Improved ion sources
Ion sources with magnetically aligned electron beam and compatibility with quadrupole mass spectrometer for planetary atmospheric analysis
ELECTRON BEAM↗
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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.
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On the use of electrical ion sources for ion tracer experiments in the magnetosphere
Electric ion source in orbit around earth to generate probes for magnetosphere studies of electric fields, ion diffusion, and distant magnetic field configuration
ELECTRIC FIELD↗
Reversal ion source - A new source of negative ion beams
A new type of ion source utilizing beams of electrons and target molecules, rather than a diffuse, volume plasma, is described. The source utilizes an electrostatic electron 'mirror' which reverses trajectories in an electron beam, producing electrons at their turning point having a distribution of velocities centered at zero velocity. A gas which attaches zero-velocity electrons is introduced at this turning point. Negative ions are produced by an attachment or dissociative attachment process. For many of the thermal electron-attaching molecules the cross sections can be quite large, varying as the inverse square root of the electron energy or just the s-wave threshold law. The efficiency and current density of the ion source for production of Cl(-) through the large, thermal energy attachment process is estimated. It is argued that the source can be used for the production of negative ions through attachment resonances located at higher energies as well.
Orient, O. J.↗
Tandem-Mirror Ion Source
Improved ion source produces beam of ions at any kinetic energy from 1 to 1,000 eV, with little spread in energy or angle. Such ion beams useful in studies of surface properties of materials, surface etching, deposition, and development of plasma-diagnostic instrumentation. Tandemmirror ion source uses electrostatic and magnetic fields to keep electrons in ionization chamber and assure uniform output ion beam having low divergence in energy and angle.
Biddle, A.↗
Equivalent equilibrium ion distributions in ion sources and beams
Ion sources and ion beams often contain ions of more than one charge-to-mass ratio, due to the presence of multiple ionization states and/or multiple atomic and molecular ion species in the source. We show that, under certain conditions, analysis of these systems can be simplified using the notion of “equivalent equilibrium ion distributions” (EEIDs). These distributions have identical ion trajectories, space-charge distributions, and electric-field distributions, but can be composed of ion species with arbitrary charge-to-mass ratios. We use this result to obtain multi-species generalizations for the perveance of an ion diode, which relates the diode voltage to the extracted beam current, and for the perveance of a drifting ion beam, which determines the axial length-scale for beam expansion due to the self-electric field. Applied to a quasi-neutral plasma ion source containing cold ions and hot electrons, we find that the location of the beam-plasma interface (meniscus), where ions are extracted from the plasma, depends on the electron density and ion energy per unit charge at the interface, independent of the ion composition. For certain types of numerical simulations, EEIDs allow one to calculate the beam optics of an intense multi-species ion source by doing a simulation for a single ion species with an artificial charge-to-mass ratio chosen to minimize computation time. We illustrate these results using the 3D particle-in-cell, finite-element code Aleph. The simulations show how ions in a plasma source self-consistently accelerate to the supersonic speed needed for steady, radially expanding flow. Multi-species equilibria are subject to streaming instabilities because, while the different species have the same kinetic energy per unit charge, their velocities scale with the square root of the charge-to-mass ratio. The simulations show that a strong ion streaming instability can occur in a multi-species plasma ion source.
74 ATOMIC AND MOLECULAR PHYSICS↗
Aperture Ion Source
The aperture ion source was conceived to eliminate distortion in measurements of angular distributions of neutral atoms and molecules that require electron-impact ion sources. The approach simplifies the coupling between ion source and spectrometer while providing virtually distortion-free angular distributions and improved accuracy in the dimensions of the ionization region. Furthermore, it virtually eliminates the volume occupied by the ion source.
Herrero, Fred↗
Carbon/Carbon Grids For Ion Sources
Ion-extraction grids made of carbon/carbon composites used in spacecraft ion engines and industrial ion sources in place of molybdenum grids. In principle, carbon/carbon grids offer greater extraction efficiency and longer life. Grid fabricated by mechanical drilling, laser drilling, or electrical-discharge machining of array of holes in sheet of carbon/carbon. Advantages; better alignment and slower erosion.
