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83 records · Page 5

A sub-cm micromachined electron microscope

A new approach for fabricating macroscopic (approximately 10x10x10 mm(exp 3)) structures with micron accuracy has been developed. This approach combines the precision of semiconductor processing and fiber optic technologies. A (100) silicon wafer is anisotropically etched to create four orthogonal v-grooves and an aperture on each 10x12 mm die. Precision 308 micron optical fibers are sandwiched between the die to align the v-grooves. The fiber is then anodically bonded to the die above and below it. This procedure is repeated to create thick structures and a stack of 5 or 6 die will be used to create a miniature scanning electron microscope (MSEM). Two die in the structure will have a segmented electrode to deflect the beam and correct for astigmatism. The entire structure is UHV compatible. The performance of an SEM improves as its length is reduced and a sub-cm 2 keV MSEM with a field emission source should have approximately 1 nm resolution. A low voltage high resolution MSEM would be useful for the examination of biological specimens and semiconductors with a minimum of damage. The first MSEM will be tested with existing 6 micron thermionic sources. In the future a micromachined field emission source will be used. The stacking technology presented in this paper can produce an array of MSEMs 1 to 30 mm in length with a 1 mm or larger period. A key question being addressed by this research is the optimum size for a low voltage MSEM which will be determined by the required spatial resolution, field of view, and working distance.

Feinerman, A. D.↗

Alkali layered compounds interfaces for energy conversion and energy storage

During year one a new ultra-high vacuum, an Ar(+) ion sputterer, a low energy electron diffraction (LEED) system, an Auger electron spectrometer (AES), a work function measurement device with a Kelvin probe, and related accessories were used. The study found a focus in the adsorption of chalcogenides on Si and III-V compound semiconductors. In the second year, a scanning tunneling microscope was obtained along with a quadrapole mass spectrometer, power supplies, a computer, a chart recorder, etc. We started the systematic study on the adsorption of chalcogenides on the compound semiconductor surfaces. The third year saw the mounting of the scanning tunneling microscope (STM) on the existing UHV system. The investigation continued with the adsorption of Cs (alkali) on S-covered Si(100)2x1 surfaces. Then the adsorption of S on Cs-covered Si(100) surfaces was studied.

Papageorgopoulos, Chris A.↗

Generation of a Cold Atom Beam from a Pyramidal Magneto-Optical Trap

Techniques to generate cold atom beams are of great interest in a variety of applications, from atomic frequency standards and atom optics to experimental studies of Bose-Einstein condensation. Cold atom beams have been produced by slowing thermal atomic beams using the Zeeman-slowing technique or chirped lasers, or using laser-cooling techniques to extract a slow atomic beam from the background gas in a low-pressure vapor cell. These laser-cooling techniques include "atomic funnels" or two-dimensional magneto-optical traps, as well as a variation of the conventional vapor cell magneto-optical trap called the "low-velocity intense source" (LVIS). Variations of the LVIS have been realized with unique trap geometries such as conical or pyramidal mirror traps. The present work implements a simple and robust design based on the pyramidal trap geometry and allows use of a single large diameter (<less than or = 20 cm) laser beam to obtain large capture rates of atoms from the background vapor. The four 45 deg mirrors are truncated just before the apex of the pyramid, and the 1 sq cm region at the center of the incident laser beam is retro-reflected by lambda /4 plate with a high-reflectance gold coating on the second surface. A small (1 mm diameter) hole in this retro-optic forms an extraction column for the atoms while maintaining a low conductance between the source region and an adjacent UHV chamber.

Kohel, J.↗

Getters for Reliable Hermetic Packages

A variety of sealed-off devices such as cathode ray tubes (CRT's) electron tubes, plasma displays, particle accelarators and colliders vacuum thermal insulation, ultra-high vacuum (UHV), extreme high vacuum (XHV) systems for semiconductor processing, X-ray tubes, lamps, field-emission displays (FEDs) flat panel displays (FPDs), some microelectromechanical systems (MEMS) and science instruments for space applications, nuclear systems require a vacuum for their successful operation.

getters hermetic packaging electronic↗

MoS2-Filled PEEK Composite as a Self-Lubricating Material for Aerospace Applications

At BAM, several projects were conducted in the past years dealing with the tribological properties of friction couples at cryogenic temperature and in vacuum environment. Promising candidates for vacuum application are MoS2-filled PEEK/PTFE composites, which showed a friction coefficient as low as 0.03 in high vacuum. To complete the tribological profile of these composites, further tests were performed in ultra-high vacuum (UHV) at room temperature. In this paper, friction and stick slip behavior, as well as outgassing characteristics during the test are presented.

