SEARCH · Search NASA

Results for “electron cyclotron resonance (ECR)”

Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

SourceResearch connectionFrom yearThrough year

Quote a phrase for an exact phrase match. Source license links do not imply unrestricted reuse.

At least 19 records

All sources NASA NTRS DOE OSTI

NASA NTRS1987

Electron-cyclotron-resonance (ECR) plasma acceleration

A research effort directed at analytically and experimentally investigating electron-cyclotron-resonance (ECR) plasma acceleration is outlined. In addition, relevant past research is reviewed. Also, the prospects for application of ECR plasma acceleration to spacecraft propulsion are described. It is shown that previously unexplained losses in converting microwave power to directed kinetic power via ECR plasma acceleration can be understood in terms of diffusion of energized plasma to the physical walls of the accelerator. It is also argued that line radiation losses due to electron-ion and electron-atom inelastic collisions should be less than estimated in past research. Based on this new understanding, the expectation now exists that very efficient ECR plasma accelerators can be designed for application to high-specific-impulse spacecraft propulsion.

Sercel, Joel C.↗

NASA NTRS1988

Electron-cyclotron-resonance (ECR) plasma thruster research

An experimental apparatus to scientifically investigate the process of Electron-Cyclotron-Resonance (ECR) plasma acceleration has been tested. The apparatus consists of a vacuum facility, a 20 kW microwave power supply, and an argon ECR plasma thruster. Present instrumentation allows measurement of microwave input power, reflected power, propellant flow rate, and static pressure in the vacuum tank. In initial tests, an argon ECR plasma has been initiated repeatably at power levels ranging from 0.3 to 7.0 kW. The ECR plasma appears to diverge and separate from the applied magnetic field as predicted by theory. These tests suggest that the ECR plasma acceleration concept can be studied scientifically in the new apparatus.

Sercel, Joel C.↗

DOE OSTI2020

Electron cyclotron resonance (ECR) magnetometry with a plasma reservoir

The local magnetic field in a Penning–Malmberg trap is found by measuring the temperatures that result when electron plasmas are illuminated by microwave pulses. Multiple heating resonances are observed as the pulse frequencies are swept. The many resonances are due to electron bounce and plasma rotation sidebands. The heating peak corresponding to the cyclotron frequency resonance is identified to determine the magnetic field. A new method for quickly preparing low density electron plasmas for destructive temperature measurements enables a rapid and automated scan of microwave frequencies. This technique can determine the magnetic field to high precision, obtaining an absolute accuracy better than 1 ppm and a relative precision of 26 ppb. One important application is in situ magnetometry for antihydrogen-based tests of charge-parity-time symmetry and of the weak equivalence principle.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

NASA NTRS1991

Electric thruster models for multimegawatt nuclear electric propulsion mission design

Three types of electric thrusters currently under development at JPL have potential to support future missions which utilize multimegawatt nuclear electric propulsion. These electric thrusters are the electron bombardment ion thruster, the magnetoplasmadynamic (MPD) thruster, and the electron-cyclotron-resonance (ECR) thruster. The electron bombardment ion thruster is a relatively mature technology which has been developed for operation at kilowatt power levels but will require new development for application in the multimegawatt regime. The MPD engine represents a technology which may be very well suited to steady-state multimegawatt applications but which has been limited to sub-scale (100's of kW) and pulsed (MW) testing thus far. The ECR plasma engine represents a class of very promising new concepts which are still in the basic research phase of development, but which may possess important fundamental advantages over other electric thruster technologies. Models of these thrusters are described and used to make projections of thrusters specific mass, efficiency, and power handling capacity for operation in the multimegawatt regime.

Leifer, Stephanie D.↗

NASA NTRS1993

Experimental studies of an ECR plasma thruster

The Electron Cyclotron Resonance (ECR) thruster is a proposed electrodeless space electric propulsion device with interesting and little understood physics. A laboratory ECR thruster was run in a vacuum tank at pressures in the 10 exp -5 torr range using 2.12 GHz microwave beam and Ar gas propellant. Movable diagnostic probes (a Faraday cup and a gridded energy analyzer) measured plasma characteristics as propellant gas flow rate and input microwave power level were varied. Ion energy and flux data were used to calculate I(sp), propulsive efficiency, and thrust. The ion flux profiles show an unexpected depression on the thruster axis for low tank pressures that disappears as the tank pressure increases. Ion energies decrease as the flow rate and pressure increase, but the microwave power level affects the energy only negligibly. The calculated propulsion parameters demonstrate that the efficiency of the laboratory device is low, and that tank pressure greatly changes the performance.

