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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 19 records
All sourcesNASA NTRSDOE OSTI
DOE OSTI2020

X-ray free-electron laser wavefront sensing using the fractional Talbot effect

Wavefront sensing at X-ray free-electron lasers is important for quantitatively understanding the fundamental properties of the laser, for aligning X-ray instruments and for conducting scientific experimental analysis. A fractional Talbot wavefront sensor has been developed. This wavefront sensor enables measurements over a wide range of energies, as is common on X-ray instruments, with simplified mechanical requirements and is compatible with the high average power pulses expected in upcoming X-ray free-electron laser upgrades. Single-shot measurements were performed at 500 eV, 1000 eV and 1500 eV at the Linac Coherent Light Source. These measurements were applied to study both mirror alignment and the effects of undulator tapering schemes on source properties. The beamline focal plane position was tracked to an uncertainty of 0.12 mm, and the source location for various undulator tapering schemes to an uncertainty of 1m, demonstrating excellent sensitivity. These findings pave the way to use the fractional Talbot wavefront sensor as a routine, robust and sensitive tool at X-ray free-electron lasers as well as other high-brightness X-ray sources.

73 NUCLEAR PHYSICS AND RADIATION PHYSICS↗
DOE OSTI2022

Simulation of X-ray Hartmann wavefront sensing with the Synchrotron Radiation Workshop

X-ray wavefront measurement is an important beam diagnostic tool, especially for the diffraction-limited X-ray beam. These in situ diagnostics give a better understanding of beam imperfections, and they enable feedback for possible corrections and/or optical alignment improvements. Hartmann wavefront sensing is one of the promising techniques to perform in situ X-ray wavefront measurements. In this work, a simulation tool of the X-ray Hartmann Wavefront Sensor (HWS) is developed under the Synchrotron Radiation Workshop (SRW) framework. Using this new simulation capability, one can take advantage of the full SRW package to simulate Hartmann wavefront sensing with the beam traveling from the X-ray source to the sample through different X-ray optical components. This SRW HWS simulation tool can help to optimize the wavefront sensor parameters for a specific X-ray energy range. It can also simulate an in situ wavefront measurement experiment with a particular beamline optical layout and predict the expected results of the wavefront measurement under different beamline configurations.

36 MATERIALS SCIENCE↗
DOE OSTI2022

Special Issue “EUV and X-ray Wavefront Sensing”

This Special Issue (SI), entitled “EUV and X-ray Wavefront Sensing” is focused on original research performed by world-recognized scientists in the field and is focused on the current state-of-the-art in-situ wavefront sensing for EUV and X-ray. We believe that this SI will provide the reader with an overview of the present status and an outlook on future development in this field.

36 MATERIALS SCIENCE↗
DOE OSTI2019

Method and apparatus for wavefront sensing

A method for performing optical wavefront sensing includes providing an amplitude transmission mask having a light input side, a light output side, and an optical transmission axis passing from the light input side to the light output side. The amplitude transmission mask is characterized by a checkerboard pattern having a square unit cell of size Λ. The method also includes directing an incident light field having a wavelength λ to be incident on the light input side and propagating the incident light field through the amplitude transmission mask. The method further includes producing a plurality of diffracted light fields on the light output side and detecting, at a detector disposed a distance L from the amplitude transmission mask, an interferogram associated with the plurality of diffracted light fields. The relation is satisfied, where n is an integer greater than zero.

71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗
DOE OSTI2025

Coded-mask-based wavefront sensing technique for APS nanofocusing beamline diagnostics

Here, we extend our recently developed coded-mask wavefront sensing technique to enable single-shot measurements of nanofocused x-ray beams. This method accurately reconstructs the focal beam profile by backpropagating the wavefront measured downstream of the beam focus. To validate its performance, we benchmarked it against the conventional fluorescence wire scan method, successfully measuring ∼120 nm focal spots at the 28-ID-B beamline of the Advanced Photon Source using a polymeric compound refractive lens. The results highlight the effectiveness of coded-mask wavefront sensing for high-precision beam profiling and its application as a real-time wavefront monitoring tool.