Theiler, Geraldine↗

A Compact, High-Flux Cold Atom Beam Source

The performance of cold atom experiments relying on three-dimensional magneto-optical trap techniques can be greatly enhanced by employing a highflux cold atom beam to obtain high atom loading rates while maintaining low background pressures in the UHV MOT (ultra-high vacuum magneto-optical trap) regions. Several techniques exist for generating slow beams of cold atoms. However, one of the technically simplest approaches is a two-dimensional (2D) MOT. Such an atom source typically employs at least two orthogonal trapping beams, plus an additional longitudinal "push" beam to yield maximum atomic flux. A 2D atom source was created with angled trapping collimators that not only traps atoms in two orthogonal directions, but also provides a longitudinal pushing component that eliminates the need for an additional push beam. This development reduces the overall package size, which in turn, makes the 2D trap simpler, and requires less total optical power. The atom source is more compact than a previously published effort, and has greater than an order of magnitude improved loading performance.

Kellogg, James R.↗

Enhanced Far Ultra-Violet Optical Properties of Physical Vapor Deposited Aluminum Mirrors Through Fluorination

Astronomical instrumentation for measurements in the Far Ultra-Violet (FUV, 90-200 nm) typically use aluminum (Al) thin films due to their high reflectance over this wavelength range. However, the native aluminum oxide layer that forms on Al upon exposure to the atmosphere is strongly absorbing in this wavelength range, requiring that the films be protected with a dielectric that inhibits oxidation. Typically, magnesium fluoride (MgF 2 ) or lithium fluoride (LiF) coatings are used as protective layers, but each has shortcomings. For example, MgF 2 has an absorption cutoff at 115 nm reducing performance in a critical part of the FUV spectrum of observational interest. A viable option to access these lower wavelengths could be the use of the LiF overcoat as it has a lower absorption cutoff at 102.5 nm, but it is hygroscopic and thus susceptible to degradation in humid conditions. An approach to reduce the hygroscopic nature of LiF would be to implement a passivation process during the deposition of both Al+LiF coatings. Our team at GSFC has developed a new reactive Physical Vapor Deposition (rPVD) process that consists of a fluorination process with XeF 2 gas combined with our traditional PVD process. We have found that this new rPVD coating process offers a protected version of Al+LiF with a more environmentally stable and more transparent LiF layer, along with unprecedent reflectivity. The process starts with a bare optically smooth substrate that is coated with Al in an ultra-high vacuum (UHV) chamber by the conventional PVD process. Then, the bare Al mirror is immediately exposed to a reactive XeF 2 gas before and after the application of the flash PVD evaporated LiF layer. We have also been investigating the use of this rPVD coating process for potential efficiency enhancements of Si-based gratings. Since it is known that the XeF 2 vapor is a strong Si etchant, we are investigating if the native SiO 2 layer on Si is sufficient to protect the groove profile of e-beam-ruled Si gratings from degradation. We will report on the characterization of various Al+LiF witness mirror coatings (both on borosilicate and Si) performed under various deposition conditions using the XeF 2 passivation process. These tests include XPS to determine film stoichiometry and AFM/SEM to measure surface roughness and any etching on the Si substrate. We will also report on FUV reflectance and spectroscopic ellipsometry to characterize optical constants of these passivated films in the UV/Visible/NIR spectral ranges.

Engineering (General)↗

Enhanced Far Ultra-Violet Optical Properties of Physical Vapor Deposited Aluminum Mirrors Through Fluorination

