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At least 19 records

Sequential Infiltration Synthesis of Bilayer Porous Alumina Nanostructures for Broad-Angle, Broadband Antireflective Coatings

Antireflective coatings (ARCs) are thin films engineered to reduce light reflections. Delivering broadband, wide-angle performance is essential for photovoltaics, imaging, and sensing, yet truly omnidirectional antireflection remains difficult due to angle-dependent optical paths and a narrow palette of suitable refractive indices. Here, in this study, we systematically investigate an emerging class of multilayer inorganic ARCs based on conformally coated nanoporous alumina templated by intrinsically microporous polymers (PIMs) and block copolymers (BCPs). We establish a design framework that maps thickness reflectance relationships to identify thickness pairs minimizing reflection across wavelength and incidence angle. We show that deliberately separating the local reflectance minima of the top and bottom layers in bilayer nanostructures broadens the antireflective bandwidth and angular range. We show that 235-nm single-side bilayer porous alumina nanostructures achieves under 2 % reflectance from 380–750 nm for incidence angles up to 45° with less than 0.6% reflectance for incidence angles under 20°. The approach is readily extensible to additional layers or materials with refractive indices tuned via templated nanoporosity and composition, enabling practical, etch-free ARC fabrication without HF or fluorinated precursors and advancing straightforward design of broadband, wide-angle (quasi-omnidirectional) ARCs for next-generation optical systems.

antireflective coatings↗

Impact of different cleaning processes on the laser damage threshold of antireflection coatings for Z-Backlighter optics at Sandia National Laboratories

We have examined how different cleaning processes affect the laser-induced damage threshold of antireflection coatings for large dimension, Z-Backlighter laser optics at Sandia National Laboratories. Laser damage thresholds were measured after the coatings were created, and again 4 months later to determine which cleaning processes were most effective. There is a nearly twofold increase in laser-induced damage threshold between the antireflection coatings that were cleaned and those that were not cleaned. Aging of the coatings after 4 months resulted in even higher laser-induced damage thresholds. Also, the laser-induced damage threshold results revealed that every antireflection coating had a high defect density, despite the cleaning process used, which indicates that improvements to either the cleaning or deposition processes should provide even higher laser-induced damage thresholds.

36 MATERIALS SCIENCE↗

Adhesion of Antireflective Coatings in Multijunction Photovoltaics

The development of a new composite dual cantilever beam (cDCB) thin-film adhesion testing method is reported, which allows the measurement of adhesion on the fragile thin substrates used in multijunction photovoltaics. We address the adhesion of several antireflective coating systems on multijunction cells. By varying interface chemistry and morphology, we demonstrate the ensuing effects on adhesion and help to develop an understanding of how high adhesion can be achieved, as adhesion values ranging from 0.5 J/m2 to 10 J/m2 were measured. Damp Heat (85 degrees C/85% RH) was used to invoke degradation of interfacial adhesion. We show that even with germanium substrates that fracture easily, quantitative measurements of adhesion can still be made at high test yield. The cDCB test is discussed as an important new methodology, which can be broadly applied to any system that makes use of thin, brittle, or otherwise fragile substrates.

14 SOLAR ENERGY↗

Antireflection coating of diamond elements of power optics for CO{sub 2} lasers

A technology of deposition of a single-layer PbF{sub 2} coating, antireflecting for the CO{sub 2} laser radiation, on diamond substrates is developed. As substrates, use is made of plates of polycrystalline CVD diamond. The transmission coefficient of diamond plates with two-side coating attains 98.5 % – 99 %. The measured laser-induced damage threshold of such plates under normal environment conditions for the pulsed (τ ∼ 100 ns) and continuous-wave radiation of CO{sub 2} lasers amounts to 250 and 4 MW cm{sup –2}, respectively. These values are comparable with the thresholds of the diamond substrate damage. The increase in the damage threshold of the AR coating under continuous-wave irradiation to 5.5 MW cm{sup –2} is found in the case of preliminary multiple irradiation of samples by weaker laser pulses. This effect can be explained by the pollutant removal from the surface of the film without its damage (laser cleaning effect). The bibliography includes 28 references. (paper)

71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗

Triangular Elastomeric Stamps for Optical Applications: Near-Field Phase Shift Photolithography, 3D Proximity Field Patterning, Embossed Antireflective Coatings, and SERS Sensing

The use of a decal transfer lithography technique to fabricate elastomeric stamps with triangular cross-sections, specifically triangular prisms and cones, is described. These stamps are used in demonstrations for several prototypical optical applications, including the fabrication of multiheight 3D photoresist patterns with near zero-width features using near-field phase shift lithography, fabrication of periodic porous polymer structures by maskless proximity field nanopatterning, embossing thin-film antireflection coatings for improved device performance, and efficient fabrication of substrates for surface-enhanced Raman spectroscopic sensing. Furthermore, the applications illustrate the utility of the triangular poly(dimethylsiloxane) decals for a wide variety of optics-centric applications, particularly those that exploit the ability of the designed geometries and materials combinations to manipulate light–matter interactions in a predictable and controllable manner.

