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Results for “PLASMA POTENTIAL”

Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 19 records
All sourcesNASA NTRSDOE OSTI
DOE OSTI2020

Experimental studies of the difference between plasma potentials measured by Langmuir probes and emissive probes in presheaths

The plasma potential measured by cylindrical and planar Langmuir probes has been shown to differ from the plasma potential measured by emissive probes in the neighborhood of the presheath near a negatively biased electrode immersed in a weakly collisional low temperature argon plasma. There are two principal results demonstrated in this paper. First, while it is well known that Langmuir probes cannot reliably measure plasma potentials inside of sheaths, results presented here demonstrate that the problem persists in presheaths, the quasineutral plasma bordering sheaths. It is known that emissive probes analyzed in the limit of zero emission accurately measure the plasma potential in the sheath. It is now clear that they are the only known electrostatic probe technique able to measure the plasma potential accurately throughout the presheath. Second, it is shown that the difference between potential measurements made by Langmuir probes and emissive probes in the body of the plasma, farther than a presheath distance from the boundary, is not proportional to T e , as has been previously claimed.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
DOE OSTI2026

Direct Measurement of ICRF-Enhanced Plasma Potentials on WEST Using Reciprocating Emissive Probes

An extensive documentation of ICRF-enhanced plasma potentials has been conducted over two experimental campaigns on the WEST tokamak using reciprocating emissive probes magnetically connected to two ICRF antennas. The collected data spans a wide range of antenna electrical settings (coupled power, toroidal phasing, left–right power balance) and plasma parameters (density at the antenna limiter above and below the lower hybrid resonance, plasma current, minority fraction). By scanning the edge safety factor across multiple probe plunges, the magnetic connection between the probe and the antenna varied, enabling the construction of a 2D map of the plasma and floating potentials around an active ICRF antenna. This dataset will be used to validate RF simulation tools equipped with the sheath boundary condition and used to predict RF rectified potentials and ICRF-induced impurity sputtering in future machines. This paper presents the diagnostic and some initial measurements, while the rest will be reported elsewhere.

Diab, Raymond [Massachusetts Inst. of Technology (↗
DOE OSTI2024

Plasma potential shaping using end-electrodes in the Large Plasma Device

We perform experiments in the Large Plasma Device at the University of California, Los Angeles, studying how different end-electrode biasing schemes modify the radial potential profile in the machine. We impose biasing profiles of different polarities and gradient signs on a set of five concentric electrodes placed 12 m downstream from the plasma source. We find that imposing concave-down profiles (negative potential radial gradient) on the electrodes creates radial potential profiles halfway up the plasma column that are comparable to those imposed on the electrodes and a few electron temperature in height, regardless of the biasing polarity. On the other hand, imposing concave-up profiles (positive potential radial gradient) leads to non-monotonic radial potential profiles. This observation can be explained by the current drawn through the electrodes and the parallel plasma resistivity, highlighting their important role in controlling the rotation of plasma. Concave-down plasma potential profiles, obtained by drawing electrons on the axis, are predicted to drive azimuthal drift velocities that can approach significant fractions of the ion sound speed in the central region of the plasma column.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
DOE OSTI2025

Comparative Mechanical Properties Analysis of Triple Ion-Beam Irradiated and Neutron Irradiated Potential Plasma Facing Components

Abstract Several classes of materials are being proposed for use in fusion reactors including oxide dispersion strengthened (ODS) and reduced activation ferritic-martensitic (RAF/M) steels to withstand the severe and harsh conditions. In this work, the mechanical properties of a Fe-16Cr-4Al-2W-0.3Ti-0.3Y 2 O 3 (K3) (ODS) ferritic steel and a Fe-8.9Cr-1.1W-0.47Mn-0.2V-0.14Ta-0.11C (Eurofer 97) (RAF/M) steel) after triple ion beam irradiation were locally evaluated utilizing in-situ micro-pillar compression tests, and continuous stiffness/quasi-static nanoindentation. No change in mechanical properties was observed in the K3 ODS steel. However, the Eurofer 97 RAF/M steel exhibited radiation-induced effects via increases in yield strength. Micro-pillar techniques were expanded to neutron-irradiated materials via an in-situ testing technique employing lift-out methods on Fe-14Cr-0.9Ti-0.3Mo-0.25Y 2 O 3 (MA957) ODS ferritic steel. Both the non-irradiated and irradiated compressive yield stresses of the MA 957 micro-pillars were in good agreement with bulk yield stress values reported in the literature, suggesting that the lift-out micro-pillar compression testing technique is a promising method. The demonstration of these techniques on ion beam and neutron irradiated ODS steels and ion beam RAF/M steels gives information to inform models of the material degradation during use in a fusion device.

