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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 19 records
All sourcesNASA NTRSDOE OSTI
DOE OSTI2021

Metal film for additive metal manufacturing

A metal film for use by an additive manufacturing apparatus is described herein. The metal film has a support structure and metal voxels removably attached to the support structure by respective junctions. When a metal voxel in the metal film is impacted by an energy pulse from an energy source of the additive manufacturing apparatus, one or more junctions that attach the metal voxel to the support structure are broken, resulting in the metal voxel detaching from the metal film (at a desired location in a two-dimensional plane).

Robinson, David↗
DOE OSTI2015

Tunneling-enabled spectrally selective thermal emitter based on flat metallic films

Infrared thermal emission from metals has important energy applications in thermophotovoltaics, radiative cooling, and lighting. The emissivity of flat metal films is close to zero because the screening effect prevents metals' fluctuating currents from emitting to the far field. As a result, metal films are often used as reflecting mirrors instead of thermal emitters. Recently, nanostructured metals, such as metamaterials, have emerged as an interesting way to enhance and to spectrally control thermal emission based on plasmonic resonant effects. However, they require sophisticated lithography. Here, we proposed and experimentally demonstrated a completely different mechanism to achieve spectrally selective metallic emitters based on atunneling effect. Furthermore, this effect allows a simple flat metal film to achieve a near-unity emissivity with controlled spectral selectivity for efficient heat-to-light energy conversion.

36 MATERIALS SCIENCE↗
DOE OSTI2014

Scalable synthesis of layer-controlled WS{sub 2} and MoS{sub 2} sheets by sulfurization of thin metal films

Transition metal dichalcogenides (TMDs) have emerged as exciting 2D materials beyond graphene due to their promising applications in the field of electronics and optoelectronics. Hence, the ability to produce controllable and uniformly thick TMD sheets over a large area is of utmost important for large-scale applications. Here, a facile method of synthesizing large-area, layer-controlled WS{sub 2}, and MoS{sub 2} sheets by sulfurization of their corresponding thin metal films is reported. A metal film, which is deposited by magnetron sputtering method, can be adjusted to produce, with great control, the desired sheet thickness down to a monolayer. Various characterization techniques, such as Raman, photoluminescence, and transmission electron microscopy, were used to evaluate the grown films. The results confirmed some of the exotic properties of TMDs such as the thickness dependent band-gap transition (indirect to direct band gap) and Raman shift. Devices made directly on the as-grown film showed modest mobility, ranging from 0.005 to 0.01 cm{sup 2} V{sup −1}s{sup −1}. Our synthesis method is simple and could also be used to synthesize other TMDs.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗
NASA NTRS1984

Amorphous metallic films in silicon metallization systems

The general objective was to determine the potential of amorphous metallic thin films as a means of improving the stability of metallic contacts to a silicon substrate. The specific objective pursued was to determine the role of nitrogen in the formation and the resulting properties of amorphous thin-film diffusion barriers. Amorphous metallic films are attractive as diffusion barriers because of the low atomic diffusivity in these materials. Previous investigations revealed that in meeting this condition alone, good diffusion barriers are not necessarily obtained, because amorphous films can react with an adjacent medium (e.g., Si, Al) before they recrystallize. In the case of a silicon single-crystalline substrate, correlation exists between the temperature at which an amorphous metallic binary thin film reacts and the temperatures at which the films made of the same two metallic elements react individually. Amorphous binary films made of Zr and W were investigated. Both react with Si individually only at elevated temperatures. It was confirmed that such films react with Si only above 700 C when annealed in vacuum for 30 min. Amorphous W-N films were also investigated. They are more stable as barriers between Al and Si than polycrystalline W. Nitrogen effectively prevents the W-Al reaction that sets in at 500 C with polycrystalline W.

Nicolet, M. A.↗
NASA NTRS1984

Corrosion behavior of magnetron sputter-deposited (Mo/0.6/Ru/0.4/)82B18 and Mo82B18 amorphous metal films

Amorphous metallic films of Mo49Ru33B18 and Mo82B18 have been prepared by magnetron sputtering, and their corrosion behavior was investigated and compared with amorphous liquid-quenched Mo49Ru33B18 and crystalline Mo i acidic and basic solutions. Sputtered Mo49Ru33B18 showed lower corrosion rates compared with liquid-quenched Mo49Ru33B18, owing to the superior surface smoothness and uniformity of the former. Amorphous Mo82B18 showed low corrosion rates in both acidic and basic aqueous solutions. Comparison of the corrosion properties of Mo49Ru33B18 with Mo82B18 and Mo demonstrates the roles of the alloys' constituents. Ru significantly extends the passive region to high-anodic potentials, but, at less-anodic potentials, Mo82B18 has the lowest corrosion rate.