Kaufman, D. A.↗

NASA NTRS2006

High Power ECR Ion Thruster Discharge Characterization

Electron cyclotron resonance (ECR) based ion thrusters with carbon based ion optics can potentially satisfy lifetime requirements for long duration missions (approximately 10 years) because grid erosion and cathode insert depletion issues are virtually eliminated. Though the ECR plasma discharge has been found to typically operate at slightly higher discharge losses than conventional DC ion thrusters (for high total thruster power applications), the discharge power fraction is small (less than 1 percent at 25 kW). In this regard, the benefits of increased life, low discharge plasma potentials, and reduced complexity are welcome tradeoffs for the associated discharge efficiency decrease. Presented here are results from discharge characterization of a large area ECR plasma source for gridded ion thruster applications. These measurements included load matching efficacy, bulk plasma properties via Langmuir probe, and plasma uniformity as measured using current probes distributed at the exit plane. A high degree of plasma uniformity was observed (flatness greater than 0.9). Additionally, charge state composition was qualitatively evaluated using emission spectroscopy. Plasma induced emission was dominated by xenon ion lines. No doubly charged xenon ions were detected.

Foster, John E.↗

NASA NTRS2003

Discharge Characterization of 40 cm-Microwave ECR Ion Source and Neutralizer

Discharge characteristics of a 40 cm, 2.45 GHz Electron Cyclotron Resonance (ECR) ion thruster discharge chamber and neutralizer were acquired. Thruster bulk discharge plasma characteristics were assessed using a single Langmuir probe. Total extractable ion current was measured as a function of input microwave power and flow rate. Additionally, radial ion current density profiles at the thruster.s exit plane were characterized using five equally spaced Faraday probes. Distinct low and high density operating modes were observed as discharge input power was varied from 0 to 200 W. In the high mode, extractable ion currents as high as 0.82 A were measured. Neutralizer emission current was characterized as a function of flow rate and microwave power. Neutralizer extraction currents as high as 0.6 A were measured.

Foster, John E.↗

NASA NTRS1989

ECR plasma thruster research - Preliminary theory and experiments

A preliminary theory of the operation of the electron-cyclotron-resonance (ECR) plasma thruster is described along with an outline of recent experiments. This work is presented to communicate the status of an ongoing research effort directed at developing a unified theory to quantitatively describe the operation of the ECR plasma thruster. The theory is presented as a set of nonlinear ordinary differential equations and boundary conditions which describe the plasma density, velocity, and electron temperature. Diagnostic tools developed to measure plasma conditions in the existing research device are described.

Sercel, Joel C.↗

DOE OSTI2024

Improving qubit coherence time through detailed materials analysis

This study investigates the defects, imperfections, and variations in superconducting Nb thin films deposited on sapphire substrates. Two samples, W114 and W118, were fabricated using DC Magnetron Sputtering and Electron Cyclotron Resonance (ECR), respectively. Each sample was analyzed at five distinct spots to compare elemental homogeneity and thickness variations. Scanning Electron Microscopy (SEM) was employed to examine surface morphology, while Energy Dispersive X-ray Spectroscopy (EDS) and X-ray Photoelectron Spectroscopy (XPS) provided elemental and chemical state analyses. SEM revealed distinct structures in W114 and a uniform surface in W118. EDS showed higher aluminum and oxygen signals in W118, indicating a thicker film. XPS detected a higher Nb₂O₅ signal in W118, attributed to a thicker oxygen layer. These findings highlight the critical role of precise material characterization in advancing quantum computing technologies.

72 PHYSICS OF ELEMENTARY PARTICLES AND FIELDS↗

NASA NTRS2005

Laboratory Studies in UV and EUV Solar Physics

A new 5 GHZ Electron Cyclotron Resonance (ECR) ion source for SAO's Ion Beam Experiment was designed, built and tested. Absolute cross sections were measured for electron impact excitation (EIE) in C(2+) (2s2p (3)P(sup o) - 2p(sup 2) (3)P), and empirical EIE rate coefficients were derived. The absolute cross section for EIE in Si(2+) (3s3p (3)P(sup o) - 3s3p (1)P(sup o)) was measured, and our experimental values for absolute cross sections for EIE in C(3+) (2s (2)S - 2p (2)P(sup o)) were reanalyzed and compared to values obtained by other experimental methods and by theory. In addition, a paper was published. The development and testing of the new ion source, the Si(2+) EIE measurements, and the reevaluation of the cross sections for C(3+) resulted from the Ph.D. research of Paul H. Janzen who completed the degree requirements for the Harvard University Department of Physics in 2002. John Kohl served as the Ph.D.Thesis Advisor. Because of delays in bringing the new ion source on line, the measurements of EIE in C(2+) (2s2p (3)P(sup o) - (2)p(sup 2) (3)P) were not completed until 2004. Preparations for measurements of EIE in C(2+) (1s(sup 2) (1)S - 2s2p (1)P(sup o)) are currently underway.

