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At least 19 records

Review of metal-containing resists in electron beam lithography: perspectives for extreme ultraviolet patterning

Background: Metal-containing resists entered the mainstream semiconductor industry process flow to mitigate the low absorbance of extreme ultraviolet (EUV) radiation by thin films of organic resists that lead to poor sensitivity and their inability to handle rigors of development and etching conditions. Aim: The long and rich history of using metal-containing resists in electron beam lithography can offer interesting lessons, pointers, and insights to the relatively newcomer EUV lithography, which is slightly over a decade old. Approach: Electron beam lithography has been enjoying a considerable amount of freedom in the choice of resist materials for close to 50 years; especially the use of metal-containing resists to attain not only single digit nanometer resolution, higher sensitivity, and etch resistance but also lower line-edge roughness. Here, we make a comprehensive historical review of the progress made in the patterning of metal-containing resists in electron beam lithography and derive insights that can be potentially useful in EUV patterning. Perspectives: Small molecular weight resists are proven to be crucial for achieving higher resolution with low line-edge roughness. Simplifying process flow by reducing etch-stack-layers is conceivable with metal-containing resists, along with direct-patterning of functional materials for heterogeneous integration. Efficient contact hole patterning at tighter pitches may be incumbent on progress in positive-tone resist research.

77 NANOSCIENCE AND NANOTECHNOLOGY↗

CO 2 –Based Dual–Tone Resists for Electron Beam Lithography

The increasing global environmental and energy crisis has urgently motivated the advancement of sustainable materials. Significant effort has been focused on developing new materials to replace the fossil-based resists in the semiconductor industry based on greener sources such as ice, dry ice, small organic molecules, and proteins. Such resist materials, however, have yet to meet the stringent requirements of high sensitivity, high resolution, reliable repeatability, and good compatibility with the current protocols. To this end, CO 2 -based polycarbonates (CO 2 -PCs) obtained from the copolymerization of CO 2 and epoxides are demonstrated as sustainable dual-tone (positive & negative tone) resists for electron beam lithography. By adjusting the chemical structure, developing agent, and molecular weight, the CO 2 -PCs present high sensitivities to electron beam (1.3/120 μC cm -2 ), narrow critical dimensions (29/58 nm), and moderate line edge roughness (4.6/26.7 nm) for negative and positive resists, respectively. Here, a deep understanding of the exposure mechanism of CO 2 -PC resists is provided on the basis of the Fourier transform infrared, Raman, and electron ionization mass spectroscopy. 2D photonic crystal devices are fabricated using the negative and positive CO 2 -PC resists, respectively, and both devices show distinct colors derived from their well-defined nanostructures, indicating the great practical potential of CO 2 -derived electron beam resists.

nanofabrication↗

Nanometer Scale Imaging to Develop Quantitative Descriptors of Bipolar Membrane Junction Structure

Swings in pH can be achieved by electrically polarizing a bipolar membrane (BPM) to drive water dissociation at the BPM junction for electrochemical conversion and separation processes. BPM junction design is critical to tailor performance for specific applications; however, characterization techniques capable of resolving the nanometer scale physical structure of the junction are limited. We present sample preparation, imaging, and analysis workflows that are adaptable to a variety of BPM junction architectures. Atomic force microscopy produces BPM junction images with nanometer scale lateral resolution for samples with and without a graphene oxide water dissociation catalyst in the junction. Subsequent image segmentation and analysis quantify line edge roughness and catalyst layer thickness as descriptors of junction structure. Comparison of pre- and post-electrodialysis junctions suggests electric field-induced alignment of catalyst particles during electrodialysis. This characterization workflow can inform manufacturing protocols, computational modeling, and failure mode analysis for next-generation BPMs.

