Improved ion sources
Ion sources with magnetically aligned electron beam and compatibility with quadrupole mass spectrometer for planetary atmospheric analysis
ELECTRON BEAM↗
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On the use of electrical ion sources for ion tracer experiments in the magnetosphere
Electric ion source in orbit around earth to generate probes for magnetosphere studies of electric fields, ion diffusion, and distant magnetic field configuration
ELECTRIC FIELD↗
Reversal ion source - A new source of negative ion beams
A new type of ion source utilizing beams of electrons and target molecules, rather than a diffuse, volume plasma, is described. The source utilizes an electrostatic electron 'mirror' which reverses trajectories in an electron beam, producing electrons at their turning point having a distribution of velocities centered at zero velocity. A gas which attaches zero-velocity electrons is introduced at this turning point. Negative ions are produced by an attachment or dissociative attachment process. For many of the thermal electron-attaching molecules the cross sections can be quite large, varying as the inverse square root of the electron energy or just the s-wave threshold law. The efficiency and current density of the ion source for production of Cl(-) through the large, thermal energy attachment process is estimated. It is argued that the source can be used for the production of negative ions through attachment resonances located at higher energies as well.
Orient, O. J.↗
Tandem-Mirror Ion Source
Improved ion source produces beam of ions at any kinetic energy from 1 to 1,000 eV, with little spread in energy or angle. Such ion beams useful in studies of surface properties of materials, surface etching, deposition, and development of plasma-diagnostic instrumentation. Tandemmirror ion source uses electrostatic and magnetic fields to keep electrons in ionization chamber and assure uniform output ion beam having low divergence in energy and angle.
Biddle, A.↗
Aperture Ion Source
The aperture ion source was conceived to eliminate distortion in measurements of angular distributions of neutral atoms and molecules that require electron-impact ion sources. The approach simplifies the coupling between ion source and spectrometer while providing virtually distortion-free angular distributions and improved accuracy in the dimensions of the ionization region. Furthermore, it virtually eliminates the volume occupied by the ion source.
Herrero, Fred↗
Carbon/Carbon Grids For Ion Sources
Ion-extraction grids made of carbon/carbon composites used in spacecraft ion engines and industrial ion sources in place of molybdenum grids. In principle, carbon/carbon grids offer greater extraction efficiency and longer life. Grid fabricated by mechanical drilling, laser drilling, or electrical-discharge machining of array of holes in sheet of carbon/carbon. Advantages; better alignment and slower erosion.
Garner, Charles E.↗
A 5 x 40 cm rectangular-beam multipole ion source
A rectangular ion source particularly suited for the continuous sputter processing of materials over a wide area is discussed. A multipole magnetic field configuration was used to design an ion source with a 5 x 40 cm beam area, while a three-grid ion optics system was used to maximize ion current density at the design ion energy of 500 eV. An average extracted current density of about 4 mA/sq cm could be obtained from 500 eV Ar ions. The difference between the experimental performance and the design value of 6 mA/sq cm is attributed to grid misalignment due to thermal expansion. The discharge losses at typical operating conditions ranged from about 600 to 1000 eV/ion, in reasonable agreement with the design value of 800 eV/ion. The use of multiple rectangular-beam ion sources to process wider areas than would be possible with a single source was also studied, and the most uniform coverage was found to be obtainable with a 0 to 2 cm overlap.
Robinson, R. S.↗
Industrial ion source technology
In reactive ion etching of Si, varying amounts of O2 were added to the CF4 background. The experimental results indicated an etch rate less than that for Ar up to an O2 partial pressure of about .00006 Torr. Above this O2 pressure, the etch rate with CF4 exceeded that with Ar alone. For comparison the random arrival rate of O2 was approximately equal to the ion arrival rate at a partial pressure of about .00002 Torr. There were also ion source and ion pressure gauge maintenance problems as a result of the use of CF4. Large scale (4 sq cm) texturing of Si was accomplished using both Cu and stainless steel seed. The most effective seeding method for this texturing was to surround the sample with large inclined planes. Designing, fabricating, and testing a 200 sq cm rectangular beam ion source was emphasized. The design current density was 6 mA/sq cm with 500 eV argon ions, although power supply limitations permitted operation to only 2 mA/sq cm. The use of multiple rectangular beam ion sources for continuous processing of wider areas than would be possible with a single source was also studied. In all cases investigated, the most uniform coverage was obtained with 0 to 2 cm beam overlay. The maximum departure from uniform processing at optimum beam overlap was found to be +15%.
