Quantitative modeling of ICRF antennas with integrated time domain RF sheath and plasma physics
Significant efforts have been made to quantitatively benchmark the sheath sub-grid model used in our time-domain simulations of plasma-immersed antenna near fields, which includes highly detailed three-dimensional geometry, the presence of the slow wave, and the non-linear evolution of the sheath potential. We present both our quantitative benchmarking strategy, and results for the ITER antenna configuration, including detailed maps of electric field, and sheath potential along the entire antenna structure. Our method is based upon a time-domain linear plasma model, using the finite-difference electromagnetic Vorpal/Vsim software. This model has been augmented with a non-linear rf-sheath sub-grid model, which provides a self-consistent boundary condition for plasma current where it exists in proximity to metallic surfaces. Very early, this algorithm was designed and demonstrated to work on very complicated three-dimensional geometry, derived from CAD or other complex description of actual hardware, including ITER antennas. Initial work with the simulation model has also provided a confirmation of the existence of propagating slow waves in the low density edge region, which can significantly impact the strength of the rf-sheath potential, which is thought to contribute to impurity generation. Our sheath algorithm is based upon per-point lumped-circuit parameters for which we have estimates and general understanding, but which allow for some tuning and fitting. We are now engaged in a careful benchmarking of the algorithm against known analytic models and existing computational techniques to insure that the predictions of rf-sheath voltage are quantitatively consistent and believable, especially where slow waves share in the field with the fast wave. Currently in progress, an addition to the plasma force response accounting for the sheath potential, should enable the modeling of sheath plasma waves, a predicted additional root to the dispersion, existing at the plasma-metal interface. Our model is presently restricted to plasma in the vicinity of metallic (highly conducting) surfaces, however we report on a new effort to include thin and thick dielectric (poorly conducting) surfaces, which are of interest to both fusion devices and to industrial plasmas, where dielectric, or dielectric-coated vessels and geometry are heavily used.