Shi, Xianbo [Argonne National Laboratory (ANL), Ar↗
DOE OSTI2022

Development of X-ray Wavefront Sensing Techniques for Adaptive Optics Control at the Advanced Photon Source

The planning and construction of new and upgraded high-brightness X-ray synchrotron and free electron laser sources, such as the Advanced Photon Source upgrade project (APS-U), are driving numerous opportunities to advance X-ray science and technologies. At the same time, an increasing number of highly diverse beamline experiments demand wavefront-preserving adaptive X-ray optics with both high precision and flexibility. At the APS, significant effort has been devoted to developing next-generation adaptive and corrective optics combined with state-of-the-art at-wavelength wavefront sensing techniques and an intelligent feedback control system for the automation and self-alignment of beamline optical systems. This article reviews recent achievements in these areas at the APS. Further, these include the development of in-situ wavefront sensing, the application in active feedback control of ultra-precision deformable mirrors, and the exploration of non-invasive wavefront sensing techniques for adaptive optics and beamline diagnostics.

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗
DOE OSTI2019

Wavefront sensing at X-ray free-electron lasers

Here a direct comparison is made between various X-ray wavefront sensing methods with application to optics alignment and focus characterization at X-ray free-electron lasers (XFELs). Focus optimization at XFEL beamlines presents unique challenges due to high peak powers as well as beam pointing instability, meaning that techniques capable of single-shot measurement and that probe the wavefront at an out-of-focus location are desirable. The techniques chosen for the comparison include single-phase-grating Talbot interferometry (shearing interferometry), dual-grating Talbot interferometry (moiré deflectometry) and speckle tracking. All three methods were implemented during a single beam time at the Linac Coherent Light Source, at the X-ray Pump Probe beamline, in order to make a direct comparison. Each method was used to characterize the wavefront resulting from a stack of beryllium compound refractive lenses followed by a corrective phase plate. In addition, difference wavefront measurements with and without the phase plate agreed with its design to within λ/20, which enabled a direct quantitative comparison between methods. Finally, a path toward automated alignment at XFEL beamlines using a wavefront sensor to close the loop is presented.

42 ENGINEERING↗
DOE OSTI2020

Reflective binary amplitude grating for soft x-ray shearing and Hartmann wavefront sensing

Here, we demonstrate a reflective wavefront sensor grating suitable for the characterization of high-quality x-ray beamlines and optical systems with high power densities. Operating at glancing incidence angles, the optical element is deeply etched with a two-level pattern of shearing interferometry gratings and Hartmann wavefront sensor grids. Transverse features block unwanted light, enabling binary amplitude in reflection with high pattern contrast. We present surface characterization and soft x-ray reflectometry of a prototype grating array to demonstrate function prior to wavefront measurement applications. A simulation of device performance is shown.

47 OTHER INSTRUMENTATION↗
DOE OSTI2024

HWO Pupil Chopping Wavefront Sensing and Control FY24 Mini-Project Writeup

This document is a summary of work completed in June through July 2024 to assess the feasibility of implementing non-coronagraphic pupil chopping (PC) for Habitable Worlds Observatory (HWO) primary mirror segment stabilization with an on- and/or off-axis Natural Guide Star (NGS) or Laser Guide Star (LGS). This work considers three different PC configurations: (1) a non-common path (NCP) continuous low-order Deformable Mirror (DM), (2) using the telescope’s primary mirror (M1) segment(s), and (3) using a NCP low-order segmented DM. We show that option 2 likely needs a LGS for guiding, while options 1 and 3 may be able to guide on NGSs. We also separately evaluate spectral bandwidth limitations in the absence of photon noise, showing that the technique is limited to Δλ/λ ≲ 25% in a standard imaging configuration but Δλ/λ ≲ 150% when using a NCP Wynne corrector.

79 ASTRONOMY AND ASTROPHYSICS↗
DOE OSTI2021

EUV and Hard X-ray Hartmann Wavefront Sensing for Optical Metrology, Alignment and Phase Imaging

For more than 15 years, Imagine Optic have developed Extreme Ultra Violet (EUV) and X-ray Hartmann wavefront sensors for metrology and imaging applications. These sensors are compatible with a wide range of X-ray sources: from synchrotrons, Free Electron Lasers, laser-driven betatron and plasma-based EUV lasers to High Harmonic Generation. In this paper, we first describe the principle of a Hartmann sensor and give some key parameters to design a high-performance sensor. We also present different applications from metrology (for manual or automatic alignment of optics), to soft X-ray source optimization and X-ray imaging.