alloys↗
DOE OSTI2021

Scaling of silicon nanoparticle growth in low temperature flowing plasmas

Low temperature plasmas are an emerging method to synthesize high quality nanoparticles (NPs). An established and successful technique to produce NPs is using a capacitively coupled plasma (CCP) in cylindrical geometry. Although a robust synthesis technique, optimizing or specifying NP properties using CCPs, is challenging. In this paper, results from a computational investigation for the growth of silicon NPs in flowing inductively coupled plasmas (ICPs) using Ar/SiH 4 gas mixtures of up to a few Torr are discussed. ICPs produce more locally constrained and quiescent plasma potentials. These positive plasma potentials produce an electrostatic trap for negatively charged NPs, which can significantly extend the residence time of NPs in the plasma, which in turn provides a controllable period for particle growth. The computational platforms used in this study consist of a two-dimensional plasma hydrodynamics model, a three-dimensional nanoparticle growth and trajectory tracking model, and a molecular dynamics simulation for deriving reactive sticking coefficients of silane radicals on Si NPs. Trends for the nanoparticle growth as a function of SiH 4 inlet fraction, gas residence time, energy deposition per particle, pressure, and reactor diameter are discussed. The general path for particle synthesis is the trapping of small NPs in the positive electrostatic potential, followed by entrainment in the gas flow upon reaching a critical particle size. Optimizing or controlling NP synthesis then depends on the spatial distribution of plasma potential, the density of growth species, and the relative time that particles spend in the electrostatic trap and flowing through higher densities of growth species upon leaving the trap.

71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗
DOE OSTI2022

Time-resolved electron energy distribution functions at the substrate during a HiPIMS discharge with cathode voltage reversal

Abstract The time-dependent plasma properties of a high-power impulse magnetron sputtering plasma are investigated which include a positive ‘kick’ pulse on the sputtering target 2 μ s after the main negative pulse, this reversing the voltage on the cathode. At a substrate 15 cm distant from the magnetron, the time-dependent electron energy distribution function (EEDF), plasma potential, potential commute time and plasma diffusion properties are measured using a single Langmuir probe. Results show that the positive pulse on the target expels plasma and raises the plasma potential across the chamber on the order of 1 to 2 μ s, which is the time scale of the electron diffusion. The EEDF at the substrate fits a Druyvesteyn distribution during the main negative pulse rising slightly in average energy over time. The distribution is still Druyvesteyn and at the very start of the positive pulse, but then loses the higher energy electrons and drops in average electron energy as the positive pulse progresses. A Boltzmann equation solver, BOLSIG+, was used to predict the EEDF at the substrate during the positive pulse and it agrees best with the measurements assuming a value of 0.2 Td for the E / N (electric field/gas number density).

