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At least 127 records · Page 7

Structured-groove phase gratings for control and optimization of the spectral efficiency

Phase gratings are used as dispersers in a variety of imaging spectroscopic instruments. However, conventional phase gratings provide limited spectral range and flexibility to fully optimize instrument performance for challenging applications. Presented here is a new design method that tailors and optimizes the spectral efficiency by introducing an arbitrary structure into the grating groove profile.

diffraction gratings↗

Dispersion Leverage Coronagraph: a nulling coronagraph for use on primary objective grating telescopes

Here, we present the Dispersion Leverage Coronagraph (DLC), a variation of the Achromatic Interfero Coronagraph (AIC) that is designed for optical systems featuring large, dispersive primary objective gratings. DLC was originally designed for the Diffractive Interfero Coronagraph Exoplanet Resolver (DICER), a notional 20 m class infrared space telescope utilizing the enhanced one-dimensional angular resolution of large diffraction gratings to discover and characterize near-Earth exoplanets. Here we develop the theoretical foundation for DLC, and apply it to DICER as an example use case. We derive important properties of the DLC system, including focal plane transmission maps, stellar leakage, residual optical path difference tolerance, and pointing error/jitter considerations. Ultimately, we found that DLC effectively nulls an on-axis target across the entire spectrum in the focal plane, allowing for 2D/λ diffraction-limited imaging. It requires asymmetrical fine-guidance tolerances on pointing error/jitter. We work through a benchmark DICER design, explaining the need for a second disperser to reduce background from Zodiacal light, and showing that it could plausibly find and characterize ∼4 nearby, habitable exoplanets around Sun-like stars in a 7-year mission; about 30% of the habitable exoplanets within 8 pc were found in our simulation. The DLC may be useful for any application requiring extremely high-resolution, close companion spectroscopy.

AIC↗

Neutron Grating Interferometry at the High Flux Isotope Reactor

Neutron imaging is a non-destructive probe that can spatially resolve bulk materials’ internal features/structures. Neutron imaging spatial resolution is driven by detector technology, i.e., pixel size, and is currently on the order of 10–20 µm. This limitation can be alleviated by the use of neutron grating interferometry – an advanced neutron imaging technique – that enables simultaneous access to three contrast mechanisms: attenuation, differential phase, and small-angle neutron scattering. Recently, a Talbot-Lau neutron grating interferometry has been implemented at the Multimodal Advanced Radiography Station at the High Flux Isotope Reactor. In this work, the design, setup and performance of the grating apparatus are presented.

Zhang, Yuxuan [ORNL] (ORCID:0000000200831408)↗

Voltage-induced modulation of interfacial ionic liquids measured using surface plasmon resonant grating nanostructures

We have used surface plasmon resonant metal gratings to induce and probe the dielectric response (i.e., electro-optic modulation) of ionic liquids (ILs) at electrode interfaces. Here, the cross-plane electric field at the electrode surface modulates the refractive index of the IL due to the Pockels effect. This is observed as a shift in the resonant angle of the grating (i.e., Δϕ), which can be related to the change in the local index of refraction of the electrolyte (i.e., Δnlocal). The reflection modulation of the IL is compared against a polar (D2O) and a non-polar solvent (benzene) to confirm the electro-optic origin of resonance shift. The electrostatic accumulation of ions from the IL induces local index changes to the gratings over the extent of electrical double layer (EDL) thickness. Finite difference time domain simulations are used to relate the observed shifts in the plasmon resonance and change in reflection to the change in the local index of refraction of the electrolyte and the thickness of the EDL. Simultaneously using the wavelength and intensity shift of the resonance enables us to determine both the effective thickness and Δn of the double layer. We believe that this technique can be used more broadly, allowing the dynamics associated with the potential-induced ordering and rearrangement of ionic species in electrode–solution interfaces.

Chemistry↗

Triangular cross-section grating couplers for integrated quantum nanophotonic hardware in silicon carbide

We design, fabricate, and characterize fishbone grating couplers for triangular cross-section photonics in silicon carbide compatible with color center integration. The periodic and aperiodic grating coupler designs are optimized to outcouple up to 31% of light in the fundamental TE mode of a triangular waveguide. The devices are fabricated using an ion beam etching process in a 4H–SiC sample implanted with NV center ensembles. The room-temperature transmission and the cryogenic NV center photoluminescence collection measurements indicate experimental grating coupler efficiency of up to 24%. This result provides a scalable method to efficiently extract color center light from SiC quantum nanophotonic devices to free-space optics.

