NASA NTRS · 19690015061
Development of ion implantation techniques for microelectronics
Abstract
Ion implantation process for fabricating active devices in high bandgap semiconductor materials for high temperature operation
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Dunlap, H. L., Hunsperger, R. G., Marsh, O. J.. 1968-10-01. Development of ion implantation techniques for microelectronics. https://ntrs.nasa.gov/citations/19690015061
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