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Results for “X-ray optical thin films”

Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 19 records
All sourcesNASA NTRSDOE OSTI
NASA NTRS1982

X-ray and extreme ultraviolet imaging using layered synthetic microstructures

Up to now designers of X-ray optical instruments such as microscopes and telescopes have been compelled to use mirrors operating at small glancing angles. However, using vapor deposition techniques, it is now possible to build multilayered thin film structures in which the individual layers have thicknesses comparable with a wavelength of X-rays. These devices operate in a manner exactly analogous to multilayer dielectric coatings at visible wavelengths and can be used to increase the X-ray and extreme ultraviolet reflectivity of surfaces at large glancing angles. These X-ray mirrors have numerous potential applications in X-ray optics. Attention is given to X-ray images with a normal incidence mirror, and applications of multilayer optics. Single-mirror telescopes for solar/stellar astronomy are discussed, taking into account solar corona and transition region studies, and X-ray and extreme ultraviolet astronomy. Hybrid X-ray telescopes are also considered.

Underwood, J. H.↗
NASA NTRS1984

Optical constants of organic tholins produced in a simulated Titanian atmosphere - From soft X-ray to microwave frequencies

The determination of the real (n) and imaginary (k) parts of the complex refractive index of thin films of the dark reddish organic solids called tholins, produced by continuous D.C. discharge through a 0.9 N2/0.1 CH4 gas mixture at 0.2 mb, is reported. For the 250 A-1000 micron wavelength range, n and k have been determined from a combination of transmittance, specular reflectance, interferometric, Brewster angle, and ellipsometric polarization measurements. Experimental uncertainties are estimated at + or -0.05 for n and + or -30 percent for k. The results in the visible range are consistent with deductions made by ground-based and spacecraft observations of Titan, in whose atmosphase tholins are thought to be present.

Khare, B. N.↗
NASA NTRS1977

Optical polarimetry: Instrumentation and applications; Proceedings of the Seminar, San Diego, Calif., August 23, 24, 1977

Instrumentation used in optical polarimetry is discussed with reference to high-resolution spectropolarimetry, an orbiter cloud photopolarimeter, X-ray polarimeters, and the design of a self-nulling ellipsometer. Consideration is given to surface and thin-film ellipsometry noting studies of electrochemical surface layers, surface anisotropy, polish layers on infrared window materials, and anodic films. Papers on biological, chemical, and physical polarimetry are presented including birefringence in biological materials, vibrational optical activity, and the optical determination of the thermodynamic phase diagram of a metamagnet. Remote sensing is discussed in terms of polarization imagery, the optical polarimetry of particulate surfaces, and techniques and applications of elliptical polarimetry in astronomy and atmospheric studies.

Azzam, R. M. A.↗
NASA NTRS1989

Surface roughness of flat and curved optical surfaces

Surface roughness measurement has several applications. Even a few A roughness will cause scattered light in optical systems. Smooth surfaces are required in a wide variety of instruments. For example, the outputs of the high power lasers are limited by the surface roughness of mirrors and windows. Similarly, the information storage capacity of magnetic media is limited by the roughness of the surface. Roughness reduces the resolving power of optics and distorts images. The performance of certain thin film components in electronic industries is affected by the roughness on the film surface. X-ray astronomical telescopes require smooth curved surfaces. To improve the surface quality, super sensitive detection methods are required. Wide ranging measurement techniques are developed based on interferometry, electron microscopy, C-rays, ellipsometry, light scattering, and using mechanical stylus, etc. Though there are several techniques available for measurement and evaluation of the surfaces, no single technique is fully adequate. Also, the technique used should be nondestructive and highly sensitive. So, an optical heterodyne profilometer was fabricated. Its current sensitivity is much better than 10A rms. It is a noncontact and nondestructive technique. The instrument can be operated even by unskilled personnel for routine measurements.

George, M. C.↗
NASA NTRS1981

Layered synthetic microstructures as Bragg diffractors for X rays and extreme ultraviolet - Theory and predicted performance

The theory of X-ray diffraction by periodic structures is applied to the layered synthetic microstructures (LSMs) made possible by recent developments in thin film technology, and approximate formulas for estimating their performance are presented. A more complete computation scheme based on optical multilayer theory is also described, and it is shown that the diffracting properties may be tailored to specific applications by adjusting the refractive indices and thicknesses of the component layers. The theory may be modified to take account of imperfections in the LMS structure, and the properties of nonperiodic structures thereby computed. Structures with high integrated reflectivity constructed according to the methods defined have potential application in many areas of X-ray or EUV research and instrumentation.

