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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 109 records · Page 6
All sourcesNASA NTRSDOE OSTI
NASA NTRS2014

Modular Pulsed Plasma Electric Propulsion System for Cubesats

Current capabilities of CubeSats must be improved in order to perform more ambitious missions. Electric propulsion systems will play a key role due to their large specific impulse. Compared to other propulsion alternatives, their simplicity allows an easier miniaturization and manufacturing of autonomous modules into the nano and pico-satellite platform. Pulsed Plasma Thrusters (PPTs) appear as one of the most promising technologies for the near term. The utilization of solid and non-volatile propellants, their low power requirements and their proven reliability in the large scale make them great candidates for rapid implementation. The main challenges are the integration and miniaturization of all the electronic circuitry into a printed circuit board (PCB) that can satisfy the strict requirements that CubeSats present. NASA Ames and the George Washington University have demonstrated functionality and control of three discrete Micro-Cathode Arc Thrusters (CAT) using a bench top configuration that was compatible with the ARC PhoneSat Bus. This demonstration was successfully conducted in a vaccum chamber at the ARC Environmental Test Laboratory. A new effort will integrate a low power Plasma Processing Unit and two plasma thrusters onto a single printed circuit board that will utilize less than 13 U of Bus volume. The target design will be optimized for the accommodation into the PhoneSatEDISON Demonstration of SmallSatellite Networks (EDSN) bus as it uses the same software interface application, which was demonstrated in the previous task. This paper describes the design, integration and architecture of the proposed propulsion subsystem for a planned Technology Demonstration Mission. In addition, a general review of the Pulsed Plasma technology available for CubeSats is presented in order to assess the necessary challenges to overcome further development.

PCB↗
NASA NTRS2018

Nanoparticle Hybrid Composites by RF Plasma Spray Deposition

A method of fabricating a composite material includes utilizing a radio frequency plasma process to form a plasma plume comprising nanoparticles. The nanoparticles may comprise boron nitride nanoparticles, silicon carbide nanoparticles, beryllium oxide nanoparticles, or carbon nanoparticles. The nanoparticles may comprise nanotubes or other particles depending on the requirements of a particular application. The nanoparticles are deposited on a substrate by directing a plasma plume towards the substrate. The nanoparticles are formed in the plasma plume immediately prior to being deposited on the substrate. The nanoparticles may form a mechanical bond with the fibers in addition to a chemical bond in the absence of a catalyst. The substrate may comprise a fiber fabric that may optionally be coated with a thin layer of metal. Alternatively, the substrate may comprise a solid material such as a metal sheet or plate.

Hales, Stephen J.↗
NASA NTRS1981

Automated Plasma Spray (APS) process feasibility study

An automated plasma spray (APS) process was developed to apply two layer (NiCrAlY and ZrO2-12Y2O3) thermal barrier coatings to aircraft and stationary gas turbine engine blade airfoils. The APS process hardware consists of four subsystems: a mechanical positioning subsystem incorporating two interlaced six degree of freedom assemblies (one for coating deposition and one for coating thickness monitoring); a noncoherent optical metrology subsystem (for in process gaging of the coating thickness buildup at specified points on the specimen); a microprocessor based adaptive system controller (to achieve the desired overall thickness profile on the specimen); and commerical plasma spray equipment. Over fifty JT9D first stage aircraft turbine blade specimens, ten W501B utility turbine blade specimens and dozens of cylindrical specimens were coated with the APS process in preliminary checkout and evaluation studies. The best of the preliminary turbine blade specimens achieved an overall coating thickness uniformity of 53 micrometers (2.1 mils), much better than is achievable manually. Comparative evaluations of coating thickness uniformity for manually sprayed and APS coated specimens were performed. One of the preliminary turbine blade evaluation specimens was subjected to a torch test and metallographic evaluation. Some cylindrical specimens coated with the APS process survived up to 2000 cycles in subsequent burner rig testing.

