Single Step and Continuous Synthesis of Advance Lithium Ion Positive Electrode Material Powders Using Unimelt Microwave Plasma Process
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We report that fabrication of parts with high mechanical properties heavily depend on the quality of powder deployed in the fabrication process. Copper powder in three different powder types were spheroidized using radio-frequency inductively coupled plasma (ICP) spheroidization process (TekSphero-15 system). The characterized powders include virgin powder as purchased from the powder manufacturer, powder used in electron beam powder bed fusion (EB-PBF) process, and reconditioned powder, which was used powder that underwent an oxygen-reduction treatment. The goal of spheroidizing these powder types was to evaluate the change in powder morphology, the possibility of enhancing the powder properties back to their as-received conditions, and assess oxygen reduction of the powder lots given their initial oxygen contents. Also, to investigate the impact of re-spheroidization on powder properties, the second round of spheroidization was performed on the already used-spheroidized powder. The impact of powder type on powder sphericity and particle size distribution was evaluated using the image analysis of scanning electron microscope (SEM) micrographs and laser diffraction, respectively. The spheroidized powder showed higher sphericity and more uniform particle size distribution overall. Depending on the powder collection bin, second round of spheroidization affected the powder sphericity differently. The possibility of deploying the plasma spheroidization process as an alternative oxygen-reduction technique was also investigated through tracking the powders’ oxygen content using inert gas fusion method before and after the spheroidization. The plasma spheroidized powder showed less oxygen content than the hydrogen-treated powder. The second round of spheroidization caused no change in oxygen content. The correlation between oxygen-reduction and created cracks was discussed and compared between plasma spheroidization and hydrogen-treatment. The plasma spheroidization process created a powder with higher sphericity, uniform particle size, and less oxygen content.
Here, in this work, we report an annular beam confocal laser-induced fluorescence (LIF) configuration, which allows for high spatial resolution measurements of plasma properties in plasma setups and sources with limited optical access. The proposed LIF configuration utilizes the annular laser beam generated by a pair of diffractive axicons. The LIF signal is collected along the main optical axis within the ring region. It is shown experimentally that at a focal distance of 300 mm, a spatial resolution of ~5.3 mm can be achieved. Using geometric optics estimations, we showed that ~1 mm resolution at the same focal distance could potentially be achieved by modifying laser beam parameters. This approaches the localization accuracy of conventional LIF collection methods (with crossing laser beam injection and fluorescence collection optical paths). Measurements of the ion velocity distribution function in an argon plasma using both the confocal LIF with an annular laser beam and conventional LIF demonstrate a satisfactory agreement. The proposed LIF setup has potential applications for diagnostics in various plasma processing equipment and plasma sources, such as hollow cathodes, microplasmas, electric propulsion, etc.
Processes occurring near the boundary between three-component plasma with negative ions and two-component electron−ion plasma are considered. The excited waves and instability are described. Stability condition at the boundary is determined.
The energy and angle of impact of ions, interspersed with fluxes of neutral radicals, on the surface of wafers during plasma materials processing are critical parameters for the fabrication of microelectronic devices, nanostructure materials and biocompatible materials. This sensitivity extends to nearly all applications of plasmas to materials processing and surface modification. Low temperature plasmas for plasma materials processing have traditionally used continuously excited plasmas. However, pulsed plasma processing is an enabling technology for achieving finer resolution of microelectronics fabrication and for producing unique surface properties in a wide range of applications. This research project is addressing fundamental plasma physics issues in materials processing – the control of pulsed plasmas and the means for optimizing plasma produced reactant fluxes.
Occurrence of unintended gas breakdown in the narrow gaps of plasma processing chambers is one of the critical challenges in developing advanced plasma sources. Here, we present a combined experimental and theoretical study of unintended discharges in the narrow gaps of plasma processing chambers and report significant drop of the gas breakdown voltage in the presence of a background plasma facing the gap. Experimentally measured breakdown voltages decrease in subsequent breakdown events due to wall erosion caused by the discharge. Therefore, preventing and mitigating the first discharge is of paramount importance. An analysis of kinetic simulation results indicates that the charged particle influx from the background plasma in the processing chamber into the gap is responsible for the onset of early breakdown: higher charged particle density within the gap modifies the electric field profile, allowing unintended breakdowns to occur at a significantly reduced threshold voltage.