20 metrology↗
DOE OSTI2019

Collaborative development of diffraction-limited beamline optical systems at US DOE light sources

An ongoing collaboration among four US Department of Energy National Laboratories has demonstrated key technology prototypes and software modeling tools required for new high-coherent flux beamline optical systems. New free electron laser (FEL) and diffraction-limited storage ring (DLSR) light sources demand wavefront preservation from source to sample to achieve and maintain optimal performance. Fine wavefront control was achieved using a novel, roomtemperature cooled mirror system called REAL (resistive element adjustable length) that combines cooling with applied, spatially variable auxiliary heating. Single-grating shearing interferometry (also called Talbot interferometry) and Hartmann wavefront sensors were developed and used for optical characterization and alignment on several beamlines, across a range of photon energies. Demonstrations of non-invasive hard x-ray wavefront sensing were performed using a thin diamond single-crystal as a beamsplitter.

Goldberg, Kenneth A.↗
DOE OSTI2023

X-ray wavefront sensor development at the Advanced Light Source

At Lawrence Berkeley National Laboratory's Advanced Light Source, we are developing x-ray wavefront sensors to support the creation and operation of beamlines with diffraction-limited quality. Our new approach to rapid, intermittent wavefront sensing operates in reflection at glancing incidence angles and is compatible with the high-power densities of modern beamlines. For soft x-ray applications especially, the wavefront sensor can operate upstream of the exit slit in a vertically dispersed beam. This single-shot technique supports lateral shearing interferometry and Hartmann wavefront sensing; it can be adapted to speckle-based techniques as well. The reflected beam is directed to an off-axis YAG crystal that produces scintillated visible light. A small mirror reflects the light to a microscope and camera, and the measured wavefront shape information can be used as feedback to adaptive x-ray mirror elements. A compact array of gratings enables measurement across a broad range of photon energies or wavefront curvatures. We describe recent demonstrations at soft x-ray and hard x-ray wavelengths measuring an adaptive x-ray mirror, and a toroidal focusing mirror.

Goldberg, Kenneth A↗
DOE OSTI2023

Using the Gerchberg-Saxton algorithm to reconstruct nonmodulated pyramid wavefront sensor measurements

Adaptive optics (AO) is a technique to improve the resolution of ground-based telescopes by correcting, in real-time, optical aberrations due to atmospheric turbulence and the telescope itself. With the rise of Giant Segmented Mirror Telescopes (GSMT), AO is needed more than ever to reach the full potential of these future observatories. One of the main performance drivers of an AO system is the wavefront sensing operation, consisting of measuring the shape of the above mentioned optical aberrations. Aims. The non-modulated pyramid wavefront sensor (nPWFS) is a wavefront sensor with high sensitivity, allowing the limits of AO systems to be pushed. The high sensitivity comes at the expense of its dynamic range, which makes it a highly non-linear sensor. We propose here a novel way to invert nPWFS signals by using the principle of reciprocity of light propagation and the Gerchberg-Saxton (GS) algorithm. We test the performance of this reconstructor in two steps: the technique is first implemented in simulations, where some of its basic properties are studied. Then, the GS reconstructor is tested on the Santa Cruz Extreme Adaptive optics Laboratory (SEAL) testbed located at the University of California Santa Cruz. This new way to invert the nPWFS measurements allows us to drastically increase the dynamic range of the reconstruction for the nPWFS, pushing the dynamics close to a modulated PWFS. The reconstructor is an iterative algorithm requiring heavy computational burden, which could be an issue for real-time purposes in its current implementation. However, this new reconstructor could still be helpful in the case of many wavefront control operations. In conclusion, this reconstruction technique has also been successfully tested on the Santa Cruz Extreme AO Laboratory (SEAL) bench where it is now used as the standard way to invert nPWFS signal.

47 OTHER INSTRUMENTATION↗
DOE OSTI2019

Preparing for the Next Generation of EUV Lithography at the Center for X-ray Optics