Garner, Charles E.↗
A 5 x 40 cm rectangular-beam multipole ion source
A rectangular ion source particularly suited for the continuous sputter processing of materials over a wide area is discussed. A multipole magnetic field configuration was used to design an ion source with a 5 x 40 cm beam area, while a three-grid ion optics system was used to maximize ion current density at the design ion energy of 500 eV. An average extracted current density of about 4 mA/sq cm could be obtained from 500 eV Ar ions. The difference between the experimental performance and the design value of 6 mA/sq cm is attributed to grid misalignment due to thermal expansion. The discharge losses at typical operating conditions ranged from about 600 to 1000 eV/ion, in reasonable agreement with the design value of 800 eV/ion. The use of multiple rectangular-beam ion sources to process wider areas than would be possible with a single source was also studied, and the most uniform coverage was found to be obtainable with a 0 to 2 cm overlap.
Robinson, R. S.↗
Industrial ion source technology
In reactive ion etching of Si, varying amounts of O2 were added to the CF4 background. The experimental results indicated an etch rate less than that for Ar up to an O2 partial pressure of about .00006 Torr. Above this O2 pressure, the etch rate with CF4 exceeded that with Ar alone. For comparison the random arrival rate of O2 was approximately equal to the ion arrival rate at a partial pressure of about .00002 Torr. There were also ion source and ion pressure gauge maintenance problems as a result of the use of CF4. Large scale (4 sq cm) texturing of Si was accomplished using both Cu and stainless steel seed. The most effective seeding method for this texturing was to surround the sample with large inclined planes. Designing, fabricating, and testing a 200 sq cm rectangular beam ion source was emphasized. The design current density was 6 mA/sq cm with 500 eV argon ions, although power supply limitations permitted operation to only 2 mA/sq cm. The use of multiple rectangular beam ion sources for continuous processing of wider areas than would be possible with a single source was also studied. In all cases investigated, the most uniform coverage was obtained with 0 to 2 cm beam overlay. The maximum departure from uniform processing at optimum beam overlap was found to be +15%.
Kaufman, H. R.↗
A hollow cathode hydrogen ion source
High current density ion sources have been used to heat plasmas in controlled thermonuclear reaction experiments. High beam currents imply relatively high emission currents from cathodes which have generally taken the form of tungsten filaments. A hydrogen ion source is described which was primarily developed to assess the emission current capability and design requirements for hollow cathodes for application in neutral injection devices. The hydrogen source produced ions by electron bombardment via a single hollow cathode. Source design followed mercury ion thruster technology, using a weak magnetic field to enhance ionization efficiency.
Sovey, J. S.↗
A hollow cathode hydrogen ion source
High current density ion sources have been used to heat plasmas in controlled thermonuclear reaction experiments. High beam currents imply relatively high emission currents from cathodes which have generally taken the form of tungsten filaments. This paper describes a hydrogen ion source which was primarily developed to assess the emission current capability and design requirements for hollow cathodes for application in neutral injection devices. The hydrogen source produced ions by electron bombardment via a single hollow cathode. Source design followed mercury ion thruster technology, using a weak magnetic field to enhance ionization efficiency. A 1.3-cm-diam hollow cathode using a low work function material dispenser performed satisfactorily over a discharge current range of 10-90 A. Cylindrical probe measurements taken without ion extraction indicate maximum ion number densities on the order of 10 trillion/cu cm. Discharge durations ranged from 30 sec to continuous operation. Tests with beam extraction at 2.5 keV and 30 A discharge current yield average ion beam current densities of 0.1 A/sq cm over a 5-cm extraction diameter. Results of this study can be used to supply the baseline information needed to scale hollow cathodes for operation at discharge currents of hundreds of amperes using distributed cathodes.
Sovey, J. S.↗
Comparison of Mg-based liquid metal ion sources for scalable focused-ion-implantation doping of GaN
We compare the suitability of various magnesium-based liquid metal alloy ion sources (LMAISs) for scalable focused-ion-beam (FIB) implantation doping of GaN. We consider GaMg, MgSO 4 $\bullet$7H 2 O, MgZn, AlMg, and AuMgSi alloys. Although issues of oxidation (GaMg), decomposition (MgSO 4 $\bullet$7H 2 O), and excessive vapor pressure (MgZn and AlMg) were encountered, the AuMgSi alloy LMAIS operating in a Wien-filtered FIB column emits all Mg isotopes in singly and doubly charged ionization states. We discuss the operating conditions to achieve <20 nm spot size Mg FIB implantation and present Mg depth profile data from time-of-flight secondary ion mass spectrometry. We also provide insight into implantation damage and recovery based on cathodoluminescence spectroscopy before and after rapid thermal processing. Prospects for incorporating the Mg LMAIS into high-power electronic device fabrication are also discussed.
