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At least 19 records

X-ray free-electron laser wavefront sensing using the fractional Talbot effect

Wavefront sensing at X-ray free-electron lasers is important for quantitatively understanding the fundamental properties of the laser, for aligning X-ray instruments and for conducting scientific experimental analysis. A fractional Talbot wavefront sensor has been developed. This wavefront sensor enables measurements over a wide range of energies, as is common on X-ray instruments, with simplified mechanical requirements and is compatible with the high average power pulses expected in upcoming X-ray free-electron laser upgrades. Single-shot measurements were performed at 500 eV, 1000 eV and 1500 eV at the Linac Coherent Light Source. These measurements were applied to study both mirror alignment and the effects of undulator tapering schemes on source properties. The beamline focal plane position was tracked to an uncertainty of 0.12 mm, and the source location for various undulator tapering schemes to an uncertainty of 1m, demonstrating excellent sensitivity. These findings pave the way to use the fractional Talbot wavefront sensor as a routine, robust and sensitive tool at X-ray free-electron lasers as well as other high-brightness X-ray sources.

73 NUCLEAR PHYSICS AND RADIATION PHYSICS↗

Simulation of X-ray Hartmann wavefront sensing with the Synchrotron Radiation Workshop

X-ray wavefront measurement is an important beam diagnostic tool, especially for the diffraction-limited X-ray beam. These in situ diagnostics give a better understanding of beam imperfections, and they enable feedback for possible corrections and/or optical alignment improvements. Hartmann wavefront sensing is one of the promising techniques to perform in situ X-ray wavefront measurements. In this work, a simulation tool of the X-ray Hartmann Wavefront Sensor (HWS) is developed under the Synchrotron Radiation Workshop (SRW) framework. Using this new simulation capability, one can take advantage of the full SRW package to simulate Hartmann wavefront sensing with the beam traveling from the X-ray source to the sample through different X-ray optical components. This SRW HWS simulation tool can help to optimize the wavefront sensor parameters for a specific X-ray energy range. It can also simulate an in situ wavefront measurement experiment with a particular beamline optical layout and predict the expected results of the wavefront measurement under different beamline configurations.

36 MATERIALS SCIENCE↗

Special Issue “EUV and X-ray Wavefront Sensing”

This Special Issue (SI), entitled “EUV and X-ray Wavefront Sensing” is focused on original research performed by world-recognized scientists in the field and is focused on the current state-of-the-art in-situ wavefront sensing for EUV and X-ray. We believe that this SI will provide the reader with an overview of the present status and an outlook on future development in this field.

36 MATERIALS SCIENCE↗

Method and apparatus for wavefront sensing

A method for performing optical wavefront sensing includes providing an amplitude transmission mask having a light input side, a light output side, and an optical transmission axis passing from the light input side to the light output side. The amplitude transmission mask is characterized by a checkerboard pattern having a square unit cell of size .LAMBDA.. The method also includes directing an incident light field having a wavelength $ \lamda $ to be incident on the light input side and propagating the incident light field through the amplitude transmission mask. The method further includes producing a plurality of diffracted light fields on the light output side and detecting, at a detector disposed a distance L from the amplitude transmission mask, an interferogram associated with the plurality of diffracted light fields.

47 OTHER INSTRUMENTATION↗

Method and apparatus for wavefront sensing

A method for performing optical wavefront sensing includes providing an amplitude transmission mask having a light input side, a light output side, and an optical transmission axis passing from the light input side to the light output side. The amplitude transmission mask is characterized by a checkerboard pattern having a square unit cell of size Λ. The method also includes directing an incident light field having a wavelength λ to be incident on the light input side and propagating the incident light field through the amplitude transmission mask. The method further includes producing a plurality of diffracted light fields on the light output side and detecting, at a detector disposed a distance L from the amplitude transmission mask, an interferogram associated with the plurality of diffracted light fields. The relation is satisfied, where n is an integer greater than zero.

