Accelerometer Based in-situ monitoring of HDC Capsule Polishing
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Wafer reuse techniques help offset the cost of III-V growth substrates by using a single wafer for multiple growths, but costly re-polishing after device removal limits the end benefit. In this work, we present planarization growth by hydride vapor-phase epitaxy (HVPE), a potentially low-cost growth technique, as a method of smoothing rough substrates for subsequent high-quality device growth without the need for polishing. First, we show there is a threshold for allowable substrate roughness without device degradation by comparing devices grown by organometallic vapor-phase epitaxy (OMVPE) on epi-ready polished and pre-polished substrates that did not have the final epi-ready polish. We then demonstrate successful smoothing with HVPE growth on substrates with different surface morphologies, with features ranging from general roughness to large facets. Initial devices grown by HVPE on a pre-polished substate showed no degradation compared to a control wafer, indicating that planarizing rough substrates through HVPE growth is a promising path toward being able to use rough substrates directly for growth, without costly polishing steps.
The United States High Performance Research Reactor Conversion Program identified the need to transition from highly enriched uranium fuel to lowly enriched uranium fuel for high power research and civil reactors. One of the fuel configurations selected for these reactors was a uranium (U) foil alloyed with 10% molybdenum (Mo). The U-10Mo fuel foil was then covered with a zirconium (Zr) interlayer and pressed into an aluminum cladding. Idaho National Laboratory prescribed a need to remove surface oxidation on the Zr prior to bonding it with U-10Mo fuel foil. To determine the best method of oxidation removal, a variety of polishing methods, including hand polishing with a diamond paste or Scotch-Brite™ pads, mechanically wet-polishing with abrasive belts, and chemical etching with hydrofluoric/nitric acid mixtures, were investigated on pre-polished Zircaloy 702 sheets purchased directly from the manufacturer. No change in surface roughness was detected using any of these methods relative to the as-received material. In fact, scanning electron microscopy detected grit from hand polishing with Amplex Grade 30 waste soluble diamond paste and Scotch-Brite™ pads. Visible staining was found, and fluorine detected via X-ray photoelectron spectroscopy on the flash etching samples. These contaminants were not seen on the as-received material. In addition to the need to remove the oxide layer on the Zr prior to co-rolling, there are concerns that the Neolube debonding agent on the co-rolling can may contaminate the Zr surface after co-rolling. The experimental results found that zirconium in contact with Neolube coated steel plates was easily cleaning with ethanol wiping after heat treated and no carbide inclusions remained on the surface. Overall, all cleaning methods tested did not significantly change the surface roughness of the plates or reduce the oxide layer present on the zirconium. Carbon was found on all the samples, before and after cleaning, except for the flash etch samples which detected fluorine instead. The insignificant changes seen in the cleaned plates relative to the as received plates question the need for cleaning prior to rolling. Further investigation in the requirements for cleaning at this step is recommended. Current methods for cleaning the surface after hot rolling with alcohol appear sufficient. After hot rolling, if Neolube does peel off the can and onto the zirconium coated foil surface, a dry abrasive or diamond paste polish is not recommended due to the chance of abrasive being embedded into the surface. However, the ability of an etchant to lift the lubricant off the zirconium surface indicates that a spot etch method could work to clean specific spots where Neolube is present, if the need arises.
Electropolishing is used to remove material from the surface of a metal using electric potential and current. U-10Mo fuel is produced from a low enriched uranium plate alloyed with 10% molybdenum (U-10Mo). Electropolishing is being considered in two steps of the process of fabricating this U-10Mo fuel. First, it could be used as a means initially improving the surface finish of the cast plate while removing smut from the casting process from the surface prior to homogenization. Second, it could be used again after homogenization to remove oxidation and continue to improve the surface finish prior to hot rolling. The purpose of this work is to demonstrate the process on full-size ingots and optimize the process. A depleted uranium U-10Mo plate was electropolished three times: the first two times were prior to homogenization and the third after a homogenization step. The first two polishes decreased the overall roughness, as measured by laser confocal microscopy. After each polish, a smoother and shinier blue-gold surface was left on the plate. Upon homogenization, the surface had a more matte appearance and the surface roughness increased back to the pre-homogenization values obtained prior to the initial polish. After electropolishing the homogenized pieces, the changes in surface roughness increased, as measured by laser confocal microscopy. The final polishing step was not long enough to return the surface roughness to pre-homogenization conditions, implying less polishing is needed before the homogenization versus afterwards. Heat generation during the polish was addressed by circulating the electrolyte solution through an external heat exchanger; however, solubility and anodization challenges require further study.
