Engineering topics

Zukic, Muamer

Publications and source records attributed to Zukic, Muamer.

At least 19 records

NASA NTRS1994

Depth Profiling Analysis of Aluminum Oxidation During Film Deposition in a Conventional High Vacuum System

The oxidation of aluminum thin films deposited in a conventional high vacuum chamber has been investigated using x-ray photoelectron spectroscopy (XPS) and depth profiling. The state of the Al layer was preserved by coating it with a protective MgF2 layer in the deposition chamber. Oxygen concentrations in the film layers were determined as a function of sputter time (depth into the film). The results show that an oxidized layer is formed at the start of Al deposition and that a less extensively oxidized Al layer is deposited if the deposition rate is fast. The top surface of the Al layer oxidizes very quickly. This top oxidized layer may be thicker than has been previously reported by optical methods. Maximum oxygen concentrations measured by XPS at each Al interface are related to pressure to rate ratios determined during the Al layer deposition.

Kim, Jongmin↗

NASA NTRS1994

Reflective Filters Design for Self-Filtering Narrowband Ultraviolet Imaging Experiment Wide-Field Surveys (NUVIEWS) Project

We report the design of multilayer reflective filters for the self-filtering cameras of the NUVIEWS project. Wide angle self-filtering cameras were designed to image the C IV (154.9 nm) line emission, and H2 Lyman band fluorescence (centered at 161 nm) over a 20 deg x 30 deg field of view. A key element of the filter design includes the development of pi-multilayers optimized to provide maximum reflectance at 154.9 nm and 161 nm for the respective cameras without significant spectral sensitivity to the large cone angle of the incident radiation. We applied self-filtering concepts to design NUVIEWS telescope filters that are composed of three reflective mirrors and one folding mirror. The filters with narrowband widths of 6 and 8 rim at 154.9 and 161 nm, respectively, have net throughputs of more than 50 % with average blocking of out-of-band wavelengths better than 3 x 10(exp -4)%.

Park, Jung- Ho↗

NASA NTRS1994

Multilayer Thin Film Polarizer Design for Far Ultraviolet using Induced Transmission and Absorption Technique

Good theoretical designs of far ultraviolet polarizers have been reported using a MgF2/Al/MgF2 three layer structure on a thick Al layer as a substrate. The thicknesses were determined to induce transmission and absorption of p-polarized light. In these designs Al optical constants were used from films produced in ultrahigh vacuum (UHV: 10(exp -10) torr). Reflectance values for polarizers fabricated in a conventional high vacuum (p approx. 10(exp -6 torr)) using the UHV design parameters differed dramatically from the design predictions. Al is a highly reactive material and is oxidized even in a high vacuum chamber. In order to solve the problem other metals have been studied. It is found that a larger reflectance difference is closely related to higher amplitude and larger phase difference of Fresnel reflection coefficients between two polarizations at the boundary of MgF2/metal. It is also found that for one material a larger angle of incidence from the surface normal brings larger amplitude and phase difference. Be and Mo are found good materials to replace Al. Polarizers designed for 121.6 nm with Be at 60 deg and with Mo at 70 deg are shown as examples.

Kim, Jongmin↗

NASA NTRS1993

Multilayer thin film design as far ultraviolet quarterwave retarders

At short wavelengths, such as FUV, transparent, optically active materials are scarce. Reflection phase retardation by a multilayer thin film can be a good alternative in this wavelength region. We design a multilayer quarterwave retarder by calculating the electric fields at each boundary in the multilayer thin film. Using this method, we achieve designs of FUV multilayers which provide high, matched reflectances for both s- and p-polarization states, and at the same time a phase difference between these two states of nearly 90 deg. For example, a quarterwave retarder designed at the Lyman-alpha line (121.6 nm) has 81.05 percent reflectance for the s-polarization and 81.04 percent for the p-polarization state. The phase difference between these two polarization states is 90.07 deg. For convenience the retarders are designed for 45 deg angle of incidence, but our design approach can be used for any other angle of incidence. Aluminum and MgF2 are used as film materials and an opaque thick film of aluminum as the substrate.

Kim, Jongmin↗

NASA NTRS1993

Multilayer thin film design as far ultraviolet polarizers

We use a concept of induced transmission and absorption to design multilayer thin film reflection polarizers in the FUV region. We achieve high s-polarization reflectance and a high degree of polarization by means of a MgF2/Al/MgF2 three layer structure on an opaque thick film of aluminum as the substrate. For convenience they are designed at a 45 deg angle of incidence. For example, our polarizer designed for the Lyman-alpha line (121.6 nm) has 88.67 percent reflectance for the s-polarization case, and 1.21 percent for the p-polarization case, with a degree of polarization of 97.31 percent. If we make a double surface polarizer with this design, it will have a degree of polarization of 99.96 percent and s-polarization throughput of 78.62 percent.

