calculated charge fractions are compared with measurements. The comparisons reveal that the ion/electron concentration and gas temperature in the afterglow critically influence the particle charge and the predictions are generally in qualitative agreement with the measurements. Along with critical assessment of the modeling assumptions, several recommendations are presented for future experimental design to probe charging in afterglows.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
DOE OSTI2021

Optical and mass-spectral characterization of mixed-gas flowing atmospheric-pressure afterglow sources

Plasma-based ambient desorption/ionization (ADI) sources for mass spectrometry (MS) often use helium as the primary discharge gas due to the large reaction cross section of excited helium species with atmospheric gases, which ultimately leads to efficient reagent-ion formation. However, some studies have shown that mixed-gas plasmas provide unique advantages. For instance, our group showed that a helium-oxygen flowing atmospheric-pressure afterglow (He:O 2 -FAPA) source yielded enhanced ion signals for small polar analytes, but compounds with aromatic rings underwent chemical modification to produce pyrylium species. Here, it is shown that the addition of H 2 to the helium FAPA gas significantly decreased the reagent-ion signals, but analyte-ion signal was not affected to the same degree. In addition, mass spectra obtained with He:H 2 -FAPA were chemically cleaner with fewer ions stemming from analyte species and produced less oxidation of analytes. Addition of nitrogen increased the abundance of negative reagent ions (e.g., NO 2 - and NO 3 - ) which led to enhanced ion signal for RDX. To better understand these unique advantages of a mixed-gas FAPA, the impact of molecular-gas (O 2 , N 2 , or H 2 ) addition on the optical-emission spectra from the discharge was also measured. Spatially resolved emission was obtained from the anode- and negative-glow regions. In general, addition of small fractions (~0.1%) of molecular gases decreased helium and OH emission intensities. Atomic oxygen and hydrogen emission increased with the addition of O 2 and H 2 , respectively. Furthermore, emission characteristics of N 2 , N 2 + , and NO with respect to molecular gas composition on He-FAPA were measured. Finally, fundamental plasma parameters, such as OH rotational temperature (T rot ), were also calculated for these mixed-gas systems.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗
NASA NTRS1991

Recombination of N4(+) ions with electrons

Using a modified high-pressure-afterglow/mass spectrometer apparatus similar to that described by Lee and Johnsen (1989), spectroscopic observations of afterglow helium plasmas, with N2 as a minor additive, were carried out in order to verify the mechanism suggested by Bates (1991) for dissociative recombination of electrons with N4(+) ions. It was found that dissociative recombination of electrons with N4(+) ions results in the formation of N2 molecules in the C 3Pi(u) (v = 0,1) state, with the recombination rate coefficient of (2.6 +/- 0.3) x 10 exp -6 cu cm/sec at 300 K.

Cao, Y. S.↗
DOE OSTI2021

Absolute ion density measurements in the afterglow of a radiofrequency atmospheric pressure plasma jet

Atmospheric pressure plasma jets (APPJs) can enable large fluxes of reactive species impinging on treated substrates in many applications. The relative importance of ionic versus neutral reactive species fluxes produced by APPJs is to date mainly deduced from modeling due to the challenge of measuring absolute ion densities/fluxes. In this study, a calibration was performed to determine the absolute densities of cold ions in the afterglow region of an RF-driven atmospheric pressure plasma jet (APPJ) in Ar + 1% O 2 by molecular beam mass spectrometry. Here, positive ion densities were found to be about 3-4 orders of magnitudes lower than the densities of the dominant reactive neutral species (O, O 2 (a 1 Δ g ), O 3 ) in the afterglow region of the APPJ at a distance larger than 2 mm from the visible plasma plume. The results illustrate the ability of molecular beam mass spectrometry to enable a quantitative evaluation of both neutral and ionic species in many applications using APPJs.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
DOE OSTI2020

Collisionless adiabatic afterglow

In this work, we study, by numerical and analytical means, the evolution of a collisionless plasma initiated between absorbing walls. The ensuing flow is described by rarefaction waves that travel inward from the boundaries, interact, and eventually vanish after crossing through, leading up to the asymptotic stage of the decay. Particle simulations indicate that the kinetic evolution strongly resembles one found in isentropic gas dynamics. Namely, a very gradual density profile forms in the expanding central region where the rarefaction waves interact, with an accompanying linear velocity profile. Asymptotically, the density falls off as 1/t. The density and the flux at the boundary show little variation over the period when rarefaction waves still exist. Plasma potential, on the other hand, drops quite rapidly (on the underlying ion-acoustic timescale) to less than initial electron temperature Te when over 70% of the particles still remain in the system. This is due to electron kinetics being governed by conservation of adiabatic invariant in a slowly varying potential well. Analytical model of the velocity distribution is presented to explain the simulations. The results have implications for afterglow plasmas used in material processing and also for ion-extraction devices. One property of potential interest is good uniformity of the decaying plasma that occurs after approximately one ion-acoustic time.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
NASA NTRS1991

Rapid Dry Etching Of Photoresists Without Toxic Gases

Experimental dry etching technique strips photoresists from semiconductor wafers without damaging semiconductor materials. Makes use of afterglow existing downstream from plasma generated by radio-frequency electric field. Constituents of afterglow react with sacrificial polymer to make reactive gases that quickly etch-away photoresist. Strips quickly at room temperature; not necessary to heat substrates. No hazardous or toxic chemicals used.

Lerner, Narcinda R.↗
DOE OSTI2020

Highly selective Si 3 N 4 /SiO 2 etching using an NF 3 /N 2 /O 2 /H 2 remote plasma. I. Plasma source and critical fluxes

Highly selective plasma etching of silicon nitride (Si 3 N 4 ), while not etching silicon dioxide (SiO 2 ), is a critical step in the fabrication of microelectronics devices. In many applications, this etching must be damage-free and isotropic, which then motivates the use of remote plasmas where the reactants interacting with the substrate are dominantly neutral species. In this paper and Paper II, mechanisms for highly selective Si 3 N 4 etching in remote plasmas are discussed based on results from experiments and simulations. It has been shown experimentally that high Si 3 N 4 /SiO 2 etch selectivity (≈380) can be achieved in the downstream effluent of an NF 3 /N 2 /O 2 /H 2 plasma. The authors found that H2 plays a principal role in the reaction mechanism as Si 3 N 4 /SiO 2 selectivity shows a sharp maximum as a function of the H2 flow rate. Based on this observation, and measured densities of F-atoms and H2 in the process chamber, a mechanism of selective Si 3 N 4 /SiO 2 etching is proposed in which HF molecules in vibrationally excited states accelerate etching reactions. A reaction mechanism for NF 3 /N 2 /O 2 /H 2 plasmas and its afterglow was developed to computationally determine the species densities and fluxes on the wafer level, validated by comparing with experimentally measured F-atom and H 2 densities. The calculated species densities and fluxes were used as input to an analytical model of Si 3 N 4 and SiO 2 etching based on the results of quantum chemistry simulations. This paper presents experimental results (etching data and species densities), the reaction mechanism for NF 3 /N 2 /O 2 /H 2 plasmas, and the results of simulations of gas phase chemistry. Quantum chemistry simulations of elementary etching reactions, description of the analytical model of Si 3 N 4 and SiO 2 etching, calculations of the etch rates, and Si 3 N 4 and SiO 2 selectivity with this model are presented in Paper II.

42 ENGINEERING↗