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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 145 records · Page 8

A Change in the Solar He II EUV Global Network Structure as an Indicator of the Geo-Effectiveness of Solar Minima

Solar activity during 2007 - 2009 was very low, causing anomalously low thermospheric density. A comparison of solar extreme ultraviolet (EUV) irradiance in the He II spectral band (26 to 34 nm) from the Solar Extreme ultraviolet Monitor (SEM), one of instruments on the Charge Element and Isotope Analysis System (CELIAS) on board the Solar and Heliospheric Observatory (SOHO) for the two latest solar minima showed a decrease of the absolute irradiance of about 15 +/- 6 % during the solar minimum between Cycles 23 and 24 compared with the Cycle 22/23 minimum when a yearly running-mean filter was used. We found that some local, shorter-term minima including those with the same absolute EUV flux in the SEM spectral band show a higher concentration of spatial power in the global network structure from the 30.4 nm SOHO/Extreme ultraviolet Imaging Telescope (EIT) images for the local minimum of 1996 compared with the minima of 2008 - 2011.We interpret this higher concentration of spatial power in the transition region's global network structure as a larger number of larger-area features on the solar disk. These changes in the global network structure during solar minima may characterize, in part, the geo-effectiveness of the solar He II EUV irradiance in addition to the estimations based on its absolute levels.

Solar extreme ultraviolet irradiance↗

Measuring Solar Doppler Velocities in the He II 30.38 nm Emission Using the EUV Variability Experiment (EVE)

The EUV Variability Experiment (EVE) onboard the Solar Dynamics Observatory has provided unprecedented measurements of the solar EUV irradiance at high temporal cadence with good spectral resolution and range since May 2010. The main purpose of EVE was to connect the Sun to the Earth by providing measurements of the EUV irradianceas a driver for space weather and Living With a Star studies, but after launch the instrument has demonstrated the significance of its measurements in contributing to studies looking at the sources of solar variability for pure solar physics purposes. This paper expands upon previous findings that EVE can in fact measure wavelength shifts during solar eruptive events and therefore provide Doppler velocities for plasma at all temperatures throughout the solar atmosphere from the chromosphere to hot flaring temperatures. This process is not straightforward as EVE was not designed or optimized for these types of measurements. In this paper we describe the many detailed instrumental characterizations needed to eliminate the optical effects in order to provide an absolute baseline for the Doppler shift studies. An example is given of a solar eruption on 7 September 2011 (SOL2011-09-07), associated with an X1.2 flare, where EVE Doppler analysis shows plasma ejected from the Sun in the He II 30.38 nm emission at a velocity of almost 120 km s(exp -1) along the line-of-sight.

Chamberlin, Phillip Clyde↗

AWARE: An Algorithm for the Automated Characterization of EUV Waves in the Solar Atmosphere

Conference Poster-Introduction Extreme ultraviolet (EUV) waves are large-scale propagating disturbances observed in the solar corona, frequently associated with coronal mass ejections and flares (Thompson et al., 1999, Thompson & Myers 2009). They appear as faint, extended structures propagating from a source region across the structured solar corona, making them difficult to isolate and measure. To further the understanding of EUV waves, we have constructed the Automated Wave Analysis and REduction (AWARE) algorithm for the measurement of EUV waves (Ireland et al, submitted). AWARE is implemented using the persistence transform, simple image processing operations and the RANSAC algorithm.

Ireland, Jack↗

Rapid Succession of Sep Events Associated With A Series of Euv Jets: Solar Orbiter, Stereo-A and Near-Earth Spacecraft Observations

A series of near-relativistic solar electron events was observed on November 9 to 15, 2022 by STEREO-A at 0.96 au, by near-Earth spacecraft such as ACE, Wind and SOHO at ⇠0.99 au, and by Solar Orbiter at heliocentric distances ranging from 0.59 to 0.66 au. At least 22 electron intensity enhancements at energies >10 keV were clearly distinguishable in the particle data collected by the Energetic Particle Detector (EPD) suite of instruments on board Solar Orbiter, with 12 of these events occurring on 11 November 2022. Several of these electron events were accompanied by <10 MeV proton and <⇠2 MeV/n heavy ion intensity enhancements. The origin of this rapid succession of particle events is a series of jet-like eruptions detected in extreme ultraviolet (EUV) observations from the vicinity of active region AR 13141 that were closely associated with type III bursts in the decametric-hectometric range. We find a close association between the EUV jets, type III radio bursts and the release of near relativistic electrons. The events on 9 November and late on 14 November are particularly interesting in that they were just evident at electron energies below ⇠30 keV, were rich in heavy ions with energies below ⇠1 MeV/n, associated with type III radio bursts at frequencies below ⇠1.0 MHz, and originated at EUV solar eruptions lacking a clear jet. By combining remote and in-situ data from the three viewpoints (Solar Orbiter and STEREO-A were ⇠20 degrees and ⇠15 degrees east of Earth, respectively), we analyze the origin of this sequence of events, determine the interplanetary context where they were observed, and investigate the interplanetary transport of electrons to the different spacecraft.

