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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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8 records
All sourcesNASA NTRSDOE OSTI
DOE OSTI2017

Efficient Fresnel zoneplate pattern data preparation for high-resolution nanofabrication

A Fresnel zoneplate is a diffractive optical element consisting of concentric rings (zones) for which the transmitted light produces a focal spot that is used in all wavelength regimes, including X-rays. The pattern of transmission openings determines the location of the spot and the sub-half wavelength size of the openings can adjust the intensity. Today, very general transmission zoneplate patterns are used for many special imaging and image compensation purposes. Manufacturing zoneplates require a zoneplate pattern file, which precisely describes the size, shape, and contour of the rings based on the desired optical properties of the lens. Generating such a pattern requires the delicate balance of achieving the required optical performance while maintaining manageable file sizes and computation times. Here we describe a new algorithm meeting these needs. In conclusion, by precisely controlling the number of shapes in each zone, the algorithm simultaneously optimizes the desired optical tolerances with the pattern file size.

47 OTHER INSTRUMENTATION↗
DOE OSTI2014

A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope

The authors are expanding the capabilities of the SHARP microscope by implementing complementary imaging modes. SHARP (the SEMATECH High-NA Actinic Reticle review Project) is an actinic, synchrotron-based microscope dedicated to extreme ultraviolet (EUV) photomask research. SHARP’s programmable Fourier Synthesis Illuminator and its use of Fresnel zoneplate lenses as imaging optics provide a versatile framework, facilitating the implementation of diverse modes beyond conventional imaging. In addition to SHARP’s set of standard zoneplates, we have created more than 100 zoneplates for complementary imaging modes, all designed to extract additional information from photomasks, improve navigation and enhance defect detection. More than 50 new zoneplates are installed in the tool; the remaining lenses are currently in production. Here in this paper we discuss the design and fabrication of zoneplates for complementary imaging modes and present image data, obtained using Zernike Phase Contrast and different implementations of Differential Interference Contrast.

36 MATERIALS SCIENCE↗
DOE OSTI2016

Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope

The SHARP high-numerical aperture actinic reticle review project is a synchrotron-based, extreme ultraviolet (EUV) microscope dedicated to photomask research. SHARP emulates the illumination and imaging conditions of current EUV lithography scanners and those several generations into the future. An anamorphic imaging optic with increased mask-side numerical aperture (NA) in the horizontal and increased demagnification in the vertical direction has been proposed in this paper to overcome limitations of current multilayer coatings and extend EUV lithography beyond 0.33 NA. Zoneplate lenses with an anamorphic 4×/8× NA of 0.55 are fabricated and installed in the SHARP microscope to emulate anamorphic imaging. SHARP’s Fourier synthesis illuminator with a range of angles exceeding the collected solid angle of the newly designed elliptical zoneplates can produce arbitrary angular source spectra matched to anamorphic imaging. A target with anamorphic dense features down to 50-nm critical dimension is fabricated using 40 nm of nickel as the absorber. In a demonstration experiment, anamorphic imaging at 0.55 4×/8× NA and 6 deg central ray angle (CRA) is compared with conventional imaging at 0.5 4× NA and 8 deg CRA. A significant contrast loss in horizontal features is observed in the conventional images. Finally, the anamorphic images show the same image quality in the horizontal and vertical directions.

36 MATERIALS SCIENCE↗
DOE OSTI2024

Towards Full Field-of-View Fourier Ptychography for Extreme Ultraviolet Microscope

We evaluate various Fourier ptychographic microscopy (FPM) reconstruction algorithms using both simulated and experimental data acquired from an Extreme Ultraviolet (EUV, 13.5 nm wavelength) microscope. We specifically focus on the algorithms' ability to robustly address field-dependent aberrations, which enables increased spatial resolution and quantitative phase imaging across an expanded field of view. We systematically compare the algorithms' performance under aberrations for a single zoneplate imaging system, utilizing Fourier Ring Correlation (FRC) as a systematic metric for assessing reconstruction quality. Furthermore, we explore the impact of systematic errors on the reconstruction of experimental data, aiming to increase the effective field of view by 25-fold, from the nominal 5x5 um2 diffraction-limited area. Additionally, our evaluation incorporates innovative FPM-adjacent methodologies, including the Angular Ptychographic Imaging with Closed-form method (APIC), for reconstructing EUV images.

Gu, Chaoying↗
DOE OSTI2025

Mask-side Hyper-NA EUV imaging on the SHARP microscope

Hyper-NA, the prospective successor to high-numerical aperture (NA) extreme ultraviolet lithography (EUVL) could be inserted soon after 2030. Hyper-NA poses a number of challenges, including reduced depth of focus, amplified mask three-dimensional effects, and increased mask-side angular range. A Hyper-NA capable extreme ultraviolet (EUV) mask-imaging tool can address these challenges and accelerate research and development toward Hyper-NA. The Sharp High-Numerical Aperture Actinic Reticle Review Project (SHARP) EUV mask microscope is supporting mask-side high-NA imaging since 2015. Implementing mask-side Hyper-NA imaging in 2024 enables research and development toward the corresponding nodes of EUVL. Hyper-NA zoneplates at 0.75 4x/8x NA with a 6.7-deg chief ray angle and 0.85 4x/8x NA with a 7.4-deg chief ray angle are added to the SHARP microscope. Imaging at mask-side Hyper-NA is demonstrated. Imaging of 5-nm half-pitch (wafer scale) horizontal lines and spaces is demonstrated using dipole illumination. Imaging of 5-nm half-pitch (wafer scale) vertical lines and spaces is demonstrated using frequency-doubled imaging of 40-nm hp (mask scale) lines and spaces. Normalized image log slope (NILS) and modulation of Hyper-NA image data match closely to simulations for horizontal lines and spaces. A reduction in NILS of 0.3 or less is observed for vertical lines and spaces in the two-beam imaging regime. Through-focus image data are discussed, comparing different dipole sources and mask-side NAs. Mask-side Hyper-NA photomask imaging has been implemented and demonstrated on the SHARP microscope and is now available to users of the instrument.

Benk, Markus↗
DOE OSTI2019

Upgrade to the SHARP EUV mask microscope

© 2019 SPIE. The Sharp High-NA Actinic Reticle review Project (SHARP) is a synchrotron-based, extreme ultraviolet (EUV) microscope dedicated to photomask research. A potential upgrade to the SHARP microscope is presented. The upgrade includes changing the light path in the instrument from its current off-Axis configuration to an on-Axis configuration. This change allows for an increased working distance of 2.5 mm or more. A central obscuration, added to the zoneplate aperture, blocks stray light from reaching the central part of the image, thus improving the image contrast. The imaging performance of the two configurations is evaluated by means of ray tracing.

Benk, M↗
DOE OSTI2016

Nm-scale spatial resolution x-ray imaging with MLL nanofocusing optics: instrumentational requirements and challenges

The Hard X-ray Nanoprobe (HXN) beamline at NSLS-II has been designed and constructed to enable imaging experiments with unprecedented spatial resolution and detection sensitivity. The HXN X-ray Microscope is a key instrument for the beamline, providing a suite of experimental capabilities which includes scanning fluorescence, diffraction, differential phase contrast and ptychography utilizing Multilayer Laue Lenses (MLL) and zoneplate (ZP) as nanofocusing optics. In this paper, we present technical requirements for the MLL-based scanning microscope, outline the development concept and present first ~15 x 15 nm 2 spatial resolution x-ray fluorescence images.

47 OTHER INSTRUMENTATION↗