97 MATHEMATICS AND COMPUTING↗

Recent efforts of vapour-phase strategies for EUV resist toward high- and hyper-NA extreme ultraviolet lithography

Extreme ultraviolet lithography (EUVL, λ = 13.5 nm) is critical for sub-1 nm technology nodes but remains constrained by inherent trade-offs among resolution, line-edge roughness (LER), and sensitivity. Stochastic effects originating from photon shot noise, low-energy secondary electron blur, and the random distribution of resist components further limit its advancement toward high numerical-aperture (NA, NA = 0.55) and hyper-NA (NA ≥0.75) EUVL. While the optimization of spin-on chemically amplified resists (CARs) continues, metal-oxide resists (MORs) have emerged as strong candidates for next-generation EUVL by incorporating metals with high EUV absorption coefficients, which enhances both resist sensitivity and etch resistance during pattern transfer. Besides spin-coating, recent advances in vapour-phase techniques, such as vapour-phase infiltration (VPI), chemical vapour deposition (CVD), and molecular atomic layer deposition (MALD), offer promising pathways to achieve new resist platforms, such as dry resists, that satisfy the stringent thickness and uniformity requirements of next-generation EUVL. These methods enable the direct incorporation of metal species into existing resist matrices or the formation of hybrid inorganic–organic resist platforms, thereby improving film uniformity, etch durability, and pattern fidelity while mitigating stochastic defects. This review highlights the latest advancements in vapour-phase-synthesized EUV resists, emphasizing material design, lithographic performance, and the underlying exposure mechanisms. Although still emerging, vapour-phase strategies are paving the way for an all-dry integration framework that could improve EUV patterning workflows and meet the demands of future technology nodes.

36 MATERIALS SCIENCE↗

Effect of pattern transfer process on roughness of block copolymer patterns from directed self-assembly

Block copolymer-directed self-assembly (DSA) remains promising for improving pattern quality and reducing the stochastic variations that challenge high numerical aperture extreme ultraviolet lithography. Equally critical is refining pattern transfer methods for accurately transferring the rectified DSA features to the underlying substrate. We compare two atomic layer deposition (ALD)-based techniques: sequential infiltration synthesis (SIS) and dry liftoff, applied to polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) DSA patterns. Both methods utilize aluminum oxide hard masks, with one synthesized through infiltration into the PMMA domains and the other through conformal ALD coating. High-resolution scanning electron micrographs were analyzed to measure line edge, width, and placement roughness for both the line (PMMA) and space (PS) features. Although both methods yielded similar overall 3σ rms roughness, they differed significantly in the frequency-dependent power spectral density (PSD) profiles. SIS reduced line placement roughness at length scales associated with the polymer pitch, but increased space width roughness at low frequencies, whereas dry liftoff mimicked the frequency content of the original guiding pattern. This study underscores the importance of PSD evaluation in selecting optimal pattern transfer strategies for specific applications.

Block copolymers↗

Comparison of the spatial statistics of random and defined-sequence photoresist films

The resolution-line edge roughness-sensitivity tradeoff has motivated the exploration of potential improvements using defined sequence polymers and polymer-bound photoacid generators and quenchers. We characterize the internal structures of positive tone photoresist polymer films formed from defined sequence polymers and compare them with random copolymers of the same composition. We model their imaging to connect initially to developable film structures. We use a polymer packing algorithm to simulate films of diverse compositions and locations of photoacid generators and quenchers, using the composition of an ESCAP photoresist. We use a simple extreme ultraviolet exposure-deprotection algorithm to model developable image formation within them. In all cases, the spatial distribution of chemical moieties in the film for defined sequence polymers is nearly indistinguishable from random copolymers. We evaluate several exposure-deprotection scenarios and find that a defined sequence copolymer has a distinctive developable image under certain circumstances. The use of defined sequence polymers within a photoresist layer does not automatically result in improved imaging; however, they do have some characteristics different from random polymers of the same composition. Further study of these characteristics may provide a route to improved control over the nanoscale imaging process.

36 MATERIALS SCIENCE↗

Engineering Assembly Kinetics and Line Roughness in Solvent Vapor-Annealed Block Copolymer/Homopolymer Blends

