Investigation of the topographical features of surface carrier concentrations in silicon solar cell material using electrolyte electroreflectance
Topographical variations in carrier concentration delta N/N across the surface of n(+) on p diffused silicon solar cell material are studied by utilizing electrolyte electroreflectance with a spatial resolution of 100 microns within approximately 500 A of the surface. The topographical variations of delta N/N approximately 10 - 20% are found to be comparable to Czochralski grown material. The electroreflectance method can also be utilized to investigate other semiconductors such as GaAs.