Fetheroff, C. W.↗
NASA NTRS1983

Dry etching of metallization

The production dry etch processes are reviewed from the perspective of microelectronic fabrication applications. The major dry etch processes used in the fabrication of microelectronic devices can be divided into two categories - plasma processes in which samples are directly exposed to an electrical discharge, and ion beam processes in which samples are etched by a beam of ions extracted from a discharge. The plasma etch processes can be distinguished by the degree to which ion bombardment contributes to the etch process. This, in turn is related to capability for anisotropic etching. Reactive Ion Etching (RIE) and Ion Beam Etching are of most interest for etching of thin film metals. RIE is generally considered the best process for large volume, anisotropic aluminum etching.

Bollinger, D.↗
NASA NTRS1999

Diagnostic for Plasma Enhanced Chemical Vapor Deposition and Etch Systems

In order to meet NASA's requirements for the rapid development and validation of future generation electronic devices as well as associated materials and processes, enabling technologies ion the processing of semiconductor materials arising from understanding etch chemistries are being developed through a research collaboration between Stanford University and NASA-Ames Research Center, Although a great deal of laboratory-scale research has been performed on many of materials processing plasmas, little is known about the gas-phase and surface chemical reactions that are critical in many etch and deposition processes, and how these reactions are influenced by the variation in operating conditions. In addition, many plasma-based processes suffer from stability and reliability problems leading to a compromise in performance and a potentially increased cost for the semiconductor manufacturing industry. Such a lack of understanding has hindered the development of process models that can aid in the scaling and improvement of plasma etch and deposition systems. The research described involves the study of plasmas used in semiconductor processes. An inductively coupled plasma (ICP) source in place of the standard upper electrode assembly of the Gaseous Electronics Conference (GEC) radio-frequency (RF) Reference Cell is used to investigate the discharge characteristics and chemistries. This ICP source generates plasmas with higher electron densities (approximately 10(exp 12)/cu cm) and lower operating pressures (approximately 7 mTorr) than obtainable with the original parallel-plate version of the GEC Cell. This expanded operating regime is more relevant to new generations of industrial plasma systems being used by the microelectronics industry. The motivation for this study is to develop an understanding of the physical phenomena involved in plasma processing and to measure much needed fundamental parameters, such as gas-phase and surface reaction rates. species concentration, temperature, ion energy distribution, and electron number density. A wide variety of diagnostic techniques are under development through this consortium grant to measure these parameters. including molecular beam mass spectrometry (MBMS). Fourier transform infrared (FTIR) spectroscopy, broadband ultraviolet (UV) absorption spectroscopy, a compensated Langmuir probe. Additional diagnostics. Such as microwave interferometry and microwave absorption for measurements of plasma density and radical concentrations are also planned.

Cappelli, Mark A.↗
NASA NTRS1978

The Automated Array Assembly Task of the Low-cost Silicon Solar Array Project, Phase 2

An advanced process sequence for manufacturing high efficiency solar cells and modules in a cost-effective manner is discussed. Emphasis is on process simplicity and minimizing consumed materials. The process sequence incorporates texture etching, plasma processes for damage removal and patterning, ion implantation, low pressure silicon nitride deposition, and plated metal. A reliable module design is presented. Specific process step developments are given. A detailed cost analysis was performed to indicate future areas of fruitful cost reduction effort. Recommendations for advanced investigations are included.

