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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 19 records

Direct matter disassembly via electron beam control: electron-beam-mediated catalytic etching of graphene by nanoparticles

Here, we report electron-beam activated motion of a catalytic nanoparticle along a graphene step edge and associated etching of the edge. The catalytic hydrogenation process was observed to be activated by a combination of elevated temperature and electron beam irradiation. Reduction of beam fluence on the particle was sufficient to stop the process, leading to the ability to switch on and off the etching. Such an approach enables the targeting of individual nanoparticles to induce motion and beam-controlled etching of matter through activated electrocatalytic processes. The applications of electron-beam control as a paradigm for molecular-scale robotics are discussed.

77 NANOSCIENCE AND NANOTECHNOLOGY↗

Electron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si 3 N 4 and Si etching

A material etching system was developed by combining beam electron injection from a direct current (DC) hollow-cathode (HC) electron source with the downstream reactive environment of a remote CF 4 /O 2 low temperature plasma. The energy of the injected beam electrons is controlled using an acceleration electrode biased positively relative to the HC Argon discharge. For an acceleration voltage greater than the ionization potential of Ar, the extracted primary electrons can produce a secondary plasma in the process chamber. We characterized the properties of the secondary plasma by performing Langmuir probe measurements of the electron energy probability function (EEPF) 2.5 cm below the extraction ring. The data indicate the existence of two major groups of electrons, including electrons with a primary beam electron energy which varies as the acceleration voltage is varied, along with low energy electrons produced by ionization of the Ar gas atoms in the process chamber by the injected beam electrons. When combining the HC Ar beam electron with a remote CF 4 /O 2 electron cyclotron wave resonance (ECWR) plasma, the EEPF of both the low energy plasma electron and beam electron components decreases. Additionally, we studied surface etching of Si3N4 and poly-crystalline Si (poly-Si) thin films as a function of process parameters, including the acceleration voltage (0-70 V), discharge current of the HC discharge (1-2 A), pressure (2- 100 mTorr), source to substrate distance (2.5 to 5 cm), and feed gas composition (with or without CF 4 /O 2 ). The direction of the incident beam electrons was perpendicular to the surface. Si 3 N 4 and poly-crystalline silicon etching are seen and indicate an electronneutral synergy effect. No/little remote plasma spontaneous etching was observed for the conditions used in this study, and the etching is confined to the substrate area irradiated by the injected beam electrons. The electron etched Si 3 N 4 surface etching rate profile distribution is confined within a ~30 mm diameter circle, which is slightly broader than the area for which poly-Si etching is seen, and coincides closely with the spatial profile of beam electrons as determined by the Langmuir probe measurements. The magnitude of poly-Si etching rate is by a factor of two times smaller than the Si 3 N 4 etching rate. In this paper, we discuss possible explanations of the data and the role of surface charging.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Electron-beam energy reconstruction for neutrino oscillation measurements

Neutrinos exist in one of three types or ‘flavours’—electron, muon and tau neutrinos—and oscillate from one flavour to another when propagating through space. This phenomena is one of the few that cannot be described using the standard model of particle physics (reviewed in ref. 1), and so its experimental study can provide new insight into the nature of our Universe (reviewed in ref. 2). Neutrinos oscillate as a function of their propagation distance (L) divided by their energy (E). Therefore, experiments extract oscillation parameters by measuring their energy distribution at different locations. As accelerator-based oscillation experiments cannot directly measure E, the interpretation of these experiments relies heavily on phenomenological models of neutrino–nucleus interactions to infer E. Here we exploit the similarity of electron–nucleus and neutrino–nucleus interactions, and use electron scattering data with known beam energies to test energy reconstruction methods and interaction models. We find that even in simple interactions where no pions are detected, only a small fraction of events reconstruct to the correct incident energy. More importantly, widely used interaction models reproduce the reconstructed energy distribution only qualitatively and the quality of the reproduction varies strongly with beam energy. This shows both the need and the pathway to improve current models to meet the requirements of next-generation, high-precision experiments such as Hyper-Kamiokande (Japan) and DUNE (USA).

