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Laser diodes based on solution-processed semiconductor quantum dots (QDs) present an economical and color-tunable alternative to traditional epitaxial lasers.
To fabricate optical components with surface layers compatible with high power laser applications that may operate as antireflective coatings, polarization rotators, or harness physical anisotropy for other uses, metasurfaces are becoming an appealing candidate. In this study, a large-beam (1.05 cm diameter) 351-nm laser-induced damage testing was done on an all-glass metasurface structure composed of cone-like features with a subwavelength spacing of adjacent features. These structures were fabricated on untreated fused silica glass and damage tested, as were structures that were fabricated on fused silica glass that experienced a preliminary etching process to remove the surface Beilby layer that is characteristic of polished fused silica. The laser-induced damage onset for structures on untreated fused silica glass was 19.3 J∙cm -2 , while the sample that saw an initial pretreatment etch exhibited an improved damage onset of 20.4 J∙cm -2 , only 6% short of the reference pretreated glass damage onset of 21.7 J∙cm -2 . For perspective, the National Ignition Facility (NIF) operational average fluence at this wavelength and pulse length is about 10 J/cm2. At a fluence of 25.5 J∙cm -2 , the reference (pretreated) fused silica initiated 5.2 damage sites per mm 2 , while the antireflective metasurface sample with a preliminary etching process treatment initiated 9.8 damage sites per mm 2 . In conclusion, these findings demonstrate that substrate-engraved metasurfaces are compatible with high energy and power laser applications, further broadening their application space.
Organic polymers are a versatile class of materials employed in a broad range of optical coating applications. However, their use as coatings in high-power laser applications, particularly in the UV spectral region, has been limited in scope due to their relatively low laser-induced damage thresholds (LIDTs), which decrease further with exposure to multiple pulses. This study explores the effect of post-deposition drying temperature and residual solvent on the LIDT of solvent-borne polymer coatings. In this work, poly(ethyl methacrylate) (PEMA) coatings were deposited by first spin coating solutions of PEMA (dissolved in 2,2,2-trichloroethanol (TCE)) onto fused silica substrates, then baking at temperatures of either 130°C (soft-bake) or 180°C (hard-bake). Analysis of the two coatings revealed that the soft-bake coating retained a significant amount of TCE within the polymer matrix, which functioned to plasticize the coating and reduce internal stress. The laser-induced damage resistance of the two coatings was evaluated using 351-nm, 1-ns laser pulses. The testing protocols included single-pulse (1-on-1), 1-pulse ramp (R-on-1), and a 1000-pulse ramp (1000R-on-1) test. The results showed that the plasticized, soft-bake coating exhibits a significantly increased LIDT, especially for multipulse irradiation conditions.
Here we explore the laser-damage behavior of gallium alloy-based liquid metal mirrors for their potential to provide higher damage-threshold performance. One of the key advantages of using liquid metal mirrors is the self-healing potential following perturbations arising from exposure to high-power laser pulses. In this work, key performance metrics, such as reflectivity and the laser-damage initiation mechanism and initiation threshold, were investigated using fused-silica cells filled with three different Ga liquid metal alloys. The results suggest that irreversible modification (damage) under 355- nm, 6-ns pulses are associated with the formation of gallium oxide, taking place at a fluence significantly higher than that for damage initiation in conventional metal mirrors. This exploratory work is the first of its kind and highlights the strong performance of gallium alloy metal mirrors.
Abstract Birefringent materials—which are highly needed in high power laser systems—may be limited in usage due to the laser‐induced damage threshold of traditional birefringent materials. This work reports here on all‐glass metasurfaces, fabricated by angled etching through sacrificial metal nanoparticle (NP) etching masks, for generation of effective birefringence in the formed layer. As a result, a fused silica metasurface, monolithic to the underlying substrate, is demonstrated to exhibit a birefringence of 6.57° under 375 nm illumination. Full‐wave analysis shows a good agreement with the measurement and presents potential paths forward to increasing the effective metasurface birefringence. This is the first demonstration, to the best of knowledge, of an etching technique to obtain the resulting tilted pillar‐like nanofeatures. The anisotropy of the metasurface nanoelements along the two window in‐plane major axes presents different effective paths for the two polarizations and thus generates birefringence in a nonbirefringent material. Additionally, the imparted anisotropy lends itself to manipulation of physical properties of the surface as well, with metasurface feature orientation suppressing water flow along one principal axis and giving rise to water flow steering capabilities.
An optically seamless method for increasing the aperture or length of nonlinear materials has been developed, which is suitable for optics in high energy laser systems and other applications. Differences between aperture and length scaling are analyzed. Bonding of component pairs of a nonlinear crystal, lithium tri-borate, is experimentally demonstrated by GAMDAN Optics Inc. and tested at the Laboratory of Laser Energetics at the University of Rochester. Here, a bonded crystal is shown to deliver beam quality and second harmonic conversion efficiency that is equivalent to that of a monolithic crystal of similar dimensions.