Williams, R. M.↗
DOE OSTI2014

Nanoparticle generation and transport resulting from femtosecond laser ablation of ultrathin metal films: Time-resolved measurements and molecular dynamics simulations

The synthesis of metal nanoparticles by ultrafast laser ablation of nanometers-thick metal films has been studied experimentally and computationally. Near-threshold backside laser ablation of 2–20 nm-thick Pt films deposited on fused silica substrates was found to produce nanoparticles with size distributions that were bimodal for the thicker films, but collapsed into a single mode distribution for the thinnest film. Time-resolved imaging of blackbody emission from the Pt nanoparticles was used to reveal the nanoparticle propagation dynamics and estimate their temperatures. The observed nanoparticle plume was compact and highly forward-directed with a well-defined collective velocity that permitted multiple rebounds with substrates to be revealed. Large-scale molecular dynamics simulations were used to understand the evolution of compressive and tensile stresses in the thicker melted liquid films that lead to their breakup and ejection of two groups of nanoparticles with different velocity and size distributions. Ultrafast laser irradiation of ultrathin (few nm) metal films avoids the splitting of the film and appears to be a method well-suited to cleanly synthesize and deposit nanoparticles from semitransparent thin film targets in highly directed beams.

77 NANOSCIENCE AND NANOTECHNOLOGY↗
DOE OSTI2018

Conduction of Metal–Thin Organic Film–Metal Junctions at Low Bias

A model for the low bias electric conductance of junctions, consisting of a thin organic film (TOF) positioned between two metallic electrodes (M), has been created. In contrast with other theoretical studies, the proposed model relies on the energy band picture of M–TOF–M systems. Theoretical analysis of the band-like transport has shown that the electronic flow between metallic electrodes can exist in M–TOF–M junctions only if injected charge carriers are able to overcome the potential barrier with the thickness-dependent height. Such an obstacle to the motion of injected charges in the TOF conduction band arises due to the bending of this band caused by carriers localized in structural traps. Two regimes of the zero bias conductance of M–TOF–M junctions have been studied theoretically for situations, where charges overcome the thickness-dependent barrier undergoing either thermally activated or tunneling transitions. Analytical expressions derived for the zero bias conduction in these two regimes enable us to specify key physical parameters controlling charge transport across the film and provide results consistent with observations. On the basis of our findings, we infer that thermally activated and tunneling conductances can be distinguished by temperature and thickness dependencies. Theoretical results obtained for the electric conductance of M–TOF–M systems in the tunneling regime are compared with those obtained for assemblies in which TOF has been replaced by a single molecule. Furthermore, distinctions between transport properties of these two systems and their similarities resulting from the present model are reported on.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗
DOE OSTI2025

Accelerating Discovery of Solid‐State Thin‐Film Metal Dealloying for 3D Nanoarchitecture Materials Design through Laser Thermal Gradient Treatment

Thin‐film solid‐state metal dealloying (thin‐film SSMD) is a promising method for fabricating nanostructures with controlled morphology and efficiency, offering advantages over conventional bulk materials processing methods for integration into practical applications. Although machine learning (ML) has facilitated the design of dealloying systems, the selection of key thermal treatment parameters for nanostructure formation remains largely unknown and dependent on experimental trial and error. To overcome this challenge, a workflow enabling high‐throughput characterization of thermal treatment parameters is demonstrated using a laser‐based thermal treatment to create temperature gradients on single thin‐film samples of Nb‐Al/Sc and Nb‐Al/Cu. This continuous thermal space enables observation of dealloying transitions and the resulting nanostructures of interest. Through synchrotron X‐ray multimodal and high‐throughput characterization, critical transitions and nanostructures can be rapidly captured and subsequently verified using electron microscopy. The key temperatures driving chemical reactions and morphological evolutions are clearly identified. While the oxidation may influence nanostructure formation during thin‐film treatment, the dealloying process at the dealloying front involves interactions solely between the dealloying elements, highlighting the availability and viability of the selected systems. Further, this approach enables efficient exploration of the dealloying process and validation of ML predictions, thereby accelerating the discovery of thin‐film SSMD systems with targeted nanostructures.

36 MATERIALS SCIENCE↗
NASA NTRS1985

Amorphous metallic films in silicon metallization systems

Diffusion barrier research was focussed on lowering the chemical reactivity of amorphous thin films on silicon. An additional area of concern is the reaction with metal overlays such as aluminum, silver, and gold. Gold was included to allow for technology transfer to gallium arsenide PV cells. Amorphous tungsten nitride films have shown much promise. Stability to annealing temperatures of 700, 800, and 550 C were achieved for overlays of silver, gold, and aluminum, respectively. The lower results for aluminum were not surprising because there is an eutectic that can form at a lower temperature. It seems that titanium and zirconium will remove the nitrogen from a tungsten nitride amorphous film and render it unstable. Other variables of research interest were substrate bias and base pressure during sputtering.

So, F.↗
NASA NTRS1981

Frictional and morphological characteristics of ion plated soft, metallic films

Ion plated metallic films in contrast to films applied by other deposition techniques offer a lower friction coefficient, longer endurance lives and exhibit a gradual increase in friction coefficient after the film has been worn off. The friction coefficients of metallic films are affected by the degree of adherence, thickness and nucleation and growth characteristics. The effective film thickness for the minimum friction coefficient was established for Au and Pb films. The nucleation and growth characteristics during ion plating lead to a fine, continuous crystalline structure, which contributes to a lower friction coefficient.