Astronomical instrumentation for measurements in the Far Ultra-Violet (FUV, 90-200 nm) typically use aluminum (Al) thin films due to their high reflectance over this wavelength range. However, the native aluminum oxide layer that forms on Al upon exposure to the atmosphere is strongly absorbing in this wavelength range, requiring that the films be protected with a dielectric that inhibits oxidation. Typically, magnesium fluoride (MgF 2 ) or lithium fluoride (LiF) coatings are used as protective layers, but each has shortcomings. For example, MgF 2 has an absorption cutoff at 115 nm reducing performance in a critical part of the FUV spectrum of observational interest. A viable option to access these lower wavelengths could be the use of the LiF overcoat as it has a lower absorption cutoff at 102.5 nm, but it is hygroscopic and thus susceptible to degradation in humid conditions. An approach to reduce the hygroscopic nature of LiF would be to implement a passivation process during the deposition of both Al+LiF coatings. Our team at GSFC has developed a new reactive Physical Vapor Deposition (rPVD) process that consists of a fluorination process with XeF 2 gas combined with our traditional PVD process. We have found that this new rPVD coating process offers a protected version of Al+LiF with a more environmentally stable and more transparent LiF layer, along with unprecedent reflectivity. The process starts with a bare optically smooth substrate that is coated with Al in an ultra-high vacuum (UHV) chamber by the conventional PVD process. Then, the bare Al mirror is immediately exposed to a reactive XeF 2 gas before and after the application of the flash PVD evaporated LiF layer. We have also been investigating the use of this rPVD coating process for potential efficiency enhancements of Si-based gratings. Since it is known that the XeF 2 vapor is a strong Si etchant, we are investigating if the native SiO 2 layer on Si is sufficient to protect the groove profile of e-beam-ruled Si gratings from degradation. We will report on the characterization of various Al+LiF witness mirror coatings (both on borosilicate and Si) performed under various deposition conditions using the XeF 2 passivation process. These tests include XPS to determine film stoichiometry and AFM/SEM to measure surface roughness and any etching on the Si substrate. We will also report on FUV reflectance and spectroscopic ellipsometry to characterize optical constants of these passivated films in the UV/Visible/NIR spectral ranges.

Engineering (General)↗

Enhanced Far Ultra-Violet Optical Properties of Physical Vapor Deposited Aluminum Mirrors Through Fluorination

Astronomical instrumentation for measurements in the Far Ultra-Violet (FUV, 90-200 nm) typically use aluminum (Al) thin films due to their high reflectance over this wavelength range. However, the native aluminum oxide layer that forms on Al upon exposure to the atmosphere is strongly absorbing in this wavelength range, requiring that the films be protected with a dielectric that inhibits oxidation. Typically, magnesium fluoride (MgF 2 ) or lithium fluoride (LiF) coatings are used as protective layers, but each has shortcomings. For example, MgF 2 has an absorption cutoff at 115 nm reducing performance in a critical part of the FUV spectrum of observational interest. A viable option to access these lower wavelengths could be the use of the LiF overcoat as it has a lower absorption cutoff at 102.5 nm, but it is hygroscopic and thus susceptible to degradation in humid conditions. An approach to reduce the hygroscopic nature of LiF would be to implement a passivation process during the deposition of both Al+LiF coatings. Our team at GSFC has developed a new reactive Physical Vapor Deposition (rPVD) process that consists of a fluorination process with XeF 2 gas combined with our traditional PVD process. We have found that this new rPVD coating process offers a protected version of Al+LiF with a more environmentally stable and more transparent LiF layer, along with unprecedent reflectivity. The process starts with a bare optically smooth substrate that is coated with Al in an ultra-high vacuum (UHV) chamber by the conventional PVD process. Then, the bare Al mirror is immediately exposed to a reactive XeF 2 gas before and after the application of the flash PVD evaporated LiF layer. We have also been investigating the use of this rPVD coating process for potential efficiency enhancements of Si-based gratings. Since it is known that the XeF 2 vapor is a strong Si etchant, we are investigating if the native SiO 2 layer on Si is sufficient to protect the groove profile of e-beam-ruled Si gratings from degradation. We will report on the characterization of various Al+LiF witness mirror coatings (both on borosilicate and Si) performed under various deposition conditions using the XeF 2 passivation process. These tests include XPS to determine film stoichiometry and AFM/SEM to measure surface roughness and any etching on the Si substrate. We will also report on FUV reflectance and spectroscopic ellipsometry to characterize optical constants of these passivated films in the UV/Visible/NIR spectral ranges.