Abstract Coating detector materials with films highly reflective in the vacuum ultraviolet region improves sensitivity of the next-generation rare-event detectors that use liquid xenon. In this work, we investigate the MgF 2 -Al-MgF 2 coating designed to achieve high reflectance at 175 nm, the mean wavelength of liquid xenon (LXe) scintillation. The coating was applied to an unpolished, passivated copper substrate mimicking a realistic detector component of the proposed nEXO experiment, as well as to two unpassivated substrates with “high” and “average” levels of polishing. After confirming the composition and morphology of the thin-film coating using TEM and EDS, the samples underwent reflectance measurements in LXe and gaseous nitrogen (GN2). Measurements in LXe exposed the coated samples to -100°C for several hours. No peeling of the coatings was observed after several thermal cycles. Polishing is found to strongly correlate with the measured specular reflectance (R spec ). In particular, 5.8(5)% specular spike reflectance in LXe was measured for the realistic sample at 20° of incidence, while the values for similar angles of incidence on the high and average polish samples are 62.3(1.3)% and 27.4(7)%, respectively. At large angles (66°–75°), theR spec in LXe for the three samples increases to 23(5)%, 80(8)%, and 84(18)%, respectively. The R spec at around 45° was measured in both GN2 and LXe for average polish sample and shows a reasonable agreement. Importantly, the total reflectance of the samples is comparable and estimated to be 92(8)%, 85(8)%, and 83(8)% in GN2 for the realistic, average, and high polish samples, respectively. This is considered satisfactory for the next-generation LXe experiments that could benefit from using reflective films, such as nEXO and DARWIN, thus validating the design of the coating.
The Tank Side Cesium Removal (TSCR) system, under development by Washington River Protection Solutions LLC (WRPS), will send initial low-activity Hanford waste tank supernate feeds to the Hanford Waste Treatment and Immobilization Plant (WTP) Low-Activity Waste (LAW) Facility. In addition to entrained solids removal from the supernate, the primary goal of TSCR is to remove cesium-137 ( 137 Cs) by ion exchange, allowing contact handling of the liquid effluent product at the WTP. Crystalline silicotitanate (CST) ion exchange media, manufactured by Honeywell UOP, LLC (product IONSIVTM R9140-B), was selected as the ion exchange media at TSCR. CST is a non-elutable inorganic material that has demonstrated robust chemical, physical, and radiation tolerance while maintaining functionality. However, exchange kinetics of Cs onto CST is slow, resulting in low utilization of the CST Cs load capacity before unacceptable Cs breakthrough. Two process flow designs have been tested, as follows. 1. Lead-lag column processing: The lead column was removed after the lag column effluent reached the waste acceptance criteria (WAC) limit, the lag column was moved into the lead position, and a new lag column was installed. This format used ~52% Cs load capacity on the lead column. 2. Lead-lag-polish column processing: The processing was stopped when the polish column effluent reached the WAC limit. This format resulted in 81% Cs load capacity on the lead column. Testing with diluted feed from Hanford tank AP-105 (AP-105DF) incorporated a nuanced change to the lead-lag-polish column system where the polish column was inserted when the lag column effluent reached WAC limit. A 10.9-L volume of AP-105DF (diluted to 5.6 M Na) was processed through the Direct Feed Test Platform system, established at Pacific Northwest National Laboratory to support small-scale waste qualification efforts. The columns consisted of 10-mL CST beds (CST Lot 2002009604, sieved to screen out >30-mesh particles) placed in 1.5-cm-inner-diameter columns. Feed was processed at 1.83 bed volumes (BV) per hour; the flowrate, in terms of contact time with the CST bed, matched the expected flowrate at TSCR. The <30-mesh CST sieve cut was expected to provide appropriate performance scaling to a full-height column. The installation of the polish column later in processing (after processing 523 BVs) did not appear to fundamentally change the utilization of the lead column for Cs exchange nor did it extend the total feed processing volume when compared to the previous test with AP-107 feed. Table ES.1 and Figure ES.1 summarize the measured AP-105DF Cs load performance.
