Bimetallic Gold Nanostars Having High Aspect Ratio Spikes for Sensitive Surface-Enhanced Raman Scattering Sensing
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The NASA Ames Research Center is working to develop a methodology for the optimization and design of the high lift system for future subsonic airliners with the involvement of two partners. Aerodynamic analysis methods for two dimensional and three dimensional wing performance with flaps and slats deployed are being developed through a grant with the aeronautical department of the University of California Davis, and a flap and slat mechanism design procedure is being developed through a contract with PKCR, Inc., of Seattle, WA. This report documents the work that has been completed in the contract with PKCR on mechanism design. Flap mechanism designs have been completed for seven (7) different mechanisms with a total of twelve (12) different layouts all for a common single slotted flap configuration. The seven mechanisms are as follows: Simple Hinge, Upside Down/Upright Four Bar Linkage (two layouts), Upside Down Four Bar Linkages (three versions), Airbus A330/340 Link/Track Mechanism, Airbus A320 Link/Track Mechanism (two layouts), Boeing Link/Track Mechanism (two layouts), and Boeing 767 Hinged Beam Four Bar Linkage. In addition, a single layout has been made to investigate the growth potential from a single slotted flap to a vane/main double slotted flap using the Boeing Link/Track Mechanism. All layouts show Fowler motion and gap progression of the flap from stowed to a fully deployed position, and evaluations based on spanwise continuity, fairing size and number, complexity, reliability and maintainability and weight as well as Fowler motion and gap progression are presented. For slat design, the options have been limited to mechanisms for a shallow leading edge slat. Three (3) different layouts are presented for maximum slat angles of 20 deg, 15 deg and 1O deg all mechanized with a rack and pinion drive similar to that on the Boeing 757 airplane. Based on the work of Ljungstroem in Sweden, this type of slat design appears to shift the lift curve so that higher lift is achieved with the deployed slat with no increase in angle of attack. The layouts demonstrate that these slat systems can be designed with no need for slave links, and an experimental test program is outlined to experimentally validate the lift characteristics of the shallow slat.
Robust adaptive mesh refinement for transonic conditions is one of the most difficult challenges to advancing CFD usage for certification by analysis. Transonic fluid-structure interaction cases represent an even more difficult challenge for adaptive mesh refinement. Production aircraft furthermore have structural models that have gaps and discontinuities that make the interdomain transfer of loads and deflections difficult. This adds to the challenge of adaptive mesh refinement. An initial attempt to create an adaptive mesh refinement process that refines regions of high flow gradient based around the HeldenMesh software is presented. The method is applied to the Integrated Adaptive Wing Technology Maturation (IAWTM) configuration. That has developed an aspect ratio 13.5 wing aeroelastic wind-tunnel model for testing in the Transonic Dynamics Tunnel (TDT). The high levels of deformation of this wing make the adaptation of meshes for the static shape difficult and has necessitated some creativity in how to efficiently adapt meshes. A time-domain identification of the unsteady system based on flexible modes using the adapted meshes is performed.
Inorganic-containing hybrid photoresists are critical for next-generation extreme ultraviolet (EUV) lithography and angstrom-era semiconductor miniaturization. However, associated conventional solution processing struggles to achieve ultrathin, uniform films with high conformality and compositional control, limiting overall patterning performance. Here, this study reports the systematic lithographic patterning characterization of an Al-based hybrid resist synthesized via vapor-phase molecular layer deposition (MLD), using the trimethylaluminum (TMA) metal precursor and the hydroquinone (HQ) aromatic organic linker. The resist supports both sub-20 nm high-resolution nanolithography and virtually infinite silicon plasma etch selectivity. Lithographic performance studied using electron beam lithography (EBL) as a proxy for EUV shows that, under an optimized process adopting post-exposure bake, the resist achieves the best resolution of 15.4 nm linewidth under stringent 1:1 line-space high-density patterning—limited only by the minimum beam size of the EBL system. The resist also shows wide dose latitude and balanced performance in resolution, roughness, and sensitivity. The infinite silicon etch selectivity, stemming from spontaneous aluminum oxyfluoride passivation layer formation, enables fabrication of micrometer-tall, 40 nm-wide silicon nanofin structures using only a ≈30 nm-thick resist layer, without no hard mask. These results highlight the potential of MLD-based hybrid resists for developing next-generation resist materials for micro/nanoelectronics manufacturing.
Two single-stage, 0.77 hub/tip ratio axial-flow compressors were tested to evaluate the effectiveness of low aspect ratio blading as a means of obtaining higher stage loadings. One compressor, designated Stage F, was comprised of circular arc blading with an aspect ratio of 0.9 for both the rotor and stator. This compressor was tested with uniform inlet flow, hub radial, tip radial, and 180 deg arc circumferential inlet distortion. The second compressor, designated Stage G, was comprised of multiple circular arc blading with an aspect ratio of 1.0 for both the rotor and stator. This compressor was tested with uniform inlet flow only. Design rotor tip speeds for Rotor F and Rotor G were 285 m/sec (934 ft/sec) and 327 m/sec (1,074 ft/sec) respectively. Both stages operated at high loading levels with adequate efficiency and operating range. The peak efficiencies and corresponding average stage diffusion factors for Stages F and G at design rotor speed were 86.4% and 84.1% and 0.59 and 0.55 respectively. The surge margin at peak efficiency for Stage F was 12.6% and the corresponding value for Stage G was 16.5%. Both stages experienced a loss in efficiency with increasing rotor speed; however, the multiple circular arc rotor delayed the characteristic loss in efficiency within increasing Mach number to higher Mach number.