36 MATERIALS SCIENCE↗

Broadband and omnidirectional polymer antireflection coatings

A method for generating antireflective coatings for polymeric substrates using a deposition process and/or a dissolving process can provide a coating onto the outer surface of the substrate. Some embodiments can include a GLAD generated fluoropolymer coating or a co-evaporated fluoropolymer coating on a substrate that may achieve ultralow refractive index as well as improved adhesion and durability properties on polymeric substrates. In some embodiments, the deposition process is performed such that a fluoropolymer can be evaporated to form chain fragments of the fluoropolymer. The chain fragments diffused into the substrate can subsequently re-polymerize, interlocking with the polymer chains of the substrate. In some embodiments, the co-evaporation process can form a nanoporous polymer chain scaffold of the fluoropolymer, from which a sacrificial material can be dissolved out. The formed coating can be a multilayer or continuously-graded antireflective coating that has strong adhesion with the substrate.

36 MATERIALS SCIENCE↗

Broadband and omnidirectional polymer antireflection coatings

A method for generating antireflective coatings for polymeric substrates using a deposition process and/or a dissolving process can provide a coating onto the outer surface of the substrate. Some embodiments can include a GLAD generated fluoropolymer coating or a co-evaporated fluoropolymer coating on a substrate that may achieve ultralow refractive index as well as improved adhesion and durability properties on polymeric substrates. In some embodiments, the deposition process is performed such that a fluoropolymer can be evaporated to form chain fragments of the fluoropolymer. The chain fragments diffused into the substrate can subsequently re-polymerize, interlocking with the polymer chains of the substrate. In some embodiments, the co-evaporation process can form a nanoporous polymer chain scaffold of the fluoropolymer, from which a sacrificial material can be dissolved out. The formed coating can be a multilayer or continuously-graded antireflective coating that has strong adhesion with the substrate.

Wang, Baomin↗

Effect of GLAD technique on optical properties of ZnS multilayer antireflection coatings

Highlights: • ZnS multi-layer antireflection coatings have been prepared by GLAD technique. • XRD analysis depicts that all the multi-layer samples are crystallized in cubic structure. • FESEM images confirmed the multi-layer and inclined formation of specimens. • Transmission increment and refractive index decrement obtained for the multi-layer samples. • Incredible impression of GLAD technique on multi-layer coatings is realized. - Abstract: In this work, we prepared Zinc sulfide (ZnS) multi-layer antireflection coatings applying glancing angle deposition (GLAD) technique by physical vapor deposition method. By comparing the structural and optical properties of the samples prepared at normal and inclined single layer coatings, salient effect of multi-layer coatings composed of normal and inclined layers are observed. Relative improvement in crystallinity of the GLAD produced films with respect to inclined single layer resulted from X-ray diffraction (XRD) studies. Despite high increment in average transmission, explicit reduction in refractive index of the multilayer specimens are obtained by Ultraviolet–visible spectroscopy (UV–VIS) analysis. Both the abovementioned changes are in the direction of improving the anti-reflectivity features.

36 MATERIALS SCIENCE↗

Nondestructive Characterization of Antireflective Coatings on PV Modules

Antireflective coatings (ARCs) are used on the vast majority of solar photovoltaic (PV) modules to increase power production. However, ARC longevity can vary from less than 1 to over 15 years depending on coating quality and deployment conditions. A technique that can quantify ARC degradation nondestructively on commercial modules would be useful both for in-field diagnostics and accelerated aging tests. In this article, we demonstrate that accurate measurements of ARC spectral reflectance can be performed using a modified commercially available integrating-sphere probe. The measurement is fast, accurate, nondestructive, and can be performed outdoors in full-sun conditions. We develop an interferometric model that estimates coating porosity, thickness, and fractional area coverage from the measured reflectance spectrum for a uniform single-layer coating. We demonstrate the measurement outdoors on an active PV installation, identify the presence of an ARC, and estimate the properties of the coating.