Saha, Pranta↗

Greater than Five-Order-of-Magnitude Postcompression Temporal Contrast Improvement with an Ionization Plasma Grating

High-intensity lasers require suppression of prepulses and other nonideal temporal structure to avoid target disruption before the arrival of the main pulse. Here, to address this, we demonstrate that ionization gratings act as a controllable optical switch for high-power light with a temporal contrast improvement of at least 3 ×10 5 and a switching time less than 500 fs. We also show that a grating system can run for hours at 10 Hz without degradation. The contrast improvement from an ionization grating compares favorably to that achievable with plasma mirrors.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Zero-crosstalk silicon photonic refractive index sensor with subwavelength gratings

Abstract Silicon photonic index sensors have received significant attention for label-free bio and gas-sensing applications, offering cost-effective and scalable solutions. Here, we introduce an ultra-compact silicon photonic refractive index sensor that leverages zero-crosstalk singularity responses enabled by subwavelength gratings. The subwavelength gratings are precisely engineered to achieve an anisotropic perturbation-led zero-crosstalk, resulting in a single transmission dip singularity in the spectrum that is independent of device length. The sensor is optimized for the transverse magnetic mode operation, where the subwavelength gratings are arranged perpendicular to the propagation direction to support a leaky-like mode and maximize the evanescent field interaction with the analyte space. Experimental results demonstrate a high wavelength sensitivity of − 410 nm/RIU and an intensity sensitivity of 395 dB/RIU, with a compact device footprint of approximately 82.8 μm 2 . Distinct from other resonant and interferometric sensors, our approach provides an FSR-free single-dip spectral response on a small device footprint, overcoming common challenges faced by traditional sensors, such as signal/phase ambiguity, sensitivity fading, limited detection range, and the necessity for large device footprints. This makes our sensor ideal for simplified intensity interrogation. The proposed sensor holds promise for a range of on-chip refractive index sensing applications, from gas to biochemical detection, representing a significant step towards efficient and miniaturized photonic sensing solutions. Graphical Abstract

Materials Science↗

Investigation of the distribution of laser-induced damage precursors in etched grating sidewalls fabricated using inductively coupled plasma reactive-ion etching

Inductively coupled plasma reactive-ion etching for grating fabrication is explored with emphasis on the type and distribution of process-induced defects that can act as precursors to laser-induced damage initiation. To provide flexibility in the ability to perform a variety of material characterization methods, grating-like features with large pitch were fabricated in silica monolayers. The results indicate that the etch process introduces surface fluorine and subsurface carbon-containing contamination, which reduces the laser-induced damage threshold. The local relative concentrations of the laser-damage precursors introduced during the etch step of the manufacturing process were investigated using angle-resolved damage testing, taking advantage of the shift of the location of the peak electric-field intensity incident on the grating sidewall. The results suggest an increased level of etch-related defects near the base of the sidewall, with directly fluorinated silicon identified as the primary defect.

Dent, R. [Univ. of Rochester, NY (United States). ↗

HDG-1 Fiber Bragg grating data analysis

The main goal of the High dose graphite 1 Advanced test reactor experiment was to study nuclear grade graphite at high fluences. Additional supplementary optical fiber instrumentation was added to this long duration experiment for instrumentation development purposes. The supplementary instrumentation consisted of two pure silica core, fluorine doped cladding optical fibers each etched with 9 fiber Bragg gratings, one fiber being heat treated for 9 hours at 750 C and 16 hours at 750 C, the other being heat treated for 24 hours at 550 C and 48 hours at 650 C. Fiber Bragg gratings are known to have issues of measurement drift when in high temperature and high radiation environments like what is encountered in the Advanced test reactor. At the culmination of this experiment, the optical fibers saw ~1.3E21 n/cm2 total fluence, which is at the highest fluences that fiber Bragg gratings have been studied to date. Reported here is the analysis of this data including radiation induced shift and changes in sensitivity.

46 - INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AN↗

Concave holographic grating for spectrographic applications: Study of the aberrations

An analysis of reflecting diffraction gratings by the application of holographic techniques is presented. The subjects discussed are: (1) holographic grating properties, (2) calculation of aberrant optical path, (3) analytical expression of stigmatic points, (4) spherical aberration and limitation of grating width, and (5) determination of construction parameters.

Pieuchard, G.↗

Sensitive visual test for concave diffraction gratings.

