Search NASA⌕ Search

SEARCH · Search NASA

Results for “mechanical polishing”

Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

Quote a phrase for an exact phrase match. Source license links do not imply unrestricted reuse.

At least 19 records

Electro-Chemically Enhanced Mechanical Polishing of Nickel Mandrels

Grinding and mechanical polishing techniques used for x-ray optics mandrel figuring lead to mid-frequency surface ripple. These small figure variations have to be addressed in order to improve the performance of the resulting x-ray mirrors. If the electrochemical etching is combined with mechanical polishing, the figuring and the surface finishing cm be done simultaneously and be used to correct the mid-frequency surface ripple. It is shown that the electrochemical mechanical polishing method allows selective removal of nickel alloy without mandrel surface microroughness degradation.

Gubarev, Mikhail↗

A Nanochannel fabrication technique using chemical-mechanical polishing (CMP) and thermal oxidation

We have developed a new nanochannel fabrication technique using chemical-mechanical polishing (CMP) and thermal oxidation. With this technique, it is possible to control the width, length, and depth of the nanochannels without the need for nanolithography. The use of sacrificial SiO2 layers allows the fabrication of centimeter-long nanochannels. In addition, the fabrication process is CMOS compatible. We have successfully fabricated an array of extremely long and narrow nanochannels (i.e. 10 mm long, 25 nm wide and 100 nm deep) with smooth inner surfaces.

bionanotechnology↗

Chemical Mechanical Polishing of Silicon Carbide

The High Temperature Integrated Electronics and Sensors (HTIES) team at the NASA Lewis Research Center is developing silicon carbide (SiC) as an enabling electronic technology for many aerospace applications. The Lewis team is focusing on the chemical vapor deposition of the thin, single-crystal SiC films from which devices are fabricated. These films, which are deposited (i.e., epitaxially "grown") on commercial wafers, must consist of a single crystal with very few structural defects so that the derived devices perform satisfactorily and reliably. Working in collaboration (NASA grant) with Professor Pirouz of Case Western Reserve University, we developed a chemical-mechanical polishing (CMP) technique for removing the subsurface polishing damage prior to epitaxial growth of the single-crystal SiC films.

Powell, J. Anthony↗

Mechanized Polishing of Optical Rod and Fiber Ends

Workpiece holder for standard grinding and polishing machine makes it easier to produce optical finish and shape on end of metal or glass rod or bundle of optical fibers. Previously, glass parts lapped and polished manually, time-consuming procedure calling for considerable skill.

Gum, J. S.↗

Electrochemical and mechanical polishing and shaping method and system

A method and system are provided for the shaping and polishing of the surface of a material selected from the group consisting of electrically semi-conductive materials and conductive materials. An electrically non-conductive polishing lap incorporates a conductive electrode such that, when the polishing lap is placed on the material's surface, the electrode is placed in spaced-apart juxtaposition with respect to the material's surface. A liquid electrolyte is disposed between the material's surface and the electrode. The electrolyte has an electrochemical stability constant such that cathodic material deposition on the electrode is not supported when a current flows through the electrode, the electrolyte and the material. As the polishing lap and the material surface experience relative movement, current flows through the electrode based on (i) adherence to Faraday's Law, and (ii) a pre-processing profile of the surface and a desired post-processing profile of the surface.