Wagner, William J.↗

DOE OSTI2024

Improving Qubit Coherence Time Through Detailed Materials Analysis

This study investigates the defects, imperfections, and variations in Nb thin films deposited on sapphire substrates. Two samples, W114 and W118, were fabricated using DC Magnetron Sputtering and Electron Cyclotron Resonance (ECR), respectively. Each sample was analyzed at five distinct spots to compare elemental homogeneity and variations in oxide layers. Scanning Electron Microscopy (SEM) was employed to examine surface morphology, while Energy Dispersive X-ray Spectroscopy (EDS) and X-ray Photoelectron Spectroscopy (XPS) provided elemental and chemical state analyses. SEM revealed distinct structures in W114 and a uniform surface in W118. EDS showed higher aluminum signals in W118, indicating a thinner film in comparison to W114. XPS detected a higher Nb₂O₅ signal in W118, in comparison to W114, which can be attributed to the presence of a thicker Nb₂O₅ layer in W118. These findings highlight the critical role of precise material characterization in advancing quantum computing technologies.

Rosado Bonilla, Cristy M.↗

NASA NTRS1998

High-Density Plasma Reactors: Simulations for Design

The development of improved and more efficient plasma reactors is a costly process for the semiconductor industry. Until five years ago, the Industry made most of its advancements through a trial and error approach. More recently, the role of computational modeling in the design process has increased. Both conventional computational fluid dynamics (CFD) techniques like Navier-Stokes solvers as well as particle simulation methods are used to model plasma reactor flowfields. However, since high-density plasma reactors generally operate at low gas pressures on the order of 1 to 10 mTorr, a particle simulation may be necessary because of the failure of CFD techniques to model rarefaction effects. The direct simulation Monte Carlo method is the most widely accepted and employed particle simulation tool and has previously been used to investigate plasma reactor flowfields. A plasma DSMC code is currently under development at NASA Ames Research Center with its foundation as the object-oriented parallel Cornell DSMC code, MONACO. The present investigation is a follow up of a neutral flow investigation of the effects of process parameters as well as reactor design on etch rate and etch rate uniformity. The previous work concentrated on silicon etch of a chlorine flow in a configuration typical of electron cyclotron resonance (ECR) or helical resonator type reactors. The effects of the plasma on the dissociation chemistry were modeled by making assumptions about the electron temperature and number density. The electrons or ions themselves were not simulated.The present work extends these results by simulating the charged species.The electromagnetic fields are calculated such that power deposition is modeled self-consistently. Electron impact reactions are modeled along with mechanisms for charge exchange. An bipolar diffusion assumption is made whereby electrons remain tied to the ions. However, the velocities of tile electrons are allowed to be modified during collisions and are not confined to a Maxwellian distribution. The interaction between the neutral flow and plasma is examined, and results for etch rate uniformity from the previous research and the present plasma simulations are compared.

Hash, David B.↗

NASA NTRS1991

Deposition Of Diamondlike Films By ECR Microwave Plasma

Hard, amorphous hydrogenated carbon films of diamondlike quality deposited at room temperature on silicon, optical glass, and quartz through decomposition of CH4 in electron-cyclotron-resonance (ECR) microwave plasma of CH4 diluted with H2. Technique provides hard, abrasion-resistant coatings for lenses and other optical components. Films chemically inert and posses high electrical resistivity and breakdown fields, valuable properties in microelectronics applications.

Pool, Frederick S.↗

NASA NTRS1991

Material properties and device evaluations of ECR-deposited a-Si:H and a-SiC:H films

Device-quality a-Si:H and a-SiC:H films have been deposited using electron cyclotron resonance (ECR) microwave plasmas of SiH4, CH4, and H2 mixtures. Typical material properties of ECR-deposited, photosensitive a-Si:H films are: (1) high photosensitivity up to 2 x 106 with a photoconductivity of 10 exp -5 to 10 exp -4/(Ohm-cm), (2) a Tauc gap of 1.75 to 1.85 eV, (3) an Urbach slope of 50-60 meV determined by the constant photocurrent method, and (4) an integrated defect density of 1-2 x 10 exp 16/cu cm determined by junction capacitance measurements. Highly conductive, p-type a-SiC:H films have been produced by ECR plasmas with a conductivity of 0.2/(Ohm-cm).

