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15 records
All sourcesNASA NTRSDOE OSTI
DOE OSTI2019

Two-dimensional stitching interferometry for self-calibration of high-order additive systematic errors

Stitching interferometry is performed by collecting interferometric data from overlapped sub-apertures and stitching these data together to provide a full surface map. The propagation of the systematic error in the measured subset data is one of the main error sources in stitching interferometry for accurate reconstruction of the surface topography. In this work, we propose, using the redundancy of the captured subset data, two types of two-dimensional (2D) self-calibration stitching algorithms to overcome this issue by in situ estimating the repeatable high-order additive systematic errors, especially for the application of measuring X-ray mirrors. The first algorithm, called CS short for “Calibrate, and then Stitch”, calibrates the high-order terms of the reference by minimizing the de-tilted discrepancies of the overlapped subsets and then stitches the reference-subtracted subsets. The second algorithm, called SC short for “Stitch, and then Calibrate”, stitches a temporarily result and then calibrates the reference from the de-tilted discrepancies of the measured subsets and the temporarily stitched result. In the implementation of 2D scans in $x$- and y -directions, step randomization is introduced to generate nonuniformly spaced subsets which can diminish the periodic stitching errors commonly observed in evenly spaced subsets. The regularization on low-order terms enables a highly flexible option to add the curvature and twist acquired by another system. Both numerical simulations and experiments are carried out to verify the proposed method. All the results indicate that 2D high-order repeatable additive systematic errors can be retrieved from the 2D redundant overlapped data in stitching interferometry.

42 ENGINEERING↗
DOE OSTI2017

One-dimensional stitching interferometry assisted by a triple-beam interferometer

In this work, we proposed for stitching interferometry to use a triple-beam interferometer to measure both the distance and the tilt for all sub-apertures before the stitching process. The relative piston between two neighboring sub-apertures is then calculated by using the data in the overlapping area. Comparisons are made between our method, and the classical least-squares principle stitching method. Our method can improve the accuracy and repeatability of the classical stitching method when a large number of sub-aperture topographies are taken into account. Our simulations and experiments on flat and spherical mirrors indicate that our proposed method can decrease the influence of the interferometer error from the stitched result. The comparison of stitching system with Fizeau interferometry data is about 2 nm root mean squares and the repeatability is within ± 2.5 nm peak to valley.

47 OTHER INSTRUMENTATION↗
DOE OSTI2019

Stitching interferometry for synchrotron mirror metrology at National Synchrotron Light Source II (NSLS-II)

With the fast development of diffraction-limited storage rings and free electron lasers, the requirement for ultimate quality X-ray mirror is getting higher and the mirror surface needs to approach the sub-nm root mean square height specifications. Here, these ultimate specifications challenge the X-ray mirror metrology community. In this work, we present our developed dedicated stitching metrology platform for X-ray mirror metrology. Various stitching methods with different stitching parameters are investigated in our stitching interferometric system. Some experimental results are given to demonstrate its validity and performance. According to the measurement results, the repeatability of measuring a flat mirror in the software stitching mode is at 0.1 nm RMS level. In relative angle determinable stitching mode when measuring a curved mirror with its radius of curvature varying from 50 m to 175 m, the repeatability is around 1 nm RMS.

42 ENGINEERING↗
DOE OSTI2016

Stitching interferometry for ellipsoidal x-ray mirrors

Ellipsoidal mirrors, which can efficiently produce a two-dimensional focusing beam with a single mirror, are superior x-ray focusing optics, especially when compared to elliptical-cylinder mirrors in the Kirkpatrick–Baez geometry. However, nano-focusing ellipsoidal mirrors are not commonly used for x-ray optics because achieving the accuracy required for the surface metrology of nano-focusing ellipsoidal mirrors is difficult due to their small radius of curvature along the short ellipsoidal axis. Here, we developed a surface metrology system for nano-focusing ellipsoidal mirrors using stitching interferometric techniques. The developed system simultaneously measures sub-aperture shapes with a microscopic interferometer and the tilt angles of the sub-aperture shapes with a large Fizeau interferometer. After correcting the systematic errors included in the sub-aperture shapes, the entire mirror shape is calculated by stitching the sub-aperture shapes based on the obtained relative angles between partially overlapped sub-apertures. In this study, we developed correction methods for systematic errors in sub-aperture shapes that originated from off-axis aberrations produced in the optics of the microscopic interferometer. The systematic errors on an ellipsoidal mirror were estimated by measuring a series of tilted plane substrates and the ellipsoidal substrate. From measurements of an ellipsoidal mirror with a 3.6-mm radius of curvature at the mirror center, we obtained a measurement repeatability of 0.51 nm (root-mean-square) in an assessment area of 0.5 mm × 99.18 mm. This value satisfies the requirements for surface metrology of nano-focusing x-ray mirrors. Thus, the developed metrology system should be applicable for fabricating nano-focusing ellipsoidal mirrors.

