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Raouf, Nasrat A.

Publications and source records attributed to Raouf, Nasrat A..

Optical Design of the Earth Surface Mineral Dust Source Investigation (EMIT) Imaging Spectrometer

The Earth Surface Mineral Dust Source Investigation (EMIT) instrument is a high fidelity imaging spectrometer developed to characterize surface mineralogy of the Earth’s dust source regions over the spectral range of 380- 2500 nm and spectral sampling of 7.4 nm. EMIT will close the current knowledge gap in dust source mineral composition by collecting over 1 billion high signal-to-noise ratio spectra in this region of our planet. These new measurements will be used in conjunction with state-of-the-art Earth System Models to understand and reduce the uncertainty in the radiative forcing effect of mineral dust aerosols. EMIT will be deployed on the International Space Station that has an orbit that is well suited for measuring the arid land regions of the Earth. The optical design utilizes a Dyson spectrometer to reduce volume and mass for a fast (F/1.8) and wide swath (1240 samples) optical system. An overview of the EMIT optical design, development, and current status are discussed.

Green, Robert O.↗

(abstract) Optical Scattering and Surface Microroughness of Ion Beam Deposited Au and Pt Thin Films

Thin films of gold and platinum have been deposited onto superpolished fused silica substrates using thermal evaporation, ion assisted deposition (IAD), and ion assisted sputtering. The influence of ion beam flux, thin film material, and deposition rate on the films microroughness have been investigated. Short range surface microroughness of the films has been examined using scanning tunneling microscopy (STM) and atomic force microscopy (AFM). Long range surface microroughness has been characterized using an angle resolved optical scatterometer. Results indicate that ion beam deposited coatings have improved microstructure over thermally evaporated films.

assisted sputtering fused silica ion beam microrou↗

Optical and Electrical Properties of Reactively Sputtered TiN, ZrN, and HfN Thin Films

Thin films of titanium, zirconium, and hafnium nitride are prepared by DC magnetron reactive sputtering at room temperature on fused silica, optical glass, and silicon substrates. Deposition parameters are investigated in order to obtain stoichiometric films. The optical and electrical properties of the films as a function of nitrogen partial pressure are determined. The results show that an inverse correlation exists between the optical reflectance and the electrical resistivity of the films. Ellipsometer data for all three films show that their refractive index in the visible spectrum is decreased by increasing the film thickness while the extinction coefficient is unchanged. Thin films of TiN have the lowest room temperature resistivity relative to ZrN and HfN thin films.

Reactive↗

Measuring Roughnesses Of Optical Surfaces

Report discusses use of scanning tunneling microscopy and atomic force microscopy to measure roughnesses of optical surfaces. These techniques offer greater spatial resolution than other techniques. Report notes scanning tunneling microscopes and atomic force microscopes resolve down to 1 nm.

Coulter, Daniel R.↗