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At least 19 records

Assessment of the present NASA optical metrology capabilities and recommendations for establishing an in-house NASA Optical Metrology Group

An investigation into when it was first recognized that there was a deficiency in NASA optical metrology oversight capability, why this deficiency existed unnoticed for so long, and a proposal for correcting the problem is presented. It is explained why this optical metrology oversight is so critical to program success and at the same time, why it is difficult to establish due to the nature of the technology. The solution proposed is the establishment of an Optics Metrology Group within the NASA/MSFC Optics Branch with a line of authority from NASA S & MA.

Parks, Robert E.↗

Optical Metrology for the Segmented Optics on the Constellation-X Spectroscopy X-Ray Telescope

We present the metrology requirements and metrology implementation necessary to prove out the reflector technology for the Constellation X(C-X) spectroscopy X-ray telescope (SXT). This segmented, 1.6m diameter highly nested Wolter-1 telescope presents many metrology and alignment challenges. In particular, these mirrors have a stringent imaging error budget as compared to their intrinsic stiffness; This is required for Constellation-X to have sufficient effective area with the weight requirement. This has implications for the metrology that can be used. A variety of contract and noncontact optical profiling and interferometric methods are combined to test the formed glass substrates before replication and the replicated reflector segments.The reflectors are tested both stand-alone and in-situ in an alignment tower.Some of these methods have not been used on prior X-ray telescopes and some are feasible only because of the segmented approach used on the SXT. Methods discussed include high precision coordinate measurement machines using very low force or optical probe axial interferometric profiling azimuthal circularity profiling and use of advanced null optics such as conical computer generated hologram (CGHs).

Content, David↗

MSFC Optical Metrology: A National Resource

A national need exists for Large Diameter Optical Metrology Services. These services include the manufacture, testing, and assurance of precision and control necessary to assure the success of large optical projects. "Best Practices" are often relied on for manufacture and quality controls while optical projects are increasingly more demanding and complex. Marshall Space Flight Center (MSFC) has acquired unique optical measurement, testing and metrology capabilities through active participation in a wide variety of NASA optical programs. An overview of existing optical facilities and metrology capabilities is given with emphasis on use by other optical projects. Cost avoidance and project success is stressed through use of existing MSFC facilities and capabilities for measurement and metrology controls. Current issues in large diameter optical metrology are briefly reviewed. The need for a consistent and long duration Large Diameter Optical Metrology Service Group is presented with emphasis on the establishment of a National Large Diameter Optical Standards Laboratory. Proposals are made to develop MSFC optical standards and metrology capabilities as the primary national standards resource, providing access to MSFC Optical Core Competencies for manufacturers and researchers. Plans are presented for the development of a national lending library of precision optical standards with emphasis on cost avoidance while improving measurement assurance.

Burdine, Robert↗

Optical metrology at the NSLS-II

Rapid progress in synchrotron optics performance places a high demand on optical characterization techniques used to validate surface parameters prior to installation of the X-ray optics. It is now necessary to characterize optical surface figure and slope errors and roughness on meter-long optics over spatial frequencies as short as 0.1 {micro}m The new NSLS-II Optical Metrology Laboratory (OML) includes instruments for measuring: (1) long spatial frequency figure errors with a ZYGO MST Fizeau-type 4* interferometer, capable of 0.1 nm sensitivity, (2) mid spatial frequencies with an upgraded ZYGO NewView 6300 white light interferometric microscope, capable of reaching 0.1 nm accuracy at a lateral resolution of 1 {micro}m, (3) high frequency roughness with an AFM (Nanosurf AG) with linearity better than 0.2% over the 80 {micro}m measurement area and sensitivity approaching 0.01 nm, and (4) slope errors with a long trace profiler currently under development that will be able to reach 50 nrad slope error accuracy. At present, the OML supports the NSLS-II R&D efforts and provides ongoing testing for NSLS optics. Future plans include the construction of a specialized metrology beamline for at-wavelength metrology, radiometry, in situ surface figuring, crystal optics characterization, and instrumentation development.