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗
DOE OSTI2016

Stitching methods at the European Synchrotron Radiation Facility (ESRF)

X-ray mirror quality has continuously improved over the past 20 years and manufacturers are now able to provide long mirrors with slope errors below 0.2 μrad. Nevertheless, these mirrors are mounted on holders or even mechanical benders to adjust their curvature and their intrinsic quality must be preserved from any parasitic deformation such as twist. The most direct method of detecting these deformations is to measure the 3D topography of the optical surface. At the ESRF metrology laboratory, three different stitching systems are under development based on Fizeau sub-aperture measurements. The first one consists of measuring long flat mirrors, the second based on the relative angle determinable stitching interferometry (RADSI) method developed at SPring-8 is aimed primarily at the measurement of short mirrors with strong curvature down to a few meters, and the last, also based on the RADSI method, is dedicated to characterize longer mirrors with intermediate curvature. For each method we will describe the measurement setup and discuss first results obtained. Micro-stitching interferometry is also currently used at the ESRF metrology laboratory. The technique is suitable for measuring deeply curved aspherical profiles and will be illustrated with results from a Kirkpatrick-Baez mirror system for nano-focusing.

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗
DOE OSTI2023

Nanometer flat blazed x-ray gratings using ion beam figure correction

With the development of nanometer accuracy stitching interferometry, ion beam figuring (IBF) of x-ray mirrors can now be achieved with unprecedented performance. However, the process of producing x-ray diffraction gratings on these surfaces may degrade the figure quality due to process errors introduced during the ruling of the grating grooves. To address this challenge, we have investigated the post-production correction of gratings using IBF, where stitching interferometry is used to provide in-process feedback. A concern with ion beam correction in this case is that ions will induce enough surface mobility of atoms to cause smoothing of the grating structure and degradation of diffraction efficiency. In this study we found however that it is possible to achieve a nanometer-level planarity of the global grating surface with IBF, while preserving the grating structure. The preservation was so good, that we could not detect a change in the diffraction efficiency after ion beam correction. This is of major importance in achieving ultra-high spectral resolution, and the preservation of brightness for coherent x-ray beams.

36 MATERIALS SCIENCE↗
DOE OSTI2025

Mechanical design of a parallel flexure-based RADSI instrument for curved x-ray mirror metrology

Modern synchrotron x-ray beamlines demand reflective optics with higher surface profile accuracy to achieve diffraction-limited focusing. This necessitates advanced metrology instruments capable of delivering repeatable measurements in the nanometer to sub-nanometer range. Slope ranges exceeding 15 mrad (0.86°) and greater pose significant challenges for mirror metrology using conventional interferometric methods. Here, to address this, we present a new relative angle determinable stitching interferometry instrument featuring a parallel flexure-based mechanical design. This approach enhances vibration and thermal stability while maintaining a compact and lightweight system. Initial measurements of a cylindrical mirror with a 16 m radius of curvature and a slope range of 5 mrad demonstrate nanometer-level repeatability. Comprehensive system characterization suggests the potential for achieving sub-nanometer repeatability with further refinement to the instrument.

36 MATERIALS SCIENCE↗
DOE OSTI2022

Binary pseudo-random array standards for calibration of 3D optical surface profilers used for metrology with aspheric x-ray optics

High-accuracy surface metrology is vitally important in manufacturing ultra-high-quality free-form mirrors designed to manipulate x-ray light with nanometer-scale wavelengths. The current and potential capabilities of x˗ray mirror manufacturing are limited by inherent imperfections of the integrated metrology tools. Metrology tools are currently calibrated with super-polished flat test-standard/reference mirrors. This is acceptable for fabrication of slightly curved x-ray optics. However, for even moderately curved aspherical x-ray mirrors the flat-reference calibration is not sufficiently accurate. For micro-stitching interferometry developed for surface measurements with curved x-ray mirrors, the tool aberration errors are known to be transferred into the optical surface topography of x-ray mirrors. Our approach to improving metrology is to thoroughly calibrate the measuring tool and apply the results of the calibration to deconvolution of the measured data. Here we explore the application of a recently developed technique for calibrating the instrument transfer function (ITF) of 3D optical surface profilers to metrology with significantly curved x-ray optics. The technique, based on test standards patterned with two-dimensional (2D) binary pseudo-random arrays (BPRAs), employs the unique properties of the BPRA patterns in the spatial frequency domain. The inherent 2D power spectral density of the pattern has a deterministic white-noise-like character that allows direct determination of the ITF with uniform sensitivity over the entire spatial frequency range and field of view of an instrument. The high efficacy of the technique has been previously demonstrated in application to metrology with flat and slightly curved optics. Here, we concentrate on development of an efficient fabrication process for production of highly randomized (HR) BPRA test standards on flat and 500-mm spherical optical substrates. We also compare and discuss the results of the ITF calibration of an interferometric microscope when using the HR BPRA standards on flat and curved substrates.