D Loyo↗

Mechanistic Advantages of Organotin Molecular EUV Photoresists

Here, extreme ultraviolet (EUV)-induced radiation exposure chemistry in organotin-oxo systems, represented by the archetypal [(R-Sn) 12 O 14 (OH) 6 ](A) 2 cage, has been investigated with density functional theory. Upholding existing experimental evidence of Sn-C cleavage-dominant chemistry, computations have revealed that either electron attachment or ionization can single-handedly trigger tin-carbon bond cleavage, partially explaining the current EUV sensitivity advantage of metal oxide systems. We have revealed that tin atoms at different parts of the molecule react differently to ionization and electron attachment and have identified such selectivity as a result of local coordination chemistry instead of the macro geometry of the molecule. An ionization-deprotonation pathway has also been identified to explain the observed evolution of an anion conjugate acid upon exposure and anion mass dependence in resist sensitivity.

38 RADIATION CHEMISTRY, RADIOCHEMISTRY, AND NUCLEA↗

EUV and Hard X-ray Hartmann Wavefront Sensing for Optical Metrology, Alignment and Phase Imaging

For more than 15 years, Imagine Optic have developed Extreme Ultra Violet (EUV) and X-ray Hartmann wavefront sensors for metrology and imaging applications. These sensors are compatible with a wide range of X-ray sources: from synchrotrons, Free Electron Lasers, laser-driven betatron and plasma-based EUV lasers to High Harmonic Generation. In this paper, we first describe the principle of a Hartmann sensor and give some key parameters to design a high-performance sensor. We also present different applications from metrology (for manual or automatic alignment of optics), to soft X-ray source optimization and X-ray imaging.

20 metrology↗

The EUV Airglow of Titan: Production and Loss of N2 c'4(0) - X

The N(2) Carroll-Yoshino (CY) c'(4) X (0,0) and (0,1) Rydberg bands between 95 and 99 nm were reported to be the most prominent EUV emission features in Voyager 1 ultraviolet spectrometer (UVS) airglow spectra from Titan's atmosphere. Although c'(4) is strongly excited by photoelectron impact, the (0,0) band is optically thick near peak production, so a multiple-scattering model is employed to calculate (0,v) nadir-viewing intensities. The model accounts for all known loss processes and quantifies the redistribution of photons to (0,v is greater than 0). Results show 7.6 R of (0,1) intensity, in agreement with reported observations (5-10 R), and 0.2 R of (0,0), in spectacular disagreement with reported observations (6-10 R). Nadir-viewing intensities of all other expected NI multiplets and N2 bands in the brightest portion of the EUV airglow spectrum (92.0-101.5 nm) are also calculated using photodissociative ionization of N(2) and photoelectron impact on N(2). It is found that NI multiplets and N(2) bands near (0,0) and unresolved by the UVS combine to produce 8.3 R, consistent with that reported for (0,0) and indicating that it was misidentified in previous analyses. The Ultraviolet Imaging Spectrograph (UVIS) on Cassini should unambiguously distinguish any (0,0) intensity from the brightest features nearby.

EUV (EXTREME ULTRAVIOLET)↗

EUV Diagnostics of Optically Thick Plasmas Using the 304 Å Channel

A fundamental limitation of current EUV diagnostic techniques is the need to neglect the He II emission contribution in the 304Å channel. This limits our ability to use strong observations available to us and increases uncertainties in the measurements made. A new EUV diagnostic technique is introduced that accounts for absorption as well as emission contributions from emitting channels such as 304 Å. This new technique can be equally applied to emitting and non-emitting channels, paving the way for more realistic discussion of the heating and energetics of transient plasmas using a wider range of observations. The diagnostic technique is used to compute the dynamics and energetics of a filament eruption observed in the high-cadence SDO/AIA and the associated ICME is observed by ACE/SWICS. The analysis gives us robust measurements of filament dynamics, energetics and its ionization history in the low solar corona. A comparison of these results with results calculated with techniques where He II emission in 304 Å is not considered allowed us to quantify the contribution from emission and comment on the robustness of our method.