14 SOLAR ENERGY↗

Studying the Formation of Antireflection Coatings on Multijunction Solar Cells

The formation of antireflection coating on multijunction solar cells based on A{sub 3}B{sub 5} semiconductor heterostructures has been studied at the stage of structure surface processing by methods of plasmachemical, wet chemical, and ion-beam etching. A technology of creating antireflection coatings based on TiO{sub x}/SiO{sub 2} layers is developed. The obtained coatings are characterized by improved adhesion to the surface of heterostructure and reduced reflection coefficient of multijunction solar cells.

14 SOLAR ENERGY↗

Influence of double- and triple-layer antireflection coatings on the formation of photocurrents in multijunction III–V solar cells

The results of simulation by the transfer-matrix method of TiO{sub 2}/SiO{sub 2} double-layer and TiO{sub 2}/Si{sub 3}N{sub 4}/SiO{sub 2} triple-layer antireflection coatings for multijunction InGaP/GaAs/Ge heterostructure solar cells are presented. The TiO{sub 2}/SiO{sub 2} double-layer antireflection coating is experimentally developed and optimized. The experimental spectral dependences of the external quantum yield of the InGaP/GaAs/Ge heterostructure solar cell and optical characteristics of antireflection coatings, obtained in the simulation, are used to determine the photogenerated current densities of each subcell in the InGaP/GaAs/Ge solar cell under AM1.5D irradiation conditions (1000 W/m{sup 2}) and for the case of zero reflection loss. It is shown in the simulation that the optimized TiO{sub 2}/Si{sub 3}N{sub 4}/SiO{sub 2} triple-layer antireflection coating provides a 2.3 mA/cm{sup 2} gain in the photocurrent density for the Ge subcell under AM1.5D conditions in comparison with the TiO{sub 2}/SiO{sub 2} double-layer antireflection coating under consideration. This thereby provides an increase in the fill factor of the current–voltage curve and in the output electric power of the multijunction solar cell.

36 MATERIALS SCIENCE↗

Terahertz antireflection coating enabled by a subwavelength metallic mesh capped with a thin dielectric film

Metamaterials/metasurfaces have enabled unprecedented manipulation of electromagnetic waves. Here we present a new design of metasurface structure functioning as antireflection coatings. The structure consists of a subwavelength metallic mesh capped with a thin dielectric layer on top of a substrate. By tailoring the geometric parameters of the metallic mesh and the refractive index and thickness of the capping dielectric film, reflection from the substrate can be completely eliminated at a specific frequency. Compared to traditional methods such as coatings with single- or multi-layer dielectric films, the metasurface antireflection coatings are much thinner and the requirement of index matching is largely lifted. Here, this approach is particularly suitable for antireflection coatings in the technically challenging terahertz frequency range and is also applicable in other frequency regimes.

36 MATERIALS SCIENCE↗

Scalable process for mitigation of laser-damaged potassium dihydrogen phosphate crystal optic surfaces with removal of damaged antireflective coating

Here, we investigate an approach for the recycling of laser-damaged large-aperture deuterated potassium dihydrogen phosphate (DKDP) crystals used for optical switching (KDP) and for frequency conversion (DKDP) in megajoule-class high-power laser systems. The approach consists of micromachining the surface laser damage sites (mitigation), combined with multiple soaks and ultrasonication steps in a coating solvent to remove, synergistically, both the highly adherent machining debris and the laser-damage-affected antireflection coating. We then identify features of the laser-damage-affected coating, such as the “solvent-persistent” coating and the “burned-in” coating, that are difficult to remove by conventional approaches without damaging the surface. We also provide a solution to the erosion problem identified in this work when colloidal coatings are processed during ultrasonication. Finally, we provide a proof of principle of the approach by testing the full process that includes laser damage mitigation of DKDP test parts, coat stripping, reapplication of a new antireflective coat, and a laser damage test demonstrating performance up to at least 12 J/cm 2 at UV wavelengths, which is well above current requirements. Our approach ultimately provides a potential path to a scalable recycling loop for the management of optics in large, high-power laser systems that can reduce cost and extend lifetime of highly valuable and difficult to grow large DKDP crystals.