72 PHYSICS OF ELEMENTARY PARTICLES AND FIELDS↗

Generation and characterization of magnetized electron beam from a DC high voltage photogun for electron beam cooling application

One of the most challenging requirements for the proposed Electron-Ion Collider is the strong cooling of the proton beam, which is key to achieving the collider’s desired luminosity of order 10 33 -10 34 cm -2 s -1 . Magnetized bunched-beam electron cooling could be a means to achieve the required high luminosity, where strong cooling is accomplished inside a cooling solenoid where the ions co-propagate with an electron beam generated from a source immersed in a magnetic field. To increase the cooling efficiency, a bunched electron beam with high bunch charge and high repetition rate is required. This work describes the production and characterization of magnetized electron beam using a compact 300 kV DC high voltage photogun and bi-alkali antimonide photocathode. Beam magnetization was studied using a diagnostic beamline that includes viewer screens for measuring the shearing angle of the electron beamlet passing through a narrow upstream slit. Simulations and corresponding measurements of beam magnetization are presented as a function of laser spot size and magnetic field strength. Correlated beam emittance with magnetic field (0–0.15 T) at the photocathode was measured for various laser spot sizes. Measurements of photocathode lifetime were carried out at different magnetized electron beam currents up to 28 mA, and bunch charge up to 0.7 nC (not simultaneously).

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗

In Situ Study of the Impact of Aberration-Corrected Electron-Beam Lithography on the Electronic Transport of Suspended Graphene Devices

The implementation of aberration-corrected electron beam lithography (AC-EBL) in a 200 keV scanning transmission electron microscope (STEM) is a novel technique that could be used for the fabrication of quantum devices based on 2D atomic crystals with single nanometer critical dimensions, allowing to observe more robust quantum effects. In this work we study electron beam sculpturing of nanostructures on suspended graphene field effect transistors using AC-EBL, focusing on the in situ characterization of the impact of electron beam exposure on device electronic transport quality. When AC-EBL is performed on a graphene channel (local exposure) or on the outside vicinity of a graphene channel (non-local exposure), the charge transport characteristics of graphene can be significantly affected due to charge doping and scattering. While the detrimental effect of non-local exposure can be largely removed by vigorous annealing, local-exposure induced damage is irreversible and cannot be fixed by annealing. We discuss the possible causes of the observed exposure effects. Our results provide guidance to the future development of high-energy electron beam lithography for nanomaterial device fabrication.

77 NANOSCIENCE AND NANOTECHNOLOGY↗

Interferometric bunch length measurements of 3 MeV picocoulomb electron beams

We report picosecond bunch length measurements using an interferometric method for a 3 MeV electron beam having bunch charge ranging from 1 to 14 pC. The method senses the single-cycle sub-terahertz (THz) pulse emitted by each electron bunch as coherent transition radiation which, in turn, is analyzed using a Michelson-type interferometer, forming an interferogram that is then processed to yield the nominal electron bunch length. This sub-THz coherent radiation intensity was measured using a quasi-optical detector (QOD) operated at room temperature. This experiment was quite challenging since the divergence angle of the sub-THz pulse emitted by the low-energy electron bunch exceeds ±10°, and its pulse energy at the entrance to the detector was as low as 100 pJ. When compared to a conventional helium-cooled silicon composite bolometer designed for frequencies above 0.5 THz, the QOD provided much better signal-to-noise ratio in the ~80 GHz frequency range, which was critical for the successful measurement of the bunch length.

36 MATERIALS SCIENCE↗

Thermal characterization of the build chamber in electron beam melting

Electron beam powder bed fusion, commonly termed electron beam melting (EBM), offers great versatility in multiple-part processes and can produce high quality as-built components due to low residual stresses. The EBM process is complex and requires careful thermal management, including uniform and consistent preheating of the powder bed, in order to ensure quality and consistency of the product. However, most of the simulations in the literature focus on the selective melting stage of the process. As of today, optimal conditions for initial pre-heating temperatures are only available for specific materials. Thus, in order to extend the EBM technology to other desired build materials, a much better understanding of the pre-heating stages is required. In this work, numerical and experimental approaches are combined in order to investigate the effects and sensitivities of heat removal from the build plate during EBM pre-heating stages. For this purpose, a carefully reconstructed numerical model of the build chamber of an ARCAM Q20 + machine is developed. It includes all main parts of the chamber and all relevant heat transfer mechanisms, whereas special attention is paid to radiation heat exchange between various bodies. In order to validate the model, dedicated experiments are performed, in which a system of thermocouples is installed in the build chamber, allowing direct measurement of the local temperatures of the start-plate and heat shields. A good agreement between the simulation and experimental findings is achieved, leading to a better understanding of the thermal processes characteristic to the pre-heating stages. This basic analysis is followed by a representative pre-heating case, where a powder bed is also considered. The energy required to obtain the desired pre-heating temperatures is evaluated, and the role of the powder bed in heat transfer within the chamber is assessed. The pre-heating stage, simulated in the present work, is supposed to create proper conditions for sintering and consequent melting of the powder, which are highly dependent on the local temperatures and heat transfer features. Thus, the findings of the reported work present a step towards a better understanding of the thermal processes that characterize EBM. The reported model can be further used to provide realistic boundary condition inputs for other meso- or macro-scale models as a function of time and geometry. The model can serve also for verification of machine settings, i.e., jump-safe and melt-safe ones which actually provide desired preheat, and for development of settings for new powders.

