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Results for “vacuum arcs”

Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 19 records
All sourcesNASA NTRSDOE OSTI
NASA NTRS2001

A theoretical analysis of vacuum arc thruster performance

In vacuum arc discharges the current is conducted through vapor evaporated from the cathode surface. In these devices very dense, highly ionized plasmas can be created from any metallic or conducting solid used as the cathode. This paper describes theoretical models of performance for several thruster configurations which use vacuum arc plasma sources. This analysis suggests that thrusters using vacuum arc sources can be operated efficiently with a range of propellant options that gives great flexibility in specific impulse. In addition, the efficiency of plasma production in these devices appears to be largely independent of scale because the metal vapor is ionized within a few microns of the cathode electron emission sites, so this approach is well-suited for micropropulsion.

thruster↗
NASA NTRS1974

Vacuum arc melting of tungsten-hafnium-carbon alloy

The vacuum arc casting of tungsten alloys, which contain carbon as an alloy addition, require special melting procedures in order to produce melts of consistent controlled levels of alloy content. A melting procedure will be described in which elemental components of a tungsten 0.35% HfC alloy are assembled to form an electrode for ac vacuum arc melting to produce 3-in.-diam ingots. Melting procedures and analytical chemistry are discussed and compared with data for ingots produced by other techniques.

Ammon, R. L.↗
DOE OSTI2021

An integrated approach to understanding RF vacuum arcs

Although used in the design and costing of large projects such as linear colliders and fusion tokamaks, the theory of vacuum arcs and gradient limits is not well understood. Almost 120 years after the isolation of vacuum arcs, the exact mechanisms of the arcs and the damage they produce are still being debated. We describe our simple and general model of the vacuum arc that can incorporate all active mechanisms and aims to explain all relevant data. Our four stage model, is based on experiments done at 805 MHz with a variety of cavity geometries, magnetic fields, and experimental techniques as well as data from Atom Probe Tomography and failure analysis of microelectronics. The model considers the trigger, plasma formation, plasma evolution and surface damage phases of the RF arc. This paper also examines how known mechanisms can explain the observed sharp field dependence, fast breakdown times and observed surface damage. We update the model and discuss new features while also pointing out where new data would be useful in extending the model to a wider range of frequencies.

72 PHYSICS OF ELEMENTARY PARTICLES AND FIELDS↗
NASA NTRS2004

Vacuum arc plasma thrusters with inductive energy storage driver

An apparatus for producing a vacuum arc plasma source device using a low mass, compact inductive energy storage circuit powered by a low voltage DC supply acts as a vacuum arc plasma thruster. An inductor is charged through a switch, subsequently the switch is opened and a voltage spike of Ldi/dt is produced initiating plasma across a resistive path separating anode and cathode. The plasma is subsequently maintained by energy stored in the inductor. Plasma is produced from cathode material, which allows for any electrically conductive material to be used. A planar structure, a tubular structure, and a coaxial structure allow for consumption of cathode material feed and thereby long lifetime of the thruster for long durations of time.

Schein, Jochen↗
NASA NTRS1984

Metal vapor vacuum arc switching - Applications and results

The design of metal-vapor vacuum-arc switches (MVSs) for electromagnetic launchers is discussed, and preliminary results are presented for an experimental MVS. The general principles of triggered-vacuum-gap and vacuum-interrupter MVSs are reviewed, and the requirements of electromagnetic launchers are analyzed. High-current design problems such as electrode erosion, current sharing, magnetic effects, and thermal effects are examined. The experimental MVS employs stainless-steel flanges, a glass vacuum vessel, an adjustable electrode gap, autonomous internal magnetic-field coils, and a tungsten-pin trigger assembly. Some results from tests without magnetic augmentation are presented graphically.

Cope, D.↗
NASA NTRS2002

Vacuum Arc Vapor Deposition Method and Apparatus for Applying Identification Symbols to Substrates

An apparatus for applying permanent markings onto products using a Vacuum Arc Vapor Deposition (VAVD) marker by accelerating atoms or molecules from a vaporization source onto a substrate to form human and/or machine-readable part identification marking that can be detected optically or via a sensing device like x-ray, thermal imaging, ultrasound, magneto-optic, micro-power impulse radar, capacitance, or other similar sensing means. The apparatus includes a housing with a nozzle having a marking end. A chamber having an electrode, a vacuum port and a charge is located within the housing. The charge is activated by the electrode in a vacuum environment and deposited onto a substrate at the marking end of the nozzle. The apparatus may be a hand-held device or be disconnected from the handle and mounted to a robot or fixed station.