36 MATERIALS SCIENCE↗
A cold cathode ion source mass spectrometer employing ion counting techniques
Design and construction of mass spectrometer using cold cathode source of ions, quadrupole mass analyzer, and ion counting detectors
Blum, P.↗
Digital twin framework for PIP-II linac: AI-driven multi-scale modeling from ion source to 800 MeV
The PIP-II superconducting linac at Fermilab is designed to deliver multi-megawatt proton beams for neutrino physics and other high-intensity applications. To expedite commissioning and enhance operational reliability, we have developed an EPICS-based data flow framework that seamlessly integrates digital twins (DT) with physical twins (PT). These digital twins comprise high-fidelity beam dynamics models or data-driven surrogate models connected to their physical counterparts through real-time diagnostics and advanced machine-learning algorithms.Central to this framework is Linac_Gen, an accelerated simulation tool that incorporates convolutional neural networks, random forests, and genetic algorithms to provide up to a tenfold speedup in optimizing the accelerator geometry model. An EPICS translator layer ensures interoperability by efficiently mapping lattice parameters across diverse simulation platforms.Our EPICS-based framework supports multiple operational modes—monitoring, passive learning, closed-loop control, and online learning—covering the entire machine lifecycle. By leveraging HPC resources and multi-objective optimization techniques, the digital twin enables adaptive trajectory correction, real-time fault detection, and predictive modeling of beam stability. This comprehensive approach paves the way for robust, high-intensity operation and data-driven accelerator R&D at Fermilab.
Pathak, Abhishek [Fermilab]↗
Experimental performance of a microwave cavity plasma disk ion source
The detailed description and performance characteristics of a microwave ion source are presented. This ion source utilizes an internally tuned, single-mode (or selective multimode) cylindrical cavity applicator to focus and match microwave energy into a disk-shaped discharge zone. The combination of mode focus control and variable, internal cavity matching allows the efficient operation and beam extraction over a wide range of pressures, powers and gaseous inputs. Experimental measurements of ion beam current versus accelerating voltage and input microwave power in xenon and oxygen gas are presented. Ion source specific energy and mass utilization versus experimental variables are also determined. The experimental performance demonstrates the ability of this ion source to extract an ion beam with a well matched, stable, and continuous operation over a wide range of input gases, low pressures, and over input gas flow rates in excess of 100 to a few sccm. Double Langmuir probe measurements in xenon gas indicate high degrees of ionization, and electron and ion concentrations in excess of 100 critical densities in the microwave discharge zone. This ion source has many potential uses such as spacecraft electric propulsion, material ion beam processing, and neutral beam ion sources.
Root, J.↗
H - Ion Source RF Plasma Testing with 13 MHz and 27 MHz at the Spallation Neutron Source (SNS)
The baseline RF-driven H⁻ ion source configuration at the Spallation Neutron Source (SNS) facility uses a continuous wave (CW) 600 W 13 MHz RF system to ignite and maintain a low-density plasma inside the ion source vacuum chamber. After the continuous low-density 13 MHz plasma has been established, a pulsed (typical 1 ms pulse width and 60 Hz pulse repetition rate) 80 kW 2 MHz RF system is used to increase the plasma density to produce the pulsed H⁻ ion beam. Incremental upgrades and improvements to the SNS ion source systems have resulted in the ability to reliably operate an H⁻ ion source for SNS neutron production run cycles that can last up to four months. Conditions inside the SNS H⁻ ion source evolve throughout a four-month run cycle due to changes in impurity levels, sputtering, and erosion. As the internal ion source conditions change during the run cycle, there can also be changes in plasma stability and the 13 MHz RF power level required to ignite the plasma. This paper presents the preliminary results of testing performed on the SNS Ion Source Test Stand (ISTS) system where we looked at plasma ignition and plasma stability using 27 MHz RF in place of the baseline 13 MHz RF system.
70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