Physics↗
DOE OSTI2025

Mitigation of ICRF—edge plasma interaction in Alcator C-Mod

The parasitic interaction between ion cyclotron range of frequencies (ICRF) waves and the edge plasma has long limited high-power ICRF utilization in magnetically confined fusion plasmas. In this paper, we report on the successful mitigation of this interaction by power tapering a four-strap field-aligned (FA) antenna in the Alcator C-Mod tokamak. With the antenna operated in dipole phasing ($0\pi0\pi$), the ratio of the power coupled by the central two straps ($P_\mathrm {cent}$) to the power coupled by the outer two straps was varied at fixed total coupled ICRF power ($P_\mathrm {tot}$). With $P_\mathrm {cent}$/$P_\mathrm {tot} \approx 0.8-0.9$, no enhancement of the plasma potential was measured despite 1 MW of coupled ICRF power. When the antenna is powered, energy deposition increases on its four corners and on neighboring limiter tiles magnetically connected to some of those corners. The energy deposited on the antenna and limiter is minimized together with near-field plasma potentials. Additionally, we show that deviation from $P_\mathrm {cent}$/$P_\mathrm {tot} \approx 0.8$ enhances wave-plasma interactions in places not magnetically connected to the antenna. These far-field effects are correlated with changes in the antenna spectrum. Hence, on C-Mod, near-field and far-field interactions were minimized for about the same range of $P_\mathrm {cent}$/$P_\mathrm {tot}$. Optimal power tapering was also found to improve ICRF heating efficiency and facilitate H-mode access. Finally, we show that the heat flux pattern on the toroidally aligned antennas reverses with the direction of the RF-induced E×B flow in front of the antenna, a correlation not observed for the FA antenna. We argue that the RF-induced E×B flow, which carries high-density plasma from the near-SOL, is aligned with the FA antenna and does not intercept its corners, where the plasma potential is large. This could explain the previously reported smaller impurity generation by the FA antenna (Wukitch et al 2013 Phys. Plasmas 20 056117).

Alcator C-Mod↗
DOE OSTI2025

Grid-Assisted Direct-Current Magnetron Sputtering of Titanium: Plasma Discharge Diagnostics

Grid-assisted magnetron sputtering is attractive for the deposition of ultrathick Be coatings in inertial confinement fusion (ICF) applications because it offers improved control over the plasma. Here, we investigate the plasma discharge characteristics of grid-assisted direct current magnetron sputtering with Ti as a surrogate sputter target material instead of Be. We map the magnetic field of our magnetron source assembly, study the current-voltage characteristics of both the source and the substrate, and measure the energy distributions of ions bombarding the film surface during growth. The results reveal a slightly asymmetric magnetic field of the magnetron source array and strong dependencies of the plasma discharge characteristics on both the grid and the substrate voltages. Positive grid voltage increases both target and substrate currents, increases the plasma potential, and broadens the energy distributions of ions bombarding the substrate. Grid biasing effects on the plasma discharge characteristics and substrate current can be attributed to corresponding changes to the plasma potential, while substrate biasing effects are more complex and nonlinear. Furthermore, these results demonstrate that grid-assisted deposition offers additional flexibility in controlling the deposition process for tuning properties of ultrathick films for ICF applications.

ICF targets↗
DOE OSTI2020

Evidence for electron energization accompanying spontaneous formation of ion acceleration regions in expanding plasmas

We report experiments conducted in an expanding argon plasma generated in the inductive mode of a helicon source in the Hot hELIcon eXperiment–Large Experiment on Instabilities and Anisotropies facility. As the neutral gas pressure increases, the supersonic ion acceleration weakens. Increasing neutral pressure also alters the radial profile of electron temperature, density, and plasma potential upstream of the plasma expansion region. Langmuir probe measurements of the electron energy probability function (EEPF) show that heating of electrons at the plasma edge by RF fields diminishes with increasing gas pressure, yielding a plasma with a centrally peaked electron temperature, and flat potential profiles at higher neutral pressures. For neutral pressures at which ion acceleration regions develop in the expanding plasma plume, EEPFs reveal electrons with two temperature components.

