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Zheng, Liu

Publications and source records attributed to Zheng, Liu.

Topological Spin Textures in an Insulating van der Waals Ferromagnet

Generation and control of topological spin textures constitutes one of the most exciting challenges of modern spintronics given their potential applications in information storage technologies. Of particular interest are magnetic insulators, which due to low damping, absence of Joule heating and reduced dissipation can provide energy-efficient spin-textures platform. Here, it is demonstrated that the interplay between sample thickness, external magnetic fields, and optical excitations can generate a prolific paramount of spin textures, and their coexistence in insulating CrBr 3 van der Waals (vdW) ferromagnets. Using high-resolution magnetic force microscopy and large-scale micromagnetic simulation methods, the existence of a large region in T-B phase diagram is demonstrated where different stripe domains, skyrmion crystals, and magnetic domains exist and can be intrinsically selected or transformed to each-other via a phase-switch mechanism. Lorentz transmission electron microscopy unveils the mixed chirality of the magnetic textures that are of Bloch-type at given conditions but can be further manipulated into Néel-type or hybrid-type via thickness-engineering. The topological phase transformation between the different magnetic objects can be further inspected by standard photoluminescence optical probes resolved by circular polarization indicative of an existence of exciton-skyrmion coupling mechanism. The findings identify vdW magnetic insulators as a promising framework of materials for the manipulation and generation of highly ordered skyrmion lattices relevant for device integration at the atomic level.

36 MATERIALS SCIENCE↗

A modified equivalent-width technique for diode-laser line strength measurements

A modified equivalent-width method is introduced that improves the accuracy of spectral line strength measurements using diode lasers. This method differs from the standard method in that no attempt is made to calculate the true equivalent width in order to determine the line strength. Instead, the line strength is derived directly from a measurement of the area under the line close to the line center and ignore the normal correction terms. Tests with actual spectra and simulations indicate that this method is accurate to better than 1 percent with lines broadened by up to 50 percent by the laser instrument function.

Strow, L. Larrabee↗