Coleman, M. G.↗
NASA NTRS1981

A Solution in Search of Problems

Ferrofluids offered vast-problem solving potential. Under license for the NASA technology, Dr. Ronald Moskowitz and Dr. Ronald Rosensweig formed Ferrofluids Corporation. First problem they found a solution for was related to the manufacture of semiconductor "chips" for use in electronic systems. They developed a magnetic seal composed of ferrofluid and a magnetic circuit. Magnetic field confines the ferrofluid in the regions between the stationary elements and the rotary shaft of the seal. Result is a series of liquid barriers that totally bar passage of contaminants. Seal is virtually wear-proof and has a lifetime measured in billions of shaft revolutions. It has reduced maintenance, minimizes "downtime" of production equipment, and reduces the cost of expensive materials that had previously been lost through seal failures. Products based on ferrofluid are exclusion seals for computer disc drives and inertia dampers for stepper motors. Uses are performance-improving, failure-reducing coolants for hi-fi loudspeakers. Other applications include analytical instrumentation, medical equipment, industrial processes, silicon crystal growing furnaces, plasma processes, fusion research, visual displays, and automated machine tools.

Source record↗
NASA NTRS2024

Hybrid Kinetic Modeling of the Magnetosheath Impulsive Plasma Cloud Penetration Through the Magnetopause and Comparison with MMS and Other Spacecraft Observations

This research examines the plasma processes under penetration of the plasma clouds (plasmoids) across the magnetopause which is modeled as a tangential discontinuity (TD). Cases with the parallel magnetic field in both sides out of the TD are under investigation. Plasma parameters and magnetic field were chosen from the MMS mission and other spacecraft observations. The results are important for understanding the following basic space plasma physics problems: (a) plasma cloud deformation and strong phase mixing with magnetospheric plasma; (b) the transfer of mass, momentum and energy of magnetosheath and magnetic cloud plasma into magnetospheric plasmas; (c) necessary conditions for plasma cloud penetration via the magnetopause; (d) wave generation by plasma clouds inside the magnetopause.

A S Lipatov↗
NASA NTRS2003

VPS GRCop-84 Liner Development Efforts

For the past several years, NASA's Marshall Space Flight Center (MSFC) has been working with Plasma Processes, Inc. (PPI) to fabricate combustion chamber liners using the Vacuum Plasma Spray (VPS) process. Multiple liners of a variety of shapes and sizes have been created. Each liner has been fabricated with GRCop-84 (a copper alloy with chromium and niobium) and a functional gradient coating (FGC) on the hot wall. While the VPS process offers versatility and a reduced fabrication schedule, the material system created with VPS allows the liners to operate at higher temperatures, with maximum blanch resistance and improved cycle life. A subscal unit (5K lbf thrust class) is being cycle tested in a LOX/Hydrogen thrust chamber assembly at MSFC. To date, over 75 hot-fire tests have been accumulated on this article. Tests include conditions normally detrimental to conventional materials, yet the VPS GRCop-84 liner has yet to show any signs of degradation. A larger chamber (15K lbf thrust class) has also been fabricated and is being prepared for hot-fire testing at MSFC near the end of 2003. Linear liners have been successfully created to further demonstrate the versatility of the process. Finally, scale up issues for the VPS process are being tackled with efforts to fabricate a full size, engine class liner. Specifically, a liner for the SSME's Main Combustion Chamber (MCC) has recently been attempted. The SSME size was chosen for convenience, since its design was readily available and its size was sufficient to tackle specific issues. Efforts to fabricate these large liners have already provided valuable lessons for using this process for engine programs. The material quality for these large units is being evaluated with destructive analysis and these results will be available by the end of 2003.

Elam, Sandra K.↗
NASA NTRS2005

VPS Process for Copper Components in Thrust Chamber Assemblies

For several years, NASA's Marshall Space Flight Center (MSFC) has been working with Plasma Processes, Inc., (PPI) to fabricate thrust chamber liners with GRCop-84. Using the vacuum plasma spray (VPS) process, chamber liners of a variety of shapes and sizes have been created. Each has been formed as a functional gradient material (FGM) that creates a unique protective layer of NiCrAlY on the GRCop-84 liner s hot wall surface. Hot-fire testing was successfully conducted on a subscale unit to demonstrate the liner's durability and performance. Similar VPS technology has also been applied to create functional gradient coatings (FGC) on copper injector faceplates. Protective layers of NiCrAlY and zirconia were applied to both coaxial and impinging faceplate designs. Hot-fire testing is planned for these coated injectors in April 2005. The resulting material systems for both copper alloy components allows them to operate at higher temperatures with improved durability and operating margins.