Engelhaupt, Darell E.↗

Carbon-Nanotube-Carpet Heat-Transfer Pads

Microscopic thermal-contact pads that include carpet-like arrays of carbon nanotubes have been invented for dissipating heat generated in integrated circuits and similarly sized single electronic components. The need for these or other innovative thermal-contact pads arises because the requisite high thermal conductances cannot be realized by scaling conventional macroscopic thermal-contact pads down to microscopic sizes. Overcoming limitations of conventional thermal-contact materials and components, the carbon-nanotube thermal-contact pads offer the high thermal conductivities needed to accommodate the high local thermal power densities of modern electronic circuits, without need for large clamping pressures, extreme smoothness of surfaces in contact, or gap-filling materials (e.g., thermally conductive greases) to ensure adequate thermal contact. Moreover, unlike some conventional thermal-contact components, these pads are reusable. The figure depicts a typical pad according to the invention, in contact with a rough surface on an electronic component that is to be cooled. Through reversible bending and buckling of carbon nanotubes at asperities on the rough surface, the pad yields sufficiently, under relatively low contact pressure, that thermal contact is distributed to many locations on the surface to be cooled, including valleys where contact would not ordinarily occur in conventional clamping of rigid surfaces. Hence, the effective thermal-contact area is greater than that achievable through scaling down of a macroscopic thermal-contact pad. The extremely high longitudinal thermal conductivities of the carbon nanotubes are utilized to conduct heat away from potential hot spots on the surface to be cooled. The fibers protrude from a layer of a filler material (Cu, Ag, Au, or metal-particle- filled gels), which provides both mechanical support to maintain the carbon nanotubes in alignment and thermal conductivity to enhance the diffusion of concentrated heat from the nanotubes into the larger adjacent volume of a heat sink. The array of carbon nanotubes, the filler material, and the heat sink are parts of a unitary composite structure that is fabricated as follows: 1. Using techniques that have been reported previously, the array of substantially perpendicularly oriented carbon nanotubes is grown on a metal, silicon, or other suitable thermally conductive substrate that is intended to become the heat sink. 2. By means of chemical vapor deposition, physical vapor deposition, plasma deposition, ion sputtering, electrochemical deposition, or casting from a liquid phase, some or all of the interstitial volume between carbon nanotubes is filled with the aforementioned layer of mechanically supporting, thermally conductive material. 3. To cause the carbon nanotubes to protrude the desired length from the filler material, an outer layer of filler is removed by mechanical polishing, chemical mechanical polishing, wet chemical etching, electrochemical etching, or dry plasma etching.

Li, Jun↗

An Auger electron spectroscopy study of surface-preparation contaminants

There are many cleaning techniques that are presently being employed for surface preparation of materials that are subsequently exposed to ultrahigh vacuum (UHV). Unfortunately, there are virtually no comparative measurements which establish the residual contaminant level of each method. In this report, eleven different cleaning methods, ranging from only detergent cleaning to electrochemical polishing, were applied to identical samples of 347 stainless steel. Two surface conditions, a standard machined surface and a mechanically polished surface, were studied. Auger electron spectroscopy (AES) within a UHV environment was then used to detect the types of contaminants and the magnitudes found on the sample surfaces. It was found that the electrochemical polishing gave the least contaminated surface of all metals studied and that mechanically polished surfaces were significantly cleaner than the as-machined surfaces for any given cleaning method. Furthermore, it was also found that the residual contaminations left by methanol, ethanol, isopropyl alcohol, acetone, and freon finishing rinses are almost the same.

Wu, D.↗

Liquid metal drop ejection

The aim of this project was to demonstrate the possibility of ejecting liquid metals using drop on demand printing technology. The plan was to make transducers for operation in the 100 MHz frequency range and to use these transducers to demonstrate the ability to eject drops of liquid metals such as gallium. Two transducers were made by indium bonding piezoelectric lithium niobate to quartz buffer rods. The lithium niobate plates were thinned by mechanical polishing to a thickness of 37 microns for operation at 100 MHz. Hemispherical lenses were polished in the opposite ends of the buffer rods. The lenses, which focus the sound waves in the liquid metal, had an F-number equals 1. A mechanical housing was made to hold the transducers and to allow precise control over the liquid level above the lens. We started by demonstrating the ability to eject drops of water on demand. The drops of water had a diameter of 15 microns which corresponds to the wavelength of the sound wave in the water. A videotape of this ejection was made. We then used a mixture of Gallium and Indium (used to lower the melting temperature of the Gallium) to demonstrate the ejection of liquid metal drops. This proved to be difficult because of the oxide skin which forms on the surface of the liquid. In some instances, we were able to eject metal drops, however, this was not consistent and reproducible. An experiment was set up at NASA-Lewis to stabilize the process of drop on demand liquid metal ejection. The object was to place the transducer and liquid metal in a vacuum station so that no oxide would form on the surface. We were successful in demonstrating that liquid metals could be ejected on demand and that this technology could be used for making sheet metal in space.

Khuri-Yakub, B. T.↗

Transmission Electron Microscopy (TEM) Sample Preparation of Si(1-x)Gex in c-Plane Sapphire Substrate

The National Aeronautics and Space Administration-invented X-ray diffraction (XRD) methods, including the total defect density measurement method and the spatial wafer mapping method, have confirmed super hetero epitaxy growth for rhombohedral single crystalline silicon germanium (Si1-xGex) on a c-plane sapphire substrate. However, the XRD method cannot observe the surface morphology or roughness because of the method s limited resolution. Therefore the authors used transmission electron microscopy (TEM) with samples prepared in two ways, the focused ion beam (FIB) method and the tripod method to study the structure between Si1-xGex and sapphire substrate and Si1?xGex itself. The sample preparation for TEM should be as fast as possible so that the sample should contain few or no artifacts induced by the preparation. The standard sample preparation method of mechanical polishing often requires a relatively long ion milling time (several hours), which increases the probability of inducing defects into the sample. The TEM sampling of the Si1-xGex on sapphire is also difficult because of the sapphire s high hardness and mechanical instability. The FIB method and the tripod method eliminate both problems when performing a cross-section TEM sampling of Si1-xGex on c-plane sapphire, which shows the surface morphology, the interface between film and substrate, and the crystal structure of the film. This paper explains the FIB sampling method and the tripod sampling method, and why sampling Si1-xGex, on a sapphire substrate with TEM, is necessary.

