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Results for “Fizeau interferometry”

Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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9 records
All sourcesNASA NTRSDOE OSTI
DOE OSTI2017

One-dimensional stitching interferometry assisted by a triple-beam interferometer

In this work, we proposed for stitching interferometry to use a triple-beam interferometer to measure both the distance and the tilt for all sub-apertures before the stitching process. The relative piston between two neighboring sub-apertures is then calculated by using the data in the overlapping area. Comparisons are made between our method, and the classical least-squares principle stitching method. Our method can improve the accuracy and repeatability of the classical stitching method when a large number of sub-aperture topographies are taken into account. Our simulations and experiments on flat and spherical mirrors indicate that our proposed method can decrease the influence of the interferometer error from the stitched result. The comparison of stitching system with Fizeau interferometry data is about 2 nm root mean squares and the repeatability is within ± 2.5 nm peak to valley.

47 OTHER INSTRUMENTATION↗
DOE OSTI2021

The effect of longer-range waviness on X-ray reflectivity measurements

A model for calculating the X-ray reflectivity (XRR) of surfaces to extract both roughness and waviness features is presented. Expressions of reflectivity intensity are derived as a function of root-mean-square (RMS) roughness σ, RMS waviness σ L , and the cut-off frequency between the features ω 0 . Experiments were conducted at the Advanced Light Source at Lawrence Berkeley National Laboratory, beamline 8.3.2, on BK7 glass manufactured with a multi-step polishing process to validate the model, and were compared with atomic force microscopy (AFM), Fizeau interferometry and surface profilometry measurements. Here, the parameter results and their deviations for XRR measurements were σ = 2.9 ± 0.2 nm and σ L = 14.6 ± 0.5 nm with a wavelength cut-off of 1/(18 ± 2) µm –1 , while the results from the AFM, Fizeau and profilometry measurements were σ AFM = 3.4 ± 0.4 nm, σ L,Fizeau = 21.6 nm, σ prof = 4.0 ± 0.1 nm, and σ L,prof = 21.4 ± 0.1 nm with cut-offs for the profilometry and Fizeau measurements limited to frequencies of (1/16) µm –1 to (1/4) mm –1 .

42 ENGINEERING↗
DOE OSTI2024

Binary pseudo-random array standards for calibration of 3D optical surface profilers used for metrology with significantly curved x-ray optics

High-accuracy metrology is vitally important in manufacturing ultra-high-quality free-form mirrors designed to manipulate X-ray light with nanometer-scale wavelengths. The current capabilities and possibility for improvements in X-ray mirror manufacturing are limited by inherent imperfections of the integrated metrology tools. In the case of Fizeau interferometry, metrology tools are currently calibrated with super-polished flat test-standard/reference mirrors. This is acceptable for measuring slightly curved X-ray optics. However, for even moderately curved aspherical X-ray mirrors the flat-reference calibration is not sufficiently accurate and stitching Fizeau interferometer-based surface metrology is used to mitigate the problem. But still, the retrace and aberration errors, as well as the limited spatial resolution, described with the instrument transfer function (ITF), can be transferred into the optical surface topography of X-ray mirrors obtained in stitching metrology. For ITF calibration, we have developed an original technique, based on test standards structured as two-dimensional (2D) highly-randomized (HR) binary pseudo-random arrays (BPRAs). The technique employs the unique properties of the HR BPRA patterns in the spatial frequency domain., i.e. the inherent 2D power spectral density of the HR BPRA pattern has a deterministic white-noise-like character that allows direct determination of the ITF with uniform sensitivity over the entire spatial frequency range and field-of-view of an instrument. Here, we explore technological, metrological, and analytical aspects essential for calibration of the retrace and aberration errors of Fizeau interferometers using different types of tilted test samples, including a super-polished reference mirror for the re-trace calibration and the uniformly redundant array (URA) BPRA standards for the geometrical distortion (aberration) calibration. While the first method was previously demonstrated by researchers at DIAMOND Light Source, a method based on the URA BPRA is described and demonstrated here for the first time. We outline the design and fabrication process used in fabrication of URA BPRA test standards, and present the results of application of the URA BPRA standards demonstrating the high efficacy of our approach to geometrical distortion calibration of Fizeau interferometers. We also discuss the possible sources of unexpected peculiarities of the systematic errors, including an astigmatic character of the retrace error, observed with Fizeau interferometers at the Advanced Light Source X-Ray Optics Laboratory.

