Results for “hydrogen lithography”

NASA NTRS1992

Properties Of Plasma-Deposited Amorphous Hydrogenated Carbon

Report reviews experimental research on plasma-deposited films of hydrogenated amorphous carbon. Such films exhibit electrical resistivity, semi-transparency, mechanical hardness, and chemical inertness. Useful as gate dielectrics and passivating layers in semiconductor devices, insulators for metal/insulator/metal devices, and masks in nanometer lithography. Show promise as wear-resistant, hard solid lubricating coats for bearings and optical components.

Miyoshi, Kazuhisa↗

NASA NTRS1993

Development and calibration of UV/VUV radiometric sources

A program exists at NIST to calibrate radiometric sources for the spectral range from 118-350 nm. These include deuterium lamps, hollow-cathode lamps, RF-excited dimer lamps, and wall-stabilized argon arcs. Sources have been calibrated for and used by researchers in solar physics, astrophysics, atmospheric physics (ozone measurements), magnetically controlled fusion, and photobiology. The argon arcs were developed in our laboratory, and provide intense sources of both radiance and irradiance. Calibrations are performed relative to two primary sources, a wall-stabilized hydrogen arc and a 12,000 K black-body line arc, both developed in our laboratory. Also we recently have begun periodic calibrations on the NIST storage ring, SURF II, to insure consistency between our respective radiometric bases. Various sources have been calibrated for space' applications, including several which are flyable. Also, some development and testing of radiometers for semiconductor lithography were recently carried out with an intense argon arc source.

Bridges, J. M.↗