Plasma polymerization of ethylene in an atmospheric pressure-pulsed discharge
The polymerization of ethylene in an atmospheric pressure-pulsed discharge has been studied. Partial pressures of ethylene up to 4 kN/sq m were used with helium as a diluent. Deposition rates (on glass slides) were the same throughout the discharge volume over a wide range of operating conditions. These rates were in the 1-2 A/sec range. The films were clear, soft, and showed good adhesion to the glass substrates. Oligomers large enough to visibly scatter 637.8-nm light were observed in the gas phase under all conditions in which film deposition occurred. The experimental results suggest that Brownian diffusion of these oligomers was the rate-limiting step in the film deposition process.