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Comparison of theory with the experimental characterization of the spatial frequency response of interferometers using a binary pseudo-random array sample

Experimental evaluations of the surface height response of an interference microscope using a binary pseudo-random array test sample are compared with a theory based on a Fourier optics model. Measurements of key instrument characteristics, including the illumination, imaging, and obscuring apertures of three different Mirau objectives, support the theoretical calculations. Agreement between experimental and theoretical modeling confirms the predictability of the spatial frequency response for the purpose of specification and optimization of instrument configuration for specific metrology tasks. The results also provide confidence in methods of compensating for the decrease in instrument response with spatial frequency.

Calibration

Binary pseudo-random array standard for extreme ultraviolet lithography tool characterization

Extreme ultraviolet (EUV) imaging tools play a crucial role in EUV lithography. Achieving high accuracy in EUV metrology is essential for advanced semiconductor manufacturing. A thorough characterization of the instrumentation in use is required. Binary pseudo-random arrays (BPRAs) are an established standard for calibrating and characterizing optical instruments in the frequency domain. Here, we expand the BPRA standard to applications in EUV imaging. To extend the technology to the EUV spectral range, a high-resolution BPRA target with the smallest feature size of 40 nm is developed. The EUV BPRA target establishes an in situ and portable calibration and alignment standard for EUV imaging. The target is patterned by means of electron-beam lithography, using a nickel absorber with a thickness of 39 nm. The substrate is a 4″ silicon wafer with a molybdenum/silicon multilayer coating. To demonstrate the efficacy of the target and develop the instrument calibration protocol, the target is imaged on the Sharp Hyper-NA Actinic Reticle Review Project EUV mask microscope. Power spectral density (PSD) data are presented. The characteristics of the imaging system are imprinted on the PSD. The modulation transfer function is extracted from the PSD data. A partially coherent imaging model is used as a reference to the experimental results.

BPRA

Topography restoration in white-light interferometry using an instrument transfer function evaluated with binary pseudo-random arrays

Accurate knowledge of the instrument transfer function (ITF) is vital for topography measurements using white-light interferometry (WLI). To this end, we derive a complete set of analytical expressions for the power spectral density (PSD) of a discretely sampled binary pseudo-random array (BPRA) as a theoretical benchmark. We then determine the ITF by comparing this theoretical PSD with the measured PSD of the BPRA. For the Zygo ZeGage Pro HR with a objective, the determined ITF closely matches the nominal modulation transfer function (MTF). Accordingly, we integrate the nominal MTF into Fourier-domain restoration filters and apply them to practical WLI topography data, yielding restored topographies that show improved agreement with atomic force microscopy measurements. Overall, our integrated BPRA-based ITF measurement and filtering methodology offers a robust yet practical means of characterizing WLI performance and enhancing the accuracy of surface measurements.

Hirose, Shigenobu [Japan Agency for Marine Earth S

Binary pseudo-random array standards for calibration of 3D optical surface profilers used for metrology with significantly curved x-ray optics

High-accuracy metrology is vitally important in manufacturing ultra-high-quality free-form mirrors designed to manipulate X-ray light with nanometer-scale wavelengths. The current capabilities and possibility for improvements in X-ray mirror manufacturing are limited by inherent imperfections of the integrated metrology tools. In the case of Fizeau interferometry, metrology tools are currently calibrated with super-polished flat test-standard/reference mirrors. This is acceptable for measuring slightly curved X-ray optics. However, for even moderately curved aspherical X-ray mirrors the flat-reference calibration is not sufficiently accurate and stitching Fizeau interferometer-based surface metrology is used to mitigate the problem. But still, the retrace and aberration errors, as well as the limited spatial resolution, described with the instrument transfer function (ITF), can be transferred into the optical surface topography of X-ray mirrors obtained in stitching metrology. For ITF calibration, we have developed an original technique, based on test standards structured as two-dimensional (2D) highly-randomized (HR) binary pseudo-random arrays (BPRAs). The technique employs the unique properties of the HR BPRA patterns in the spatial frequency domain., i.e. the inherent 2D power spectral density of the HR BPRA pattern has a deterministic white-noise-like character that allows direct determination of the ITF with uniform sensitivity over the entire spatial frequency range and field-of-view of an instrument. Here, we explore technological, metrological, and analytical aspects essential for calibration of the retrace and aberration errors of Fizeau interferometers using different types of tilted test samples, including a super-polished reference mirror for the re-trace calibration and the uniformly redundant array (URA) BPRA standards for the geometrical distortion (aberration) calibration. While the first method was previously demonstrated by researchers at DIAMOND Light Source, a method based on the URA BPRA is described and demonstrated here for the first time. We outline the design and fabrication process used in fabrication of URA BPRA test standards, and present the results of application of the URA BPRA standards demonstrating the high efficacy of our approach to geometrical distortion calibration of Fizeau interferometers. We also discuss the possible sources of unexpected peculiarities of the systematic errors, including an astigmatic character of the retrace error, observed with Fizeau interferometers at the Advanced Light Source X-Ray Optics Laboratory.

Munechika, Keiko