71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗

Coded-mask-based wavefront sensing technique for APS nanofocusing beamline diagnostics

Here, we extend our recently developed coded-mask wavefront sensing technique to enable single-shot measurements of nanofocused x-ray beams. This method accurately reconstructs the focal beam profile by backpropagating the wavefront measured downstream of the beam focus. To validate its performance, we benchmarked it against the conventional fluorescence wire scan method, successfully measuring ∼120 nm focal spots at the 28-ID-B beamline of the Advanced Photon Source using a polymeric compound refractive lens. The results highlight the effectiveness of coded-mask wavefront sensing for high-precision beam profiling and its application as a real-time wavefront monitoring tool.

Shi, Xianbo [Argonne National Laboratory (ANL), Ar↗

Development of X-ray Wavefront Sensing Techniques for Adaptive Optics Control at the Advanced Photon Source

The planning and construction of new and upgraded high-brightness X-ray synchrotron and free electron laser sources, such as the Advanced Photon Source upgrade project (APS-U), are driving numerous opportunities to advance X-ray science and technologies. At the same time, an increasing number of highly diverse beamline experiments demand wavefront-preserving adaptive X-ray optics with both high precision and flexibility. At the APS, significant effort has been devoted to developing next-generation adaptive and corrective optics combined with state-of-the-art at-wavelength wavefront sensing techniques and an intelligent feedback control system for the automation and self-alignment of beamline optical systems. This article reviews recent achievements in these areas at the APS. Further, these include the development of in-situ wavefront sensing, the application in active feedback control of ultra-precision deformable mirrors, and the exploration of non-invasive wavefront sensing techniques for adaptive optics and beamline diagnostics.

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗

Wavefront sensing at X-ray free-electron lasers

Here a direct comparison is made between various X-ray wavefront sensing methods with application to optics alignment and focus characterization at X-ray free-electron lasers (XFELs). Focus optimization at XFEL beamlines presents unique challenges due to high peak powers as well as beam pointing instability, meaning that techniques capable of single-shot measurement and that probe the wavefront at an out-of-focus location are desirable. The techniques chosen for the comparison include single-phase-grating Talbot interferometry (shearing interferometry), dual-grating Talbot interferometry (moiré deflectometry) and speckle tracking. All three methods were implemented during a single beam time at the Linac Coherent Light Source, at the X-ray Pump Probe beamline, in order to make a direct comparison. Each method was used to characterize the wavefront resulting from a stack of beryllium compound refractive lenses followed by a corrective phase plate. In addition, difference wavefront measurements with and without the phase plate agreed with its design to within λ/20, which enabled a direct quantitative comparison between methods. Finally, a path toward automated alignment at XFEL beamlines using a wavefront sensor to close the loop is presented.

42 ENGINEERING↗

Direct binary search for improved coherent beam shaping and optical differentiation wavefront sensing

Spatially dithered distributions of binary amplitude pixels are optimized using a full direct binary search taking into account the experimental configuration for amplitude modulation of coherent waves. This design process is shown to yield a significant reduction of the noise induced by binarization and pixelation over the region of interest. In this study, we demonstrate this approach for beam shaping and optical differentiation wavefront sensing, where the region of interest is in an image plane of the pixel distribution and in the far field of the pixel distribution, respectively. Lastly, the observed reduction in error compared to a standard error diffusion algorithm is significant for both applications because it improves performance without the tighter fabrication tolerance and cost associated with smaller pixels.

47 OTHER INSTRUMENTATION↗

Reflective binary amplitude grating for soft x-ray shearing and Hartmann wavefront sensing

Here, we demonstrate a reflective wavefront sensor grating suitable for the characterization of high-quality x-ray beamlines and optical systems with high power densities. Operating at glancing incidence angles, the optical element is deeply etched with a two-level pattern of shearing interferometry gratings and Hartmann wavefront sensor grids. Transverse features block unwanted light, enabling binary amplitude in reflection with high pattern contrast. We present surface characterization and soft x-ray reflectometry of a prototype grating array to demonstrate function prior to wavefront measurement applications. A simulation of device performance is shown.