Block copolymer (BCP) directed self-assembly (DSA) is a promising route to enhance lithography resolution by multiplying nanopattern density and reducing feature roughness. Eliminating kinetically trapped self-assembly defects requires fast self-assembly. However, acceleration strategies like solvent vapor annealing or homopolymer blending broaden domain interfaces, implying a trade-off in increased feature roughness. In this work, we experimentally investigate this apparent dilemma between self-assembly kinetics and line roughness for solvent vapor-annealed thin films of a lamellar poly(styrene-block-2-vinylpyridine) (PS-b-P2VP) BCP blended with PS and P2VP homopolymers. Binary blends with PS or P2VP homopolymers and ternary blends incorporating both in equal weight fractions were solvent vapor annealed using acetone, a near-neutral solvent for PS and P2VP, followed by P2VP-selective vapor-phase infiltration with alumina (AlOx) and polymer etching. Binary blends with P2VP exhibit a modest kinetic enhancement but also higher line-edge and -width roughness due to the increased frequency of P2VP protrusions and bridge defects in the alumina line patterns. In contrast, binary blends with PS self-assemble noticeably faster, while domain asymmetry from the added PS homopolymer reduces roughness by curbing the number of alumina protrusions and bridge defects. Ternary blends maintain DSA line patterns across a wider composition window and, at higher homopolymer loadings, reduce roughness at length scales near the lamellar period, consistent with a reduced impact of intradomain compositional fluctuations. These findings provide important insights for codesigning blend compositions and process flows to achieve high-resolution, defect free patterns with minimal roughness through BCP DSA.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Scattering from binary optics

There are a number of sources of scattering in binary optics: etch depth errors, line edge errors, quantization errors, roughness, and the binary approximation to the ideal surface. These sources of scattering can be systematic (deterministic) or random. In this paper, scattering formulas for both systematic and random errors are derived using Fourier optics. These formulas can be used to explain the results of scattering measurements and computer simulations.

Ricks, Douglas W.↗

Calculating C-grids with fine and embedded mesh regions

A program for calculating a C-type mesh around airfoil like shapes is described. The Jameson/Caughey approach is used: a parabolic transformation coupled with a shearing transformation. The algebraic algorithm is capable of efficiently generating nearly orthogonal grids. A high degree of grid control is possible. The user may specify grid boundaries, number of grid lines, and location of (and spacing in) trailing edge and leading edge fine mesh areas. The capability of embedding fine mesh regions, for use with new adaptive grid techniques, is being developed. Grids generated by the program were used in Euler flow flow calculatons by W. Usab. Results superior to results calculated on previous O-type grids were obtained. Specifically, calculations converged faster using C-grids rather than 0-grids, total pressure loss spikes at the trailing edge of the airfoil were eliminated, and the Ni method converged with zero artificial smoothing for a subcritical case (resulting overall total pressure loss was then nearly zero). These improvements were attributed to higher grid orthogonality, especially at the trailing edge. The program itself is fairly straightforward. Roughly half of the 800 code lines are comment lines.

Loyd, B.↗

Shock Demagnetization of Pyrrhotite

Maps of the remanent magnetic field of Mars show demagnetized zones within and around giant impact basins. It is likely that vast regions of the Martian crust were demagnetized due to a shock-induced phase change or magnetic transition of magnetic minerals in the crust. This hypothesis is supported by the fact that around the Hellas and Argyre basins, the edges of the unmagnetized zones roughly correspond with peak shock pressure contour lines of a few GPa. Although pyrrhotite is not a major carrier of magnetization in the Earth s crust, it is a common phase in Martian meteorites and may be an important carrier in the Martian crust. Understanding the effects of shock waves on magnetic minerals is critical for determining the origin of the demagnetized zones in impact basins and possibly for identifying the major magnetic carrier phases. Here we present the results of the first controlled shock demagnetization measurements on pyrrhotite. Previous experiments: Shock demagnetization

Louzada, K. L.↗

Length scales and scale-free dynamics of dislocations in dense solid solutions

The fundamental interactions between an edge dislocation and a random solid solution are studied by analyzing dislocation line roughness profiles obtained from molecular dynamics simulations of Fe 0.70 Ni 0.11 Cr 0.19 over a range of stresses and temperatures. These roughness profiles reveal the hallmark features of a depinning transition. Namely, below a temperature-dependent critical stress, the dislocation line exhibits roughness in two different length scale regimes which are divided by a so-called correlation length. This correlation length increases with applied stress and at the critical stress (depinning transition or yield stress) formally goes to infinity. Above the critical stress, the line roughness profile converges to that of a random noise field. Motivated by these results, a physical model is developed based on the notion of coherent line bowing over all length scales below the correlation length. Above the correlation length, the solute field prohibits such coherent line bow outs. Using this model, we identify potential gaps in existing theories of solid solution strengthening and show that recent observations of length-dependent dislocation mobilities can be rationalized.