Munechika, Keiko↗
DOE OSTI2025

Fabrication and characterization of a full-size ultra-precise lamellar grating for the Cosmic beamline at ALS-U

We have developed a new process for the production of ultra-precise variable line spacing (VLS) lamellar diffraction gratings through nanofabrication. The process enables the fabrication of full-size X-ray gratings with sub-nanometre accuracy in groove depth, an optimal land-to-groove ratio, and uniform groove depth across the entire grating area. We also established a method for evaluating VLS groove density variation using stitched Fizeau interferometry. The measurements confirmed the exceptionally high accuracy of the VLS groove density in the fabricated gratings, which is well within the specification tolerances while the residual groove density errors are vanishingly small. The gold-coated grating demonstrated near-theoretical diffraction efficiency across the energy range of 100–1200 eV.

36 MATERIALS SCIENCE↗
DOE OSTI2017

Direct Writing of X-ray Gratings Using Zone-Plate-Array Lithography (ZPAL)

With the objective of providing the synchrotron and free-electron-laser communities with rapid turnaround and low prices for the highest quality and most advanced gratings and diffractive-focusing optics, LumArray has made specific improvements to its ZP-150 maskless photolithography system, which is based on Zone-Plate-Array Lithography (ZPAL), a technology unique to Lumarray. ZPAL’s advantages include an ability to correct in software for systematic patterning errors. Emphasis was placed on interferometric measurements of various contributors to patterning errors using Fizeau interferometry and a Mireau technique that was developed specifically for measuring errors within a micron-scale area. Average line-placement error was reduced below 20 nm using both pattern-file distortion and address-grid modification. The preferred implementation, address-grid modification, is hardware-based and requires no user intervention while also correcting more types of error. With continued iteration and refinement of the error measurements, we anticipate achieving global line-placement error below10nm. In order to investigate line-edge smoothness and high-frequency line-placement errors, a scheme for inspecting micron-sized areas was invented and implemented based on Mireau interferometry. This enabled the various contributions to be separately evaluated and measured. These included: exposure-dose variation, pattern-writing strategy and errors in the positioning of the microlenses. Deleterious crosstalk between microlenses was minimized via a pattern-dependent software modification. The impact of exposure threshold was revealed and adjustment made. The impact of address-grid fineness on line-edge roughness was likewise shown. Lastly, techniques were developed to measure and correct errors in the positioning of microlenses within the array. We expect final calibration of microlens positions to within 5nm.

42 ENGINEERING↗
DOE OSTI2023

Binary pseudo-random array (BPRA) for inspection and calibration for cylindrical wavefront interferometry

High-accuracy metrology is vitally important in manufacturing ultra-high-quality free-form mirrors designed to manipulate X-ray light with nanometer-scale wavelengths. However, surface topography measurements are instrument dependent, and without the knowledge of how the instrument performs under the practical usage conditions, the measured data contain some degree of uncertainty. Binary Pseudo Random Array (BPRA) “white noise” artifact are effective and useful for characterizing the Instrument Transfer Function (ITF) of surface topography metrology tools and wavefront measurement instrument. BPRA artifact contains features with all spatial frequencies in the instrument bandpass with equal weight. As a result, power spectral density of the patterns has a deterministic white-noise-like character that allows direct determination of the ITF with uniform sensitivity over the entire spatial frequency range. The application examples include electron microscopes, x-ray microscopes, interferometric microscopes, and large field-of-view Fizeau Interferometers. Furthermore, we will introduce the application of BPRA method to characterizing the ITF of Cylindrical Wavefront Interferometry (CWI), by developing the BPRA artifact which matches the radius of curvature of the cylindrical wavefront. The data acquisition and analysis procedures for different applications of the ITF calibration technique developed are also discussed.