Kim, Jongmin↗

NASA NTRS1993

Polarimetry of the HI Lyman-alpha for coronal magnetic field diagnostics

We discuss and analyze the possible sources of observational and instrumental uncertainty that can be encountered in measuring magnetic fields of the solar corona through polarimetric observations of the Hanle effect of the coronal Ly-alpha line. The Hanle effect is the modification of the linear polarization of a resonantly scattered line, due to the presence of a magnetic field. Simulated observations are used to examine how polarimetric measurements of this effect are affected by the line-of-sight integration, the electron collisions, and the Ly-alpha geocorona. We plan to implement the coronal magnetic field diagnostics via the Ly-alpha Hanle effect using an all-reflecting Ly-alpha coronagraph/polarimeter (Ly-alphaCoPo) which employs reflecting multilayer mirrors, polarizers, and filters. We discuss here the requirements for such an instrument, and analyze the sources of instrumental uncertainty for polarimetric observations of the coronal Ly-alpha Hanle effect. We conclude that the anticipated polarization signal from the corona and the expected performance of the Ly-alphaCoPo instrument are such that the Ly-alpha Hanle effect method for coronal field diagnostics is feasible.

Fineschi, Silvano↗

NASA NTRS1993

Design and fabrication of the All-Reflecting H-Lyman-alpha Coronagraph/Polarimeter

We have designed, analyzed, and are now fabricating an All-Reflecting H-Lyman-alpha Coronagraph/Polarimeter for solar research. This new instrument operates in a narrow bandpass centered at 215.7 A - the neutral hydrogen Ly-alpha line. It is shorter and faster than the telescope which produced solar Ly-alpha images as a part of the MSSTA payload that was launched on May 13, 1991. The Ly-alpha line is produced and linearly polarized in the solar corona by resonance scattering, and the presence of a magnetic field modifies this polarization according to the Hanle effect. The Lyman-alpha Coronagraph/Polarimeter instrument has been designed to measure coronal magnetic fields by interpreting, via the Hanle effect, the measured linear polarization of the coronal Ly-alpha line. Ultrasmooth mirrors, polarizers, and filters are being flow-polished for this instrument from CVD silicon carbide substrates. These optical components will be coated using advanced induced transmission and absorption thin film multilayer coatings to optimize the reflectivity and polarization properties at 1215.7 A. We describe some of the solar imaging results obtained with the MSSTA Lyman-alpha coronagraph. We also discuss the optical design parameters and fabrication plans for the All-Reflecting H-Lyman-alpha Coronagraph/Polarimeter.

Hoover, Richard B.↗

NASA NTRS1993

Filters for the International Solar Terrestrial Physics (ISTP) mission far ultraviolet imager

The far ultraviolet (FUV) imager for the International Solar Terrestrial Physics (ISTP) mission is designed to image four features of the aurora: O I lines at 130.4 nm and 135.6 nm and the N2 Lyman-Birge-Hopfield (LBH) bands between 140 nm - 160 nm (LBH long) and 160 nm - 180 nm (LBH long). In this paper we report the design and fabrication of narrow-band and broadband filters for the ISTP FUV imager. Narrow-band filters designed and fabricated for the O I lines have a bandwidth of less than 5 nm and a peak transmittance of 23.9 percent and 38.3 percent at 130.4 nm and 135.6 nm, respectively. Broadband filters designed and fabricated for LBH bands have the transmittance close to 60 percent. Blocking of out-of-band wavelengths for all filters is better than 5x10(exp -3) percent with the transmittance at 121.6 nm of less than 10(exp -6) percent.

Zukic, Muamer↗

NASA NTRS1993

Multilayer thin film design for far ultraviolet polarizers using an induced transmission and absorption technique

An explanation of induced transmission for spectral regions excluding the far ultraviolet (FUV) is given to better understand how induced transmission and absorption can be used to design effective polarizers in the FUV spectral region. We achieve high s-polarization reflectance and a high degree of polarization (P equals (Rs-Rp)/(Rs+Rp)) by means of a MgF2/Al/MgF2 three layer structure on an opaque thick film of Al as the substrate. For example, our polarizer designed for the Lyman-alpha line (lambda equals 121.6 nm) has 87.95 percent reflectance for the s-polarization case and 0.43 percent for the p-polarization case, with a degree of polarization of 99.03 percent. If a double reflection polarizer is made with this design, it will have a degree of polarization of 99.99 percent and s-polarization throughput of 77.35 percent.

