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NASA NTRS · 19670000915

Isolation of components on a silicon wafer using SiO2

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Abstract

Isolation of components on silicon wafer by groove etching and silicon dioxide deposition

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ISOLATION GROOVE ETCHING SILICON COMPOUND DEPOSITION

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Skouson, G. W.. 1966-11-01. Isolation of components on a silicon wafer using SiO2. https://ntrs.nasa.gov/citations/19670000915

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