Harry F Schramm↗
NASA NTRS2005

Method of forming ultra thin film devices by vacuum arc vapor deposition

A method for providing an ultra thin electrical circuit integral with a portion of a surface of an object, including using a focal Vacuum Arc Vapor Deposition device having a chamber, a nozzle and a nozzle seal, depressing the nozzle seal against the portion of the object surface to create an airtight compartment in the chamber and depositing one or more ultra thin film layer(s) only on the portion of the surface of the object, the layers being of distinct patterns such that they form the circuit.

Schramm, Harry F.↗
NASA NTRS1959

Vacuum-Induction, Vacuum-Arc, and Air-Induction Melting of a Complex Heat-Resistant Alloy

The relative hot-workability and creep-rupture properties at 1600 F of a complex 55Ni-20Cr-15Co-4Mo-3Ti-3Al alloy were evaluated for vacuum-induction, vacuum-arc, and air-induction melting. A limited study of the role of oxygen and nitrogen and the structural effects in the alloy associated with the melting process was carried out. The results showed that the level of boron and/or zirconium was far more influential on properties than the melting method. Vacuum melting did reduce corner cracking and improve surface during hot-rolling. It also resulted in more uniform properties within heats. The creep-rupture properties were slightly superior in vacuum heats at low boron plus zirconium or in heats with zirconium. There was little advantage at high boron levels and air heats were superior at high levels of boron plus zirconium. Vacuum heats also had fewer oxide and carbonitride inclusions although this was a function of the opportunity for separation of the inclusions from high oxygen plus nitrogen heats. The removal of phosphorous by vacuum melting was not found to be related to properties. Oxygen plus nitrogen appeared to increase ductility in creep-rupture tests suggesting that vacuum melting removes unidentified elements detrimental to ductility. Oxides and carbonitrides in themselves did not initiate microcracks. Carbonitrides in the grain boundaries of air heats did initiate microcracks. The role of microcracking from this source and as a function of oxygen and nitrogen content was not clear. Oxygen and nitrogen did intensify corner cracking during hot-rolling but were not responsible for poor surface which resulted from rolling heats melted in air.

Decker, R. F.↗
DOE OSTI2021

Thermal stability and diffusion characteristics of ultrathin amorphous carbon films grown on crystalline and nitrogenated silicon substrates by filtered cathodic vacuum arc deposition

Amorphous carbon (a-C) films are widely used as protective overcoats in many technology sectors, principally due to their excellent thermophysical properties and chemical inertness. The growth and thermal stability of sub-5-nm-thick a-C films synthesized by filtered cathodic vacuum arc on pure (crystalline) and nitrogenated (amorphous) silicon substrate surfaces were investigated in this study. Samples of a-C/Si and a-C/SiN x /Si stacks were thermally annealed for various durations and subsequently characterized by high-resolution transmission electron microscopy (TEM) and electron energy loss spectroscopy (EELS). The TEM images confirmed the continuity and uniformity of the a-C films and the 5-nm-thick SiN x underlayer formed by silicon nitrogenation using radio-frequency sputtering. The EELS analysis of cross-sectional samples revealed the thermal stability of the a-C films and the efficacy of the SiNx underlayer to prevent carbon migration into the silicon substrate, even after prolonged heating. The obtained results provide insight into the important attributes of an underlayer in heated multilayered media for preventing elemental intermixing with the substrate, while preserving the structural stability of the a-C film at the stack surface. An important contribution of this investigation is the establishment of an experimental framework for accurately assessing the thermal stability and elemental diffusion in layered microstructures exposed to elevated temperatures.

42 ENGINEERING↗
NASA NTRS2003

RF Frequency Oscillations in the Early Stages of Vacuum Arc Collapse

RF frequency oscillations may be produced in a typical capacitive charging / discharging pulsed power system. These oscillations may be benign, parasitic, destructive or crucial to energy deposition. In some applications, proper damping of oscillations may be critical to proper plasma formation. Because the energy deposited into the plasma is a function of plasma and circuit conditions, the entire plasma / circuit system needs to be considered as a unit To accomplish this, the initiation of plasma is modeled as a time-varying, non-linear element in a circuit analysis model. The predicted spectra are compared to empirical power density spectra including those obtained from vacuum arcs.

Griffin, Steven T.↗
NASA NTRS1999

Enhanced vacuum arc vapor deposition electrode

A process for forming a thin metal coating on a substrate wherein a gas stream heated by an electrical current impinges on a metallic target in a vacuum chamber to form a molten pool of the metal and then vaporize a portion of the pool, with the source of the heated gas stream being on one side of the target and the substrate being on the other side of the target such that most of the metallic vapor from the target is directed at the substrate.

Weeks, Jack L.↗