Underwood, J. H.↗
NASA NTRS1985

The Extended Range X-Ray Telescope center director's discretionary fund report

An Extended Range X-Ray Telescope (ERXRT) of high sensitivity and spatial resolution capable of functioning over a broad region of the X-ray/XUV portion of the spectrum has been designed and analyzed. This system has been configured around the glancing-incidence Wolter Type I X-ray mirror system which was flown on the Skylab Apollo Telescope Mount as ATM Experiment S-056. Enhanced sensitivity over a vastly broader spectral range can be realized by the utilization of a thinned, back-illuminated, buried-channel Charge Coupled Device (CCD) as the X-ray/XUV detector rather than photographic film. However, to maintain the high spatial resolution inherent in the X-ray optics when a CCD of 30 micron pixel size is used, it is necessary to increase the telescope plate scale. This can be accomplished by use of a glancing-incidence X-ray microscope to enlarge and re-focus the primary image onto the focal surface of the CCD.

Hoover, R. B.↗
NASA NTRS1985

Boron and silicon - Filters for the extreme ultraviolet

Thin films of boron and silicon have been developed using electron beam deposition. The transmissions of these filters were measured from soft X-ray wavelengths to the far ultraviolet and at optical wavelengths. The boron filter transmission peaks near 66 A and the silicon filter peaks near 136 A as expected on theoretical grounds, but the extreme ultraviolet bandpass is narrower than expected. The peak transmission of these filters does not change with time, but the width of the silicon filter bandpass is reduced slightly as the filter ages.

Labov, S.↗
NASA NTRS1986

Optics for X-ray astronomy

This paper describes a large grazing incidence X-ray telescope that is being prepared for use in a spectrometer for X-ray astronomical observations. The telescope is figured by diamond turning and polished by applying an acrylic lacquer that is overcoated by a thin film of tungsten to provide high X-ray reflectivity. The current status of our research in multilayer deposition is presented and some astronomical applications of multilayer mirrors are described.

Catura, R. C.↗
NASA NTRS1989

Research and test facilities for development of technologies and experiments with commercial applications

One of NASA'S agency-wide goals is the commercial development of space. To further this goal NASA is implementing a policy whereby U.S. firms are encouraged to utilize NASA facilities to develop and test concepts having commercial potential. Goddard, in keeping with this policy, will make the facilities and capabilities described in this document available to private entities at a reduced cost and on a noninterference basis with internal NASA programs. Some of these facilities include: (1) the Vibration Test Facility; (2) the Battery Test Facility; (3) the Large Area Pulsed Solar Simulator Facility; (4) the High Voltage Testing Facility; (5) the Magnetic Field Component Test Facility; (6) the Spacecraft Magnetic Test Facility; (7) the High Capacity Centrifuge Facility; (8) the Acoustic Test Facility; (9) the Electromagnetic Interference Test Facility; (10) the Space Simulation Test Facility; (11) the Static/Dynamic Balance Facility; (12) the High Speed Centrifuge Facility; (13) the Optical Thin Film Deposition Facility; (14) the Gold Plating Facility; (15) the Paint Formulation and Application Laboratory; (16) the Propulsion Research Laboratory; (17) the Wallops Range Facility; (18) the Optical Instrument Assembly and Test Facility; (19) the Massively Parallel Processor Facility; (20) the X-Ray Diffraction and Scanning Auger Microscopy/Spectroscopy Laboratory; (21) the Parts Analysis Laboratory; (22) the Radiation Test Facility; (23) the Ainsworth Vacuum Balance Facility; (24) the Metallography Laboratory; (25) the Scanning Electron Microscope Laboratory; (26) the Organic Analysis Laboratory; (27) the Outgassing Test Facility; and (28) the Fatigue, Fracture Mechanics and Mechanical Testing Laboratory.