Shing, Y. H.↗

NASA NTRS2007

Large-Area Permanent-Magnet ECR Plasma Source

A 40-cm-diameter plasma device has been developed as a source of ions for material-processing and ion-thruster applications. Like the device described in the immediately preceding article, this device utilizes electron cyclotron resonance (ECR) excited by microwave power in a magnetic field to generate a plasma in an electrodeless (noncontact) manner and without need for an electrically insulating, microwave-transmissive window at the source. Hence, this device offers the same advantages of electrodeless, windowless design - low contamination and long operational life. The device generates a uniform, high-density plasma capable of sustaining uniform ion-current densities at its exit plane while operating at low pressure [<10(exp -4) torr (less than about 1.3 10(exp -2) Pa)] and input power <200 W at a frequency of 2.45 GHz. Though the prototype model operates at 2.45 GHz, operation at higher frequencies can be achieved by straightforward modification to the input microwave waveguide. Higher frequency operation may be desirable in those applications that require even higher background plasma densities. In the design of this ECR plasma source, there are no cumbersome, power-hungry electromagnets. The magnetic field in this device is generated by a permanent-magnet circuit that is optimized to generate resonance surfaces. The microwave power is injected on the centerline of the device. The resulting discharge plasma jumps into a "high mode" when the input power rises above 150 W. This mode is associated with elevated plasma density and high uniformity. The large area and uniformity of the plasma and the low operating pressure are well suited for such material-processing applications as etching and deposition on large silicon wafers. The high exit-plane ion-current density makes it possible to attain a high rate of etching or deposition. The plasma potential is <3 V low enough that there is little likelihood of sputtering, which, in plasma processing, is undesired because it is associated with erosion and contamination. The electron temperature is low and does not vary appreciably with power.

Foster, John E.↗

NASA NTRS2012

Fabrication of a Kilopixel Array of Superconducting Microcalorimeters with Microstripline Wiring

A document describes the fabrication of a two-dimensional microcalorimeter array that uses microstrip wiring and integrated heat sinking to enable use of high-performance pixel designs at kilopixel scales (32 X 32). Each pixel is the high-resolution design employed in small-array test devices, which consist of a Mo/Au TES (transition edge sensor) on a silicon nitride membrane and an electroplated Bi/Au absorber. The pixel pitch within the array is 300 microns, where absorbers 290 microns on a side are cantilevered over a silicon support grid with 100-micron-wide beams. The high-density wiring and heat sinking are both carried by the silicon beams to the edge of the array. All pixels are wired out to the array edge. ECR (electron cyclotron resonance) oxide underlayer is deposited underneath the sensor layer. The sensor (TES) layer consists of a superconducting underlayer and a normal metal top layer. If the sensor is deposited at high temperature, the ECR oxide can be vacuum annealed to improve film smoothness and etch characteristics. This process is designed to recover high-resolution, single-pixel x-ray microcalorimeter performance within arrays of arbitrarily large format. The critical current limiting parts of the circuit are designed to have simple interfaces that can be independently verified. The lead-to-TES interface is entirely determined in a single layer that has multiple points of interface to maximize critical current. The lead rails that overlap the TES sensor element contact both the superconducting underlayer and the TES normal metal

Chervenak, James↗

DOE OSTI2024

Investigation of Materials for Radio Frequency Antenna Plasma Facing Components

Here, the interaction of radio frequency (RF) sheaths with fusion reactor relevant materials (e.g., tungsten and titanium diboride) is being studied on the RF Plasma Interaction Experiment (RF PIE). The RF PIE consists of an electron cyclotron resonance (ECR) plasma source (2.45 GHz, 5 kW) with a biased and heated RF electrode that is used to simulate antenna surfaces in contact with the edge plasma. Helium plasmas (density of ~1e18/m 3 , electron temperature of 4–5 eV) are being used to explore sheath formation on material surfaces with biases up to 500 V. The erosion of a tungsten surface is being studied spectroscopically using a mirror-linked 1 m Czerny-Turner UV imaging spectrometer with a spectral resolution of 0.012 nm for measuring plasma emission in and near the sheath. Tungsten line emission intensity is higher for RF versus dc biasing for similar plasma conditions and average ion energy. RF biasing causes a broadening of the ion energy distribution function (IEDF) due to the RF sheath, as determined from the hPIC2 code, and results in enhanced sputtering. Calculations of the expected sputtering yield for dc and RF biasing are consistent with experimental observations of changes in the 400.9 nm tungsten line emission intensity as a function of ion energy.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

NASA NTRS2007

Slotted antenna waveguide plasma source

A high density plasma generated by microwave injection using a windowless electrodeless rectangular slotted antenna waveguide plasma source has been demonstrated. Plasma probe measurements indicate that the source could be applicable for low power ion thruster applications, ion implantation, and related applications. This slotted antenna plasma source invention operates on the principle of electron cyclotron resonance (ECR). It employs no window and it is completely electrodeless and therefore its operation lifetime is long, being limited only by either the microwave generator itself or charged particle extraction grids if used. The high density plasma source can also be used to extract an electron beam that can be used as a plasma cathode neutralizer for ion source beam neutralization applications.

Foster, John↗