43 PARTICLE ACCELERATORS↗

Correlation approach for quality assurance of additive manufactured parts based on optical metrology

Surface topography and surface finish are two significant factors for evaluating the quality of products in additive manufacturing (AM). AM parts are fabricated layer by layer, which is quite different from traditional formative or subtractive methods. Despite rapid progress in additive manufacturing and associated optical metrology for quality control and in-situ monitoring, limited research has been conducted to investigate the reliability of 3D surface measurement data. The surface topologies scanned by multiple optical systems demonstrated significant differences due to varying sampling mechanisms, resolutions, system noises, etc. The 3D datasets should be trustworthy in order to extract parameters for quality assurance or feedback control from 3D surface measurements. In this paper, we set up new standards to evaluate the reliability of 3D surface measurement data and analyze the variation in the topographical profile. In this study, two non-contact optical methods based on Focus Variation Microscopy (FVM) and Structured Light System (SLS) were adopted to measure the surface topography of the target components. The two optical metrology systems generated two entirely different point cloud datasets. Statistical methods were applied to test the difference between the data obtained from the two systems. By using a data analytics approach for comparison, it was found that the surface roughness estimated from the point cloud data sets of FVM and SLS has no significant difference, though the point cloud data sets were completely different. This paper provides standard validation approach to evaluate the plausibility of metrology data from in-situ real-time surface analysis for process planning of AM.

36 MATERIALS SCIENCE↗

Absolute optical metrology : nanometers to kilometers

We provide and overview of the developments in the field of high-accuracy absolute optical metrology with emphasis on space-based applications. Specific work on the Modulation Sideband Technology for Absolute Ranging (MSTAR) sensor is described along with novel applications of the sensor.

optical metrology↗

Coupling characterization and noise studies of the optical metrology system onboard the LISA Pathfinder mission

We describe the first investigations of the complete engineering model of the optical metrology system (OMS), a key subsystem of the LISA Pathfinder science mission to space. The latter itself is a technological precursor mission to LISA, a spaceborne gravitational wave detector. At its core, the OMS consists of four heterodyne Mach-Zehnder interferometers, a highly stable laser with an external modulator, and a phase meter. It is designed to monitor and track the longitudinal motion and attitude of two floating test masses in the optical reference frame with (relative) precision in the picometer and nanorad range, respectively. We analyze sensor signal correlations and determine a physical sensor noise limit. The coupling parameters between motional degrees of freedom and interferometer signals are analytically derived and compared to measurements. We also measure adverse cross-coupling effects originating from system imperfections and limitations and describe algorithmic mitigation techniques to overcome some of them. Their impact on system performance is analyzed within the context of the Pathfinder mission.

71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗

X-ray optics metrology limited by random noise, instrumental drifts, and systematic errors

Continuous, large-scale efforts to improve and develop third- and forth-generation synchrotron radiation light sources for unprecedented high-brightness, low emittance, and coherent x-ray beams demand diffracting and reflecting x-ray optics suitable for micro- and nano-focusing, brightness preservation, and super high resolution. One of the major impediments for development of x-ray optics with the required beamline performance comes from the inadequate present level of optical and at-wavelength metrology and insufficient integration of the metrology into the fabrication process and into beamlines. Based on our experience at the ALS Optical Metrology Laboratory, we review the experimental methods and techniques that allow us to mitigate significant optical metrology problems related to random, systematic, and drift errors with super-high-quality x-ray optics. Measurement errors below 0.2 mu rad have become routine. We present recent results from the ALS of temperature stabilized nano-focusing optics and dedicated at-wavelength metrology. The international effort to develop a next generation Optical Slope Measuring System (OSMS) to address these problems is also discussed. Finally, we analyze the remaining obstacles to further improvement of beamline x-ray optics and dedicated metrology, and highlight the ways we see to overcome the problems.

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗

Optical metrology for testing an all-composite 2-meter diameter mirror

The Herschel Space Observatory (formerly known as FIRST) consists of a 3.5 m space telescope designed for use in the long IR and sub-milimeter wavebands. To demonstrate the viability of a carbon fiber composite telescope for this application, Composite Optics Incorporated (COI) manufactured a fast (f/1), large (2 m), lightweight (10.1 kg/m squared) demonstration mirror. A key challenge in demonstrating the performance of this novel mirror was to characterize the surface accuracy at cryogenic (70 K) temperatures. A wide variety of optical metrology techniques were investigated and a brief survey of empirical test results and limitations of the various techniques will be presented in this paper. Two complementary infrared (IR)techniques operating at a wavelength of 10.6 microns were chosen for further development: (1) IR Twyman-Green Phase Shifting Interferometry (IR PSI) and (2) IR Shack-Hartmann (IR SH) Wavefront Sensing. Innovative design modifications made to an existing IR PSI to achieve high-resolution, scannable, infrared measurements of the composite mirror are described. The modified interferometer was capable of measuring surface gradients larger than 350 microradians. The design and results of measurements made with a custom-built IR SH Wavefrong Sensor operating at 10.6 microns are also presented. A compact experimental setup permitting simultaneous operation of both the IR PSI and IR SH tools is shown. The advantages and the limitations of the two key IR metrology tools are discussed.