EUV↗

Optimization of echo-enabled harmonic generation toward coherent EUV and soft X-ray free-electron laser at NSLS-II

Prebunching via echo-enabled harmonic generation (EEHG) is an efficient way to reduce the radiator length and improve the longitudinal coherence as well as output stability in storage-ring-based free-electron lasers. We propose a conceptual design, which uses two straight sections to seed coherent extreme-ultraviolet (EUV) and soft X-ray emission with nearly MHz repetition rate. To take the large energy spread (10 –3 ) of a storage ring into account and utilize the existing bending magnets between the two straight sections as the first chicane, we implement a special modeling tool, named EEHG optimizer. This tool has been successfully applied to maximize the prebunching with a reasonably low energy modulation, thereby generating intense coherent X-ray pulses within a short undulator length (a few meters) limited by the available space of a storage ring. Numerical simulations confirm that the optimized EEHG parameters can be directly applied to generate a 10 MW scale peak power with fully coherent ultrafast EUV to soft X-ray pulses based on the NSLS-II parameters. This method can be easily extended to other types of diffraction-limited storage rings.

36 MATERIALS SCIENCE↗

Technical and personal remembrances of David A. Shirley in studies of surface magnetism, photoelectron spectroscopy, EUV lithography, and hydrogen storage

This article describes the influence of Professor David A. Shirley on the research science of one of his Ph.D. students in the diverse areas of surface magnetism, x-ray photoelectron spectroscopy (XPS), spin-resolved XPS (SRXPS), extreme ultraviolet (EUV) lithography, and hydrogen storage materials science. Examples are given from the author's work on Cr(001) surface magnetism, XPS, and SRXPS studies of multiplet-splitting in core-level photoemission from Fe. In addition, Dave's influence in understanding the radiation-induced deposition of carbon on EUV optics is described, along with the use of XPS in deciphering how hydrogen storage materials are modified by repeated hydrogen adsorption/desorption cycling. The current status of these particular topics is briefly summarized. These technical remembrances are combined with some fond personal stories about Dave, in recognition of his passing on March 29, 2021.

Klebanoff, L. E.↗

Mask-side Hyper-NA EUV imaging on the SHARP microscope

Hyper-NA, the prospective successor to high-numerical aperture (NA) extreme ultraviolet lithography (EUVL) could be inserted soon after 2030. Hyper-NA poses a number of challenges, including reduced depth of focus, amplified mask three-dimensional effects, and increased mask-side angular range. A Hyper-NA capable extreme ultraviolet (EUV) mask-imaging tool can address these challenges and accelerate research and development toward Hyper-NA. The Sharp High-Numerical Aperture Actinic Reticle Review Project (SHARP) EUV mask microscope is supporting mask-side high-NA imaging since 2015. Implementing mask-side Hyper-NA imaging in 2024 enables research and development toward the corresponding nodes of EUVL. Hyper-NA zoneplates at 0.75 4x/8x NA with a 6.7-deg chief ray angle and 0.85 4x/8x NA with a 7.4-deg chief ray angle are added to the SHARP microscope. Imaging at mask-side Hyper-NA is demonstrated. Imaging of 5-nm half-pitch (wafer scale) horizontal lines and spaces is demonstrated using dipole illumination. Imaging of 5-nm half-pitch (wafer scale) vertical lines and spaces is demonstrated using frequency-doubled imaging of 40-nm hp (mask scale) lines and spaces. Normalized image log slope (NILS) and modulation of Hyper-NA image data match closely to simulations for horizontal lines and spaces. A reduction in NILS of 0.3 or less is observed for vertical lines and spaces in the two-beam imaging regime. Through-focus image data are discussed, comparing different dipole sources and mask-side NAs. Mask-side Hyper-NA photomask imaging has been implemented and demonstrated on the SHARP microscope and is now available to users of the instrument.

Benk, Markus↗

High efficiency Al/Sc-based multilayer coatings in the EUV wavelength range above 40 nanometers

In this Letter, we have developed new and highly efficient periodic multilayer mirrors Al/Sc, Al/Sc/SiC, and Mo/Al/Sc with optimized reflectance at wavelengths between 40 and 65 nm. We have reached record values in measured peak reflectance: 57.5% at 44.7 nm and 46.5% at 51 nm, with Al/Sc/SiC at near-normal incidence. Furthermore, to the best of our knowledge, we have achieved the largest reported bandwidth with Mo/Al/Sc at 57 nm and the narrowest bandwidth with Al/Sc at a 60 nm wavelength. These new and promising results demonstrate that Al/Sc-based multilayer coatings are excellent candidates for future generations of extreme ultraviolet (EUV) instruments for solar physics, EUV lasers, and attosecond science, in a wavelength range that has not been fully explored.