36 MATERIALS SCIENCE↗

Efficiency enhancement in Si solar cell using 1D quasi-periodic antireflection coating

In order to enhance the efficiency of thin-film Si solar cell, two well-known Fibonacci and Thue–Morse sequences of 1D quasi-periodic structures have been considered to achieve a broadband (300–1100 nm) planar antireflection coating, in this article. As almost non-absorbing materials in the solar spectrum, TiO{sub 2} and SiO{sub 2} with optimized thicknesses are considered to eliminate the reflections in the front side of the solar cell. An optimized bilayer antireflection coating with thicknesses of 54.4 nm and 85.6 nm respectively for the TiO{sub 2} and SiO{sub 2} layers has been obtained. Considering material dispersion and solar power spectrum (AM1.5), maximum efficiency enhancements of 42.78%, 46.15%, and 50% have been achieved for the 3 µm thin-film Si solar cell using the FC(3,1) structure which correspond to the cells without any recombination, with bulk recombination, and with bulk and surface recombinations, respectively. The proposed quasi-periodic multilayer antireflection structures have been investigated and optimized using the TMM and FDTD methods. The electrical characteristic of the design is studied by the drift–diffusion method after extracting the electron–hole pair generation. Also, the stability of the performance of the proposed ARC against induced roughness in practice has been investigated and discussed.

14 SOLAR ENERGY↗

Optical properties of Mo and amorphous MoOx, and application to antireflection coatings for metals

To form antireflection (AR) coatings to hide metal architecture in display technologies, we deposited thin films of metal Mo and oxide MoOx by sputtering targets of various compositions using pure Ar sputter gas. The optical constants [n,k] of these samples were measured by the direct numerical solution of reflectance and transmittance at each wavelength point measured. We find that 50 nm films are uniform in the growth direction, but for thicker 100 nm samples, evidence exists for nonuniform growth, where the top 20 nm appears to be metal rich. From these [n,k], negative Tauc bandgap energies show these oxides are semi-metals. We then identified the specific composition (x) that optimizes the AR response for a host of metals (Al, Cu, Ag, Au). Finally, two methods were used to understand why these MoOx materials function well as AR media, including (i) using phasor rays and (ii) developing a universal expression for the AR condition that applies to both dielectric and metal substrates. In (i), we find two characteristics for AR of metals: (a) its optical thickness should be roughly π3, not the π2 for dielectrics, since for MoOx, their [r^ij,t^ij] Fresnel phases differ from the usual [180°, 0°] of dielectrics; and (b) the medium incorporates a k-dominant strategy whose function is to absorb the energy that is reflected at the AR/metal interface. In (ii), the universal AR condition is found to be r^01+r^12z^=0. For dielectrics, this reduces to the well-known nAR=nairnsub condition. However, for metals, a concise analytic expression is lacking since this expression is highly nonlinear but is easily solved by numerical methods.

Tsu, David V. (ORCID:0000000295903418)↗

Diagnosis of PV Cell Antireflective Coating Degradation Resulting from Hot-Humid, High Voltage Potential Aging

Corrosion of the antireflective coating on a photovoltaic cell ("ARc corrosion") has previously been observed in studies using hot-humid test conditions with external high-voltage (HV) bias. This study primarily focuses on known vulnerable, legacy aluminum back surface field (Al-BSF) cells in mini-modules (MiMos) put through comparative stepped stress tests. Each cell type had MiMos at +1500 V, -1500 V, or unbiased ("Voc") potential, which were sequentially subjected to test conditions of 60deg C/60% relative humidity (RH) for 96 h, as in International Electrotechnical Commission (IEC) Technical Specification 62804-1; 70 deg C/70% RH for 200 h; and 85 deg C/85% RH for 200 h. Characterizations at each step included visual camera and electroluminescence (EL) imaging, colorimetry, and current-voltage (I-V) curve tracing. Final characterizations included: Suns-Voc; spatial mapping of external quantum efficiency (EQE); high-resolution photoluminescence (PL), EL, and dark lock-in thermography (DLIT) imaging. Forensics were performed on extracted cores, including scanning electron microscopy (SEM) with energy-dispersive X-ray spectroscopy (EDS), X-ray photoelectron spectroscopy (XPS), and scanning Auger microscopy (SAM). Forensics were also conducted on MiMos from previous studies that underwent stepped HV aging and separate outdoor aged full-sized modules. ARc corrosion was specifically seen for the glass/encapsulant/cell side of the +1500V (HV+) stressed MiMos and modules. Appearance, color, and reflectance were the most distinguishing characteristics relative to glass corrosion, gridline-corrosion and -delamination as well as other concurrent degradation modes. SEM/EDS and SAM identified conversion of silicon nitride to hydrated silica, hydrous silica, or hydrated amorphous silica, which preferentially occurred at the edges and tips of the pyramidal textured cell surface.

14 SOLAR ENERGY↗