The results of experiments on the noise generated by a 1.33 x 91.4 cm slot nozzle with various V-gutter reversers are presented. The experiments were conducted with near-ambient temperature jets at nozzle pressure ratios of 1.25 to 3.0, yielding jet velocities of about 190 to 400 m/sec. At pressure ratios of 2 or less, the reversers, in addition to being noisier than the nozzle alone, also had a more uniform directional distribution and more high-frequency noise. At pressure ratios above 2, the nozzle alone generated enough shock noise that the levels were about the same as for the reversers. The maximum overall sound pressure level and the effective overall sound power level both varied with the sixth power of jet velocity over the range tested.
The results of experiments on the noise generated by a 1.33- by 91.4 cm slot nozzle with various V-gutter reversers, and some thrust measurements are presented. The experiments were conducted with near-ambient temperature jets at nozzle pressure ratios of 1.25 to 3.0, yielding jet velocities of about 190 to 400 m/sec. At pressure ratios of 2 or less, the reversers, in addition to being noisier than the nozzle alone, also had a more uniform directional distribution and more high-frequency noise. At pressure ratios above 2, the nozzle alone generated enough shock noise that the levels were about the same as for the reversers. The maximum overall sound pressure level and the effective overall sound power level both varied with the sixth power of jet velocity over the range tested. The data were scaled up to a size suitable for reversing the wing-flap slot nozzle flow of a 45 400-kg augmentor-wing-type airplane on the ground, yielding perceived noise levels well above 95 PNdB on a 152-m sideline.
These basic characteristics of critical wings included wing area, aspect ratio, average thickness, and sweep as well as practical constraints on the planform and thickness near the wing root to allow for the landing gear. Within these constraints, a large matrix of wing designs was studied with spanwise variations in the types of airfoils and distribution of lift as well as some small planform changes. The criteria by which the five candidate wings were chosen for testing were the cruise and buffet characteristics in the transonic regime and the compatibility of the design with low speed (high-lift) requirements. Five wing-wide-body configurations were tested in the NASA Ames 11-foot transonic wind tunnel. Nacelles and pylons, flap support fairings, tail surfaces, and an outboard aileron were also tested on selected configurations.
Here, we report a spontaneous and hierarchical self-assembly mechanism of carbon dots prepared from citric acid and urea into nanowire structures with large aspect ratios (>50). Scattering-type scanning near-field optical microscopy (s-SNOM) with broadly tunable mid-IR excitation was used to interrogate details of the self-assembly process by generating nanoscopic chemical maps of local wire morphology and composition. s-SNOM images capture the evolution of wire formation and the complex interplay between different chemical constituents directing assembly over the nano- to microscopic length scales. We propose that residual citrate promotes tautomerization of melamine surface functionalities to produce supramolecular shape synthons comprised of melamine-cyanurate adducts capable of forming long-range and highly directional hydrogen-bonding networks. This intrinsic, heterogeneity-driven self-assembly mechanism reflects synergistic combinations of high chemical specificity and long-range cooperativity that may be harnessed to reproducibly fabricate functional structures on arbitrary surfaces.
Silicone elastomers have a broad variety of applications, such as soft robotics, biomedical devices, and structural metamaterials. The extrusion-based method known as direct ink write (DIW) has enabled the production of additively manufactured silicone structures. However, this method is limited to manufacturing mostly planar or pseudo-3D structures. Due to the low self-supporting capabilities of extruded strands for traditional silicone-based “inks,” obtaining tall or overhanging structures, or structures comprised by thin walls is not feasible. Here, in this study, a novel Fast Cure silicone-based ink is demonstrated that enables manufacturing of complex 3D structures. The Fast Cure ink is a two-part mixture and silicone structures are produced by inline mixing and coextrusion of a part containing a catalyst (part A) and a part containing a crosslinker (part B). By the virtue of crosslinking, the extruded strands rapidly rigidize, increasing their self-supportive capacity. Hence, structures can be obtained with superior shape retention and previously unobtainable parts are realized that are tall, with aspect ratios higher than 3, and have overhanging features, achieving inclination angles smaller than 35° with respect to the printing plane. These minimal sag parts are achieved without requiring extra curing or mechanisms, support structures, or suspension baths.
Driven by numerous discoveries of novel physical properties and integration into functional devices, interest in one-dimensional (1D) magnetic nanostructures has grown tremendously. Traditionally, such structures are accessed with bottom-up techniques, but these require increasing sophistication to allow precise control over crystallinity, branching, aspect ratio, and surface termination, especially when approaching the subnanometer regime in magnetic phases. In this work, we show that mechanical exfoliation of bulk quasi-one-dimensional crystals, a method similar to those popularized for two-dimensional van der Waals (vdW) lattices, serves as an efficient top-down method to produce ultrathin freestanding nanowires that are both magnetic and semiconducting. We use CrSbSe 3 as a representative quasi-1D vdW crystal with strong magnetocrystalline anisotropy and show that it can be exfoliated into nanowires with an average cross-section of 10 ± 2.8 nm. The CrSbSe 3 nanowires display reduced Curie–Weiss temperature but higher coercivity and remanence than the bulk phase. The methodology developed here for CrSbSe 3 , a representative for a vast class of 1D vdW lattices, serves as a blueprint for investigating confinement effects for 1D materials and accessing functional nanowires that are difficult to produce via traditional bottom-up methods.
Plasma etching of semiconductors is an essential process in the production of microchips which enable nearly every aspect of modern life. Two frequencies of applied voltage are often used to provide control of both the ion fluxes and energy distribution.
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