The introduction of EUV lithography into high-volume semiconductor manufacturing this year represents a monumental milestone for EUV technology. After nearly 30 years of development, the EUV research community has overcome many of the key obstacles required to enable the long-awaited integration of EUV lithography into the lab. These obstacles have included: the development of a stable, high-powered EUV source to ensure adequate exposure tool reliability; controlling EUV mask defects and mask contamination; and the development of EUV resists with adequate sensitivity, resolution, and line width roughness to meet the tolerances required for high-volume manufacturing. As EUV moves into its second generation, there will be new challenges facing the community as it works to push EUV technology into the future. Smaller feature sizes will be achieved using higher numerical aperture optics, which are planned to have an anamorphic geometry (asymmetric magnification and numerical aperture between horizontal and vertical axes) to overcome 3D effects at the mask. This new geometry and its larger angle ranges make understanding mask absorber and multilayer effects all the more important. New methods for high-NA wavefront metrology need to be tested to ensure that these optical systems can be aligned to operate with minimal aberrations. Mask defects need to continue to be studied, and the inclusion of EUV pellicles in the roadmap requires that mask inspection and review systems adapt accordingly. Finally, new resists must be developed to support the increased resolution of feature sizes below 8 nm half pitch. The Center for X-ray Optics (CXRO) at Berkeley Lab has been a leader in EUV research for the past 25 years. Leveraging 13.5 nm EUV light from the Advanced Light Source synchrotron facility, CXRO is home to several EUV and soft X-ray (SXR) research tools that have provided important insights into EUV resists, masks, and coatings. The 0.3 NA Microfield exposure tool (MET) and Dose Calibration Tool (DCT) have played an instrumental role in the development of the current generation of high-resolution EUV resists. The Actinic Inspection Tool (AIT) and its successor, SHARP, have enabled aerial image analysis, providing key insights into mask defects, 3D mask effects, illumination, and aberrations. And the CXRO Reflectometer continues to be the industry standard in multilayer coating and EUV mask scattering metrology. To address the new challenges facing the next generation of EUV lithography, CXRO has upgraded its suite of EUV research tools. The 0.5 NA MET5 is a newly commissioned projection lithography tool that is capable of printing feature sizes down to 8 nm half pitch. A new radiation chemistry program is deploying several techniques aimed at dissecting the role of primary photoelectrons and secondary electrons in EUV resists. The SHARP microscope has been outfitted with anamorphic zone plate lenses that can emulate the geometry of next-generation EUV scanners, and the reflectometer has been applied to new scattering experiments for the purpose of understanding the 3D effects of EUV mask multilayers, as well as determining mask properties using scattering profiles. In parallel with these tools, the CXRO High-NA Wavefront Sensing Program is developing high-resolution wavefront sensors suitable for measuring aberrations at high NA. This article presents an overview of these programs and describes how they will address the primary challenges that face the EUV community as it moves to the next generation of EUV lithography.

47 OTHER INSTRUMENTATION↗
DOE OSTI2023

At-wavelength characterization of X-ray wavefronts in Bragg diffraction from crystals

The advent of next-generation synchrotron radiation sources and X-ray free-electron lasers calls for high-quality Bragg-diffraction crystal optics to preserve the X-ray beam coherence and wavefront. This requirement brings new challenges in characterizing crystals in Bragg diffraction in terms of Bragg-plane height errors and wavefront phase distortions. Here, a quantitative methodology to characterize crystal optics using a state-of-the-art at-wavelength wavefront sensing technique and statistical analysis is proposed. The method was tested at the 1-BM-B optics testing beamline at the Advanced Photon Source for measuring silicon and diamond crystals in a self-referencing single-crystal mode and an absolute double-crystal mode. The phase error sensitivity of the technique is demonstrated to be at the λ/100 level required by most applications, such as the characterization of diamond crystals for cavity-based X-ray free-electron lasers.

73 NUCLEAR PHYSICS AND RADIATION PHYSICS↗
DOE OSTI2019

Laser Guide Star for Large Segmented-aperture Space Telescopes. I. Implications for Terrestrial Exoplanet Detection and Observatory Stability

Precision wavefront control on future segmented-aperture space telescopes presents significant challenges, particularly in the context of high-contrast exoplanet direct imaging. We present a new wavefront control architecture that translates the ground-based artificial guide star concept to space with a laser source on board a second spacecraft, formation flying within the telescope’s field of view. We describe the motivating problem of mirror segment motion and develop wavefront sensing requirements as a function of guide star magnitude and segment motion power spectrum. Several sample cases with different values for transmitter power, pointing jitter, and wavelength are presented to illustrate the advantages and challenges of having a non-stellar-magnitude noise limited wavefront sensor for space telescopes. These notional designs allow increased control authority, potentially relaxing spacecraft stability requirements by two orders of magnitude and increasing terrestrial exoplanet discovery space by allowing high-contrast observations of stars of arbitrary brightness.

79 ASTRONOMY AND ASTROPHYSICS↗