36 MATERIALS SCIENCE↗

Evaluation of accuracy and resolution of the electron beam profile scanner at the Fermilab Main Injector

The objective of this work is to assess the accuracy of measurements made by the Electron Beam Profile Scanner (EBPS), which captures the trajectory of an electron beam with and without a proton beam present. The proton beam induces deflection in the electron beam, which is influenced by proton charges.For high-resolution images, the probe beam needs to be of high intensity, small diameter, and small divergence, evaluated using a YAG screen and an optical transition radiation (OTR) screen. Additionally, the point spread function (PSF) will be calculated to characterize the optical system's properties using ZEMAX software. The capabilities of the Hamamatsu Charge-Injection Device (CID) camera and Kimball Physics electron gun (e-gun) will be considered for accuracy.

Mwaniki, Matilda [IIT, Chicago; Fermilab]↗

Generation of High-Charge Magnetized Electron Beams Consistent With JLEIC Electron Cooling Requirements

The proposed Jefferson Lab Electron-Ion Collider (JLEIC), currently under design, relies on electron cooling in order to achieve the desired luminosity. This includes an electron beam with >55 Mev, 3.2 nC bunches that cools hadron beams with energies up to 100 GeV. To enhance the cooling, the electron beam must be magnetized with a specific eigen-emittance partition. This paper explores the use of the Fermilab Accelerator Science and Technology (FAST) facility to demonstrate the generation of an electron beam with parameters consistent with those required in the JLEIC high-energy cooler. We demonstrate via simulations the generation of the required electron-beam parameters and perform a preliminary experiment to validate FAST capabilities to produce such beams.

43 PARTICLE ACCELERATORS↗

SPACE CHARGE EFFECT IN LOW ENERGY MAGNETIZED ELECTRON BEAM

Magnetized electron cooling is one of the major approaches towards obtaining the required high luminosity in the proposed Electron-Ion Collider (EIC). In order to increase the cooling efficiency, a bunched electron beam with a high bunch charge and high repetition rate is required. At Jefferson Lab, we generated magnetized electron beams with high bunch charge using a new compact DC high voltage photogun biased at -300 kV with bialkali-antimonide photocathode and a commercial ultra-fast laser. This contribution discusses how magnetization affects space charge dominated beams as a function of magnetic field strength, gun high voltage, and laser pulse width, and spot size in comparison with simulations performed using General Particle Tracer.

Wijethunga, S.A.K.↗

Space Charge Effects in Low Energy Magnetized Electron Beams

Magnetized electron cooling of the ion beam is one of the major approaches towards obtaining the required high luminosity in the proposed Electron-Ion Collider (EIC). To increase the cooling efficiency, a bunched electron beam with a high bunch charge and high repetition rate is required. However, these features can combine to enhance the collective interactions, such as the space charge effect. A magnetized electron beam was successfully generated at the Thomas Jefferson National Accelerator Facility (JLab) using a compact, 300 kV DC high voltage photo-gun with an inverted insulator geometry and bi-alkali antimonide photocathode. The beam magnetization was characterized using a modest diagnostic beamline to measure beam sizes, rotation angles, and normalized transverse emittance as a function of magnetic field at the photocathode, laser spot size, and gun high-voltage. Simultaneously, simulations were performed using the A Space Charge Tracking Algorithm (ASTRA) and General Particle Tracer (GPT) programs. Further, sustained high average current magnetized beam up to 28 mA was demonstrated, and the photocathode lifetime for different magnetized electron beam currents was investigated. In the second part of the project, the space charge effect in low-energy magnetized electron beams was studied and compared with GPT simulations. The high bunch charge studies showed evidence of space charge current limitations starting at 0.3 nC and limited the maximum delivered bunch charge to 0.7 nC. To reach the high bunch charge goal of a few nC, the existing DC photo-gun design was modified using CST Studio Suite’s electromagnetic field solver, and a way to cancel the beam deflection exerted by the non-symmetric nature of the inverted insulator photo-gun geometry was discovered. This thesis presents a detailed description of the generation, characterization, and simulation of high current, high bunch charge magnetized electron beams at JLab, as well as the modified photo-gun design. Together with measurements and simulations, the purpose of this thesis is to provide a solid background on the theoretical aspects and the experimental challenges associated with magnetized electron beams for accelerator applications.

