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Diffuse X-ray scattering from polished silicon: application of the distorted wave Born approximation
Measured diffuse X-ray scattering data for a `smooth' as well as for a `rough' silicon sample were fit to theoretical expressions within the distorted wave Born approximation (DWBA). Data for the power spectral density (PSD) for both samples were also obtained by means of atomic force microscopy and optical interferometry. The Fourier transforms of trial correlation functions were fit to the PSD data and then applied to the DWBA formalism. The net correlation functions needed to fit the PSD data for each sample comprised the sum of two terms with different cutoff lengths and different self-affine fractal exponents. At zero distance these correlation functions added up to yield net values of σ 2 = (2) 2 and (71) 2 Å 2 for the smooth and rough samples, respectively. X-ray scattering data were obtained at beamline 1-BM of the Advanced Photon Source. Data and fits at values of q z = 0.05 and 0.10 Å −1 for the smooth sample are reported. Good fits for the smooth sample were obtained at both q z values simultaneously, that is, identical fitting parameters were applied at both values of q z . The smooth sample also exhibited weak Yoneda wings and a clear distinction between the strong specular scattering and the weak diffuse scattering. Data for the rough sample were qualitatively different and exhibited very weak scattering at the specular condition in contrast to extremely large Yoneda wings. Fits for the rough sample are reported for q z = 0.04, 0.05, and 0.06 Å −1 . Although the large Yoneda wings could be fit quite well in both position and amplitude, scattering near the specular condition could not be equally well fit by applying the same fitting parameters at all values of q z . Albeit imperfect, best-fitting results at the specular condition were obtained by invoking only diffuse scattering, that is, without including a separate theoretical expression for specular scattering.
High-Efficiency, Low-Cost III-V Solar Cells by Dynamic Hydride Vapor Phase Epitaxy Coupled with Rapid, Polishing-Free Wafer Reuse through Orientation-Optimized (110) Spalling
We demonstrated (110) GaAs solar cells grown by D-HVPE with equivalent performance and material quality relative to (100) devices. Also, we developed a procedure for repeatable wafer-scale spalling of (110) GaAs. Spalled surfaces were free of the facets founds in (100) GaAs spalling, the large arrest lines found in (100) Ge spalling, and surface features greater than 3 µm in peak-to-valley height, which can otherwise degrade the efficiency of regrown III-V devices. A sub-µm step-terrace morphology was discovered on the post-spall wafer surface, resulting from the restricted cleavage system of GaAs, but we developed understanding of the factors that determine the resulting morphology, enabling ample opportunity for optimization of morphologies suitable for device growth and spall depth waste minimization on (110) GaAs. Lastly, we demonstrated a device grown on a previously spalled surface with only 8% relative efficiency difference to a cell grown on a new unspalled wafer. Significant optimization of the substrate regrowth conditions are required to enable higher efficiency, but these results highlight the promise of (110)-oriented devices coupled with substrate reuse by spalling as a pathway for low-cost III-V photovoltaics.
Origins of Quench in Buffered Chemical Polished and Low Temperature Baked SRF Cavities
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Formation of stainless steel powder bed fusion surfaces and how to polish them.
Abstract not provided.
Dry electrolyte polishing of as-printed additively manufactured metals
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Dry electrolyte polishing of as-printed additively manufactured stainless steel
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Surface finishing of AM metallic parts by electrochemical polishing
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Non-toxic microemulsions polishing for potassium dihydrogen phosphate (KDP) optic
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The total hemispherical emittance of platinum, columbium-1 percent zirconium, and polished and oxidized inor-8 in the range 100 deg to 1200 deg c
Temperature dependence of hemispherical emittance of metal and alloy strips in 100- to 1200-deg c range using blackbody vacuum chamber
The reflection of soft x-rays by polished surfaces of glass and steel
Reflection efficiency of soft X-rays by optical flats of Pyrex glass and stainless steel
Grating groove formation in Au and Au-Ge alloys. Surface polish effects on Au mirrors Final report, 1 Apr. - 30 Sep. 1965
Electron microscopy and vacuum ultraviolet reflectometry of mirror surfaces
Preparation of samples for transmission electron microscopy by illuminated jet polishing
Two stage electropolishing technique for preparation of multiphase alloys for transmission electron microscopy
Experimental proof of flow during processes of mechanical polishing
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Polishing is made cheaper by disposable diamond-impregnated abrasive cloth
Diamond impregnated abrasive cloth eliminated expensive diamond pastes and was economically disposed of to avoid contamination. Cloth was spunbonded nylon, but any napless fabric could be used. Cloth was sprayed with diamond abrasive gel.
Extreme ultraviolet reflection efficiencies of diamond-turned aluminum, polished nickel, and evaporated gold surfaces
Measured reflection efficiencies are presented for flat samples of diamond-turned aluminum, nickel, and evaporated gold surfaces fabricated by techniques suited for EUV telescopes. The aluminum samples were 6.2-cm-diameter disks of 6061-T6, the electroless nickel samples were formed by plating beryllium disks with 7.5-microns of Kanigen. Gold samples were produced by coating the aluminum and nickel samples with 5 strips of evaporated gold. Reflection efficiencies are given for grazing angles in the 5-75 degree range. The results indicate that for wavelengths over about 100 A, the gold-coated nickel samples yield highest efficiencies. For shorter wavelengths, the nickel samples yield better efficiencies. 500 A is found to be the optimal gold thickness.
Grinding and polishing articles in bulk: Burnishing
Various processes and equipment used for burnishing different materials are discussed. Drum and vibration installations are considered, as are processing chemicals and additive materials used in the burnishing process.
Scatter of X-rays on polished surfaces
In investigating the dispersion properties of telescope mirrors used in X-ray astronomy, the slight scattering characteristics of X-ray radiation by statistically rough surfaces were examined. The mathematics and geometry of scattering theory are described. The measurement test assembly is described and results of measurements on samples of plane mirrors are given. Measurement results are evaluated. The direct beam, the convolution of the direct beam and the scattering halo, curve fitting by the method of least squares, various autocorrelation functions, results of the fitting procedure for small scattering, and deviations in the kernel of the scattering distribution are presented. A procedure for quality testing of mirror systems through diagnosis of rough surfaces is described.