Kaufman, H. R.↗
A hollow cathode hydrogen ion source
High current density ion sources have been used to heat plasmas in controlled thermonuclear reaction experiments. High beam currents imply relatively high emission currents from cathodes which have generally taken the form of tungsten filaments. A hydrogen ion source is described which was primarily developed to assess the emission current capability and design requirements for hollow cathodes for application in neutral injection devices. The hydrogen source produced ions by electron bombardment via a single hollow cathode. Source design followed mercury ion thruster technology, using a weak magnetic field to enhance ionization efficiency.
Sovey, J. S.↗
A hollow cathode hydrogen ion source
High current density ion sources have been used to heat plasmas in controlled thermonuclear reaction experiments. High beam currents imply relatively high emission currents from cathodes which have generally taken the form of tungsten filaments. This paper describes a hydrogen ion source which was primarily developed to assess the emission current capability and design requirements for hollow cathodes for application in neutral injection devices. The hydrogen source produced ions by electron bombardment via a single hollow cathode. Source design followed mercury ion thruster technology, using a weak magnetic field to enhance ionization efficiency. A 1.3-cm-diam hollow cathode using a low work function material dispenser performed satisfactorily over a discharge current range of 10-90 A. Cylindrical probe measurements taken without ion extraction indicate maximum ion number densities on the order of 10 trillion/cu cm. Discharge durations ranged from 30 sec to continuous operation. Tests with beam extraction at 2.5 keV and 30 A discharge current yield average ion beam current densities of 0.1 A/sq cm over a 5-cm extraction diameter. Results of this study can be used to supply the baseline information needed to scale hollow cathodes for operation at discharge currents of hundreds of amperes using distributed cathodes.
Sovey, J. S.↗
A cold cathode ion source mass spectrometer employing ion counting techniques
Design and construction of mass spectrometer using cold cathode source of ions, quadrupole mass analyzer, and ion counting detectors
Blum, P.↗
Experimental performance of a microwave cavity plasma disk ion source
The detailed description and performance characteristics of a microwave ion source are presented. This ion source utilizes an internally tuned, single-mode (or selective multimode) cylindrical cavity applicator to focus and match microwave energy into a disk-shaped discharge zone. The combination of mode focus control and variable, internal cavity matching allows the efficient operation and beam extraction over a wide range of pressures, powers and gaseous inputs. Experimental measurements of ion beam current versus accelerating voltage and input microwave power in xenon and oxygen gas are presented. Ion source specific energy and mass utilization versus experimental variables are also determined. The experimental performance demonstrates the ability of this ion source to extract an ion beam with a well matched, stable, and continuous operation over a wide range of input gases, low pressures, and over input gas flow rates in excess of 100 to a few sccm. Double Langmuir probe measurements in xenon gas indicate high degrees of ionization, and electron and ion concentrations in excess of 100 critical densities in the microwave discharge zone. This ion source has many potential uses such as spacecraft electric propulsion, material ion beam processing, and neutral beam ion sources.
Root, J.↗
Characteristics of a microwave plasma disk ion source
This letter describes an ion source using a cylindrical microwave cavity operating in a hybrid mode associated with the TE(211) empty cavity mode. The design principles and associated electrical systems are also discussed. Extracted beam current versus accelerating voltage, and specific energy versus extracted beam current are displayed over the range of flow rates 20-80 sccm and absorbed powers 80-150 W. The results show the feasibility of this concept. The ion source has many potential uses such as space propulsion, material processing, and neutral beam ion sources.
Asmussen, J.↗
Negative deuterium-ion source
Negative ions are formed by collisions with surfaces having low work function.
Goldstein, R.↗
Industrial ion source technology
A 30 cm electron bombardment ion source was designed and fabricated for micromachining and sputtering applications. This source has a multipole magnetic field that employs permanent magnets between permeable pole pieces. An average ion current density of 1 ma/sq cm with 500 eV argon ions was selected as a design operating condition. The ion beam at this operating condition was uniform and well collimated, with an average variation of plus or minus 5 percent over the center 20 cm of the beam at distances up to 30 cm from the ion source. A variety of sputtering applications were undertaken with a small 10 cm ion source to better understand the ion source requirements in these applications. The results of these experimental studies are also included.
Kaufman, H. R.↗
A 30-cm diameter argon ion source
A 30 cm diameter argon ion source was evaluated. Ion source beam currents up to 4a were extracted with ion energies ranging from 0.2 to 1.5 KeV. An ion optics scaling relation was developed for predicting ion beam extraction capability as a function of total extraction voltage, gas type, and screen grid open area. Ignition and emission characteristics of several hollow cathode geometries were assessed for purposes of defining discharge chamber and neutralizer cathodes. Also presented are ion beam profile characteristics which exhibit broad beam capability well suited for ion beam sputtering applications.
Sovey, J. S.↗