Crystallizing protein assemblies via free and grafted linkers
Porous protein superlattices have plausible catalytic applications in biotechnology and nanotechnology.
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Porous protein superlattices have plausible catalytic applications in biotechnology and nanotechnology.
The flux synthesis of a uranium gallophosphate and a uranium gallate, Cs 4 [UO 2 Ga 2 (PO 4 ) 4 ] and Cs 2 UO 2 Ga 2 O 5 , and 4 uranium phosphates, [Rb 2 Rb 3.93 Cl 0.93 ][(UO 2 ) 5 (PO 4 ) 5 ], Rb 11 [(UO 2 ) 8 (PO 4 ) 9 ], Rb 7.6 [(UO 2 ) 8 O 8.6 F 0.4 (PO 4 ) 2 ], and Rb 6 [(UO 2 ) 5 O 2 (PO 4 ) 4 ], is reported.
Abstract not provided
The ternary silver halides CH 3 NH 3 AgBr 2 and CH 3 NH 3 Ag 2 I 3 are low-dimensional, wide band gap semiconductors made up of edge-sharing silver halide tetrahedra.
Hard stoichiometric WB 4 is synthesized under high-pressure and high-temperature conditions.
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A detailed high-pressure study on NH{sub 3}BH{sub 3} has been carried out using in situ synchrotron X-ray diffraction (XRD) and Raman scattering with a diamond anvil cell up to 20 and 33 GPa, respectively. The Rietveld refinement based on the XRD pattern and analysis of Raman data indicate two first-order phase transitions from the ambient pressure I4 mm structure (α-NH{sub 3}BH{sub 3}) to a high pressure Cmc2{sub 1} phase (β-NH{sub 3}BH{sub 3}) at 2.14 GPa, and further into a monoclinic P2{sub 1} (Z = 2) phase (γ-NH{sub 3}BH{sub 3}) at 9.67 GPa. Fitting the measured volumetric compression data to the third order Birch-Murnaghan equation of state reveals a bulk modulus of B{sub 0} = 9.9 ± 0.5 and 17.0 ± 3.0 GPa (with fixed B{sub 0}{sup ′} = 4) for the β-NH{sub 3}BH{sub 3} below and above 5 GPa, respectively. Still, with the splitting of the NBH rock mode in Raman experiment, it is concluded that a second-order isostructural phase transition occurs at 5 GPa. By analyzing the dihydrogen bonding framework, the origin of the isostructural phase transition is attributed to the number of dihydrogen bondings per molecule in the Cmc2{sub 1} phase increasing from 12 to 14 at 5 GPa.
Lattice disorder and compositional changes in In{sub x}Ga{sub 1-x}N (x = 0.32, 0.47, 0.7, 0.8, and 1.0) films on GaN/Al{sub 2}O{sub 3} substrates, induced by room-temperature irradiation of 5 MeV Xe ions, have been investigated using both Rutherford backscattering spectrometry under ion-channeling conditions and time-of-flight secondary ion mass spectrometry. The results show that for a fluence of 3 × 10{sup 13 }cm{sup −2}, the relative level of lattice disorder in In{sub x}Ga{sub 1-x}N increases monotonically from 59% to 90% with increasing indium concentration x from 0.32 to 0.7; a further increase in x up to 1.0 leads to little increase in the disorder level. In contrast to Ga-rich In{sub x}Ga{sub 1-x}N (x = 0.32 and 0.47), significant volume swelling of up to ∼25% accompanied with oxidation in In-rich In{sub x}Ga{sub 1-x}N (x = 0.7, 0.8, and 1.0) is observed. In addition, irradiation-induced atomic mixing occurs at the interface of In-rich In{sub x}Ga{sub 1-x}N and GaN. The results from this study indicate an extreme susceptibility of the high In-content In{sub x}Ga{sub 1-x}N to heavy-ion irradiation, and suggest that cautions must be exercised in applying ion-implantation techniques to these materials at room temperature. Further studies of the irradiation behavior at elevated temperatures are warranted.
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