Source record↗
NASA NTRS1988

Soft X-ray images of the solar corona using normal incidence optics

A solar coronal loop system has been photographed in soft X-rays using a normal incidence telescope based on multilayer mirror technology. The telescope consisted of a spherical objective mirror of 4 cm aperture and 1 m focal length, a film cassette, and a focal plane shutter. A metallized thin plastic film filter was used to exclude visible light. The objective mirror was covered with a multilayer coating consisting of alternating layers of tungsten and carbon whose combined thicknesses satisfied the Bragg diffraction condition for 44 A radiation. The image was recorded during a rocket flight on October 25, 1985 and was dominated by emission lines arising from the Si XII spectrum. The rocket also carried a high resolution soft X-ray spectrograph that confirmed the presence of Si XII line radiation in the source. This image represents the first successful use of multilayer technology for astrophysical observations.

Bruner, M. E.↗
NASA NTRS1981

A wide-field soft X-ray camera

A wide-field soft X-ray camera (WFSXC) sensitive in the 50 to 250 eV band is described. The camera features Wolter-Schwarzschild optics with an 8 degree field of view and 300 cu cu collecting area. The focal plane instrument is a microchannel plate detector. Broad-band energy discrimination is provided by thin-film filters mounted immediately in front of the focal plane. The WFSXC is capable of detecting sources with intensities greater than 5 percent of HZ 43 during typical sounding rocket exposures, and it would approach the same sensitivity range as EUVE during a typical exposure from the Shuttle.

Petre, R.↗
NASA NTRS1976

The theoretical reflectance of X-rays from optical surfaces

The theoretical reflectance of X-rays from various materials and evaporated films is presented. A computer program was written that computes the reflected intensity as a function of the angle of the incident radiation. The quantities necessary to generate the efficiency and their effect on the data are demonstrated. Five materials were chosen for evaluation: (1) fused silica, (2) chromium, (3) beryllium, (4) gold, and (5) a thin layer contaminant. Fused silica is a versatile and common material; chromium has high reflection efficiency at X-ray wavelengths and is in the middle of the atomic number range; beryllium contains a single atomic shell and has a low range atomic number; gold contains multiple atomic shells and has a high atomic number; the contaminant is treated as a thin film in the calculations and results are given as a function of thickness for selected wavelengths. The theoretical results are compared to experimental data at lambda = 8.34 A.

Neergaard, J. R.↗
NASA NTRS1991

Effects on LDEF exposed copper film and bulk

Two forms of copper were exposed to the Long Duration Exposure Facility (LDEF) Mission 1 environment: a copper film, initially 74.2 plus or minus 1.1 nm thick sputter coated on a fused silica flat and a bulk piece of oxygen-free, high conductivity (OFHC) copper. The optical density of the copper film changed from 1.33 to 0.70 where exposed, and the film thickness increased to 106.7 plus or minus 0.5 nm where exposed. The exposed area appears purple by reflection and green by transmission for the thin film and maroon color for the bulk copper piece. The exposed areas increased in thickness, but only increase in the thickness of the thin film sample could be readily measured. The increase in film thickness is consistent with the density changes occurring during conversion of copper to an oxide. However, we have not been able to confirm appreciable conversion to an oxide by x-ray diffraction studies. We have not yet subjected the sample to e-beams or more abusive investigations out of concern that the film might be modified.

Peters, Palmer N.↗
NASA NTRS1978

Lubrication and failure mechanisms of molybdenum disulfide films. 2: Effect of substrate roughness

An optical microscope was used to study the lubrication and failure mechanisms of rubbed MoS2 films applied to three substrate surface finishes; polished, sanded, and sandblasted as a function of sliding distance. The lubrication mechanism was the plastic flow of thin films of MoS2 between flat plateaus on the rider and on the metallic substrate. If the substrate was rough, flat plateaus were created during run-in and the MoS2 flowed across them. Wear life was extended by increasing surface roughness since valleys in the roughened substrate served as reservoirs for MoS2 and as deposit sites for wear debris. In moist air the failure mechanism was the transformation of metallic colored MoS2 films to a black, powdery material that was found by X-ray diffraction to be alpha iron, MoO3, and possibly FeMoO3. In dry argon the failure mechanism was the gradual depletion of MoS2 from the contact region by transverse flow, and the wear debris on the track at failure was alpha iron, residual MoS2, and possibly FeS.