Wijethunga, W M Sajini↗

Superconducting RF Gun with High Current and the Capability to Generate Polarized Electron Beams

High-current low-emittance CW electron beams are indispensable for nuclear and high-energy physics fixed target and collider experiments, cooling high energy hadron beams, generating CW beams of monoenergetic X-rays (in FELs) and gamma-rays (in Compton sources). Polarization of electrons in these beams provides extra value by opening a new set of observables and frequently improving the data quality. We report on the upgrade of the unique and fully functional CW SRF 1.25 MeV SRF gun, built as part of the Coherent electron Cooling (CeC) project, which has demonstrated sustained CW operation with CsK2Sb photocathodes generating electron bunches with record-low transverse emittances and record-high bunch charge exceeding 10 nC. We propose to extend the capabilities of this system to high average current of 100 milliampere in two steps: increasing the current 30-fold at each step with the goal to demonstrate reliable long-term operation of the high-current low-emittance CW SRF guns. We also propose to test polarized GaAs photocathodes in the ultra-high vacuum (UHV) environment of the SRF gun, which has never been successfully demonstrated in RF accelerators.

43 PARTICLE ACCELERATORS↗

Mitigating challenges in aberration-corrected electron-beam lithography on electron-opaque substrates

Aberration-corrected electron-beam lithography (AC-EBL) using ultra-thin electron transparent membranes has achieved single-digit nanometer resolution in two widely used electron-beam resists: poly (methyl methacrylate) (PMMA) and hydrogen silsesquioxane. On the other hand, AC-EBL implementation on thick, electron-opaque substrates is appealing for conventional top-down fabrication of quantum devices with nanometer-scale features. To investigate the performance of AC-EBL on thick substrates, we measured the lithographic point spread function of a 200 keV aberration-corrected scanning transmission electron microscope by defining both positive and negative patterns in PMMA thin films, spin-cast on thick SiO 2 /Si substrates. We present the problems encountered during pre-exposure beam focusing and discuss methods to overcome them. In addition, applying some of these methods using commercial 50 nm thick SiN X membranes with thick Si support frames, we printed arrays of holes in PMMA with pitches around 26 nm on SiN X /Si substrates with increasing Si thickness. Here, our results show that proximity effects from even 50 nm thick SiN X membranes limit hole arrays to 20 nm pitch; however, down to this limit, the effect of the substrate thickness on the pattern quality is minimal. These results highlight the need for novel resists less susceptible to proximity effects, or resists which can be used directly, after development, as the dielectric material in periodic gates in 2D quantum devices.

2D quantum devices↗

Electro-optic sampling beam position monitor for relativistic electron beams

Here, an electro-optic sampling beam position monitor for installation at the SLAC National Accelerator Laboratory FACET-II facility is described. Simulations of the detector signal were performed using realistic electron beam current profiles, demonstrating that this single-shot, non-destructive, compact detector is capable of resolving the relative transverse offset and longitudinal separation of an ultra-relativistic, two-bunch electron beam to order 1 μm and 10 fs, respectively. A design study was performed to optimize the detector’s response to the ultra-relativistic two-bunch electron beam utilized in plasma wakefield accelerator experiments. In addition, the expected sensitivity to beam tilt is studied for typical electron beams used in free electron lasers.

73 NUCLEAR PHYSICS AND RADIATION PHYSICS↗

Conditional diffusion machine-learning framework for mapping valence electron distribution from convergent beam electron diffraction

Quantitative convergent beam electron diffraction (CBED) enables determination of aspherical valence electron distributions through refinement of low-order structure factors, which are highly sensitive to chemical bonding and charge density variations. However, conventional quantitative CBED (QCBED) requires solving a highly nonlinear inverse problem with many coupled parameters, and computationally intensive dynamical diffraction calculations, making it time-consuming and difficult to apply to complex systems. More broadly, reconstructing charge density and orbital electron distribution from diffraction data has long been a central challenge in both x-ray and electron crystallography. Here, in this study, we introduce an artificial-intelligence (AI)-based framework that replaces traditional refinement with a data-driven inverse solver. Using a large synthetic CBED dataset generated by Bloch-wave simulations, we train a conditional diffusion model to directly infer crystal structural parameters and multipole density formalism parameters, and hence valence electron distributions, from CBED patterns alone. By learning from forward simulations across realistic parameter space, the model effectively solves the inverse problem. Compared with direct regression approaches, the diffusion-based framework provides posterior parameter distributions for rigorous uncertainty quantification while preserving quantitative fidelity and reducing analysis time by orders of magnitude. By eliminating the need for external single-crystal x-ray diffraction data and complex nonlinear refinement, this approach enables practical, high-throughput, and in situ quantitative CBED, enabling real-time mapping of valence electron distributions and their correlation with functional responses in quantum and energy materials.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