To assess the feasibility of measuring material property changes induced by ion irradiation one pristine and three legacy HT-9 samples were sectioned and polished. The polish protocol was first optimized using a pristine unirradiated HT-9 sample before polishing the ion irradiated samples as the spot size was small and repeated polishing could remove the ion irradiated region entirely. AFM tapping mode was used to assess the surface quality after each polish. AFM based hardness mapping was optimized for new diamond tips specifically for use with the HT-9 samples to compensate for differences in grain size, precipitates, and heterogeneity of hardness relative to past samples. In addition, a hardness calibration protocol was developed using NIST copper, nickel, and steel reference materials. Co-located SEM-EDS and AFM analysis was used to verify the ion irradiated edge using the silver/tungsten coating as a fiducial mark. Once benchmarked, the hardness across the ion irradiated cross section, a comparison of bulk hardness according to neutron irradiation, and the hardness of the ion irradiated surface edge was measured.
Using electrochemical impedance spectroscopy, we have devised a method of sensing the microscopic surface conditions on the surface of niobium as it is undergoing an electrochemical polishing (EP) treatment. The method uses electrochemical impedance spectroscopy (EIS) to gather information on the surface state of the electrode without disrupting the polishing reaction. The EIS data is analyzed using a so-called distribution of relaxation times (DRT) method. Using DRT, the EIS data can be deconvolved into discrete relaxation time peaks without any a priori knowledge of the electrode dynamics. By analyzing the relaxation time peaks, we are able to distinguish two distinct modes of the EP reaction. As the polishing voltage is increased, the electrode transitions from the low voltage EP mode, characterized by a single relaxation time peaks, to the high voltage EP mode, characterized by two relaxation time peaks. We theorize that this second peak is caused by the formation of an oxide layer on the electrode. We also find that this oxide induced peak transitions from to a negative relaxation time, which is indicative of a blocking electrode process. By analyzing EPed samples, we show that samples polished in the low voltage mode have significantly higher surface roughness due to grain etching and faceting. We find that the surface roughness of the samples only improves when the oxide film peak is present and in the negative relaxation time region. This shows that EIS combined with DRT analysis can be used to predict etching on EPed Nb. This method can also be performed before or during the EP, which could allow for adjustment of polishing parameters to guarantee a smooth cavity surface finish.
The Hanford Site stores an estimated 56 million gallons of mixed radioactive and chemically hazardous waste in large underground tanks. In support of the Direct Feed Low-Activity Waste (DFLAW) Program for expediting Hanford tank waste supernate treatment, laboratory-scale ion exchange processing using prototypic unit operations was conducted on AW-105 tank waste at the Pacific Northwest National Laboratory Radiochemical Processing Laboratory. This report describes the small-scale ion exchange testing with 9.2 L of diluted and filtered supernate from Tank 241-AW-105 (hereafter referred to as AW-105) at 16 °C (62 °F). One of the waste acceptance criteria (WAC) for the Waste Treatment Plant (WTP) Low-Activity Waste Facility is that the waste must contain less than 3.18×10 -5 Ci 137 Cs per mole of Na. For the AW-105 tank waste to meet this criterion, only 0.225% of the influent 137 Cs concentration may be delivered to the WTP; this requires a Cs decontamination factor of 445. Testing with AW-105 matched current Tank Side Cesium Removal (TSCR) facility prototypic operations where a lead-lag configuration was used until the lag column reached the WAC limit, then a polish column was brought online for continued processing in a lead-lag-polish column configuration. Feed was processed at 1.9 bed volumes (BVs) per hour; the flowrate, in terms of contact time with the crystalline silicotitanate (CST) bed, matched the expected flowrate at TSCR. The Cs-decontaminated product was retained for vitrification testing (to be reported separately). The lead column reached 83% Cs breakthrough after processing ~1500 BVs of feed; the 50% Cs breakthrough was interpolated from the breakthrough data and occurred at 1041 BVs. Despite the AW-105 having a significantly higher K concentration (0.55 M compared to 0.10 M), testing compared to previous AP-107 ion exchange column testing at 16 °C showed no difference in BVs processed to reach the WAC on the lead column and only an approximate ~20 BV decrease in volume processed to reach the WAC limit on the lag column. The negligible differences in capacity despite the 5x concentration differences in K was determined to be due to the significantly lower NO3 concentration in the AW-105 supernate compared to the AP-107 tank waste matrix. A comparison in breakthrough curves for the two tests also indicated slightly faster kinetic behavior in the AW-105, with the variations in feed matrices (lower NO3 concentration) likely responsible for the deviation. The Cs effluent from the lag column reached the WAC limit after processing 772 BVs. Anticipating this breakthrough point, the polish column was preemptively installed around 675 BVs. Cs breakthrough from the lag column began at 300 BVs, reaching 1.10×10 1 µCi/mL, or 14.13 % Cs breakthrough, after processing all 1500 BVs of feed. The polish column processed nominally 830 BVs and reached 2.10×10 -1 µCi/mL, or 0.27 % Cs breakthrough at the conclusion of the test. Table S.1 and Figure S.1 summarize the observed column performance and relevant Cs loading characteristics.