Kim, Hyun Jung↗

Fatigue Behavior of Laser Powder Bed Fused HAYNES 214: Effects of Different Surface Treatments

In this study, under NASA’s Rapid and Analysis Manufacturing Propulsion Technology (RAMPT) project, effects of different surface post-treatments on surface texture and fatigue behavior of L-PBF Alloy 214 were investigated. Various subtractive SPTs including abrasive flow machining (AFM), machining (M), shot peening (SP), vapormatt (VM), dry electropolishing (DE), chemical milling (CM), chemical-mechanical polishing (CMP), electro chemical (ECP) were applied to study the variations of the surface texture, microstructure and uniaxial fatigue behavior under fully reversed strain-controlled condition at four different strain amplitudes of 0.005, 0.004, 0.003, and 0.0025 mm/mm. The insights gained regarding the relationship between structural and mechanical properties for different SPTs can help establish guidelines for selecting the most effective process to enhance the performance of Laser Powder Bed Fusion (L-PBF) Alloy 214, especially for critical aerospace applications.

Post-Processing↗

Technology Demonstrator for Direct Polishing of a 50cm C/SiC Ultra Light Mirror

The NRSU portion of the contract was completed on schedule and within acceptable limits of the estimated cost. The lapping of the substrate started on schedule, and completed ahead of schedule. The polishing of the substrate was begun ahead of schedule, and was completed approximately one month ahead of schedule. It is our opinion that the substrate meets the requirements of "diffraction limited performance at 2 microns" over the measured 16 in. area. The final photos suggest that there may be edge roll-off beyond the 16 in. diameter. However, we cannot quantify this. It is our opinion that this material is suitable for use in lightweight optics as long as cladding of some type is used (Silicon, SiC, Sol-Gel, etc), as the bare material itself is too "porous" to obtain a high quality finish. We feel that this part was at the low limit of structural integrity required to mechanically polish to this level of figure requirement. Any lesser structural integrity would require some form of "non contact" figuring.

Scribner, Ken↗

Influence of various surface pretreatments on adherence of sputtered molybdenum disulfide to silver, gold, copper, and bronze

Solid film lubricants of radio frequency sputtered molybdenum disulfide (MoS2) were applied to silver, gold, copper, and bronze surfaces that had various pretreatments (mechanical polishing, sputter etching, oxidation, and sulfurization). Optical and electron transmission micrographs and electron diffraction patterns were used to interpret the film formation characteristics and to evaluate the sputtering conditions in regard to the film and substrate compatibility. Sputtered MoS2 films flaked and peeled on silver, copper, and bronze surfaces except when the surfaces had been specially oxidized. The flaking and peeling was a result of sulfide compound formation and the corresponding grain growth of the sulfide film. Sputtered MoS2 films showed no peeling and flaking on gold surfaces regardless of surface pretreatment.

Spalvins, T.↗

Dynamic oxidation behavior of TD-NiCr alloy with different surface pretreatments

Oxidation tests of TD-NiCr alloy with different surface pretreatments were conducted in a Mach-5 arc-jet at 1200 C and 0.002 lb/sec flowing air environment. The mechanisms responsible for the observed oxidation behavior are examined. The presence of atomic oxygen in the air stream plays a significant role in determining the oxidation characteristic of the alloy. The rate of Cr2O3 vaporization by formation of volatile CrO3 is greatly enhanced by the flowing conditions. The typical microstructure of oxides formed in the dynamic tests consists of an external layer of NiO with a porous mushroom-type morphology, an intermediate layer of NiO and Cr2O3 oxide mixture, and a continuous inner layer of Cr2O3 in contact with the Cr-depleted alloy substrate. Three basic processes underlying the formation of mushroom-type NiO are identified and discussed. The oxidation rate is determined by the rate of vaporization of NiO. Surface pretreatment has a significant effect on the oxidation behavior of the alloy in the early stage of oxidation, but becomes less important as exposure time increases. Mechanical polishing induces surface recrystallization, but promotes the concurrence of external growth of NiO and internal oxidation of the alloy in the dynamic atmosphere.

Young, C. T.↗