All-glass metasurface “nanograting” structures that exhibit birefringence in the formed layer are reported. The key enabler of this work is ion beam processing at an angle sufficiently off-normal incidence, inducing self-assembly of a deposited metal layer into quasi-linear metallic features that can function as an etching mask. As a result, a fused silica metasurface, monolithic to the underlying substrate, is demonstrated at 375 nm wavelength to exhibit a phase delay angle of 30° between the principal axes. The capability of an angled etch mask replenishment process is also demonstrated for achieving deeper etch depth and for increasing the grating period, another first – to the best of the knowledge. This is the first display of a technology capable of fabricating glass-engraved near-linear grating structure with a feature-to-feature period as small as 118.6 nm. Furthermore, this technology has the potential to generate grating-like structures with periods as small as 12.4 nm, as demonstrated here with reactive ion beam processing assisted mask assembly. Furthermore, these structures are shown to have reflectivity < 0.4% across the wavelength band 350 nm – 1000 nm. Such a technology can enable laser-durable grating structures for the deep-UV and even down to soft X-ray wavelengths.
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A beam shaping system including an all-optical liquid crystal beam shaper, the beam shaper including a photoswitchable alignment material including at least one of a PESI-F, SPMA:MMA 1:5, SPMA:MMA 1:9, ora SOMA:SOMA-p:MMA 1:1:6 material, at least some of the liquid crystals of the beam shaper including at least one of a phenylcyclohexane, cyclo-cyclohexane, or a perfluorinated material.
Laser systems based on coherent beam combination (CBC) that rely on tiled pupil architecture intrinsically carry digital capabilities independently applicable to all three essential characteristics of a laser pulse: amplitude, phase and polarization. Those capabilities allow the far-field energy distribution to be flexibly tailored in real time. Operation in the femtosecond regime at high repetition rates gives access to a wide range of applications requiring both high peak and average powers. We address the task of independent peak versus average power adjustment needed for applications seeking to decouple nonlinear phenomena associated with GW peak power from the thermal load inherent to kW average power operation. The technical solutions proposed are presented in the framework of the Ecole Polytechnique XCAN CBC laser platform (61 independent channels) with an emphasis on thermal management measures implemented to ensure its nominal operation.
Laser-accelerated ion beams show promise for many applications, including high-resolution flash imaging of static or dynamic objects in next-generation radiography to probe materials and plasmas in extreme environments and inertial confinement fusion. To scale up ion beam production for radiography applications, we conducted experiments using sub-picosecond lasers up to 0.5 kJ at the OMEGA-EP facility to characterize proton beams from solid targets, primarily CH/CD sub-micron thin films from which ion beams were also used for static and dynamic radiography for the first time. For standalone sub-micron thin CH films, the highest detected proton energy is in the range of 72–97 MeV. Proton beams with highest energy near or above 60 MeV at full laser energy and similar beam profiles are also measured from low-density CD foams and flat CH foil target of micrometer-scale thickness. The ~ 700–800 nm CH/CD foils achieve the highest ion yield among the targets tested. For sub-micron thin films, the laser prepulse can expand the target and lead to complex interactions, which is simulated using coupled hydrodynamic and two-step kinetic models. Simulations suggest the presence of a micrometer-scale preplasma plateau with near-critical density and further indicate that target normal sheath acceleration, electron heating from Relativistic transparency in the preplasma plateau, and background proton reflection from carbon ion front at the rear side contribute to the resulting proton spectrum from these sub-micron thin targets at various stages. These proton beams show strong potential for radiography and for production of secondary sources.
The shock imparted by a laser beam striking a metal surface can be increased by the presence of an optically transparent tamper plate bonded to the surface. We explore the shock produced in an aluminum slab, for a selection of tamper materials and drive conditions. The experiments are conducted with a single-pulse laser of maximum fluence up to 100 J/cm 2 . The pressure and impulse are measured by photon doppler velocimetry, while plasma imaging is used to provide evidence of nonlinear tamper absorption. We demonstrate a pressure enhancement of 50x using simple commercially available optics. We compare results from hard dielectric glasses such as fused silica to soft plastics such as teflon tape. We discuss the mechanism of pressure saturation observed at high pulse fluence, along with some implications regarding applications. Below saturation, overall dependencies on pulse intensity and material parameters such as mechanical impedances are shown to correlate with a model by Fabbro et al .