Munechika, Keiko↗
DOE OSTI2023

Ion Beam Figuring System for Synchrotron X-Ray Mirrors Achieving Sub-0.2-µrad and Sub-0.5-nm Root Mean Square

Abstract Optics with high-precision height and slope are increasingly desired in numerous industrial fields. For instance, Kirkpatrick–Baez (KB) mirrors play an important role in synchrotron X-ray applications. A KB system is composed of two aspherical, grazing-incidence mirrors used to focus an X-ray beam. The fabrication of KB mirrors is challenging due to the aspherical departure of the mirror surfaces from base geometries and the high-quality requirements for slope and height residuals. In this paper, we present the process of manufacturing an elliptical cylinder KB mirror using our in-house-developed ion beam figuring (IBF) and metrology technologies. First, the key aspects of figuring and finishing processes with IBF are illustrated in detail. The effect of positioning error on the convergence of the residual slope error is highlighted and compensated. Finally, inspection and cross-validation using different metrology instruments are performed and used as the final validation of the mirror. Results confirm that relative to the requested off-axis ellipse, the mirror has achieved 0.15-µrad root mean square (RMS) and 0.36-nm RMS residual slope and height errors, respectively, while maintaining the initial 0.3-nm RMS microroughness.

36 MATERIALS SCIENCE↗
DOE OSTI2025

Fabrication and characterization of a full-size ultra-precise lamellar grating for the Cosmic beamline at ALS-U

We have developed a new process for the production of ultra-precise variable line spacing (VLS) lamellar diffraction gratings through nanofabrication. The process enables the fabrication of full-size X-ray gratings with sub-nanometre accuracy in groove depth, an optimal land-to-groove ratio, and uniform groove depth across the entire grating area. We also established a method for evaluating VLS groove density variation using stitched Fizeau interferometry. The measurements confirmed the exceptionally high accuracy of the VLS groove density in the fabricated gratings, which is well within the specification tolerances while the residual groove density errors are vanishingly small. The gold-coated grating demonstrated near-theoretical diffraction efficiency across the energy range of 100–1200 eV.

36 MATERIALS SCIENCE↗
DOE OSTI2024

Binary pseudo-random array standards for calibration of 3D optical surface profilers used for metrology with significantly curved x-ray optics

High-accuracy metrology is vitally important in manufacturing ultra-high-quality free-form mirrors designed to manipulate X-ray light with nanometer-scale wavelengths. The current capabilities and possibility for improvements in X-ray mirror manufacturing are limited by inherent imperfections of the integrated metrology tools. In the case of Fizeau interferometry, metrology tools are currently calibrated with super-polished flat test-standard/reference mirrors. This is acceptable for measuring slightly curved X-ray optics. However, for even moderately curved aspherical X-ray mirrors the flat-reference calibration is not sufficiently accurate and stitching Fizeau interferometer-based surface metrology is used to mitigate the problem. But still, the retrace and aberration errors, as well as the limited spatial resolution, described with the instrument transfer function (ITF), can be transferred into the optical surface topography of X-ray mirrors obtained in stitching metrology. For ITF calibration, we have developed an original technique, based on test standards structured as two-dimensional (2D) highly-randomized (HR) binary pseudo-random arrays (BPRAs). The technique employs the unique properties of the HR BPRA patterns in the spatial frequency domain., i.e. the inherent 2D power spectral density of the HR BPRA pattern has a deterministic white-noise-like character that allows direct determination of the ITF with uniform sensitivity over the entire spatial frequency range and field-of-view of an instrument. Here, we explore technological, metrological, and analytical aspects essential for calibration of the retrace and aberration errors of Fizeau interferometers using different types of tilted test samples, including a super-polished reference mirror for the re-trace calibration and the uniformly redundant array (URA) BPRA standards for the geometrical distortion (aberration) calibration. While the first method was previously demonstrated by researchers at DIAMOND Light Source, a method based on the URA BPRA is described and demonstrated here for the first time. We outline the design and fabrication process used in fabrication of URA BPRA test standards, and present the results of application of the URA BPRA standards demonstrating the high efficacy of our approach to geometrical distortion calibration of Fizeau interferometers. We also discuss the possible sources of unexpected peculiarities of the systematic errors, including an astigmatic character of the retrace error, observed with Fizeau interferometers at the Advanced Light Source X-Ray Optics Laboratory.

Munechika, Keiko↗