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Zukic, Muamer

Publications and source records attributed to Zukic, Muamer.

22 records · Page 2

High throughput narrowband 83.4 nm self-filtering camera

Photometric imaging of ionospheric/magnetospheric O II emission at 83.4 nm is a primary objective for mapping the distribution of O(+) ions. However, instrumental sensitivity has been a major barrier to realizing this goal. We report an instrumental design employing a low focal ratio three-mirror camera where the reflecting surfaces act as both narrowband reflection filters at 83.4 nm and as a high quality imaging system. The design includes coatings with reflectances that are relatively insensitive to the angle of incidence of light. The peak reflectance per mirror is more than 60 percent at 83.4 nm with the average reflectance for out-of-band wavelengths of less than 5 percent. The net reflective transmission for the three mirrors is greater than 20 percent with 6.8 nm bandwidth and 0.01 percent maximum transmittance for out-of-band wavelengths. The transmittance at 30.4 nm is 0.03 percent at 58.4 nm 0.05 percent, and at 121.6 nm 0.004 percent. When used with an open microchannel plate detector, contamination by H Ly-alpha is essentially eliminated. With this spectral purity and effective elimination of major contributors to background contamination noise, a signal-to-noise ratio (excluding detector noise) of 10 is achievable for a 0.01 R signal in 8.8 seconds for the full 6 deg field-of-view.

Zukic, Muamer

High-reflective multilayers as narrowband VUV filters

A novel coating has been developed for the 120-230 nm wavelength VUV region which yields significantly higher reflectivity over selectable bandwidths and can be used to fabricate high-performance narrowband reflection filters; the spectral properties of such filters are greatly enhanced through their use in tandem. The coating uses a combination of high and low refractive index dielectric pairs. The proper choice of high-low ratio reduces the effects of VUV absorption for high refractive index films whose extinction coefficient is much higher than for a low-index material.

Zukic, Muamer

Vacuum ultraviolet thin films. I - Optical constants of BaF2, CaF2, LaF3, MgF2, Al2O3, HfO2, and SiO2 thin films. II - Vacuum ultraviolet all-dielectric narrowband filters

An iteration process matching calculated and measured reflectance and transmittance values in the 120-230 nm VUV region is presently used to ascertain the optical constants of bulk MgF2, as well as films of BaF2, CaF2, LaF3, MgF2, Al2O3, HfO2, and SiO2 deposited on MgF2 substrates. In the second part of this work, a design concept is demonstrated for two filters, employing rapidly changing extinction coefficients, centered at 135 nm for BaF2 and 141 nm for SiO2. These filters are shown to yield excellent narrowband spectral performance in combination with narrowband reflection filters.

Zukic, Muamer

Design of nonpolarizing achromatic beamsplitters with dielectric multilayer coatings

A novel design approach is presented for nominally nonpolarizing beamsplitters with very low polarization over an extended wavelength range, with low angular sensitivity. A high degree of intensity matching for s and p polarization in a given wavelength interval, from 500 to 600 nm, has been obtained for multilayer stacks derived from an initial graded-index film design by matching of the characteristic matrices. This graded-index film design maintains a very low polarization ratio for almost the complete visible region, covering a wavelength range about twice that covered by the derived homogeneous multilayer stack.

Zukic, Muamer