The integrated Resonant Magnetic Perturbation (RMP)-based Edge-Localized Mode (ELM)-crash-control process aims to enhance the plasma performance during the RMP-driven ELM crash suppression, where the RMP induces an unwanted confinement degradation. In this study, the normalized beta ($\beta_\textrm{N}$) is introduced as a metric for plasma performance. The integrated process incorporates the latest achievements in the RMP technique to enhance $\beta_\textrm{N}$ efficiently. The integrated process triggers the n = 1 Edge-localized RMP (ERMP) at the L–H transition timing using the real-time Machine Learning (ML) classifier. The pre-emptive RMP onset can reduce the required external heating power for achieving the same $\beta_\textrm{N}$ by over 10% compared to the conventional onset. During the RMP phase, the adaptive feedback RMP ELM controller, demonstrating its performance in previous experiments, plays a crucial role in maximizing $\beta_\textrm{N}$ during the suppression phase and sustaining the $\beta_\textrm{N}$-enhanced suppression state by optimizing the RMP strength. The integrated process achieves $\beta_\textrm{N}$ up to ~2.65 during the suppression phase, which is ~10% higher than the previous KSTAR record but ~6% lower than the target of the K-DEMO first phase ($\beta_\textrm{N}$ = 2.8), and maintains the suppression phase above the lower limit of target $\beta_\textrm{N}$ (= 2.4) for ~4 s (~60$\tau_\textrm{E}$). In addition to $\beta_\textrm{N}$ enhancement, the integrated process demonstrates quicker restoration of the suppression phase and recovery of $\beta_\textrm{N}$ compared to the adaptive control with the n = 1 Conventional RMP (CRMP). The post-analysis of the experiment shows the localized effect of the ERMP spectrum in radial and the close relationship between the evolution of $\beta_\textrm{N}$ and the electron temperature.
Al{sub 2}O{sub 3}-10TiC composites were synthesized by spark plasma sintering (SPS) process. Microstructural and mechanical properties of the composite reveal homogeneous distribution of the fine TiC particles in the matrix. The samples were produced with different sintering temperature, and it shows that the hardness and density gradually increases with increasing sintering temperature. Abrasion wear test result reveals that the composite sintered at 1500 °C shows high abrasion resistance (wt. loss ~ 0.016 g) and the lowest abrasion resistance was observed for the composite sample sintered at 1100 °C (wt. loss ~ 1.459 g). The profilometry surface roughness study shows that sample sintered at 1100 °C shows maximum roughness (R{sub a} = 6.53 µm) compared to the sample sintered at 1500 °C (R{sub a} = 0.66 µm) corroborating the abrasion wear test results.
Plasma processing of superconducting radio frequency (SRF) cavities has shown an improvement in accelerating gradient by reducing the radiation due to field emission and multipacting. Plasma processing is a common tech-nique where the free oxygen produced by the plasma breaks down and removes hydrocarbons from surfaces. This increases the work function and reduces the second-ary emission coefficient. The hydrocarbon fragments of H2, CO, CO2, and H2O are removed from the system with the process gas which is flowing through the system. Here, we present COMSOL for the first time to simulate the plasma processing of an SRF cavity. In this work, we use Jefferson Lab's C75 SRF cavities design as our case study. Using simulation, we predict the condition of plasma ignition inside the SRF cavity. The simulation provides information about the optimal rf coupling to the cavity, mode for plasma ignition, choice of gas concen-tration, power, and pressure.