Kim, Jongmin↗

NASA NTRS1993

Design and fabrication of a reflection far ultraviolet polarizer and retarder

New methods have been developed for the design of a far ultraviolet multilayer reflection polarizer and retarder. A MgF2/Al/MgF2 three-layer structure deposited on a thick opaque Al film (substrate) is used for the design of polarizers and retarders. The induced transmission and absorption method is used for the design of a polarizer and layer-by-layer electric field calculation method is used for the design of a quarterwave retarder. In order to fabricate these designs in a conventional high vacuum chamber, we have to minimize the oxidation of the Al layers and somehow characterize the oxidized layer. X-ray photoelectron spectroscopy is used to investigate the amount and profile of oxidation. Depth profiling results and a seven layer oxidation model are presented.

Kim, Jongmin↗

NASA NTRS1993

Transparent conductive coatings in the far ultraviolet

In certain cases a space-borne optical instrument with a dielectric window requires a transparent conductive coating deposited on the window to remove the electrostatic charge collected due to the bombardment of ionized particles. Semiconductor and metal films are studied for use as transparent conductive coatings for the front window of far ultraviolet camera. Cr is found to be the best coating material. The theoretical search for the semiconductor and metal coating materials and experimental results for ITO and Cr films are reported.

Kim, Jongmin↗

NASA NTRS1993

VUV thin films, chapter 7

The application of thin film technology to the vacuum ultraviolet (VUV) wavelength region from 120 nm to 230 nm has not been fully exploited in the past because of absorption effects which complicate the accurate determination of the optical functions of dielectric materials. The problem therefore reduces to that of determining the real and imaginary parts of a complex optical function, namely the frequency dependent refractive index n and extinction coefficient k. We discuss techniques for the inverse retrieval of n and k for dielectric materials at VUV wavelengths from measurements of their reflectance and transmittance. Suitable substrate and film materials are identified for application in the VUV. Such applications include coatings for the fabrication of narrow and broadband filters and beamsplitters. The availability of such devices open the VUV regime to high resolution photometry, interferometry and polarimetry both for space based and laboratory applications. This chapter deals with the optics of absorbing multilayers, the determination of the optical functions for several useful materials, and the design of VUV multilayer stacks as applied to the design of narrow and broadband reflection and transmission filters and beamsplitters. Experimental techniques are discussed briefly, and several examples of the optical functions derived for selected materials are presented.

Zukic, Muamer↗

NASA NTRS1993

X ray, extreme and far ultraviolet optical thin films for space applications

Far and extreme ultraviolet optical thin film filters find many uses in space astronomy, space astrophysics, and space aeronomy. Spacebased spectrographs are used for studying emission and absorption features of the earth, planets, sun, stars, and the interstellar medium. Most of these spectrographs use transmission or reflection filters. This requirement has prompted a search for selective filtering coatings with high throughput in the FUV and EUV spectral region. Important progress toward the development of thin film filters with improved efficiency and stability has been made in recent years. The goal for this field is the minimization of absorption to get high throughput and enhancement of wavelength selection. The Optical Aeronomy Laboratory (OAL) at the University of Alabama in Huntsville has recently developed the technology to determine optical constants of bulk and film materials for wavelengths extending from x-rays (0.1 nm) to the FUV (200 nm), and several materials have been identified that were used for designs of various optical devices which previously have been restricted to space application in the visible and near infrared. A new design concept called the Pi-multilayer was introduced and applied to the design of optical coatings for wavelengths extending from x-rays to the FUV. Section 3 of this report explains the Pi-multilayer approach and demonstrates its application for the design and fabrication of the FUV coatings. Two layer Pi-stacks have been utilized for the design of reflection filters in the EUV wavelength range from 70 - 100 nm. In order to eliminate losses due to the low reflection of the imaging optics and increase throughput and out-of-band rejection of the EUV instrumentation we introduced a self-filtering camera concept. In the FUV region, MgF2 and LiF crystals are known to be birefringent. Transmission polarizers and quarterwave retarders made of MgF2 or LiF crystals are commercially available but the performances are poor. New techniques for the design of the EUV and FUV polarizers and quarterwave retarders are described in Section 5. X- and gamma-ray detectors rely on a measurement of the electron which is effected when a ray interacts with matter. The design of an x- and gamma-ray telescope to operate in a particular region of the spectrum is, therefore, largely dictated by the mechanism through which the rays interact. Energy selection and the focusing of the incident high energy rays can be achieved with spectrally selective high reflective multilayers. The design and spectral performance of narrowband reflective x-ray Pi-multilayers are presented in section 6.

