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Results for “Anti-reflective coatings”

Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 19 records
All sourcesNASA NTRSDOE OSTI
NASA NTRS1975

Practical anti-reflection coating for metal semiconductor solar cells

The metal-semiconductor solar cell is a possible candidate for converting solar to electrical energy for terrestrial application. A method is given for obtaining optical parameters of practical antireflection coatings for the metal-semiconductor solar cell. This method utilizes the measured refractive index obtained from ellipsometry since the surface to be AR coated has a multilayer structure. Both the experimental results and theoretical calculation of optical parameters for Ta2O5 antireflection coatings on Au-GaAs and Au-GaAs(0.78)P(0.22) solar cells are presented for comparison.

Yeh, Y.-C. M.↗
NASA NTRS1979

Anti-reflection Coatings on Large Area Glass Sheets

The first quarter of a one-year program designed to research and perfect a method of producing antireflective coatings on large glass sheets through the use of sodium silicate hardened by exposure to acid is reported. The requirements for a linear motion device used to produce uniform sodium silicate films were determined. A search for a commercially available device is underway. Sodium silicate solutions of varying concentrations were prepared. Determinations of the physical properties relevant to film thickness are in progress. In addition, material costs are being recorded for later use in a cost analysis of the method. All tasks of the project are proceeding according to schedule. Of the tasks, only the sodium silicate solution preparation is complete.

Pastirik, E.↗
NASA NTRS1980

Anti-reflection coatings on large area glass sheets

Antireflective coatings which may be suitable for use on the covers of photovoltaic solar modules can be easily produced by a dipping process. The coatings are applied to glass by drawing sheets of glass vertically out of dilute aqueous sodium silicate solutions at a constant speed, allowing the adherent liquid film to dry, then exposing the dried film to concentrated sulfuric acid, followed by a water rinse and dry. The process produces coatings of good optical performance (96.7 percent peak transmission at 0.540 mu M wavelength) combined with excellent stain and soil resistance, and good resistance to abrasion. The process is reproduceable and easily controlled.

Pastirik, E.↗
NASA NTRS1980

Anti-reflection coatings applied by acid leaching process

The Magicote C process developed by S.M. Thompsen was evaluated for use in applying an antireflective coating to the cover plates of solar panels. The process uses a fluosilicic acid solution supersaturated with silica at elevated temperature to selectively attack the surface of soda-lime glass cover plates and alter the physical and chemical composition of a thin layer of glass. The altered glass layer constitutes an antireflective coating. The process produces coatings of excellent optical quality which possess outstanding resistance to soiling and staining. The coatings produced are not resistant to mechanical abrasion and are attacked to some extent by glass cleansers. Control of the filming process was found to be difficult.

Pastirik, E.↗
NASA NTRS1975

Moisture resistant and anti-reflection optical coatings produced by plasma polymerization of organic compounds

The need for protective coatings on critical optical surfaces, such as halide crystal windows or lenses used in spectroscopy, has long been recognized. It has been demonstrated that thin, one micron, organic coatings produced by polymerization of flourinated monomers in low temperature gas discharge (plasma) exhibit very high degrees of moisture resistence, e.g., hundreds of hours protection for cesium iodide vs. minutes before degradation sets in for untreated surfaces. The index of refraction of these coatings is intermediate between that of the halide substrate and air, a condition for anti-reflection, another desirable property of optical coatings. Thus, the organic coatings not only offer protection, but improved transmittance as well. The polymer coating is non-absorbing over the range 0.4 to 40 microns with an exception at 8.0 microns, the expected absorption for C-F bonds.

Hollahan, J. R.↗
NASA NTRS1978

A low cost, durable anti-reflective film for solar collectors

The physics of reflection reduction by thin films is briefly reviewed. Current techniques for the production of anti-reflective coatings are surveyed with respect to their applicabilities to solar panel covers. Techniques for the production of suitable anti-reflection coatings based on acid-hardened sodium silicate solutions are presented along with optical data for both acid-leached and silicate coatings

Pastirik, E. M.↗
NASA NTRS1981

Advances in high output voltage silicon solar cells

Solar cells have been fabricated from 0.1 ohm-cm, p-type silicon by means of a two-step diffusion process of emitter formation in order to delineate the factors limiting V(oc) in conventionally structured cells with the goal of achieving 700 mV. The cells are 200 microns thick and 2 x 2 cm in area with a planar front surface that has an anti-reflection coating of tantalum oxide, as well as Cr-Au-Ag contact metallization on both sides of the cell. The Cr-Au-Ag is applied over an aluminum diffused layer on the back, while it is applied through small holes in the anti-reflection coating on the front. Results show that the best of these cells exhibits an open-circuit voltage of 654 mV under AMO illumination.

Arndt, R. A.↗
NASA NTRS1973

The use of FEP Teflon in solar cell cover technology

FEP plastic film was used as a cover and as an adhesive to bond cover glasses to silicon solar cells. Various anti-reflective coatings were applied to cells and subsequently covered with FEP. Short circuit currents were measured before and after application of the coating and of the FEP. FEP was bonded to seven of the nine differently coated cells, with no change in the total short circuit current in four cases.

Broder, J. D.↗
NASA NTRS1974

The use of FEP Teflon in solar cell cover technology

FEP plastic film was used as a cover and as an adhesive to bond cover glasses to silicon solar cells. Various anti-reflective coatings were applied to cells and subsequently covered with FEP. Short-circuit currents were measured before and after application of the coating and of the FEP. FEP bonded to seven of the nine differently coated cells, with no change in the total short circuit current in four cases.

