Laser-induced damage-growth threshold at 351 nm in the nanosecond regime in dielectric coatings employing different high-index materials
The laser-damage performance of HfO 2 /SiO 2 and Al 2 O 3 /SiO 2 mirrors was investigated at a laser wavelength of 351 nm with nanosecond pulse durations. A method was developed to quantify the laser-induced damage-growth threshold under conditions relevant to high-repetition-rate, large-aperture laser systems. The results suggest that the damage-growth performance cannot be inferred from the corresponding damage-initiation threshold that is commonly used to evaluate the performance of optical materials. Here, a systematic difference was also observed in the performance between these two groups of high-index materials, with the Al 2 O 3 /SiO 2 mirrors exhibiting about twofold improvement in the damage-growth threshold.