36 MATERIALS SCIENCE↗

Considerations of Methods of Improving Helicopter Efficiency

Recent NASA helicopter research indicates that significant improvements in hovering efficiency, up to 7 percent, are available from the use of a special airfoil section formed by combining an NACA 632A015 thickness distribution with an NACA 230 mean line. This airfoil should be considered for flying-crane-type helicopters. Application of standard leading-edge roughness causes a large drop in efficiency; however, the cambered rotor is shown to retain its superiority over a rotor having a symmetrical airfoil when both rotors have leading-edge roughness. A simple analysis of available rotor static-thrust data indicates a greatly reduced effect of compressibility effects on the rotor profile-drag power than predicted from calculations. Preliminary results of an experimental study of helicopter parasite drag indicate the practicability of achieving an equivalent flat-plate parasite-drag area of less than 4 square feet for a rotor-head-pylon-fuselage configuration (landing gear retracted) in the 2,000-pound minimum-flying-weight class. The large drag penalty of a conventional skid-type landing (3.6 square feet) can be reduced by two-thirds by careful design. Clean, fair, and smooth fuselages that tend to have narrow, deep cross sections are shown to have advantages from the standpoint of drag and download. A ferry range of the order of 1,500 miles is indicated to be practicable for the small helicopter considered.

Dingeldein, Richard C.↗

Effect of Anisotropic Confinement on Electronic Structure and Dynamics of Band Edge Excitons in Inorganic Perovskite Nanowires

Inorganic lead halide perovskite nanostructures show promise as the active layers in photovoltaics, light emitting diodes, and other optoelectronic devices. They are robust in the presence of oxygen and water, and the electronic structure and dynamics of these nanostructures can be tuned through quantum confinement. Here we create aligned bundles of CsPbBr3 nanowires with widths resulting in quantum confinement of the electronic wave functions and subject them to ultrafast microscopy. We directly image rapid one-dimensional exciton diffusion along the nanowires, and we measure an exciton trap density of roughly one per nanowire. Using transient absorption microscopy, we observe a polarization-dependent splitting of the band edge exciton line, and from the polarized fluorescence of nanowires in solution, we determine that the exciton transition dipole moments are anisotropic in strength. Furthermore, our observations are consistent with a model in which splitting is driven by shape anisotropy in conjunction with long-range exchange.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Blue lobes in the Hydra A cluster central galaxy

We present new U- and I-band images of the centrally dominant galaxy in the Hydra A cluster, obtained with the 2.5 m Isaac Newton Telescope at La Palma. The galaxy is centered in a poor, X-ray-luminous cluster whose gaseous intracluster medium is apparently cooling at a rate of m-dot(sub CF) approximately 3000 solar masses/yr. The galaxy's structure is that of a normal giant elliptical galaxy, apart from the central approximately 8 x 6 arcsec (approximately 12 x 9 kpc) region which contains an unusually blue, lobelike structure that is spatially coincident with a luminous emission-line nebula in rotation about the nucleus. Based on near spatial coincidence of the central continuum structure and the emission-line nebula, we suggest that the blue continuum is due to a warm stellar population in a central disk. In order to isolate and study the structure of the disk, we have subtracted a smooth galactic background model from the U-band image. The disk's surface brightness profiles along its major and minor axes decline roughly exponentially with radius. The disk's axial ratio is consistent with a nearly edge-on thick disk or a thin disk that is inclined with respect to the line of sight. The bluest regions, located a few arcsec on either side of the nucleus (giving the lobelike appearance), may be due to locally enhanced star formation or a seeing-blurred ring of young stars embedded in the disk observed nearly edge-on. If star-formation is occurring with the local initial mass function, the central color, surface brightness, and dynamical mass would be consistent with models for star formation at a rate of less than and approximately 1 solar masses/yr which has persisted for the past approximately 10(exp 9) yr, a short burst (10(exp 7) yr) of star formation at a rate of approximately 30 solar masses/yr which occurred less than and approximately 10(exp 8) yr ago, or an instantaneous burst of star formation which occurred approximately 5 x 10(exp 7) yr ago. While the young population contributes approximately 30%-40% of the central U-band luminosity, its mass would be less than and approximately 1% to less than and approximately 10% (10(exp 8) solar masses - 2 x 10(exp 9) solar masses of the galaxy's central dynamical mass. We consider a number of possible origins for the disk material.