Fusaro, R. L.↗
NASA NTRS1981

Effect of substrate surface finish on the lubrication and failure mechanisms of molybdenum disulfide films

An optical microscope was used to study the lubrication and failure mechanisms of rubbed (burnished) MoS2 films applied to three substrate surface finishes - polished, sanded, and sandblasted - as a function of sliding distance. The lubrication mechanism was the plastic flow of thin films of MoS2 between flat plateaus on the rider and on the metallic substrate. If the substrate was rough, flat plateaus were created during 'run-in' and the MoS2 flowed across them. Wear life was extended by increasing surface roughness since valleys in the roughened substrate served as reservoirs for MoS2 and a deposit site for wear debris. In moist air, the failure mechanism was the transformation of metallic-colored MoS2 films to a black, powdery material that was found by X-ray diffraction to consist primarily of alpha-iron and MoO3 powders. In dry argon, the failure mechanism was the gradual depletion of the MoS2 film from the contact region by transverse flow. Analysis of the wear debris on the wear track at failure showed it consisted mainly of alpha-iron and some residual MoS2. No molybdenum oxides were found.

Fusaro, R. L.↗
NASA NTRS1990

Silicon carbon alloy thin film depositions using electron cyclotron resonance microwave plasmas

Amorphous and microcrystalline silicon carbon films (a-SiC:H, micro-c-SiC:H) have been deposited using SiH4, CH4 and H2 mixed gas ECR (electron cyclotron resonance) plasmas. The optical bandgap of a-SiC:H films is not dependent on the hydrogen dilution in the ECR plasma. The deposition rate of a-SiC:H films is found to be strongly dependent on the ECR magnetic field and the hydrogen dilution. The hydrogen dilution effect on the deposition rate indicates that the etching in ECR hydrogen plasmas plays an important role in the deposition of a-SiC:H films. The optical constants n and k of ECR-deposited a-SiC:H films in the wavelength region of 0.4 to 1.0 micron are determined to be 2.03-1.90 and 0.04-0.00, respectively. The microstructures of ECR-deposited micro-c-SiC:H films are shown by X-ray diffraction and SEM (scanning electron microscopy) to be composed of 1000-A alpha-SiC microcrystallites and amorphous network structures.

Shing, Y. H.↗
NASA NTRS1990

Diamond Coatings

Advances in materials technology have demonstrated that it is possible to get the advantages of diamond in a number of applications without the cost penalty, by coating and chemically bonding an inexpensive substrate with a thin film of diamond-like carbon (DLC). Diamond films offer tremendous technical and economic potential in such advances as chemically inert protective coatings; machine tools and parts capable of resisting wear 10 times longer; ball bearings and metal cutting tools; a broad variety of optical instruments and systems; and consumer products. Among the American companies engaged in DLC commercialization is Diamonex, Inc., a diamond coating spinoff of Air Products and Chemicals, Inc. Along with its own proprietary technology for both polycrystalline diamond and DLC coatings, Diamonex is using, under an exclusive license, NASA technology for depositing DLC on a substrate. Diamonex is developing, and offering commercially, under the trade name Diamond Aegis, a line of polycrystalline diamond-coated products that can be custom tailored for optical, electronic and engineering applications. Diamonex's initial focus is on optical products and the first commercial product is expected in late 1990. Other target applications include electronic heat sink substrates, x-ray lithography masks, metal cutting tools and bearings.

Source record↗
NASA NTRS1980

Structure and optical properties of evaporated films of the Cr- and V-group metals

Thin films of Cr, Mo, and W rapidly evaporated in high vacuum (5 x 10 to the -7th torr) onto room-temperature substrates show anomalously low reflectance (compared to bulk samples). From electron and X-ray diffraction and electron microscopy, the normal bcc crystal structure is found, but with very fine grains. Columnar grains about 100 A in diameter were separated by a less dense grain-boundary network about 10-A wide. The measured optical conductivity agrees with an inhomogeneous-medium model that assumes the normal crystalline conductivity for the grain interiors, with model parameters that correlate to the observed columnar grain size. In contrast, V and Nb films rapidly evaporated onto room-temperature substrates have the reflectance of bulk crystalline material. On liquid-nitrogen temperature substrates, however, V and Nb have normal bcc crystal structure but with small flat-plate grains, and the same model, with appropriate parameters, accounts for the optical conductivity. The difference between these two groups apparently depends on residual gases segregated at the grain boundaries in the Cr-group films.

Nestell, J. E., Jr.↗