Engineering (General)↗

Noble Gases in Samples Returned From Asteroids Ryugu and Bennu

Introduction: The asteroid sample return missions, JAXA’s Hayabusa2 [1] and NASA’s OSIRIS-REx [2], fromC-rich asteroids Ryugu and Bennu offer unique opportunities to sample pristine early solar system material, unaffected by terrestrial weathering and contamination, and with a known geological context. The comparison with most primi-tive members of carbonaceous –and inner solar system ordinary and enstatite– chondrite classes allows us to (i) assess the variation (or the lack of thereof) of the distribution of the most volatile elements throughout the entire early solar system, (ii) determine the effects of parent body thermal and aqueous alteration, and (iii) learn about the dynamic evolution and history of the various parent bodies, as sampled by both return missions and meteorite delivery. Here we will present noble gas data obtained from newly received particles from Ryugu and Bennu. Samples & Analysis: We received nine particles allocated by JAXA, with masses of 0.5-1.7 mg mass: four col-lected during Hayabusa2’s first touchdown (chamber A) and five from a small artificial crater (chamber C). We received three particles from Bennu of 0.07, 0.89 and 0.94 mg mass (OREX-800032-102/3/4). All particles were processed, allocated, weighed, and transferred into our UHV sample chamber within pure N2, to prevent any contact with air. We examined all He-Xe isotopes with our custom-built mass spectrometer “Albatros” ([3,4]). Gases were extracted individually from each particle by melting induced by a 1064 μm Nd:YAG IR laser in 2–4 heating steps. Large amounts of water and other reactive volatiles were released, consistent with the presence of abundant volatiles from both Ryugu and Bennu. Residues of Ryugu particles remaining after lasering, subsequently exposed to air, were additionally extracted in a crucible to verify complete gas extraction. Only the particle that still showed a “crystalline” structure after lasering contained detectable Ryugu noble gases, whereas all other particles turned immediately into glassy spheres by laser heating and lacked any gas. Results & Discussion: Ryugu and Bennu matter contains noble gases similar to the most pristine, unheated aqueously altered meteorites, e.g., CM or CI chondrites [5,6]. Remarkably, all four chamber A samples that originated from Ryugu’s surface show solar wind (SW) Ne (trapped (20Ne/22Ne)tr ~12–13), whereas all five chamber C samples do not ((20Ne/22Ne)tr ~9.0–10.7 consistent with the presence of non-solar trapped Ne components such as Q and HL). This demonstrates that JAXA’s sampling strategy succeeded: Chamber C samples analyzed in this work originated from areas shielded from SW, slightly below the surface, that was sampled after the impactor excavated material. The three Bennu particles populate the same range as the Ryugu particles in Ne isotope space with one particle containing SW suggesting that it was part of the uppermost surface layer of Bennu during sampling, while Ne in the smallest sample can be explained best by mixing Ne from presolar diamonds and SiC or graphite, and that in the third one by mixing of, e.g., Q and HL. Using cosmic ray production rates given by [7] yields preliminary exposure ages for Ryugu particles in the same range as determined in [7]. There is, as expected, also no systematic difference between samples from chambers A and C because both sample sets were likely collected within the uppermost layer of Ryugu, which were not shielded from cosmic rays. The concentration of cosmogenic (cos) Ne in the Bennu particle, where Necos was resolvable, is in the same range as found for Ryugu, suggesting roughly similar exposure time to cosmic rays for 5–8 Ma for all particles examined here. The Xe isotopic compositions of all particles are consistent with those of phase Q, with small additions of Xe-HL from presolar diamonds and excess 129Xe* from short-lived 129I decay. The comparably high 129Xe*/129XeQ ratio is similar in all samples, suggesting similar initial I concentrations and closure to Xe loss –or the incorporation of a well-mixed Xe reservoir. The Bennu material was in brief contact with air in the capsule, after atmospheric entry and before storage in pure N2 in a clean room. Both, the –most diagnostic– Xe isotopes and the Ar/Xe vs. Kr/Xe systematics prove that the noble gases are not affected by terrestrial contamination, in contrast to many CI, CY, and CM chondrites found on Earth [5,6], illustrating the importance of sample return. He-Xe concentrations in all particles unaffected bySW are comparable to but at the upper end of ranges reported [5-7]. In accordance with the strong aqueous alteration experienced on the parent bodies of Ryugu and Bennu [1,2], all samples lack the Ar-rich and water-susceptible noble gas components found in less aqueously altered CMs or CRs [e.g., 5,8] and all COs.

Henner Busemann↗

Demonstration of Long Vacuum Integrity Lifetime of Trapped Ion Standard Package

A compact Hg ion trap package that was vacuum-sealed since 9 years has been demonstrated to be successfully operational showing excellent ion-trap lifetime exceeding 400 days. In addition to the vacuum package, the same 9-year old optical and detection packages are utilized to obtain these results. Charge transfer relaxation effects between neutral Hg and trapped Hg ion are studied. This work shows the reliability of such units in view of next-generation ground and space-borne trapped ion clocks.

charge-transfer relaxation↗