This DOE Phase I SBIR project has developed a glow discharge-based plasma process to convert carbon dioxide to sold carbon and water. By adding natural gas, the additional enthalpy can be used to reform the output carbon dioxide to value added carbon and EPA-compliance-grade water, thus creating a process that has no gaseous products at all, such as: CO 2 + CH 4 → 2C + 2H 2 O, which is simply the exothermic reverse of the syngas reaction. During the Phase I work, several milestones were accomplished successfully. a. First, a synthesis reactor was designed, assembled, and successfully operated using the combined simultaneous operation of glow discharge and microwaves. DC discharge and microwaves can also be operated individually, allowing multiple configurations to be used This is one of the first reactors of its kind, and perhaps the first ever. b. Second, the research team successfully produced carbon nanomaterials using carbon dioxide as the source of carbon via CO 2 + 2H 2 → C + 2H 2 O. This is certainly one of the first processes to use plasma to convert carbon dioxide to nanocarbon, and perhaps the first ever demonstration. c. Third, it was also shown that carbon monoxide and carbon dioxide can be used with methane to reduce the synthesis temperature of ASI graphene decorated carbon nanotubes (GDCNT). Hitherto GDCNT were only fabricated above 1200 °C. GDCNT was synthesized at 780 °C. CO 2 + C → 2CO; 2 CO + CH 4 → 3 C + 2H 2 O, and also, CH 4 + CO 2 → 2 C + 2H 2 O. d. Fourth, closed cycle synthesis of nanomaterial was demonstrated with over 80% conversion of carbon dioxide to carbon and water was achieved, on the basis of pressure drop during glow discharge. e. Fifth, plasma operation was achieved via glow discharge and microwaves at 500 Torr, demonstrating a path forward to atmospheric pressure operation f. Sixth, using carbon monoxide and carbon dioxide in an electrothermal furnace, we produced 350 grams per hour of high-quality nanotubes in a single furnace, compared to 200 grams per hour for the commercial process. Controlling the enthalpy prevents self-extinguishing hot gas pyrolysis. Thus, carbon dioxide enhances the properties and reduces the production cost. This is a near term advance that can go into trial production in the near term. g. Seventh, economic analysis suggests an economic plan forward, producing carbon nanotubes for less than $50 per pound. The use of hydrogen and carbon dioxide as the feedstocks is acceptable from a cost basis, and in fact hydrogen is less expensive than carbon monoxide. Niche applications are available in the near term, though quantities relevant to sequestration remain a far-term goal. h. Eighth, though it was not the research team’s intention to create a new process for producing carbon monoxide, it was realized that almost by accident we demonstrated plasma reforming of carbon dioxide via a plasma version of the reverse Boudouard reaction. Accordingly, we have contacted a major gas manufacturer (Matheson Gas) to determine whether there is interest in creating an industrial version of the process. i. Ninth, a long-range strategy is identified in which a progressively more carbon-conscious world will seek to create solid carbon as a means of sequestering carbon dioxide, impeding its return to the atmosphere. In the long term the price must drop by orders of magnitude with larger production, and assuming success, solid carbon could be the preferred form for sequestration rather than underground storage. If carbon can be made as cheaply as dirt, or nearly so, then it can serve a useful purpose as structural material for housing, soil amendments in agriculture and fillers to modify low areas.
Capacitive plasma pickup is a well-known and difficult problem for plasma-facing edge diagnostics. This problem must be addressed to ensure an accurate and robust interpretation of the real signal measurements vs noise. The Faraday cup fast ion loss detector array of the Joint European Torus (JET) is particularly prone to this issue and can be used as a testbed to prototype solutions. The issue of separation and distinction between warranted fast ion signal and electromagnetic plasma noise has traditionally been solved with hardware modifications, but a more versatile post-processing approach is of great interest. This work presents post-processing techniques to characterize the signal noise. While hardware changes and advancements may be limited, the combination with post-processing procedures allows for more rapid and robust analysis of measurements. The characterization of plasma pickup noise is examined for alpha losses in a discharge from JET’s tritium campaign. In addition to highlighting the post-processing methodology, the spatial sensitivity of the detector array is also examined, which presents significant advantages for the physical interpretation of fast ion losses.
Fabricating sub-10 nm microelectronics places plasma processing precision at atomic dimensions. Atomic layer etching (ALE) is a cyclic plasma process used in semiconductor fabrication that has the potential to remove a single layer of atoms during each cycle. In self-limiting ideal ALE, a single monolayer of a material is consistently removed in each cycle, typically expressed as EPC (etch per cycle). In plasma ALE of dielectrics, such as SiO 2 and Si 3 N 4 , using fluorocarbon gas mixtures, etching proceeds through deposition of a thin polymer layer and the process is not strictly self-terminating. As a result, EPC is highly process dependent and particularly sensitive to the thickness of the polymer layer. In this paper, results are discussed from a computational investigation of the ALE of SiO 2 on flat surfaces and in short trenches using capacitively coupled plasmas consisting of a deposition step (fluorocarbon plasma) and an etch step (argon plasma). We found that ALE performance is a delicate balance between deposition of polymer during the first half cycle and etching (with polymer removal) during the second half cycle. In the absence of complete removal of the overlying polymer in each cycle, ALE may be transient as the polymer thickness grows with each cycle with a reduction in EPC until the thickness is too large to enable further etching. Small and statistical amounts of polymer left from a previous cycle can produce statistical variation in polymer thickness on the next cycle, which in turn can lead to a spatially dependent EPC and ALE roughness. Based on synergy between T i (sputtering time) and T p (passivation time), dielectric ALE can be described as having three modes: deposition, roughening surface (transitioning to etch-stop), and smooth surface with steady-state EPC.