Rapid Ge Diffusion along Si/SiO2 Interfaces during High Temperature Oxidation for Quantum-Scale Structures.
Abstract not provided.
Thornton, Chappel Sharrock↗
Engineering topics
Hicks, Benjamin
Publications and source records attributed to Hicks, Benjamin.
Activation Energy of Rapid Ge Diffusion along Si/SiO2 Interfaces during High Temperature Oxidation.
Abstract not provided.
Sharrock, Chappel↗