IR metrology phase shifting interferometry Shack-H↗

Radius of Curvature Measurements: An Independent Look at Accuracy Using Novel Optical Metrology

The AMSD (Advanced Mirror System Demonstrator) program mirror specifications include the ability to manufacture the mirror to a radius of curvature of 10 m +/- 1 mm and to control its radius at 30K to the same specification. Therefore, it is necessary for the Government Team to be able to measure mirror radius of curvature to an accuracy of better than 0.5 mm. This presentation discusses a novel optical metrology system for measuring radius of curvature.

Taylor, Bryon↗

Optical Metrology for the Filter Set for the Hubble Space Telescope (HST) Advanced Camera for Surveys (ACS)

The Hubble Space Telescope (HST) Advanced Camera for Surveys (ACS) will employ a wide variety of spectral filtration components including narrow band, medium band, wide band, and far ultraviolet (FUV) long pass filters, spatially- variable filters (ramp filters), VIS/IR polarizers, NUV polarizers, FUV prisms, and a grism. These components are spread across ACS's Wide Field, High Resolution, and Solar Blind channels which provide diffraction-limited imaging of astronomical targets using aberration-correcting optics which remove most aberrations from HST's Optical Telescope Assembly (OTA). In order for ACS to be truly advanced, these filters must push the state-of-the-art in performance in a number of key areas at the same time. Important requirements which these filters must meet include outstanding transmitted wavefront, high transmittance, uniform transmittance across each filter, spectrally structure-free bandpasses, exceptionally high out of band rejection, and a high degree of parfocality. These constitute a very stringent set of requirements indeed, especially for filters which are up to 90 mm in diameter. The development of optical metrology stations used to demonstrate that each ACS filter will meet its design specifications is discussed. Of particular note are specially-designed spectral transmissometers and interferometers.

Leviton, Douglas B.↗

Rules for Optical Metrology

Based on 30 years of optical testing experience, I have defined seven guiding principles for optical testing. This paper introduces these rules and discusses examples of their application.

Stahl, H. Philip↗

Dual-Image Color Normalization to Enable High-Performance Concentrating Solar Optical Metrology

Concentrating Solar Power (CSP) requires precision mirrors, and these in turn require metrology systems to measure their optical slope. In this project we studied a color-based approach to the correspondence problem, which is the association of points on an optical target with their corresponding points seen in a reflection. This is a core problem in deflectometry-based metrology, and a color solution would enable important new capabilities. We modeled color as a vector in the [R,G,B] space measured by a digital camera, and explored a dual-image approach to compensate for inevitable changes in illumination color. Through a series of experiments including color target design and dual-image setups both indoors and outdoors, we collected reference/measurement image pairs for a variety of configurations and light conditions. We then analyzed the resulting image pairs by selecting example [R,G,B] pixels in the reference image, and seeking matching [R,G,B] pixels in the measurement image. Modulating a tolerance threshold enabled us to assess both match reliability and match ambiguity, and for some configurations, orthorectification enabled us to assess match accuracy. Using direct-direct imaging, we demonstrated color correspondence achieving average match accuracy values of 0.004 h, where h is the height of the color pattern. We found that wide-area two-dimensional and linear one-dimensional color targets outperformed hybrid linear/lateral gradient targets in the cases studied. Introducing a mirror degraded performance under our current techniques, and we did not have time to evaluate whether matches could be reliably achieved despite varying light conditions. Nonetheless, our results thus far are promising.

14 SOLAR ENERGY↗

EUV and Hard X-ray Hartmann Wavefront Sensing for Optical Metrology, Alignment and Phase Imaging

For more than 15 years, Imagine Optic have developed Extreme Ultra Violet (EUV) and X-ray Hartmann wavefront sensors for metrology and imaging applications. These sensors are compatible with a wide range of X-ray sources: from synchrotrons, Free Electron Lasers, laser-driven betatron and plasma-based EUV lasers to High Harmonic Generation. In this paper, we first describe the principle of a Hartmann sensor and give some key parameters to design a high-performance sensor. We also present different applications from metrology (for manual or automatic alignment of optics), to soft X-ray source optimization and X-ray imaging.

20 metrology↗