Elam, Sandra↗
NASA NTRS1998

Plasma-assisted microwave processing of materials

A microwave plasma assisted method and system for heating and joining materials. The invention uses a microwave induced plasma to controllably preheat workpiece materials that are poorly microwave absorbing. The plasma preheats the workpiece to a temperature that improves the materials' ability to absorb microwave energy. The plasma is extinguished and microwave energy is able to volumetrically heat the workpiece. Localized heating of good microwave absorbing materials is done by shielding certain parts of the workpiece and igniting the plasma in the areas not shielded. Microwave induced plasma is also used to induce self-propagating high temperature synthesis (SHS) process for the joining of materials. Preferably, a microwave induced plasma preheats the material and then microwave energy ignites the center of the material, thereby causing a high temperature spherical wave front from the center outward.

Barmatz, Martin↗
NASA NTRS2001

Plasma Reactor Modeling and Validation Experiments

Plasma processing is a key processing stop in integrated circuit manufacturing. Low pressure, high density plum reactors are widely used for etching and deposition. Inductively coupled plasma (ICP) source has become popular recently in many processing applications. In order to accelerate equipment and process design, an understanding of the physics and chemistry, particularly, plasma power coupling, plasma and processing uniformity and mechanism is important. This understanding is facilitated by comprehensive modeling and simulation as well as plasma diagnostics to provide the necessary data for model validation which are addressed in this presentation. We have developed a complete code for simulating an ICP reactor and the model consists of transport of electrons, ions, and neutrals, Poisson's equation, and Maxwell's equation along with gas flow and energy equations. Results will be presented for chlorine and fluorocarbon plasmas and compared with data from Langmuir probe, mass spectrometry and FTIR.

Meyyappan, M.↗
NASA NTRS1983

Process Sprays Uniforms Plasma Coatings

Composite-powder processing procedure developed along with plasma-spray parameters to achieve homogeneous, well-bonded, low-porosity, self-lubricating coatings. Multicomponent plasma coatings are applied without segretation of components.

Sliney, H. E.↗
NASA NTRS1973

Structure and evolutionary history of the solar system. III.

Analysis of the plasma processes and the hydromagnetic aspects involved in the evolution of the solar system. In order to reduce the speculative element as far as possible, the present analysis tries to connect the cosmogonic processes as directly as possible to laboratory plasma physics and to space phenomena actually observed today. Models of the Laplacian type have been made obsolete by magnetohydrodynamics. Furthermore they are in conflict with observations. A new model is suggested. A plasma surrounding a rotating central body may attain a state of partial corotation which is determined by the balance between gravitation and the centrifugal force acting on a plasma in a dipole field. Condensation from a partially corotating plasma results in grains orbiting in ellipses with e = 1/3 and finally accreting to bodies at 2/3 of the central distance of the point of condensation. An application of the theory of the Saturnian rings and to the asteroidal belt shows that the fall-down ratio 2/3 (derived from the geometry of a dipole field) is essential for the understanding of their structure. The structure of the groups of planets and satellites is also discussed, but only in a preliminary way.

Alfven, H.↗
NASA NTRS1996

Absolute Inelastic Differential Electron Scattering Cross Sections for He, Xe, N2, and CO at Near Threshold Impact Energies for 90(deg) Scattering Angle

There is a great deal of need for accurate differential cross sections (DCSs) associated with electron impact excitation of various atomic and molecular species. These cross sections are needed for modeling of various plasma systems (ranging from lasers and material processing plasmas to planetary and astrophysical plasmas) and for guiding development of theoretical and computational schemes.

DCS beam scattering beam-beam scattering↗