A simple visual test for the evaluation of concave diffraction gratings is described. It is twice as sensitive as the Foucault knife edge test, from which it is derived, and has the advantage that the images are straight and free of astigmatism. It is particularly useful for grating with high ruling frequency where the above image faults limit the utility of the Foucault test. The test can be interpreted quantitatively and can detect zonal grating space errors of as little as 0.1 A.

Bruner, E. C., Jr.↗

Josephson junction interference grating.

The maximum current through multiple Josephson structures as a function of applied magnetic field is presented. Particular emphasis is placed on the Josephson penetration depth effects and geometrical considerations. The symmetrical and asymmetrical current feed two-, three-, four-, and five-junction gratings are analyzed and discussed. The Josephson penetration depth is shown to control the amplitude of the interference and diffraction patterns of the interference grating. In addition the interior-junction-length/interference-loop-area product is shown to control the operating mode of the interference grating. The dependence of the magnetic field sensitivity and interference pattern amplitude on the number of junctions is discussed.

Stuehm, D. L.↗

Theoretical and experimental investigation of 'grating' type photovoltaic cells

The fabrication procedure and properties of 'grating' cells made by forming a fine grating pattern of aluminum alloyed into n-silicon wafers are described. The finest grating lines achieved in the cells described were 5 microns; the smallest spacing was about 15 microns. The best temperature for alloying was found to be about 600 C, a bit above the Si-Al eutectic temperature (576 C). The short-circuit current obtained from the best of these cells exposed to 100 mW/sq cm of (simulated air mass zero) illumination was at least equal to that obtained from conventional diffused cells, but their open-circuit voltage was lower. Their quantum yield was strongly blue-shifted; it was flat from 4000 to 8500 A.

Loferski, J. J.↗

Electromagnetic diffraction efficiencies for plane reflection diffraction gratings

The theory and computer programs, based on electromagnetic theory, for the analysis and design of echelle gratings were developed. The gratings are designed for instruments that operate in the ultraviolet portion of the spectrum. The theory was developed so that the resulting computer programs will be able to analyze deep (up to 30 wavelengths) gratings by including as many as 100 real or homogeneous diffraction orders. The program calculates the complex amplitude coefficient for each of the diffracted orders. A check on the numerical method used to solve the integral equations is provided by a conservation of energy calculation.

Marathay, A. S.↗

Summary of theoretical and experimental investigation of grating type, silicon photovoltaic cells

Theoretical and experimental aspects are summarized for single crystal, silicon photovoltaic devices made by forming a grating pattern of p/n junctions on the light receiving surface of the base crystal. Based on the general semiconductor equations, a mathematical description is presented for the photovoltaic properties of such grating-like structures in a two dimensional form. The resulting second order elliptical equation is solved by computer modeling to give solutions for various, reasonable, initial values of bulk resistivity, excess carrier concentration, and surface recombination velocity. The validity of the computer model is established by comparison with p/n devices produced by alloying an aluminum grating pattern into the surface of n-type silicon wafers. Current voltage characteristics and spectral response curves are presented for cells of this type constructed on wafers of different resistivities and orientations.

Chen, L. Y.↗

A calibration of detectors and gratings between 100 and 600 Angstroms

Calibration and efficiency measurements of magnetic electron multipliers, diffraction gratings, and photocathodes over the wavelength range 100 to 600 A are reported. For some of the measurements it was found necessary to use the synchrotron radiation from a storage ring. Measurements of grating efficiencies, the polarization produced by diffraction gratings, and the photoelectric yields of various photocathodes are included.

Samson, J. A. R.↗

Refractive-index profile and physical process determination in thick gratings in electrooptic crystals

A method for determining the refractive index profile of thick phase gratings in linear electrooptic crystals is presented. This method also determines the effective photovoltaic electric field and the relative contributions of diffusion and drift during hologram recording. The method requires only a knowledge of the modulation ratio during hologram recording and the fundamental and the higher-order diffraction efficiencies of the grating. As an illustration of the method, the refractive index profile, the effective photovoltaic field, and the relative contributions of diffusion and drift are determined from experimental measurements for a lithium niobate holographic grating.

Su, S. F.↗

Continuation of the study of reflecting diffraction grating by the application of holographic techniques

For a given wavelength, the angle of incidence for the optimum relative efficiency was sensibly the same for the various gratings independently of the Nb grooves/mm. In spite of the fact that all these gratings were blazed at the same wavelength this was not obvious a priori as the blaze angle varied from 1.71 deg for 600 gr/mm to 14.41 deg for the 5,000 gr/mm grating.

Source record↗