Spalvins, T.↗
NASA NTRS1981

Frictional and morphological characteristics of ion plated soft, metallic films

Ion plated metallic films in contrast to films applied by other deposition techniques offer a lower friction coefficient, longer endurance lives and exhibit a gradual increase in friction coefficient after the film has been worn off. The friction coefficients of metallic films are affected by the degree of adherence, thickness and nucleation and growth characteristics during ion plating lead to a fine, continuous crystalline structure, which contributes to a lower friction coefficient.

Spalvins, T.↗
DOE OSTI2019

Liquid-State Dewetting of Pulsed-Laser-Heated Nanoscale Metal Films and Other Geometries

Metal films of nanoscale thickness, deposited on substrates and exposed to laser heating, provide systems that involve several interesting multiphysics effects. In addition to fluid mechanical aspects associated with a free boundary setup, other relevant physical effects include phase change, thermal flow, and liquid–solid interactions. Such films are challenging to model, in particular because inertial effects may be relevant, and large contact angles require care when considering the long-wave formulation. Applications of nanoscale metal films are numerous, and the materials science community is actively pursuing more complex setups involving templated films and substrates, bimetallic films and alloys, and a variety of elemental film geometries. The goal of this review is to discuss our current understanding of thin metal film systems, while also providing an overview of the challenges in this research area, which stands at the intersection of fluid mechanics, materials science, and thermal physics.

36 MATERIALS SCIENCE↗
DOE OSTI2016

Optically Thin Metallic Films for High-Radiative-Efficiency Plasmonics

Plasmonics enables deep-subwavelength concentration of light and has become important for fundamental studies as well as real-life applications. Two major existing platforms of plasmonics are metallic nanoparticles and metallic films. Metallic nanoparticles allow efficient coupling to far field radiation, yet their synthesis typically leads to poor material quality. Metallic films offer substantially higher quality materials, but their coupling to radiation is typically jeopardized due to the large momentum mismatch with free space. We propose and theoretically investigate optically thin metallic films as an ideal platform for high-radiative-efficiency plasmonics. For far-field scattering, adding a thin high-quality metallic substrate enables a higher quality factor while maintaining the localization and tunability that the nanoparticle provides. For near-field spontaneous emission, a thin metallic substrate, of high quality or not, greatly improves the field overlap between the emitter environment and propagating surface plasmons, enabling high-Purcell (total enhancement >10 4 ), high-quantum-yield (>50%) spontaneous emission, even as the gap size vanishes (3–5 nm). The enhancement has almost spatially independent efficiency and does not suffer from quenching effects that commonly exist in previous structures.

77 NANOSCIENCE AND NANOTECHNOLOGY↗
DOE OSTI2015

Formation of continuous metallic film on quartz studied by noncontact resonant ultrasound spectroscopy

Dynamics of continuous film formation of metallic films on quartz substrates is studied using an electrodeless resonance method. Bare quartz is used as a substrate, and a metallic film is deposited on it. We use antenna transmission technique to measure the evolution of resonance frequencies and internal friction of the substrate during and after deposition, and the morphological transition between discontinuous islands and a continuous film is detected. By comparison with atomic force microscopy images, we confirm that the frequency drop and the internal-friction peak that appear during deposition indicate this transition. We also find that Pt film shows unexpected morphology change after deposition.

71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗
NASA NTRS2010

Flexible thin metal film thermal sensing system

A flexible thin metal film thermal sensing system is provided. A self-metallized polymeric film has a polymeric film region and a metal surface disposed thereon. A layer of electrically-conductive metal is deposited directly onto the self-metallized polymeric film's metal surface. Coupled to at least one of the metal surface and the layer of electrically-conductive metal is a device/system for measuring an electrical characteristic associated therewith as an indication of temperature.

Thomsen, Donald L.↗
DOE OSTI2022

Contributions to Dielectric Constant Enhancement in Thin Film Metal Insulator Metal Capacitors

Thin film metal-insulator-metal capacitors were fabricated with varying dielectric and electrode thicknesses and areas. Measurement of the dielectric properties of the capacitors consistently yielded higher than predicted capacitance values, which prompted the exploration of three factors that could enhance the capacitance. Modeling of the fringing capacitance and field enhancement due to the capacitor geometry, both yield capacitance gains, albeit insufficient to fully explain the observed behavior. The possible role of changes in polarizability of the dielectric film constituents, due to the amorphous nature of the films was also evaluated, but the results of the investigation of this contribution were inconclusive. Herein, the role of accumulation/depletion layers on capacitance enhancement was also analyzed. For capacitors fabricated with thinner dielectrics, the presence of these layers can effectively reduce the dielectric thickness, resulting in contributions to capacitance that are significant. The calculations completed suggest these contributions may be more important than fringing field contributions. Additional studies of these mechanisms are in progress.

36 MATERIALS SCIENCE↗