Zukic, Muamer↗

NASA NTRS1993

A vacuum ultraviolet spectrophotometric system

The development of a vacuum ultraviolet spectrophotometric system for measuring transmittance and reflectance at variable angles is presented. Using various detectors and sources, the spectrophotometric system has been used for wavelengths from 80 nm to 300 nm with optical components up to 80 mm in diameter. The capability exists to make measurements through the visible range.

Spann, James F.↗

NASA NTRS1993

Radiation Damage Effects in Far Ultraviolet Filters and Substrates

New advances in VUV thin film filter technology have been made using filter designs with multilayers of materials such as Al2O3, BaF2, CaF2, HfO2, LaF3, MgF2, and SiO2. Our immediate application for these filters will be in an imaging system to be flown on a satellite where a 2 X 9 R(sub E) orbit will expose the instrument to approximately 275 krads of radiation. In view of the fact that no previous studies have been made on potential radiation damage of these materials in the thin film format, we report on such an assessment here. Transmittances and reflectances of BaF2, CaF2, HfO2, LaF3, MgF2, and SiO2 thin films on MgF2 substrates, Al2O3 thin films on fused silica substrates, uncoated fused silica and MgF2, and four multilayer filters made from these materials were measured from 120 nm to 180 nm before and after irradiation by 250 krads from a Co-60 gamma radiation source. No radiation-induced losses in transmittance or reflectance occurred in this wavelength range. Additional postradiation measurements from 160 nm to 300 nm indicated a 3 - 5% radiation-induced absorption near 260 nm in some of the samples with MgF2 substrates. From these measurements it is concluded that far ultraviolet filters made from the materials tested should experience less that 5% change from exposure to up to 250 krads of high energy radiation in space applications.

Keffer, Charles E.↗

NASA NTRS1992

Far ultraviolet filters for the ISTP UV imager

The far ultraviolet (FUV) imager for the International Solar-Terrestrial Physics (ISTP) mission is designed to image four features of the aurora: O I lines at 130.4 nm and 135.6 nm and the N2 Lyman-Birge-Hopfield (LBH) bands between 140 nm-160 nm (LBH long) and 160 nm-180 nm (LBH long). We report the design and fabrication of narrow-band and broadband filters for the ISTP FUV imager. Narrow-band filters designed and fabricated for the O I lines have a bandwidth of less than 5 nm and a peak transmittance of 22.3 and 29.6 percent at 130.4 nm and 135.6 nm, respectively. Broadband filters designed and fabricated for LBH bands have the transmittance greater than 40 percent for LBH short and close to 60 percent for LBH long. Blocking of out-of-band wavelengths for all filters is better than 0.001 percent with the transmittance at 121.6 nm of less than 10 exp -6 percent.

Zukic, Muamer↗

NASA NTRS1992

Extreme ultraviolet filters for 58.4 and 83.4 nm

We report the design of an EUV filter for He I at 58.4 nm and the design and fabrication of an EUV filter for O II at 83.4 nm. Both filters are designed as combinations of three narrow-band reflection filters. The net transmittance through both EUV filters is close to 10 percent with bandwidths less than 10 nm, and blocking better than 0.005 percent for out-of-band wavelengths. A theoretical calculation of the 83.4 nm filter predicts higher values for the peak transmittance than the measured spectral performance of the fabricated filter. Since aluminum is one of the film materials used for the fabrication of EUV filters, the aluminum film oxidation can be modeled in order to explain the discrepancy between the theory and experiment. Since the filters operate at angles of incidence up to 50 deg, the optical components of a system can serve as both the filtering and imaging elements.

Zukic, Muamer↗

NASA NTRS1992

Optical configurations of H I Lyman-alpha coronagraph/polarimeters

The Multi-Spectral Solar Telescope Array (MSSTA) has obtained numerous high-resolution soft X-ray/EUV/FUV solar images with multilayer telescopes; these show dramatic prominences, spicules, and threadlike limb structures. There is excellent correlation between faint Lyman-alpha coronal structures seen in the digitized MSSTA images and prominences seen in H-alpha images gathered by ground-based observatories. The MSSTA has established the feasibility of an all-reflecting, imaging Ly-alpha coronagraph/polarimeter.

Hoover, Richard B.↗