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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.
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Effects of ion irradiation on chemical and mechanical properties of magnetron sputtered amorphous SiOC
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Nanotwin formation in Ni-Mo-W alloys deposited by dc magnetron sputtering
Nanotwinned metals and alloys have an attractive suite of properties, but the formation of the underlying nanostructure is generally dependent on the alloy chemistry and processing conditions. This study was undertaken to investigate the effect of deposition rate on nanotwin formation in sputter deposited Ni 84 Mo 11 W 5 that possess ultrahigh strength and stability. Specifically, deposition rates of 0.5-2.3 nm/s were examined and the grain size, texture, twin spacing and hardness were characterized. Minimal variations in the underlying nanostructure and attendant hardness were observed, elucidating a wide processing window and the importance of chemistry on the formation of nanotwins in this alloy.
Phase tailoring of tantalum thin films deposited in deep oscillation magnetron sputtering mode
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Effect of SrO Doping on LaGaO 3 Synthesis via Magnetron Sputtering
The high temperature growth behavior of epitaxial LaGaO 3 thin films with and without SrO is determined with real-time X-ray scattering. In this study, we find SrO alters the thin film growth mode of LaGaO 3 , both when predeposited on a surface as well as when SrO and LaGaO 3 are codeposited. We also find that depositing a small amount of SrO on a LaGaO 3 surface induces significant structural rearrangement in the film. We describe mechanisms under which these transformations can occur. In conclusion, the strong effect of SrO on the microstructure of La 1–x Sr x GaO 3 likely has wider implications for other ionically conducting oxide materials.
Ultralow Index SiO 2 Antireflection Coatings Produced via Magnetron Sputtering
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Gas Suppression via Copper Interlayers in Magnetron Sputtered Al–Cu 2 O Multilayers
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Plasma studies of a linear magnetron operating in the range from DC to HiPIMS
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Optical constants of magnetron sputtered Pt thin films with improved accuracy in the N- and O-electronic shell absorption regions
We introduce an experimental, self-consistent determination of the optical constants (refractive index) of Pt using a combination of photoabsorption and reflectance data in the photon energy range 25–778 eV, which includes the N- and O-shell electronic absorption edges of Pt. We compare our new experimental values with Pt optical constant data sets from the literature. Our Pt optical constant values demonstrate highly resolved absorption-edge fine structure around the O 2,3 and N 6,7 edges in both the absorptive and dispersive portions of the refractive index, which were missing in the earlier literature.
Optical constants of magnetron sputtered aluminum in the range 17–1300 eV with improved accuracy and ultrahigh resolution in the L absorption edge region
This work determines a new set of EUV/x-ray optical constants for aluminum (Al), one of the most important materials in science and technology. Absolute photoabsorption (transmittance) measurements in the 17–1300 eV spectral range were performed on freestanding Al films protected by carbon (C) layers, to prevent oxidation. The dispersive portion of the refractive index was obtained via the Kramers–Kronig transformation. Our data provide significant improvements in accuracy compared to previously tabulated values and reveal fine structure in the Al L 1 and L 2,3 regions, with photon energy step sizes as small as 0.02 eV. The implications of this work in the successful realization of EUV/x-ray instruments and in the validation of atomic and molecular physics models are also discussed.
Effects of discharge power for magnetron sputter deposition of boron carbide films on tilted substrates
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High figure-of-merit p -type transparent conductor, Cu alloyed ZnS via radio frequency magnetron sputtering
p-type transparent conducting Cu alloyed ZnS thin films from Cu$_{{x}}$ Zn$_{{1-x}}$ S targets ($x = 0.1$ , 0.2, 0.3, 0.4, and 0.5) were deposited on glass substrates via radio frequency sputtering. x-ray diffraction and TEM–SAED analysis show that all the films have sphalerite ZnS as the majority crystalline phase. In addition, films with 30% and 40% Cu show the presence of increasing amounts of crystalline Cu2S phase. Conductivity values ≥400 S ${\rm cm}^{-1}$ were obtained for the films having 30% and 40% Cu, with the maximum conductivity of 752 S ${\rm cm}^{-1}$ obtained for the film with 40% Cu. Temperature dependent electrical transport measurements indicate metallic as well as degenerate hole conductivity in the deposited films. The reflection-corrected transmittance of this Cu alloyed ZnS (40% Cu) film was determined to be ≥75% at 550 nm. In conclusion, the transparent conductor figure of merit ($\Phi_{{\rm TC}}$ ) of the Cu alloyed ZnS (40% Cu), calculated with the average value of transmittance between 1.5 to 2.5 eV, was ≈276 $\mu{\rm S}$ .