In this work, the effects of surface roughness on the high-temperature corrosion of nickel-based superalloy X produced through electron-beam melting (EBM) additive manufacturing were studied. Surface area of samples in the rough, as-fabricated condition was measured using a 2D cross-section image analysis technique and a 3D image analysis technique. To verify the accuracy of surface area measurements, oxidation testing of samples in the as-fabricated and polished conditions was performed; polished sample oxidation curves were then compared to the as-fabricated sample oxidation curves before and after being adjusted using obtained surface area measurements. It was found that the 2D technique accurately measured surface area and accounted for the overlapping features present on EBM sample surfaces, whereas the 3D technique did not. Further, it was also observed that oxidation kinetics were moderately faster on the alloy X samples in the as-fabricated condition than for the polished condition.
In this report, the electrodeposition of Al from aluminum scrap alloys (A2020) on copper cathode substrates with varied surface roughness under different deposition temperatures was studied using low-temperature AlCl 3 -1-butyl-3-methyl-imidazolium chloride (BMIC) ionic liquid electrolytes. The bulk electrodeposition of Al was carried out under a voltage of 1.5 V at a stirring rate of 120 rpm using a fixed ionic liquid electrolyte concentration (molar ratio AlCl 3 : BMIC = 2:1). The effects of deposition temperature (range from 80 °C to 140 °C) and surface roughness of Cu cathode substrates (polished by 320, 600, 800, 1200 grits SiC sandpapers and mirror polishing process) on the morphology of deposited Al, current density, current efficiency and energy consumption, were investigated. The Al deposits were characterized using scanning electron microscopy (SEM) with energy-dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD), profilometer, and electrochemical measurements for current density, current efficiency, and energy consumption. It is demonstrated that the deposition temperature and surface roughness of Cu electrodes play a critical role in the nucleation and growth of Al deposits. Higher deposition temperature promotes the diffusion and/or migration of Al 2 Cl 7 - ions and then enhances the current density and efficiency during the electrodeposition of Al. Smoother surface of Cu electrodes is preferred for the formation of dendrite-free Al deposits. Typically, on the mirror polished Cu electrode, no Al dendrite structure was observed, and only plate-like Al deposits were formed at the deposition temperature of 100 °C. Pure metallic Al was successfully deposited on Cu electrodes in AlCl 3 + BMIC ionic liquid electrolytes for all experiments with a current efficiency range from 72% to 99% and energy consumption of 4.6–6.3 kW h/kg Al.
Pool boiling experiments have been performed at atmospheric pressure on potential accident tolerant fuel (ATF) cladding materials (Zirlo®, Cr coated Zirlo®, FeCrAl coated Zirlo®, and monolithic SiC) to evaluate the Critical Heat Flux (CHF) points. Corrosion resistant coatings of Cr and FeCrAl alloy were deposited on flat Zirlo® samples using cold spray technology. The as-prepared samples after uniform surface polishing were subjected to autoclave tests at 360 °C water and 18.6 MPa for 360 h to simulate prototypic corrosion of the ATF cladding materials in LWR normal operation. Surface characteristics potentially influencing CHF such as surface morphology, roughness, static contact angle, and surface chemistry were characterized using a suite of characterization methods including scanning electron microscopy, 3D optical profilometry, optical contact angle measurements, and x-ray photoelectron spectroscopy (XPS). Thermo-physical properties of the samples such as density, thermal conductivity, and heat capacity were measured by differential scanning calorimetry and laser flash thermal diffusivity measurement. FeCrAl coatings showed CHF values comparable to bare Zirlo® samples, while slightly lower CHF values were observed for Cr coated samples and bulk SiC flats (produced by chemical vapor deposition, CVD). As-deposited Cr coatings showed 67% higher CHF than the as-polished Cr coatings due to its higher surface roughness level. The autoclave testing for the prepared samples generally increased the CHF except for the surface polished Cr coatings. Similar CHF values of bare Zirlo®, FeCrAl coating, and CVD SiC samples were observed after autoclave test but there were negligible change CHF of Cr coatings. XPS studies indicated that the formation or deposition of a few monolayers of hydrophobic carbonaceous species on surface can affect CHF values. The trends in CHF data are discussed in terms of evolution of the surface characteristics of the ATF materials.