Munechika, K↗
DOE OSTI2019

In situ metrology for adaptive x-ray optics with an absolute distance measuring sensor array

Adaptive x-ray mirrors are emerging as one of the primary solutions for meeting the performance needs of the next generation of x-ray light sources. Currently, these mirrors operate open loop with intermittent feedback from invasive sensors that measure the beam quality. This paper outlines a novel design for real-time in situ metrology of the shape of these mirrors using an array of interferometric sensors that does not interrupt the x-ray beam. We describe a proof-of-principle demonstration which shows sub-nm agreement over a range of mirror deflection magnitudes and shapes as compared to simultaneous measurements by using a large-aperture Fizeau interferometer.

42 ENGINEERING↗
DOE OSTI2016

Stitching methods at the European Synchrotron Radiation Facility (ESRF)

X-ray mirror quality has continuously improved over the past 20 years and manufacturers are now able to provide long mirrors with slope errors below 0.2 μrad. Nevertheless, these mirrors are mounted on holders or even mechanical benders to adjust their curvature and their intrinsic quality must be preserved from any parasitic deformation such as twist. The most direct method of detecting these deformations is to measure the 3D topography of the optical surface. At the ESRF metrology laboratory, three different stitching systems are under development based on Fizeau sub-aperture measurements. The first one consists of measuring long flat mirrors, the second based on the relative angle determinable stitching interferometry (RADSI) method developed at SPring-8 is aimed primarily at the measurement of short mirrors with strong curvature down to a few meters, and the last, also based on the RADSI method, is dedicated to characterize longer mirrors with intermediate curvature. For each method we will describe the measurement setup and discuss first results obtained. Micro-stitching interferometry is also currently used at the ESRF metrology laboratory. The technique is suitable for measuring deeply curved aspherical profiles and will be illustrated with results from a Kirkpatrick-Baez mirror system for nano-focusing.

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗
DOE OSTI2016

Stitching interferometry for ellipsoidal x-ray mirrors

Ellipsoidal mirrors, which can efficiently produce a two-dimensional focusing beam with a single mirror, are superior x-ray focusing optics, especially when compared to elliptical-cylinder mirrors in the Kirkpatrick–Baez geometry. However, nano-focusing ellipsoidal mirrors are not commonly used for x-ray optics because achieving the accuracy required for the surface metrology of nano-focusing ellipsoidal mirrors is difficult due to their small radius of curvature along the short ellipsoidal axis. Here, we developed a surface metrology system for nano-focusing ellipsoidal mirrors using stitching interferometric techniques. The developed system simultaneously measures sub-aperture shapes with a microscopic interferometer and the tilt angles of the sub-aperture shapes with a large Fizeau interferometer. After correcting the systematic errors included in the sub-aperture shapes, the entire mirror shape is calculated by stitching the sub-aperture shapes based on the obtained relative angles between partially overlapped sub-apertures. In this study, we developed correction methods for systematic errors in sub-aperture shapes that originated from off-axis aberrations produced in the optics of the microscopic interferometer. The systematic errors on an ellipsoidal mirror were estimated by measuring a series of tilted plane substrates and the ellipsoidal substrate. From measurements of an ellipsoidal mirror with a 3.6-mm radius of curvature at the mirror center, we obtained a measurement repeatability of 0.51 nm (root-mean-square) in an assessment area of 0.5 mm × 99.18 mm. This value satisfies the requirements for surface metrology of nano-focusing x-ray mirrors. Thus, the developed metrology system should be applicable for fabricating nano-focusing ellipsoidal mirrors.

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