36 MATERIALS SCIENCE↗

EUV FEL light source based on energy recovery linac with on-orbit laser plasma injection

We report on a week-long study of a conceptual design of EUV FEL light source based on an energy recovery linac with on-orbit laser plasma accelerator injection scheme. We carried out this study during USPAS Summer 2023 session of Unifying Physics of Accelerators, Lasers and Plasma applying the art of inventiveness TRIZ. An ultrashort Ti-sapphire laser accelerates electron beams from a gas target with mean energy of 20 MeV, which are then ramped up to 1 GeV in a five-turn scheme with a series of fixed field alternating magnets and two superconducting RF cavities (100 MeV per cavity per turn). The electron beam is then bypassed to an undulator line optimized to generate EUV light of 13.5 nm at kW level in a single pass.

43 PARTICLE ACCELERATORS↗

SBV: Characterization of Highly Reflective EUV Coatings (CRADA AWD00002394)

The overall goals were to support the development of new high efficiency EUV coatings which would dramatically reduce the energy needed in the semiconductor manufacturing lithography process as well as dramatically reducing the cost of future EUV lithography tools. The project was successful in the characterization of numerous samples generating many hundreds of datasets and critical feedback for the partner’s internal material development program.

36 MATERIALS SCIENCE↗

Special Issue “EUV and X-ray Wavefront Sensing”

This Special Issue (SI), entitled “EUV and X-ray Wavefront Sensing” is focused on original research performed by world-recognized scientists in the field and is focused on the current state-of-the-art in-situ wavefront sensing for EUV and X-ray. We believe that this SI will provide the reader with an overview of the present status and an outlook on future development in this field.

36 MATERIALS SCIENCE↗

Atomic layer deposition and its derivatives for extreme ultraviolet (EUV) photoresist applications

Solution-processed photoresists have been forerunners in semiconductor patterning for decades. Even with the drastic reduction in photolithography wavelength, traditional spin-on resists still support the fabrication of the most advanced, sub-5 nm node logic and memory devices using EUV lithography (EUVL) (λ = 13.5 nm). However, trade-off between resolution, sensitivity, and roughness in the conventional resists pose a critical challenge in the race towards device downscaling to 1 nm node. While great efforts are being made to improve spin-on EUV photoresist performance, there has been emergence of new approaches focused on developing novel resists via vapor-phase processing routes, such as atomic layer deposition (ALD) and its analogs. This review summarizes recent advances in EUVL photoresist development based on ALD and its derivative techniques, which include ALD-based inorganic–organic dry resists and hybrid resists synthesized by infiltrating conventional spin-on resists. Despite being in the early stage, initial studies have shown the great potential of ALD applications in EUVL photoresist development.

36 MATERIALS SCIENCE↗

The Coupling of an EUV Coronal Wave and Ion Acceleration in a Fermi-LAT Behind-the-Limb Solar Flare

We present the Fermi-LAT observations of the behind-the-limb (BTL) flare of 2021 July 17 and the joint detection of this flare by STIX on board the Solar Orbiter. The separation between Earth and the Solar Orbiter was $99^{\circ}_{\centerdot}2$ at 05:00 UT, allowing STIX to have a front view of the flare. The location of the flare was S20E140 in Stonyhurst heliographic coordinates, making this the most distant behind-the-limb flare ever detected in >100 MeV gamma-rays. The LAT detection lasted for ~16 minutes, the peak flux was 3.6 ± 0.8 (10 –5 ) ph cm –2 s –1 with a significance >15σ. A coronal wave was observed from both STEREO-A and SDO in extreme ultraviolet (EUV), with an onset on the visible disk in coincidence with the LAT onset. A complex type II radio burst was observed by GLOSS also in coincidence with the onset of the LAT emission, indicating the presence of a shock wave. We discuss the relation between the time derivative of the EUV wave intensity profile at 193 Å as observed by STEREO-A and the LAT flux to show that the appearance of the coronal wave at the visible disk and the acceleration of protons as traced by the observed >100 MeV gamma-ray emission are coupled. We also report how this coupling is present in the data from three other BTL flares detected by Fermi-LAT, suggesting that the protons driving the gamma-ray emission of BTL solar flares and the coronal wave share a common origin.

79 ASTRONOMY AND ASTROPHYSICS↗