71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗
DOE OSTI2022

Plasma parameters and the reduction potential at a plasma-liquid interface

We report nonthermal plasmas in contact with liquids have been shown to generate a variety of reactive species capable of initiating reduction–oxidation (redox) reactions at the electrochemically active plasma–liquid interface. In conventional electrochemical cells, selective redox chemistry is achieved by controlling the reduction potential at the solid electrode–electrolyte interface by applying a bias via an external circuit. In the case of plasma–liquid systems, an analogous means of tuning the reduction potential near the interface has not clearly been identified. When treated as a floating surface, the liquid is expected to adopt a net negative charge to balance the flux of hot electrons and relatively cold positive ions. The reduction potential near the plasma–liquid interface is hypothesized to be proportional to the floating potential, which can be approximated using an analytical model provided the plasma parameters are known. Herein, we present a framework for correlating the electron density and electron temperature of a noble gas plasma jet to the reduction potential near the plasma–liquid interface. The plasma parameters were acquired for an argon atmospheric plasma jet in contact with an aqueous solution by means of laser Thomson scattering. The reduction potential was determined using identical reference electrodes to measure the potential difference between the plasma–liquid interface and bulk solution. Interestingly, the measured reduction potentials near the plasma–liquid interface were found to be in good agreement with the model-predicted values determined using the plasma parameters obtained from the Thomson scattering experiments.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
DOE OSTI2021

The Digital Mirror Langmuir Probe: Field Programmable Gate Array Implementation of Real-Time Langmuir Probe Biasing

High bandwidth, high spatial resolution measurements of electron temperature, density and plasma potential are valuable for resolving turbulence in the boundary plasma of tokamaks. While conventional Langmuir probes can provide such measurements either their temporal or spatial resolution is limited: the former by the sweep rate necessary for obtaining I-V characteristics and the latter by the need to use multiple electrodes, as is the case in triple and double probe configurations. The Mirror Langmuir Probe (MLP) bias technique overcomes these limitations by rapidly switching the voltage on a single electrode cycling between three bias states, each dynamically optimised for the local plasma conditions. The MLP system on Alcator C-Mod used analog circuitry to perform this function, measuring Te, VF, and Isat at 1.1 MSPS. Recently, a new prototype digital MLP controller has been implemented on a Red Pitaya Field Programmable Gate Array (FPGA) board which reproduces the functionality of the original controller and performs all data acquisition. There is also the potential to provide the plasma parameters externally for use with feedback control systems. The use of FPGA technology means the system is readily customisable at a fraction of the development time and implementation cost. A second Red Pitaya was used to test the MLP by simulating the current response of a physical probe using C-Mod experimental measurements. This project is available as a git repository to facilitate extensibility (e.g. real-time control outputs, more voltage states) and scalability through collaboration.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
DOE OSTI2024

Synergistic effects of W–Ta alloys exposed to various ELM-like fusion events

Abstract Recently tungsten alloys have shown capabilities in suppressing morphological changes when exposed to harsh fusion conditions. Morphological changes due to He + and D + ions at high temperatures (1000–2000 K) can lead to easier erosion and sputtering of tungten (W) particles towards quenching the fusion plasma. This study investigated W–3Ta alloy as potential plasma facing materials (PFMs) exposed to different edge-localized mode (ELM)-like energies and ion loadings. Performance of W–3Ta has been tested as a function of ELM-like energies (0.6–1.5 GW m −2 ) and varying He + and D + ion concentrations (100% He + , 50% He + :50% D + ,10% He + :90% D + (similar ELM-like reactor condition), and 100% D + ions). Early-stage fuzz formation and surface pores were observed during 100% He + ion irradiation and mixed ion loadings but not observed during 100% D + ion loadings. Pores decreased in quantity and increased in size with increasing transient heat loading. Grain boundaries acted as trapping sites of helium and deuterium atoms during dual beam ion irradiations, as observed through increased pore size along the grain boundary. Qualitative erosion estimates were measured using witness plates. Increased erosion was observed with increasing D + ion concentration, which is attributed to D supersaturation in the near surface region affecting thermal and mechanical properties. More erosion was observed for W–3Ta samples compared to pure W, evident through large (>10 µ m) cracks on the surface, and an increase in W metal x-ray photoelectron spectroscopy peaks under similar loading conditions. The slight enhancement in erosion is attributed to the slightly decreased thermal properties, ∼10% thermal diffusivity drop, of W–3Ta at high temperatures. The damage threshold was impacted by ion loading, where distinct cracking was observed for 100% He + at a lower heat loading. This matrix study using reactor-like loading supports the need for extensive studies on future W alloy PFMs before selecting one as an alternative.