Deterministic finishing methods of optical components for high-peak-power laser applications that can meet the requirements for high laser damage resistance are not sufficiently developed to meet all needs. This is especially the case for ultraviolet (UV) laser applications. Fused silica is the material of choice for optics operating at UV wavelengths owing to its intrinsically large bandgap, high transparency, and excellent uniformity. Here we report on the laser damage behavior of fused silica surfaces finished by fluid jet polishing (FJP) as a function of removal depth. Fused silica test substrates were processed by FJP to depths ranging from 0.7 μm to 18 μm. Laser damage testing was conducted on these surfaces at 351 nm and 1-ns pulse lengths for both, 1-on-1 and R-on-1 testing protocols. The results for 1-on-1 testing showed no degradation in the laser-induced damage threshold (LIDT) of the substrates. Instead, a gradual improvement starting at a depth of 2.1 μm was observed and continued to the 18-μm surface. At 18-μm of removal, the LIDT was 16% higher than a surface that was not finished by FJP. For R-on-1 testing, all surfaces treated by FJP demonstrated an improvement in laser damage resistance. At depths greater than 5 μm, the improvements were significantly more pronounced and a 30% increase in the LIDT was realized.
Laser damage-prone precursors in high index materials such as hafnia are believed to be the primary limiter in the performance of dielectric multilayer films to advance ultra-high power and energy laser applications. Removing or suppressing these precursors is the key to fabricating laser damage resistant thin films for the enabling technologies. Early work has revealed that nanobubbles formed by entrapped argon (Ar) working gas in ion beam sputtering (IBS) produced hafnia films are primarily responsible for the onset of laser damage upon exposure to UV, ns-laser pulses. In this study, we demonstrate that the UV ns-laser damage onset of IBS produced hafnia films can be improved to 3.1 +/- 0.2 J/cm 2 by substituting the conventional Ar working gas with xenon (Xe), a nearly 1 J/cm 2 increase from that of the Ar produced hafnia films. In addition to the suppression of the overall point-defect density of the hafnia films, the reduction of the Xe entrapment eliminates the nanobubbles and the generation of plasmas that initiates the laser damage. The defect suppression and its correlation to the increase in laser damage threshold is revealed by the combined analysis of Rutherford backscattering spectroscopy, electron paramagnetic resonance spectroscopy, transmission electron microscopy, and laser damage testing. Monte Carlo simulations suggest a much smaller entrapment of Xe gas by comparison to Ar, which is attributed to the significant difference in the energy of the reflected neutrals (3X) which are likely to be implanted. These results provide an effective process route with a fundamental understanding for producing high laser damage resistant dielectric films for high power and high energy laser applications.
It has been recently demonstrated that eutectic alloys processed by additive manufacturing have excellent high-temperature mechanical properties. We suggest that nickel-base eutectic alloys may enable new combinations of structural and functional properties. To this end, we investigate the processability, microstructure, and thermal stability of five, binary near-eutectic Ni-X (X = B, Ce, La, Y, and Zr) alloys processed via surface laser-remelting. The microstructure of all alloys contain a two-phase lamellar eutectic microstructure consisting of γ-Ni and intermetallic phases; this microstructure is significantly finer (100–200 nm lamellar spacing) in the laser-remelted alloys than in the cast substrate (0.5–1.0 µm lamellar spacing). The microhardness of the laser-remelted alloys (550–770 HV) is 35–50% higher than that of the cast alloys (370–570 HV) due to this finer eutectic spacing. An anomalous eutectic microstructure appears at the meltpool boundaries, containing globular and lamellar γ-Ni phases. The alloys contain a high volume fraction (>50 vol%) of intermetallic phase which forms a continuous network, causing brittleness. Following laser-remelting trials, the alloys showed a high density of solid-state cracks, except for the Ni-Zr alloy which processed well. During thermal exposure at 700 and 900°C for up to 500 h, the eutectic microstructure coarsens. Coarsening occurs heterogeneously and initiates at the meltpool boundaries. This process occurs more slowly in the Ni-Zr and Ni-Y alloys, and more rapidly in the remaining alloys, resulting in greater microhardness retention in the Ni-Zr and Ni-Y alloys following thermal exposure at 700°C. Thus, among the five alloys, the Ni-Zr system exhibits a good combination of high-temperature mechanical properties and processability. Here, we conclude with recommendations for future work on designing additively manufactured alloys based on these eutectic Ni systems.
Research on plasma generated by electrical discharge in gas-filled capillaries plays an important role in advancing laser wakefield accelerators. We present a comprehensive study of the temporal and spatial distribution of plasma density within a short, 1 cm long, square-shaped capillary filled with hydrogen gas. Two transverse capillary sizes, 500 μm and 300 μm, were investigated achieving peak plasma densities of 0.9 × 10 18 cm −3 and 2.5 × 10 18 cm −3 , respectively, at the capillary center. In addition, we explore how these distributions depend on discharge parameters, specifically discharge current and gas flow through the capillary. Plasma density was determined by analyzing the Stark broadening of the hydrogen Balmer-alpha line. The results obtained were compared with the theoretical models and simulations. The comparison between the model predictions and the experimental data at the transient ionization stage of the discharge reveals a discrepancy of a factor of ∼1.3–2.1, depending on the capillary size, which is thoroughly discussed.
Abstract not provided.