Mcnamara, Brian R.↗

A new system of nonthermal filaments near the Galactic center

The discovery of a new system of bright nonthermal filaments near the Galactic center is reported. This system is located in the interior of the western lobe of the Galactic center lobes and at the edge of a molecular cloud centered at V(LSR) of roughly -140 km/s in a relatively uncluttered field. The cloud has spectral lines about 50 km/s wide in (C-12)O, (C-13)O, and CS and a mass of order 100,000 solar.

Bally, John↗

Effects of Suction on Swept-Wing Transition

Stability experiments are conducted in the Arizona State University Unsteady Wind Tunnel on a 45 deg swept airfoil. The pressure gradient is designed to provide purely crossflow-dominated transition; that is, the boundary layer is subcritical to Tollmien-Schlichting disturbances. The airfoil surface is hand polished to a 0.25 microns rms finish. Under these conditions, stationary crossflow disturbances grow to nonuniform amplitude due to submicron surface irregularities near the leading edge. Uniform stationary crossflow waves are produced by controlling the initial conditions with spanwise arrays of micron-sized roughness elements near the attachment line. Hot-wire measurements provide detailed maps of the crossflow wave structure, and accurate spectral decompositions isolate individual-mode growth rates for the fundamental and harmonic disturbances. Roughness spacing, roughness height, and Reynolds number are varied to investigate the growth of all amplified wavelengths. The measurements show early nonlinear mode interaction causing amplitude saturation well before transition. Comparisons with nonlinear parabolized stability equations calculations show excellent agreement in both the disturbance amplitude and the mode-shape profiles.

Saric, William S.↗

Galaxies with biconical ionized structure in MaNGA – I. Sample selection and driven mechanisms

ABSTRACT Based on the integral field unit (IFU) data from Mapping Nearby Galaxies at Apache Point Observatory (MaNGA) survey, we develop a new method to select galaxies with biconical ionized structures, building a sample of 142 edge-on biconical ionized galaxies. We classify these 142 galaxies into 81 star-forming galaxies, 31 composite galaxies, and 30 AGNs (consisting of 23 Seyferts and 7 LI(N)ERs) according to the [N ii]-BPT diagram. The star-forming bicones have bar-like structures while AGN bicones display hourglass structures, and composite bicones exhibit transitional morphologies between them due to both black hole and star formation activities. Star-forming bicones have intense star formation activities in their central regions, and the primary driver of biconical structures is the central star formation rate surface density. The lack of difference in the strength of central black hole activities (traced by dust attenuation corrected [O iii]λ5007 luminosity and Eddington ratio) between Seyfert bicones and their control samples can be naturally explained as that the accretion disc and the galactic disc are not necessarily coplanar. Additionally, the biconical galaxies with central LI(N)ER-like line ratios are edge-on disc galaxies that show strong central dust attenuation. The radial gradients of H α surface brightness follow the r−2.35 relation, roughly consistent with r−2 profile, which is expected in the case of photoionization by a central point-like source. These observations indicate obscured AGNs or AGN echoes as the primary drivers of biconical structures in LI(N)ERs.

Zhou, Zhi-Jie (ORCID:0000000317096005)↗

Raised Relief Mars Globe Brings the Red Planet Closer

The Mars Globe 20x is the first digitally produced raised relief globe to be sold at retail establishments. The rises and dips of the Martian landscape have been multiplied by 20 to make the shapes more noticeable to human touch and sight. They make this globe, with its over 1 million elevation points, a visually stunning introduction to the planet. Spectrum 3D used the NASA digital land elevation data to aim lasers that then shaped and defined the master globe s surface. Subsequent copies were then made by creating a master globe mold. The molded copies are hand finished by workers who remove errant edges or lines that may appear on the raw globes and then paint the surfaces. The result is a globe that measures in at 18 inches in diameter, roughly 1:15,729,473 scale of the actual planet. The exaggerated raised relief is like having a 3-D digital microscope for planetary shapes. This makes the landmarks easier to learn and understand, as it provides easy visuals for orientation. People have a natural propensity for understanding 3-D shapes more easily than numbers or words. The 3-D globes appeal to both the kinetic and visual learning aspects of the brain, making it easy for people to readily memorize the landmarks and to make a mental model that they will remember for a long time.

Source record↗