Broder, J. D.↗
NASA NTRS1977

Development of a high efficiency thin silicon solar cell

A key to the success of this program was the breakthrough development of a technology for producing ultra-thin silicon slices which are very flexible, resilient, and tolerant of moderate handling abuse. Experimental topics investigated were thinning technology, gaseous junction diffusion, aluminum back alloying, internal reflectance, tantalum oxide anti-reflective coating optimization, slice flexibility, handling techniques, production rate limiting steps, low temperature behavior, and radiation tolerance.

Lindmayer, J.↗
NASA NTRS1978

Automated Array Assembly, Phase 2. Low-cost Solar Array Project, Task 4

Work was done to verify the technological readiness of a select process sequence with respect to satisfying the Low Cost Solar Array Project objectives of meeting the designated goals of $.50 per peak watt in 1986 (1975 dollars). The sequence examined consisted of: (1) 3 inches diameter as-sawn Czochralski grown 1:0:0 silicon, (2) texture etching, (3) ion implanting, (4) laser annealing, (5) screen printing of ohmic contacts and (6) sprayed anti-reflective coatings. High volume production projections were made on the selected process sequence. Automated processing and movement of hardware at high rates were conceptualized to satisfy the PROJECT's 500 MW/yr capability. A production plan was formulated with flow diagrams integrating the various processes in the cell fabrication sequence.

Lopez, M.↗
NASA NTRS1978

Development of Low-cost, High Energy-per-unit-area Solar Cell Modules

The development of two hexagonal solar cell process sequences, a laserscribing process technique for scribing hexagonal and modified hexagonal solar cells, a large through-put diffusion process, and two surface macrostructure processes suitable for large scale production is reported. Experimental analysis was made on automated spin-on anti-reflective coating equipment and high pressure wafer cleaning equipment. Six hexagonal solar cell modules were fabricated. Also covered is a detailed theoretical analysis on the optimum silicon utilization by modified hexagonal solar cells.

Jones, G. T.↗
NASA NTRS1985

Process and design considerations for high-efficiency solar cells

This paper shows that oxide surface passivation coupled with optimum multilayer anti-reflective coating can provide approx. 3% (absolute) improvement in solar cell efficiency. Use of single-layer AR coating, without passivation, gives cell efficiencies in the range of 15 to 15.5% on high-quality, 4 ohm-cm as well as 0.1 to 0.2 ohm-cm float-zone silicon. Oxide surface passivation alone raises the cell efficiency to or = 17%. An optimum double-layer AR coating on oxide-passivated cells provides an additional approx. 5 to 10% improvement over a single-layer AR-coated cell, resulting in cell efficiencies in excess of 18%. Experimentally observed improvements are supported by model calculations and an approach to or = 20% efficient cells is discussed.

Rohati, A.↗
NASA NTRS1984

Fabrication of p(+)-n junction GaAs solar cells by a novel method

A novel method for making p(+)-n diffused junction GaAs solar cells, with the formation of a diffusion source, an anti-reflective coating, and a protective cover glass in a single chemical-vapor deposition operation is discussed. Consideration is given to device fabrication and to solar-cell characteristics. The advantages of the technique are that the number of process steps is kept to an absolute minimum, the fabrication procedure is low-cost, and the GaAs surface is protected during the entire operation.

Ghandhi, S. K.↗
NASA NTRS1987

Development of a unique laboratory standard: Indium gallium arsenide detector for the 500-1700 nm spectral region

A planar (5 mm diameter) indium gallium arsenide detector having a high (greater than 50 pct) quantum efficiency from the visible into the infrared spectrum (500 to 1700 nm) was fabricated. Quantum efficiencies as high as 37 pct at 510 nm, 58 pct at 820 nm and 62 pct at 1300 nm and 1550 nm were measured. A planar InP/InGaAs detector structure was also fabricated using vapor phase epitaxy to grow device structures with 0, 0.2, 0.4 and 0.6 micrometer thick InP caps. Quantum efficiency was studied as a function of cap thickness. Conventional detector structures were also used by completely etching off the InP cap after zinc diffusion. Calibrated quantum efficiencies were measured. Best results were obtained with devices whose caps were completely removed by etching. Certain problems still remain with these detectors including non-uniform shunt resistance, reproducibility, contact resistance and narrow band anti-reflection coatings.

Source record↗
NASA NTRS1989

Metal-silicon reaction rates - The effects of capping

Evidence is presented showing that the presence of the commonly used anti-reflection coating material Ta2O5 on the free surface of contact metallization can either suppress or enhance, depending on the system, the interaction that takes place at elevated temperatures between the metallization and the underlying Si. The cap layer is shown to suppress both the generation and annihilation of vacancies at the free surface of the metal which are necessary to support metal-Si interactons. Evidence is also presented indicating that the mechanical condition of the free metal surface has a significant effect on the metal-silicon reaction rate.

Weizer, Victor G.↗
NASA NTRS1991

Laser transmitter for Lidar In-Space Technology Experiment

The Lidar In-Space Technology Experiment (LITE) Laser Transmitter Module (LTM) flight laser optical architecture has been space qualified by extensive testing at the system, subsystem and component level. The projected system output performance has been verified using an optically and electrically similar breadboard version of the laser. Parasitic lasing was closely examined and completely suppressed after design changes were implemented and tested. Oscillator and amplifier type heads were separately tested to 150 million shots. Critical subassemblies have undergone environmental testing to Shuttle qualification levels. A superior three color anti-reflection coating was developed and tested for use on 14 surfaces after the final amplifier.

Chang, John↗