47 OTHER INSTRUMENTATION↗

HWO Pupil Chopping Wavefront Sensing and Control FY24 Mini-Project Writeup

This document is a summary of work completed in June through July 2024 to assess the feasibility of implementing non-coronagraphic pupil chopping (PC) for Habitable Worlds Observatory (HWO) primary mirror segment stabilization with an on- and/or off-axis Natural Guide Star (NGS) or Laser Guide Star (LGS). This work considers three different PC configurations: (1) a non-common path (NCP) continuous low-order Deformable Mirror (DM), (2) using the telescope’s primary mirror (M1) segment(s), and (3) using a NCP low-order segmented DM. We show that option 2 likely needs a LGS for guiding, while options 1 and 3 may be able to guide on NGSs. We also separately evaluate spectral bandwidth limitations in the absence of photon noise, showing that the technique is limited to Δλ/λ ≲ 25% in a standard imaging configuration but Δλ/λ ≲ 150% when using a NCP Wynne corrector.

79 ASTRONOMY AND ASTROPHYSICS↗

EUV and Hard X-ray Hartmann Wavefront Sensing for Optical Metrology, Alignment and Phase Imaging

For more than 15 years, Imagine Optic have developed Extreme Ultra Violet (EUV) and X-ray Hartmann wavefront sensors for metrology and imaging applications. These sensors are compatible with a wide range of X-ray sources: from synchrotrons, Free Electron Lasers, laser-driven betatron and plasma-based EUV lasers to High Harmonic Generation. In this paper, we first describe the principle of a Hartmann sensor and give some key parameters to design a high-performance sensor. We also present different applications from metrology (for manual or automatic alignment of optics), to soft X-ray source optimization and X-ray imaging.

20 metrology↗

Collaborative development of diffraction-limited beamline optical systems at US DOE light sources

An ongoing collaboration among four US Department of Energy National Laboratories has demonstrated key technology prototypes and software modeling tools required for new high-coherent flux beamline optical systems. New free electron laser (FEL) and diffraction-limited storage ring (DLSR) light sources demand wavefront preservation from source to sample to achieve and maintain optimal performance. Fine wavefront control was achieved using a novel, roomtemperature cooled mirror system called REAL (resistive element adjustable length) that combines cooling with applied, spatially variable auxiliary heating. Single-grating shearing interferometry (also called Talbot interferometry) and Hartmann wavefront sensors were developed and used for optical characterization and alignment on several beamlines, across a range of photon energies. Demonstrations of non-invasive hard x-ray wavefront sensing were performed using a thin diamond single-crystal as a beamsplitter.

Goldberg, Kenneth A.↗

X-ray wavefront sensor development at the Advanced Light Source

At Lawrence Berkeley National Laboratory's Advanced Light Source, we are developing x-ray wavefront sensors to support the creation and operation of beamlines with diffraction-limited quality. Our new approach to rapid, intermittent wavefront sensing operates in reflection at glancing incidence angles and is compatible with the high-power densities of modern beamlines. For soft x-ray applications especially, the wavefront sensor can operate upstream of the exit slit in a vertically dispersed beam. This single-shot technique supports lateral shearing interferometry and Hartmann wavefront sensing; it can be adapted to speckle-based techniques as well. The reflected beam is directed to an off-axis YAG crystal that produces scintillated visible light. A small mirror reflects the light to a microscope and camera, and the measured wavefront shape information can be used as feedback to adaptive x-ray mirror elements. A compact array of gratings enables measurement across a broad range of photon energies or wavefront curvatures. We describe recent demonstrations at soft x-ray and hard x-ray wavelengths measuring an adaptive x-ray mirror, and a toroidal focusing mirror.

Goldberg, Kenneth A↗

Design and demonstration of tunable soft x-ray lateral shearing and Hartmann wavefront sensors

We describe design guidelines for soft x-ray wavefront sensors and experimentally demonstrate their performance, comparing grating-based lateral shearing interferometry and Hartmann wavefront sensing. We created a compact shearing interferometer concept with a dense array of binary amplitude gratings in a single membrane to support one-dimensional wavefront measurements across a wide wavelength range without the need for longitudinal position adjustment. We find that a common scaling parameter based on wavelength and the distance to the measurement plane guides the design of both systems toward optimal sensitivity. We show preliminary results from recent experiments demonstrating one and two-dimensional wavefront sensing below the Marechal criterion.

Chao, Weilun↗