We have imaged the evolution of plasma following nanosecond pulsed laser ablation of cerium in air with sub-10 ns resolution. We find the ablated plasma plume expansion and shape to be strongly dependent on the time after mechanical polishing of the sample surface. After an initial shock front common to both new and aged samples (velocities up to 16 km s ₋1 ), we observe a second front that is relatively localized to the surface vicinity of newly polished samples, but in the case of older samples it moves outward at velocities of up to 4 km s ₋1 . We attribute this behavior to the formation and growth of a native oxide layer on the order of hours after polishing. These results demonstrate that plasma imaging can be used to diagnose the presence of, and evaluate the extent of, thin surface oxides or other compounds that form soon after exposure to some atmosphere. These findings also highlight the need to explicitly consider the presence of such overlayers when modeling laser/metal interaction, when making measurements of vapor phase chemistry, and when analyzing the composition, phase, and morphology of solid particulates formed after the ablation of reactive metals.
Advancements in computer-controlled polishing, metrology, and replication have led to an x-ray mirror fabrication process that is capable of producing high-resolution Wolter microscopes. Here, we present the fabrication and test of a nickel–cobalt replicated full-shell x-ray mirror that was electroformed from a finely figured and polished mandrel. This mandrel was designed for an 8-m source-to-detector-distance microscope, with 10× magnification, and was optimized to reduce shell distortions that occur within 20 mm of the shell ends. This, in combination with an improved replication tooling design and refined bath parameters informed by a detailed COMSOL Multiphysics® model, has led to reductions in replication errors in the mirrors. Mandrel surface fabrication was improved by implementing a computer-controlled polishing process that corrected the low-frequency mandrel figure error and achieved <2.0 nm RMS convergence error. X-ray tests performed on a pair of mirror shells replicated from the mandrel have demonstrated <10 μm full-width at half-maximum (FWHM) spatial resolution. Here, we discuss the development process, highlight results from metrology and x-ray testing, and define a path for achieving a program goal of 5 μm FWHM resolution.
Build Optimization Software Tools (BOOST) accelerate the design of DNA, RNA and protein sequences for their synthesis and assembly in an automated and scalable fashion. The BOOST Juggler automates the following two design tasks: - Reverse-Translation of protein sequences into DNA sequences - Codon Juggling of DNA sequences The BOOST Polisher provides the following design tasks: - The Verification of DNA sequences against DNA synthesis constraints - The Modification of DNA sequences in case they violate any DNA synthesis constraint In addition, the BOOST Polisher can be instructed to verify and modify DNA sequences against sequence patterns, such as restriction sites. The BOOST Partitioner supports both Gibson/chewback and Yeast assembly (also known as Transformation-Associated Recombination, or TAR) methods when performing the decomposition of large sequences that exceed the maximum length of DNA synthesis into synthesizable building blocks. The Partitioner can be instructed to find building blocks with appropriate overlap sequences, making their assembly into the complete construct more efficient. BOOST Workflows enable, in a customized fashion, the execution of the Juggler, Polisher, and Partitioner tools on a batch of sequences.
This article shows a study on an alternative pathway for the fabrication of a complete 1.3 GHz SRF cavity, aiming at improving production reliability, reducing the use of chemical polishing (EP or BCP) which is a costly and safety-critical step, and preserving surface quality after forming. Unlike the conventional pathway, the fabrication process is performed after polishing. This point is crucial as the used polishing technology could be applied only to flat geometries. The performed investigation demonstrates that damages during the fabrication process are considered minor, localized, and limited to the near-surface. Moreover, these studies confirm that the damaged layer (100-200 µm) is mainly caused by the rolling process, and not by the subsequent fabrication steps. A laser confocal microscope and SEM-EBSD technique were used to compare samples before and after forming. The preliminary results are discussed and presented in this paper.