Physics↗
DOE OSTI2023

Particle-in-cell modeling of electron beam generated plasma

Plasmas generated using energetic electron beams are well known for their low electron temperature (T e ) and plasma potential, which makes them attractive for atomic-precision plasma processing applications such as atomic layer etch and deposition. A 2-dimensional particle-in-cell model for an electron beam-generated plasma in argon confined by a constant applied magnetic field is described here in this article. Plasma production primarily occurs in the path of the beam electrons in the center of the chamber. The resulting plasma spreads out in the chamber through non-ambipolar diffusion with a short-circuiting effect allowing unequal electron and ion fluxes to different regions of the bounding conductive chamber walls. The cross-field transport of the electrons (and thus the steady-state characteristics of the plasma) are strongly impacted by the magnetic field. T e is anisotropic in the electron beam region, but low and isotropic away from the plasma production zone. The plasma density increases and the plasma becomes more confined near the region of production when the magnetic field strengthens. The magnetic field reduces both electron physical and energy transport perpendicular to the magnetic field. T e is uniform along the magnetic field lines and slowly decreases perpendicular to it. Electrons are less energetic in the sheath regions where the sheath electric field repels and confines the low-energy electrons from the bulk plasma. Even though electron and ion densities are similar in the bulk plasma due to quasi-neutrality, electron and ion fluxes on the grounded chamber walls are unequal at most locations. Electron confinement by the magnetic field weakens with increasing pressure, and the plasma spread out farther from the electron beam region.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
DOE OSTI2020

Collisionless adiabatic afterglow

In this work, we study, by numerical and analytical means, the evolution of a collisionless plasma initiated between absorbing walls. The ensuing flow is described by rarefaction waves that travel inward from the boundaries, interact, and eventually vanish after crossing through, leading up to the asymptotic stage of the decay. Particle simulations indicate that the kinetic evolution strongly resembles one found in isentropic gas dynamics. Namely, a very gradual density profile forms in the expanding central region where the rarefaction waves interact, with an accompanying linear velocity profile. Asymptotically, the density falls off as 1/t. The density and the flux at the boundary show little variation over the period when rarefaction waves still exist. Plasma potential, on the other hand, drops quite rapidly (on the underlying ion-acoustic timescale) to less than initial electron temperature Te when over 70% of the particles still remain in the system. This is due to electron kinetics being governed by conservation of adiabatic invariant in a slowly varying potential well. Analytical model of the velocity distribution is presented to explain the simulations. The results have implications for afterglow plasmas used in material processing and also for ion-extraction devices. One property of potential interest is good uniformity of the decaying plasma that occurs after approximately one ion-acoustic time.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
DOE OSTI2020

Power matching to pulsed inductively coupled plasmas

Matching of power delivery to nonlinear loads in plasma processing is a continuing challenge. Plasma reactors used in microelectronics fabrication are increasingly multi-frequency and/or pulsed, producing a non-linear and, in many cases, non-steady state electrical termination that can complicate efficient power coupling to the plasma. This is particularly the case for pulsed inductively coupled plasmas where the impedance of the plasma can significantly change during the start-up-transient and undergo an E–H (capacitive-to-inductive) transition. In this paper, we discuss the results from a computational investigation of the dynamics of power matching to pulsed inductively coupled plasmas (Ar/Cl 2 mixtures of tens of mTorr pressure) using fixed component impedance matching networks and their consequences on plasma properties. In this investigation, we used set-point matching where the components of the matching network provide a best-case impedance match (relative to the characteristic impedance of the power supply) at a chosen time during the pulsed cycle. Matching impedance early during the pulse enables power to feed the E-mode, thereby emphasizing capacitive coupling and large excursions in the plasma potential. This early power coupling enables a more rapid ramp-up in plasma density while being mismatched during the H-mode later in the pulse. The early match also produces more energetic ion bombardment of surfaces. Matching late in the pulse diminishes power dissipated in the E-mode at the cost of also reducing the rate of increase in plasma density.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