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Chao, H. W.

Publications and source records attributed to Chao, H. W..

Effect of magnetic field profile on the uniformity of a distributed electron cyclotron resonance plasma

This study extensively measured the uniformity of an electron cyclotron resonance (ECR) plasma versus the magnetic field distribution. The influence of magnetic field distribution on the generation of uniform ECR plasma was examined. It is suggested that in addition to the uniformity of the magnetic field distribution at ECR zone and at the downstream zone near the substrate, the transition of the magnetic field between these two zones is also crucial. A uniform ECR plasma with the electron density uniformity of ±7.7% over 500 × 500 mm{sup 2} was measured at the downstream. The idea of generating uniform ECR plasma can be scaled up to a much larger area by using an n × n microwave input array and a well-designed magnetic system.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Generating electron cyclotron resonance plasma using distributed scheme

This study employs a distributed microwave input system and permanent magnets to generate large-area electron cyclotron resonance (ECR) plasma. ECR plasmas were generated with nitrogen gas, and the plasma density was measured by Langmuir probe. A uniform ECR plasma with the electron density fluctuation of {+-}9.8% over 500 mm Multiplication-Sign 500 mm was reported. The proposed idea of generating uniform ECR plasma can be scaled to a much larger area by using n Multiplication-Sign n microwave input array system together with well-designed permanent magnets.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